CN102308364A - Laser exposure device - Google Patents
Laser exposure device Download PDFInfo
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- CN102308364A CN102308364A CN2010800064003A CN201080006400A CN102308364A CN 102308364 A CN102308364 A CN 102308364A CN 2010800064003 A CN2010800064003 A CN 2010800064003A CN 201080006400 A CN201080006400 A CN 201080006400A CN 102308364 A CN102308364 A CN 102308364A
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- laser
- lens
- fly
- light
- fly lens
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0275—Photolithographic processes using lasers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
- G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
- G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
- G02B27/0961—Lens arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70083—Non-homogeneous intensity distribution in the mask plane
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
Abstract
The device is provided with a first fly eye lens (2) to enlarge the cross-sectional shape of a laser beam, a first light path difference adjustment member (3) that is provided on the laser beam incident side of the first fly eye lens (2) and creates phase differences in the laser beam that enters each condenser lens (2a) of the first fly eye lens (2), a condenser lens (4) for transforming the laser beam exiting the light path difference adjustment member (3) into parallel light, a second fly eye lens (6) to produce uniform light intensity distribution by the laser beam in a photomask illumination area, and a second light path difference adjustment member (7) that is provided on the laser beam incident side of the second fly eye lens (6) and creates phase differences in the laser beam that enters each condenser lenses (6a) of the second fly eye lens (6). As a result, interference patterns in the laser beam created by the first fly eye lens are averaged out, and uneven lighting by the laser beam is reduced.
Description
Technical field
The present invention relates to possess with the face of the optical axis approximate vertical of laser in dispose the laser explosure device that fly's eye (the Off ラ イ ア イ) lens of a plurality of collector lenses form side by side; In detail; The interference fringe equalization that relates to the laser that will be produced by fly lens reduces the uneven illumination of laser and the laser explosure device that can make public uniformly simultaneously.
Background technology
Existing laser explosure device shines by the exposure body in order to make laser equably, use expansion of laser light diameter optical beam expander and be used for and will have enlarged the light integrators such as fly lens etc. of intensity distributions homogenizing of the laser of diameter.And reduction is provided with optical path difference adjustment member (for example, with reference to patent documentation 1) by the interference fringe that the interference of light produced that sees through of fly lens between optical beam expander and fly lens for the coherence's (but interference capability) who utilizes laser.
Patent documentation 1: the spy opens the 2004-12757 communique
But; In this existing laser explosure device; Because optical path difference adjustment member only is located between optical beam expander and the fly lens; Therefore; Can not remove the interference fringe that light causes that sees through of fly lens fully; On by the exposure body, produce uneven illumination owing to a little remaining interference fringe, be difficult to carry out the formation of fine pattern.
Summary of the invention
Therefore, the present invention is directed to such problem, its purpose is, a kind of interference fringe equalization of the laser that will be produced by fly lens is provided, and reduces the uneven illumination of laser simultaneously, the laser explosure device that can make public uniformly.
In order to realize said purpose, laser explosure device of the present invention possesses: LASER Light Source, and it launches laser; First fly lens, its with the optical axis of said laser a plurality of lens of configuration side by side in the face of quadrature roughly, will penetrate the temporary transient optically focused of light after, it is dispersed radially, the cross sectional shape of expansion of laser light; The first phase difference generation device, the light incident side that it is disposed at the laser of said first fly lens makes the laser generation phase difference to each collector lens difference incident of said first fly lens; Convergent lens, it will penetrate and the laser beam transformation that enlarged cross sectional shape is a directional light from said first fly lens; Second fly lens, its with the optical axis of said convergent lens a plurality of lens of configuration side by side in the face of quadrature roughly, the light intensity distributions homogenizing in the field of illumination of the photomask that laser is brought; The second phase difference generation device, the light incident side that it is disposed at the laser of said second fly lens makes the laser generation phase difference to each collector lens difference incident of said second fly lens.
According to such formation; From LASER Light Source emission laser; Make its not expanded light beam diameter and to the first phase difference generation device incident of the light incident side of the laser that is disposed at first fly lens; By this first phase difference generation device make to the optical axis of first fly lens roughly in the face of quadrature side by side a plurality of collector lenses of configuration respectively the laser of incident produce phase difference; Make from coherence's reduction of the laser of first fly lens ejaculation; Behind the ejaculation light temporary transient optically focused of first fly lens with each collector lens; Make its radial dispersing; The cross sectional shape of expansion of laser light; The laser that will enlarge this cross sectional shape by convergent lens changes directional light into; The second phase difference generation device of the light incident side of the laser by being disposed at second fly lens make to the optical axis of second fly lens roughly in the face of quadrature side by side a plurality of collector lenses of configuration respectively the laser of incident produce phase difference; The coherence of the laser that penetrates from second fly lens is reduced once more, the light intensity distributions homogenising is made its irradiates light mask by second fly lens.
In addition, be provided with relative optical axis tilted configuration and be the transparent parallel plane swivel plate of center rotation at the light incident side of the laser of said convergent lens with the optical axis.Thus, be located at convergent lens laser light incident side and relatively the transparent parallel plane swivel plate of optical axis tilted configuration be the center rotation with the optical axis, the incident angle to the laser of the second fly lens incident is changed.
Invention according to the laser explosure device of first aspect; Make a plurality of laser generation phase differences through first and second two phase difference generation devices to each collector lens difference incident of first and second fly lens; Make from coherence's reduction of the laser of first and second fly lens ejaculation; Therefore, can compare prior art and further be reduced in the interference fringe that the field of illumination produces.In addition, compare the situation of using a fly lens, the intensity distributions of laser homogenizing more further can be reduced uneven illumination.Thereby, can and make public uniformly to the even illumination of photomask, be easy to being carried out the exposure of fine pattern by the exposure body.In addition, first fly lens has the function of homogenizing laser and these two kinds of functions of function of expanded light beam diameter, therefore, does not need to be equipped with in addition optical beam expander, can reduce the part number.
In addition, according to the invention of second aspect, the incident angle to the laser of the second fly lens incident is changed in exposure.Therefore; Can make the field of illumination fine motion along with the rotation of parallel plane swivel plate on the photomask that the laser that penetrates from each collector lens of second fly lens brings, the interference fringe equalization of the laser that the field of illumination on photomask can be produced makes it not remarkable.Thus, can further reduce the uneven illumination of laser, can make public more equably by the exposure body.
Description of drawings
Fig. 1 is the front view of first execution mode of expression laser explosure device of the present invention.
Fig. 2 be the above-mentioned laser explosure device of expression the parallel plane swivel plate the position and to the key diagram of the relation of the variation of the incident angle of the laser of the second fly lens incident and the field of illumination on the photomask.
Fig. 3 is the front view of second execution mode of expression laser explosure device of the present invention.
Embodiment
Below, based on accompanying drawing execution mode of the present invention is described in detail.Fig. 1 is the front view of first execution mode of expression laser explosure device of the present invention.To being made public by exposure body irradiating laser, it possesses LASER Light Source 1, first fly lens 2, first optical path difference adjustment member 3, first convergent lens 4, parallel plane swivel plate 5, second fly lens 6, second optical path difference adjustment member 7 to this laser explosure device, second convergent lens 8 forms via photomask.
Above-mentioned LASER Light Source 1 is the ultraviolet pulse laser oscillator, can use excimer laser or YAG laser etc.
Transmit direction the place ahead at the laser of above-mentioned LASER Light Source 1 is provided with first fly lens 2.This first fly lens 2 is will be behind the temporary transient optically focused of LASER Light Source 1 emitted laser; Make its radial dispersing; The function of the optical beam expander of the cross sectional shape of realization expansion of laser light; Simultaneously; With after state the light intensity distributions homogenizing in the incident side of second fly lens 6; In the face of the optical axis that roughly is orthogonal to laser, for example vertical 3 * horizontal 3 rectangular ground dispose a plurality of collector lens 2a side by side.
Light incident side at the laser of above-mentioned first fly lens 2 is provided with first optical path difference adjustment member 3.This first optical path difference adjustment member 3 is used to reduce the coherence of the laser that penetrates from first fly lens 2 and suppresses to interfere in the incident side of second fly lens 6 from a plurality of laser that each collector lens 2a of first fly lens 2 penetrates, and constitutes to make respectively the first phase difference generation device that produces phase differences to a plurality of laser of each collector lens 2a incident of first fly lens 2.
Particularly; First optical path difference adjustment member 3 is corresponding with each collector lens 2a of first fly lens 2; For be provided be parallel to optical axis axial length respectively difference and refractive index greater than 1 bar-shaped transparent component 3a; The member of quartz glass or clear glass etc. for example, its performance change the function of the optical path length of the optics of a plurality of laser of incident respectively to each collector lens 2a of first fly lens 2.
At the direct of travel of above-mentioned laser, be provided with first convergent lens 4 in the downstream of first fly lens 2.The radial laser that this first convergent lens 4 is used for penetrating from first fly lens 2 becomes directional light, and the light incident side of light is smooth planoconvex spotlight, and its front focus position is configured with the back focus position of first fly lens 2 with roughly overlapping.
On the light path between above-mentioned first fly lens 2 and first convergent lens 4, be provided with parallel plane swivel plate 5.This parallel plane swivel plate 5 is used to change the incident angle of the laser of stating 6 incidents of second fly lens backward, and it is made as relative inclined light shaft with transparent for example glass plectane, and it is the center rotation with the optical axis.Thus, make the field of illumination fine motion of the laser on the photomask 9, the interference fringe equalization of the laser that is caused by second fly lens 6 that will on photomask 9, produce makes it not remarkable.In addition, after the first optical path difference adjusting member 3 from the first fly-eye lens
unevenness of illumination laser light emitted decreases.
Fig. 2 is the position of expression parallel plane swivel plate 5 and key diagram to the relation of the variation of the incident angle of the laser of second fly lens, 6 incidents and the field of illumination on the photomask 9.When parallel plane swivel plate 5 with the optical axis was the center rotation, parallel plane swivel plate 5 was to move back and forth shown in arrow in the front view of Fig. 2 (a).Under this situation, when parallel plane swivel plate 5 was arranged in the position of figure shown in (a) solid line, laser was reflected shown in solid line by this parallel plane swivel plate 5, with certain incident angle to the collector lens 6a of second fly lens 6 incident.
On the other hand, parallel plane swivel plate 5 rotation, during position in reaching Fig. 2 (a) shown in the dotted line, laser is reflected shown in dotted line by this parallel plane swivel plate 5, upwards to state collector lens 6a incident with above-mentioned different incident angle.Its result is to be moved to the zone shown in the dotted line by the zone shown in the solid line from same figure (b), field of illumination 10 on the photomask 9 of the laser lighting of penetrating from second fly lens 6.Like this; Rotate parallel plane swivel plate 5 and make incident angle variation to the laser of second fly lens, 6 incidents; Thus; The uneven equalization of intensity of the laser that will penetrate from first fly lens 2; Simultaneously; Make field of illumination 10 fine motions on the photomask 9, can make the light and shade state and the uneven illumination equalization of the interference fringe that produces at photomask 9 owing to the interference of a plurality of laser that penetrate from second fly lens 6, make it not remarkable.
At the direct of travel of above-mentioned laser, be provided with second fly lens 6 in the downstream of first convergent lens 4.This second fly lens 6 is with the light intensity distributions homogenizing in the field of illumination 10 of photomask 9; With the optical axis of first convergent lens 4 roughly in the face of quadrature for example vertical 12 * horizontal 4 dispose a plurality of collector lens 6a rectangularly, be two fly lenses that two groups of identical fly lenses are combined.
Light incident side at the laser of above-mentioned second fly lens 6 is provided with second optical path difference adjustment member 7.This second optical path difference adjustment member 7 is used to reduce the coherence of the laser that penetrates from second fly lens 6 and suppresses to interfere at photomask 9 from a plurality of laser that each collector lens 6a of second fly lens 6 penetrates, and becomes to make respectively the second phase difference generation device that produces phase differences to a plurality of laser of each collector lens 6a incident of second fly lens 6.
Particularly; The second optical path difference adjustment member 7 vertical 4 collector lens 6a that are listed as with second fly lens 6 respectively is corresponding; Make be parallel to optical axis axial length respectively difference and refractive index greater than 1 tabular transparent component 7a for example quartz glass or clear glass etc. overlap and form along transverse direction, performance changes the optical path length function of the optics of laser between the row of transverse direction adjacency of vertical 4 row of incident respectively to each collector lens 6a of second fly lens 6.
At the direct of travel of above-mentioned laser, be provided with second convergent lens 8 in the downstream of second fly lens 6.The laser that this second convergent lens 8 is used for penetrating from second fly lens 6 becomes directional light and makes it vertically to photomask 9 incidents; The light incident side of light constitutes two smooth planoconvex spotlight combinations, and its front focus position is roughly disposed with the back focus position of second fly lens 6 with overlapping.In addition, in Fig. 1, symbol 11,12,13 is the plane mirror of bending light path.
Below, the action of the laser explosure device of such formation is described.
Reflect by two speculums 11,12 from LASER Light Source 1 emitted laser, and to 3 incidents of first optical path difference adjustment member.This first optical path difference adjustment member 3 is corresponding with each collector lens 2a of first fly lens 2; The axial length that will be parallel to optical axis respectively difference and refractive index greater than a plurality of transparent component 3a combinations of 1 and constitute; Therefore, adjust the mutual phase shifting of a plurality of laser of a plurality of transparent component 3a ejaculations of member 3 from first optical path difference.
The a plurality of laser that penetrate from a plurality of transparent component 3a of first optical path difference adjustment member 3 are respectively to the collector lens 2a incident of the correspondence of first fly lens 2.And a plurality of laser that penetrate from each collector lens 2a of first fly lens 2 after the back focus that is concentrated on each collector lens 3a, are dispersed respectively radially.Under this situation, to each laser of each collector lens 2a incident of first fly lens 2 because phase shift each other, so reduced the coherence of the laser that penetrates from first fly lens 2.Therefore, on second fly lens 6 by a plurality of laser lightings of penetrating from each collector lens 2a, suppressed the interference of each laser, and suppressed the generation of interference fringe, second fly lens 6 is by roughly illumination equably.
After the radial laser that penetrates from first fly lens 3 changes directional light into through first convergent lens 4, through second optical path difference adjustment member 7 to 6 incidents of second fly lens.At this moment; Light incident side at the laser of first convergent lens 4 is provided with the parallel plane swivel plate 5 that relative optical axis tilted configuration has the plectane of transparent for example glass; Because it is the center rotation with the optical axis; Therefore; Shown in Fig. 2 (a), the position to 4 incidents of first convergent lens that reflects the chief ray of the laser that also from then on penetrates by parallel plane swivel plate 5 changes at the radial direction of first convergent lens 4.Thus, shown in figure (a), change to the incident angle of the laser of second fly lens, 6 incidents.Simultaneously, will be to the uneven illumination equalization of the laser of second fly lens, 6 incidents.
On the other hand; The laser that penetrates from first convergent lens 4 the axial length that will be parallel to optical axis respectively second optical path difference adjustment member 7 that constitutes greater than a plurality of transparent component 7a combinations of 1 of difference and refractive index be split into multiple laser, second fly lens 6 is thrown light on.At this moment, because the optical beam path of each laser of each the transparent component 7a through second optical path difference adjustment member 7 is long different, so, between each laser that penetrates from second optical path difference adjustment member 7, producing phase difference.Therefore, reduced the coherence of the laser that penetrates from second fly lens 6, and suppressed to penetrate and to the interference of each laser of photomask 9 irradiations from each collector lens 6a of second fly lens 6.
After the laser that penetrates from each collector lens 6a of second fly lens 6 temporarily is concentrated on the focus of each collector lens 6a respectively, radial disperse and to plane mirror 13 incidents.And laser changes directional light by plane mirror 13 reflection backs into by second convergent lens 8, generally perpendicularly to photomask 9 incidents, to evenly throwing light on the photomask 9.
At this; In the above-described first embodiment; Constitute second optical path difference adjustment member 7 by overlapping along transverse direction with the length difference of optical axis direction and at the long tabular transparent component 7a of longitudinal direction; For the synchronous laser of arranging along the longitudinal direction of second fly lens 6 of each collector lens 6a incident; For each collector lens 6a incident phase different laser of arranging along transverse direction; Therefore, the field of illumination on photomask 9 10 possibly produce the interference fringe that few synchronous laser that penetrates from each the collector lens 6a that arranges along the longitudinal direction of second fly lens 6 causes.But, in above-mentioned first execution mode, being provided with parallel plane swivel plate 5 at the light incident side of first convergent lens 4, it is the center rotation with its optical axis, therefore, changes to the incident angle of the laser of second fly lens, 6 incidents.Therefore, shown in Fig. 2 (b), field of illumination 10 fine motions that laser on the photomask 9 produces with the light and shade state equalization of above-mentioned interference striped and make it not remarkable, can make public the uneven illumination equalization of laser simultaneously uniformly.
Fig. 3 is the front view of second execution mode of expression laser explosure device of the present invention.In this second execution mode, with the first execution mode difference be replace second convergent lens 8 and in the position configuration of plane mirror 13 collimating mirror 14.Under this situation, make the front focus position of collimating mirror 14 roughly consistent with the back focus position of second fly lens 6.Thus, can convert the laser light that penetrates from second fly lens 6 into directional light, make it to photomask 9 vertical incidence.
In addition; In above-mentioned first and second execution mode; Second optical path difference adjustment member 7 is corresponding respectively with the collector lens 6a of vertical 4 row of second fly lens 6; To be parallel to the different respectively tabular transparent component 7a of the axial length of optical axis overlaps and situation about forming is illustrated at transverse direction; But the invention is not restricted to this; Also can be corresponding with each collector lens 6a of second fly lens 6, the different respectively bar-shaped transparent component of axial length that will be parallel to optical axis makes up and forms.Under this situation, because the phase place of each laser that penetrates from each collector lens 6a of second fly lens 6 is different fully, therefore, each laser possibility of interference on photomask 9 reduces.
In addition, in the above-described embodiment, be that the situation of optical path difference adjustment member is illustrated to the phase difference generation device, but the invention is not restricted to this, also the phase-plate that can be provided with for each collector lens of corresponding fly lens.
Symbol description
1 ... LASER Light Source
2 ... First fly lens (fly lens)
2a ... The collector lens of first fly lens
3 ... First optical path difference adjustment member (the first phase difference generation device)
3a ... The transparent component of first optical path difference adjustment member
4 ... First convergent lens
5 ... The parallel plane swivel plate
6 ... Second fly lens
6a ... The collector lens of second fly lens
7 ... Second optical path difference adjustment member (the second phase difference generation device)
7a ... The transparent component of second optical path difference adjustment member
8 ... Second convergent lens
9 ... Photomask
10 ... Field of illumination on the photomask
Claims (2)
1. a laser explosure device is characterized in that,
Possess:
LASER Light Source, it launches laser;
First fly lens, its with the optical axis of said laser a plurality of lens of configuration side by side in the face of quadrature roughly, will penetrate the temporary transient optically focused of light after, it is dispersed radially, the cross sectional shape of expansion of laser light;
The first phase difference generation device, the light incident side that it is disposed at the laser of said first fly lens makes the laser generation phase difference to each collector lens difference incident of said first fly lens;
Convergent lens, it will penetrate and the laser beam transformation that enlarged cross sectional shape is a directional light from said first fly lens;
Second fly lens, its with the optical axis of said convergent lens a plurality of lens of configuration side by side in the face of quadrature roughly, will be in the light intensity distributions homogenizing in the field of illumination of the photomask of laser;
The second phase difference generation device, the light incident side that it is disposed at the laser of said second fly lens makes the laser generation phase difference to each collector lens difference incident of said second fly lens.
2. laser explosure device as claimed in claim 1 is characterized in that,
Be provided with that relative optical axis disposes obliquely and be the transparent parallel plane swivel plate of center rotation at the light incident side of the laser of said convergent lens with the optical axis.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009-022631 | 2009-02-03 | ||
| JP2009022631A JP5639745B2 (en) | 2009-02-03 | 2009-02-03 | Laser exposure equipment |
| PCT/JP2010/051447 WO2010090190A1 (en) | 2009-02-03 | 2010-02-02 | Laser exposure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102308364A true CN102308364A (en) | 2012-01-04 |
Family
ID=42542084
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010800064003A Pending CN102308364A (en) | 2009-02-03 | 2010-02-02 | Laser exposure device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5639745B2 (en) |
| KR (1) | KR101634329B1 (en) |
| CN (1) | CN102308364A (en) |
| TW (1) | TWI463270B (en) |
| WO (1) | WO2010090190A1 (en) |
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|---|---|---|---|---|
| CN108037641A (en) * | 2017-12-14 | 2018-05-15 | 中国科学院长春光学精密机械与物理研究所 | A kind of moth ocular structure preparation system based on efficient intensity distribution and preparation method thereof |
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| CN103703408B (en) * | 2011-04-05 | 2016-01-13 | 株式会社V技术 | Laser illuminator system |
| JP5803222B2 (en) * | 2011-04-05 | 2015-11-04 | 株式会社ブイ・テクノロジー | Laser illumination device |
| JP6002964B2 (en) * | 2012-01-31 | 2016-10-05 | 株式会社ブイ・テクノロジー | Laser illumination device |
| CN102269936B (en) * | 2011-06-01 | 2013-07-10 | 长春理工大学 | Method and system for simulating moth compound eye optical antireflection structure pattern |
| JP6345963B2 (en) * | 2014-03-28 | 2018-06-20 | 株式会社Ｓｃｒｅｅｎホールディングス | Light irradiation apparatus and drawing apparatus |
| PL3360319T3 (en) | 2015-10-11 | 2020-02-28 | Dolby Laboratories Licensing Corporation | Improved optical system for image projectors |
| JP2021009274A (en) * | 2018-07-09 | 2021-01-28 | レーザーテック株式会社 | Light source, inspection device, and production method and inspection method of euv light |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5237367A (en) * | 1990-12-27 | 1993-08-17 | Nikon Corporation | Illuminating optical system and exposure apparatus utilizing the same |
| JPH1062710A (en) * | 1996-08-22 | 1998-03-06 | Nikon Corp | Illumination optical system |
| US5742426A (en) * | 1995-05-25 | 1998-04-21 | York; Kenneth K. | Laser beam treatment pattern smoothing device and laser beam treatment pattern modulator |
| JP2003218017A (en) * | 2001-11-16 | 2003-07-31 | Ricoh Co Ltd | Laser lighting optical system, aligner using the same, laser processing device, and projection device |
| CN1438546A (en) * | 2002-02-13 | 2003-08-27 | 佳能株式会社 | Exposing device and method, and making method for device using same |
| US20040227919A1 (en) * | 1990-11-15 | 2004-11-18 | Nikon Corporation | Projection exposure apparatus and method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2662562B2 (en) * | 1988-04-11 | 1997-10-15 | 株式会社ニコン | Exposure equipment |
| JP3969197B2 (en) | 2002-06-06 | 2007-09-05 | 石川島播磨重工業株式会社 | Laser irradiation device |
| JP2007206566A (en) * | 2006-02-03 | 2007-08-16 | Seiko Epson Corp | Projector |
-
2009
- 2009-02-03 JP JP2009022631A patent/JP5639745B2/en active Active
-
2010
- 2010-02-02 KR KR1020117016451A patent/KR101634329B1/en active IP Right Grant
- 2010-02-02 CN CN2010800064003A patent/CN102308364A/en active Pending
- 2010-02-02 WO PCT/JP2010/051447 patent/WO2010090190A1/en active Application Filing
- 2010-02-03 TW TW099103204A patent/TWI463270B/en not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040227919A1 (en) * | 1990-11-15 | 2004-11-18 | Nikon Corporation | Projection exposure apparatus and method |
| US5237367A (en) * | 1990-12-27 | 1993-08-17 | Nikon Corporation | Illuminating optical system and exposure apparatus utilizing the same |
| US5742426A (en) * | 1995-05-25 | 1998-04-21 | York; Kenneth K. | Laser beam treatment pattern smoothing device and laser beam treatment pattern modulator |
| JPH1062710A (en) * | 1996-08-22 | 1998-03-06 | Nikon Corp | Illumination optical system |
| JP2003218017A (en) * | 2001-11-16 | 2003-07-31 | Ricoh Co Ltd | Laser lighting optical system, aligner using the same, laser processing device, and projection device |
| CN1438546A (en) * | 2002-02-13 | 2003-08-27 | 佳能株式会社 | Exposing device and method, and making method for device using same |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108037641A (en) * | 2017-12-14 | 2018-05-15 | 中国科学院长春光学精密机械与物理研究所 | A kind of moth ocular structure preparation system based on efficient intensity distribution and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010182731A (en) | 2010-08-19 |
| JP5639745B2 (en) | 2014-12-10 |
| TWI463270B (en) | 2014-12-01 |
| TW201115279A (en) | 2011-05-01 |
| KR20110120872A (en) | 2011-11-04 |
| KR101634329B1 (en) | 2016-07-08 |
| WO2010090190A1 (en) | 2010-08-12 |
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