DE102007051671A1 - Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik - Google Patents

Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik Download PDF

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Publication number
DE102007051671A1
DE102007051671A1 DE102007051671A DE102007051671A DE102007051671A1 DE 102007051671 A1 DE102007051671 A1 DE 102007051671A1 DE 102007051671 A DE102007051671 A DE 102007051671A DE 102007051671 A DE102007051671 A DE 102007051671A DE 102007051671 A1 DE102007051671 A1 DE 102007051671A1
Authority
DE
Germany
Prior art keywords
mirrors
imaging
imaging optics
optics
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102007051671A
Other languages
German (de)
English (en)
Inventor
Hans-Jürgen Mann
Wilhelm Ulrich
Stephan Müllender
Hartmut Enkisch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102007051671A priority Critical patent/DE102007051671A1/de
Priority to CN2012102202210A priority patent/CN102749810A/zh
Priority to KR1020107010271A priority patent/KR101593243B1/ko
Priority to EP08841328A priority patent/EP2203785A1/en
Priority to CN200880113387.4A priority patent/CN101836165B/zh
Priority to PCT/EP2008/008619 priority patent/WO2009052962A1/en
Priority to JP2010530304A priority patent/JP5653755B2/ja
Priority to KR1020167002267A priority patent/KR20160018817A/ko
Priority to TW097140935A priority patent/TWI402629B/zh
Publication of DE102007051671A1 publication Critical patent/DE102007051671A1/de
Priority to US12/767,627 priority patent/US8605255B2/en
Priority to US14/075,313 priority patent/US9285515B2/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
DE102007051671A 2007-10-26 2007-10-26 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik Ceased DE102007051671A1 (de)

Priority Applications (11)

Application Number Priority Date Filing Date Title
DE102007051671A DE102007051671A1 (de) 2007-10-26 2007-10-26 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
PCT/EP2008/008619 WO2009052962A1 (en) 2007-10-26 2008-10-11 Imaging optical system and projection exposure installation
KR1020107010271A KR101593243B1 (ko) 2007-10-26 2008-10-11 결상 광학 시스템 및 투영 노광 장치
EP08841328A EP2203785A1 (en) 2007-10-26 2008-10-11 Imaging optical system and projection exposure installation
CN200880113387.4A CN101836165B (zh) 2007-10-26 2008-10-11 成像光学系统和投射曝光设备
CN2012102202210A CN102749810A (zh) 2007-10-26 2008-10-11 成像光学系统和投射曝光设备
JP2010530304A JP5653755B2 (ja) 2007-10-26 2008-10-11 結像光学系及び投影露光装置
KR1020167002267A KR20160018817A (ko) 2007-10-26 2008-10-11 결상 광학 시스템 및 투영 노광 장치
TW097140935A TWI402629B (zh) 2007-10-26 2008-10-24 成像光學系統與包含此型的成像光學系統之用於微蝕刻的投影曝光裝置
US12/767,627 US8605255B2 (en) 2007-10-26 2010-04-26 Imaging optical system and projection exposure system including the same
US14/075,313 US9285515B2 (en) 2007-10-26 2013-11-08 Imaging optical system and projection exposure system including the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007051671A DE102007051671A1 (de) 2007-10-26 2007-10-26 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik

Publications (1)

Publication Number Publication Date
DE102007051671A1 true DE102007051671A1 (de) 2009-05-07

Family

ID=40514165

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102007051671A Ceased DE102007051671A1 (de) 2007-10-26 2007-10-26 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik

Country Status (8)

Country Link
US (2) US8605255B2 (enExample)
EP (1) EP2203785A1 (enExample)
JP (1) JP5653755B2 (enExample)
KR (2) KR101593243B1 (enExample)
CN (2) CN101836165B (enExample)
DE (1) DE102007051671A1 (enExample)
TW (1) TWI402629B (enExample)
WO (1) WO2009052962A1 (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009046685A1 (de) * 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
DE102012202675A1 (de) * 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
DE102013213544A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Tragsystem und Projektionsbelichtungsanlage
WO2015078861A1 (de) * 2013-11-28 2015-06-04 Carl Zeiss Smt Gmbh Messanordnung zur messung optischer eigenschaften eines reflektiven optischen elements, insbesondere für die mikrolithographie
US9291751B2 (en) 2013-06-17 2016-03-22 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
DE102024109828A1 (de) * 2024-04-09 2025-10-09 Carl Zeiss Meditec Ag Pupillenrelay, Verwendung desselben, Scannervorrichtung, ophthalmologische Vorrichtung, Verfahren zum Abbilden eines Lichtstrahls

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101645142B1 (ko) 2007-10-26 2016-08-02 칼 짜이스 에스엠티 게엠베하 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치
CN101836164B (zh) 2007-10-26 2013-03-13 卡尔蔡司Smt有限责任公司 成像光学系统和具有该类型的成像光学系统的微光刻投射曝光设备
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
DE102009047179B8 (de) * 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh Projektionsobjektiv
CN103038690B (zh) * 2010-07-30 2016-08-03 卡尔蔡司Smt有限责任公司 成像光学系统以及具有该类型成像光学系统的用于微光刻的投射曝光设备
DE102011083888A1 (de) 2011-09-30 2013-04-04 Carl Zeiss Smt Gmbh Abbildende katoptrische EUV-Projektionsoptik
DE102013107192A1 (de) 2013-07-08 2015-01-08 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich
CN108594411B (zh) * 2018-06-04 2023-06-02 凯迈（洛阳）测控有限公司 一种长焦距、大口径、多视场中波红外光学系统

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0267766A2 (en) 1986-11-10 1988-05-18 Compact Spindle Bearing Corporation Catoptric reduction imaging systems
US6750948B2 (en) 1999-10-15 2004-06-15 Nikon Corporation Projection optical system, projection exposure apparatus having the projection optical system, projection method thereof, exposure method thereof and fabricating method for fabricating a device using the projection exposure apparatus
US7050152B2 (en) * 2003-08-07 2006-05-23 Canon Kabushiki Kaisha Exposure apparatus
WO2006069725A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges objektiv mit obskurierter pupille
US20060232867A1 (en) 2004-12-23 2006-10-19 Hans-Jurgen Mann Catoptric objectives and systems using catoptric objectives
US7209286B2 (en) 2001-08-16 2007-04-24 Carl Zeiss Smt Ag Objective with pupil obscuration
EP1930771A1 (en) * 2006-12-04 2008-06-11 Carl Zeiss SMT AG Projection objectives having mirror elements with reflective coatings

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4804258A (en) * 1986-05-05 1989-02-14 Hughes Aircraft Company Four mirror afocal wide field of view optical system
IL113789A (en) 1994-05-23 1999-01-26 Hughes Aircraft Co A non-focusing device with three hinged mirrors and a corrective mirror
US5473263A (en) 1994-12-19 1995-12-05 Advanced Micro Devices, Inc. Negative feedback to reduce voltage oscillation in CMOS output buffers
JPH09213618A (ja) 1996-01-31 1997-08-15 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
US6600552B2 (en) * 1999-02-15 2003-07-29 Carl-Zeiss Smt Ag Microlithography reduction objective and projection exposure apparatus
JP4143236B2 (ja) 1999-10-15 2008-09-03 キヤノン株式会社 画像形成装置
US6867913B2 (en) * 2000-02-14 2005-03-15 Carl Zeiss Smt Ag 6-mirror microlithography projection objective
EP1327172A1 (de) * 2000-10-20 2003-07-16 Carl Zeiss 8-spiegel-mikrolithographie-projektionsobjektiv
DE10052289A1 (de) * 2000-10-20 2002-04-25 Zeiss Carl 8-Spiegel-Mikrolithographie-Projektionsobjektiv
US6396900B1 (en) * 2001-05-01 2002-05-28 The Regents Of The University Of California Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application
US6785051B2 (en) * 2001-07-18 2004-08-31 Corning Incorporated Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
CN1123950C (zh) 2001-08-24 2003-10-08 清华大学 内腔变反射率光参量振荡器
US6920199B2 (en) * 2002-02-20 2005-07-19 Gkss-Forschungszentrum Geesthacht Gmbh Mirror element for the reflection of x-rays
JP2004022945A (ja) * 2002-06-19 2004-01-22 Canon Inc 露光装置及び方法
JP3938040B2 (ja) 2002-12-27 2007-06-27 キヤノン株式会社 反射型投影光学系、露光装置及びデバイス製造方法
US7154586B2 (en) * 2003-02-21 2006-12-26 Canon Kabushiki Kaisha Catoptric projection optical system and exposure apparatus having the same
JP2004252363A (ja) * 2003-02-21 2004-09-09 Canon Inc 反射型投影光学系
TWI311691B (en) 2003-10-30 2009-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2005059617A2 (en) 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface
WO2005098504A1 (en) 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
US8011793B2 (en) 2004-12-15 2011-09-06 European Space Agency Wide field four mirror telescope using off-axis aspherical mirrors
KR101176686B1 (ko) * 2005-03-08 2012-08-23 칼 짜이스 에스엠티 게엠베하 접근 용이한 조리개 또는 구경 조리개를 구비한마이크로리소그래피 투영 시스템
US7336416B2 (en) * 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
EP1889110A1 (en) 2005-05-13 2008-02-20 Carl Zeiss SMT AG A six-mirror euv projection system with low incidence angles
JP2009508150A (ja) * 2005-09-13 2009-02-26 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影光学系、ある機器を製造するための方法、光学面を設計する方法
DE102006017336B4 (de) 2006-04-11 2011-07-28 Carl Zeiss SMT GmbH, 73447 Beleuchtungssystem mit Zoomobjektiv
CN101836164B (zh) * 2007-10-26 2013-03-13 卡尔蔡司Smt有限责任公司 成像光学系统和具有该类型的成像光学系统的微光刻投射曝光设备
KR101645142B1 (ko) 2007-10-26 2016-08-02 칼 짜이스 에스엠티 게엠베하 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0267766A2 (en) 1986-11-10 1988-05-18 Compact Spindle Bearing Corporation Catoptric reduction imaging systems
US6750948B2 (en) 1999-10-15 2004-06-15 Nikon Corporation Projection optical system, projection exposure apparatus having the projection optical system, projection method thereof, exposure method thereof and fabricating method for fabricating a device using the projection exposure apparatus
US7209286B2 (en) 2001-08-16 2007-04-24 Carl Zeiss Smt Ag Objective with pupil obscuration
US7050152B2 (en) * 2003-08-07 2006-05-23 Canon Kabushiki Kaisha Exposure apparatus
WO2006069725A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges objektiv mit obskurierter pupille
US20060232867A1 (en) 2004-12-23 2006-10-19 Hans-Jurgen Mann Catoptric objectives and systems using catoptric objectives
EP1930771A1 (en) * 2006-12-04 2008-06-11 Carl Zeiss SMT AG Projection objectives having mirror elements with reflective coatings

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
"EUV Engineering Test Stand" von D. A. Tichenor et al., Lawrence Livermore National Laboratory, 14.02.2000,

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009046685A1 (de) * 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
US9201226B2 (en) 2009-11-13 2015-12-01 Carl Zeiss Smt Gmbh Imaging optics
DE102012202675A1 (de) * 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
US9291751B2 (en) 2013-06-17 2016-03-22 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
DE102013213544A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Tragsystem und Projektionsbelichtungsanlage
WO2015078861A1 (de) * 2013-11-28 2015-06-04 Carl Zeiss Smt Gmbh Messanordnung zur messung optischer eigenschaften eines reflektiven optischen elements, insbesondere für die mikrolithographie
US9709494B2 (en) 2013-11-28 2017-07-18 Carl Zeiss Smt Gmbh Measuring arrangement for measuring optical properties of a reflective optical element, in particular for microlithography
DE102024109828A1 (de) * 2024-04-09 2025-10-09 Carl Zeiss Meditec Ag Pupillenrelay, Verwendung desselben, Scannervorrichtung, ophthalmologische Vorrichtung, Verfahren zum Abbilden eines Lichtstrahls

Also Published As

Publication number Publication date
KR20100100781A (ko) 2010-09-15
TWI402629B (zh) 2013-07-21
US8605255B2 (en) 2013-12-10
EP2203785A1 (en) 2010-07-07
CN102749810A (zh) 2012-10-24
US20140132941A1 (en) 2014-05-15
JP2011502275A (ja) 2011-01-20
KR20160018817A (ko) 2016-02-17
KR101593243B1 (ko) 2016-02-11
CN101836165B (zh) 2016-12-07
US20100265481A1 (en) 2010-10-21
TW200923595A (en) 2009-06-01
CN101836165A (zh) 2010-09-15
WO2009052962A1 (en) 2009-04-30
US9285515B2 (en) 2016-03-15
JP5653755B2 (ja) 2015-01-14

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