JP2005340459A5 - - Google Patents

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Publication number
JP2005340459A5
JP2005340459A5 JP2004156362A JP2004156362A JP2005340459A5 JP 2005340459 A5 JP2005340459 A5 JP 2005340459A5 JP 2004156362 A JP2004156362 A JP 2004156362A JP 2004156362 A JP2004156362 A JP 2004156362A JP 2005340459 A5 JP2005340459 A5 JP 2005340459A5
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JP
Japan
Prior art keywords
film
optical system
projection optical
mirrors
mirror
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Granted
Application number
JP2004156362A
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English (en)
Japanese (ja)
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JP4532991B2 (ja
JP2005340459A (ja
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Priority to JP2004156362A priority Critical patent/JP4532991B2/ja
Priority claimed from JP2004156362A external-priority patent/JP4532991B2/ja
Priority to US11/139,337 priority patent/US7511888B2/en
Publication of JP2005340459A publication Critical patent/JP2005340459A/ja
Publication of JP2005340459A5 publication Critical patent/JP2005340459A5/ja
Application granted granted Critical
Publication of JP4532991B2 publication Critical patent/JP4532991B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004156362A 2004-05-26 2004-05-26 投影光学系、露光装置及びデバイス製造方法 Expired - Fee Related JP4532991B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004156362A JP4532991B2 (ja) 2004-05-26 2004-05-26 投影光学系、露光装置及びデバイス製造方法
US11/139,337 US7511888B2 (en) 2004-05-26 2005-05-26 Projection optical system, exposure apparatus, device manufacturing method, and device manufactured by using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004156362A JP4532991B2 (ja) 2004-05-26 2004-05-26 投影光学系、露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005340459A JP2005340459A (ja) 2005-12-08
JP2005340459A5 true JP2005340459A5 (enExample) 2007-07-12
JP4532991B2 JP4532991B2 (ja) 2010-08-25

Family

ID=35448607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004156362A Expired - Fee Related JP4532991B2 (ja) 2004-05-26 2004-05-26 投影光学系、露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US7511888B2 (enExample)
JP (1) JP4532991B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007029852A1 (en) * 2005-09-07 2007-03-15 Fujifilm Corporation Pattern exposure method and pattern exposure apparatus
JP4905914B2 (ja) * 2005-10-14 2012-03-28 Ｈｏｙａ株式会社 多層反射膜付き基板、その製造方法、反射型マスクブランクおよび反射型マスク
JP2007258625A (ja) * 2006-03-27 2007-10-04 Nikon Corp 露光装置及びレチクル
JP2009141177A (ja) * 2007-12-07 2009-06-25 Canon Inc Ｅｕｖ用ミラー及びそれを有するｅｕｖ露光装置
DE102008002403A1 (de) * 2008-06-12 2009-12-17 Carl Zeiss Smt Ag Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung
JP2010199503A (ja) * 2009-02-27 2010-09-09 Nikon Corp 光学素子、露光装置及びデバイス製造方法
DE102009017096A1 (de) 2009-04-15 2010-10-21 Carl Zeiss Smt Ag Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
DE102011005144A1 (de) * 2010-03-17 2011-09-22 Carl Zeiss Smt Gmbh Reflektives optisches Element, Projektionssystem und Projektionsbelichtungsanlage
DE102010038697B4 (de) * 2010-07-30 2012-07-19 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Qualifizierung einer Optik einer Projektionsbelichtungsanlage für die Mikrolithographie
WO2012041697A1 (en) * 2010-09-27 2012-04-05 Carl Zeiss Smt Gmbh Mirror, projection objective comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
JP6069919B2 (ja) * 2012-07-11 2017-02-01 旭硝子株式会社 Ｅｕｖリソグラフィ用反射型マスクブランクおよびその製造方法、ならびに該マスクブランク用の反射層付基板およびその製造方法
JP2014160752A (ja) 2013-02-20 2014-09-04 Asahi Glass Co Ltd Ｅｕｖリソグラフィ用反射型マスクブランクおよび該マスクブランク用反射層付基板
TWI664452B (zh) * 2013-05-09 2019-07-01 Nikon Corporation 光學構件、投影光學系統、曝光裝置以及元件製造方法
WO2018160866A1 (en) * 2017-03-02 2018-09-07 3M Innovative Properties Company Dynamic reflected color film with low optical caliper sensitivity

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04169898A (ja) * 1990-11-02 1992-06-17 Seiko Instr Inc Ｘ線多層膜鏡構造体
US6188513B1 (en) * 1999-03-15 2001-02-13 Russell Hudyma High numerical aperture ring field projection system for extreme ultraviolet lithography
TWI267704B (en) * 1999-07-02 2006-12-01 Asml Netherlands Bv Capping layer for EUV optical elements
JP2001057328A (ja) * 1999-08-18 2001-02-27 Nikon Corp 反射マスク、露光装置および集積回路の製造方法
FR2802311B1 (fr) * 1999-12-08 2002-01-18 Commissariat Energie Atomique Dispositif de lithographie utilisant une source de rayonnement dans le domaine extreme ultraviolet et des miroirs multicouches a large bande spectrale dans ce domaine
JP2002134385A (ja) * 2000-10-20 2002-05-10 Nikon Corp 多層膜反射鏡および露光装置
JP2003014893A (ja) * 2001-04-27 2003-01-15 Nikon Corp 多層膜反射鏡及び露光装置
EP1282011B1 (de) 2001-08-01 2006-11-22 Carl Zeiss SMT AG Reflektives Projektionsobjektiv für EUV-Photolithographie
JP2003315532A (ja) * 2002-04-22 2003-11-06 Sony Corp 極短紫外光の反射体およびその製造方法、位相シフトマスク、並びに露光装置
JP4144301B2 (ja) * 2002-09-03 2008-09-03 株式会社ニコン 多層膜反射鏡、反射型マスク、露光装置及び反射型マスクの製造方法
JP2005056943A (ja) * 2003-08-08 2005-03-03 Canon Inc Ｘ線多層ミラーおよびｘ線露光装置
US7572556B2 (en) * 2003-09-17 2009-08-11 Carl Zeiss Smt Ag Masks, lithography device and semiconductor component
KR101083466B1 (ko) * 2003-10-15 2011-11-16 가부시키가이샤 니콘 다층막 반사경, 다층막 반사경의 제조방법, 및 노광장치
US7336416B2 (en) * 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method

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