CN101836165B - 成像光学系统和投射曝光设备 - Google Patents

成像光学系统和投射曝光设备 Download PDF

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Publication number
CN101836165B
CN101836165B CN200880113387.4A CN200880113387A CN101836165B CN 101836165 B CN101836165 B CN 101836165B CN 200880113387 A CN200880113387 A CN 200880113387A CN 101836165 B CN101836165 B CN 101836165B
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CN
China
Prior art keywords
optical system
imaging optical
mirrors
imaging
light
Prior art date
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CN200880113387.4A
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English (en)
Chinese (zh)
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CN101836165A (zh
Inventor
汉斯-于尔根·曼
威廉·乌尔里克
斯蒂芬·马伦德
哈特穆特·恩基希
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN101836165A publication Critical patent/CN101836165A/zh
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
CN200880113387.4A 2007-10-26 2008-10-11 成像光学系统和投射曝光设备 Active CN101836165B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US98279307P 2007-10-26 2007-10-26
DE102007051671.3 2007-10-26
DE102007051671A DE102007051671A1 (de) 2007-10-26 2007-10-26 Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
US60/982,793 2007-10-26
PCT/EP2008/008619 WO2009052962A1 (en) 2007-10-26 2008-10-11 Imaging optical system and projection exposure installation

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN2012102202210A Division CN102749810A (zh) 2007-10-26 2008-10-11 成像光学系统和投射曝光设备

Publications (2)

Publication Number Publication Date
CN101836165A CN101836165A (zh) 2010-09-15
CN101836165B true CN101836165B (zh) 2016-12-07

Family

ID=40514165

Family Applications (2)

Application Number Title Priority Date Filing Date
CN200880113387.4A Active CN101836165B (zh) 2007-10-26 2008-10-11 成像光学系统和投射曝光设备
CN2012102202210A Pending CN102749810A (zh) 2007-10-26 2008-10-11 成像光学系统和投射曝光设备

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2012102202210A Pending CN102749810A (zh) 2007-10-26 2008-10-11 成像光学系统和投射曝光设备

Country Status (8)

Country Link
US (2) US8605255B2 (enExample)
EP (1) EP2203785A1 (enExample)
JP (1) JP5653755B2 (enExample)
KR (2) KR101593243B1 (enExample)
CN (2) CN101836165B (enExample)
DE (1) DE102007051671A1 (enExample)
TW (1) TWI402629B (enExample)
WO (1) WO2009052962A1 (enExample)

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DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
JP5902884B2 (ja) 2007-10-26 2016-04-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置
CN102819197B (zh) 2007-10-26 2016-06-22 卡尔蔡司Smt有限责任公司 成像光学系统、投射曝光设备、微结构部件及其产生方法
DE102009046685A1 (de) 2009-11-13 2011-05-26 Carl Zeiss Smt Gmbh Abbildende Optik
DE102009047179B8 (de) * 2009-11-26 2016-08-18 Carl Zeiss Smt Gmbh Projektionsobjektiv
WO2012013241A1 (en) * 2010-07-30 2012-02-02 Carl Zeiss Smt Gmbh Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
DE102011083888A1 (de) * 2011-09-30 2013-04-04 Carl Zeiss Smt Gmbh Abbildende katoptrische EUV-Projektionsoptik
DE102012202675A1 (de) * 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
US9291751B2 (en) 2013-06-17 2016-03-22 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit
DE102013107192A1 (de) 2013-07-08 2015-01-08 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element für streifenden Einfall im EUV-Wellenlängenbereich
DE102013213544A1 (de) * 2013-07-10 2015-01-15 Carl Zeiss Smt Gmbh Tragsystem und Projektionsbelichtungsanlage
DE102013224435A1 (de) 2013-11-28 2015-05-28 Carl Zeiss Smt Gmbh Messanordnung zur Messung optischer Eigenschaften eines reflektiven optischen Elements, insbesondere für die Mikrolithographie
CN108594411B (zh) * 2018-06-04 2023-06-02 凯迈（洛阳）测控有限公司 一种长焦距、大口径、多视场中波红外光学系统
DE102024109828A1 (de) * 2024-04-09 2025-10-09 Carl Zeiss Meditec Ag Pupillenrelay, Verwendung desselben, Scannervorrichtung, ophthalmologische Vorrichtung, Verfahren zum Abbilden eines Lichtstrahls

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CN102819197B (zh) 2007-10-26 2016-06-22 卡尔蔡司Smt有限责任公司 成像光学系统、投射曝光设备、微结构部件及其产生方法
JP5902884B2 (ja) 2007-10-26 2016-04-13 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系及びこの種の結像光学系を含むマイクロリソグラフィ用の投影露光装置
DE102007051671A1 (de) 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik

Also Published As

Publication number Publication date
CN101836165A (zh) 2010-09-15
KR20100100781A (ko) 2010-09-15
US20100265481A1 (en) 2010-10-21
KR101593243B1 (ko) 2016-02-11
KR20160018817A (ko) 2016-02-17
WO2009052962A1 (en) 2009-04-30
JP5653755B2 (ja) 2015-01-14
CN102749810A (zh) 2012-10-24
US20140132941A1 (en) 2014-05-15
TW200923595A (en) 2009-06-01
TWI402629B (zh) 2013-07-21
US8605255B2 (en) 2013-12-10
JP2011502275A (ja) 2011-01-20
EP2203785A1 (en) 2010-07-07
US9285515B2 (en) 2016-03-15
DE102007051671A1 (de) 2009-05-07

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