JP2014508414A5 - - Google Patents

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Publication number
JP2014508414A5
JP2014508414A5 JP2013555773A JP2013555773A JP2014508414A5 JP 2014508414 A5 JP2014508414 A5 JP 2014508414A5 JP 2013555773 A JP2013555773 A JP 2013555773A JP 2013555773 A JP2013555773 A JP 2013555773A JP 2014508414 A5 JP2014508414 A5 JP 2014508414A5
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JP
Japan
Prior art keywords
spectral purity
radiation
purity filter
recesses
radiation beam
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Pending
Application number
JP2013555773A
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English (en)
Japanese (ja)
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JP2014508414A (ja
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Publication date
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Priority claimed from PCT/EP2011/073537 external-priority patent/WO2012119672A1/en
Publication of JP2014508414A publication Critical patent/JP2014508414A/ja
Publication of JP2014508414A5 publication Critical patent/JP2014508414A5/ja
Pending legal-status Critical Current

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JP2013555773A 2011-03-04 2011-12-21 リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法 Pending JP2014508414A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161449381P 2011-03-04 2011-03-04
US61/449,381 2011-03-04
PCT/EP2011/073537 WO2012119672A1 (en) 2011-03-04 2011-12-21 Lithograpic apparatus, spectral purity filter and device manufacturing method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2017078096A Division JP6420864B2 (ja) 2011-03-04 2017-04-11 スペクトル純度フィルタ、放射システム、及びコレクタ

Publications (2)

Publication Number Publication Date
JP2014508414A JP2014508414A (ja) 2014-04-03
JP2014508414A5 true JP2014508414A5 (enExample) 2015-02-19

Family

ID=45420654

Family Applications (2)

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JP2013555773A Pending JP2014508414A (ja) 2011-03-04 2011-12-21 リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法
JP2017078096A Active JP6420864B2 (ja) 2011-03-04 2017-04-11 スペクトル純度フィルタ、放射システム、及びコレクタ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2017078096A Active JP6420864B2 (ja) 2011-03-04 2017-04-11 スペクトル純度フィルタ、放射システム、及びコレクタ

Country Status (5)

Country Link
US (2) US9594306B2 (enExample)
EP (1) EP2681625A1 (enExample)
JP (2) JP2014508414A (enExample)
TW (1) TWI534557B (enExample)
WO (1) WO2012119672A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014508414A (ja) 2011-03-04 2014-04-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法
WO2013109986A1 (en) * 2012-01-19 2013-07-25 Jaiswal Supriya Materials, components, and methods for use with extreme ultraviolet radiation in lithography and other applications
KR102262448B1 (ko) * 2013-01-28 2021-06-09 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 방사선 소스, 거울 및 투영 시스템
CN106489084B (zh) * 2014-07-04 2020-10-30 Asml荷兰有限公司 用于光刻设备内的膜和包括这种膜的光刻设备
WO2016128029A1 (en) * 2015-02-10 2016-08-18 Carl Zeiss Smt Gmbh Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror
WO2017032569A1 (en) * 2015-08-25 2017-03-02 Asml Netherlands B.V. Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter
DE102016213247A1 (de) * 2016-07-20 2017-05-18 Carl Zeiss Smt Gmbh Optisches Element, insbesondere Kollektorspiegel einer EUV-Lichtquelle einer mikrolithographischen Projektionsbelichtungsanlage
US10691024B2 (en) * 2018-01-26 2020-06-23 Kla-Tencor Corporation High-power short-pass total internal reflection filter
DE102018220629A1 (de) * 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel
CN113841071B (zh) * 2019-05-21 2025-01-24 Asml荷兰有限公司 用于光刻装置的反射镜
DE102019212017A1 (de) * 2019-08-09 2021-02-11 Carl Zeiss Smt Gmbh Optisches Beleuchtungssystem zur Führung von EUV-Strahlung
DE102019213063A1 (de) * 2019-08-30 2021-03-04 Carl Zeiss Smt Gmbh Optische Beugungskomponente
JP7403271B2 (ja) * 2019-10-10 2023-12-22 ギガフォトン株式会社 極端紫外光集光ミラー、極端紫外光生成装置、及び電子デバイスの製造方法
US11511524B2 (en) * 2020-03-11 2022-11-29 LabForInvention Energy-efficient window coatings transmissible to wireless communication signals and methods of fabricating thereof
DE102020212367A1 (de) * 2020-09-30 2022-03-31 Carl Zeiss Smt Gmbh Optische Komponente
DE102021214237A1 (de) 2021-12-13 2022-12-22 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine EUV-Projektionsbelichtungsanlage
DE102022202059A1 (de) * 2022-03-01 2023-09-07 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks
US20240369939A1 (en) * 2023-05-03 2024-11-07 Taiwan Semiconductor Manufacturing Company Ltd. Extreme ultraviolet (euv) radiation source apparatus, euv lithography system, and method for generating extreme ultraviolet radiation

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US6469827B1 (en) * 1998-08-06 2002-10-22 Euv Llc Diffraction spectral filter for use in extreme-UV lithography condenser
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US6577442B2 (en) * 2001-09-27 2003-06-10 Intel Corporation Reflective spectral filtering of high power extreme ultra-violet radiation
CN1495531B (zh) * 2002-08-23 2010-05-26 Asml荷兰有限公司 光刻投射装置及用于所述装置中的粒子屏障
US7230703B2 (en) * 2003-07-17 2007-06-12 Tokyo Electron Limited Apparatus and method for measuring overlay by diffraction gratings
EP1515188A1 (en) * 2003-09-10 2005-03-16 ASML Netherlands B.V. Method for protecting an optical element, and optical element
SG112034A1 (en) 2003-11-06 2005-06-29 Asml Netherlands Bv Optical element, lithographic apparatus comprising such optical element and device manufacturing method
US7453645B2 (en) 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
US7196343B2 (en) * 2004-12-30 2007-03-27 Asml Netherlands B.V. Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
US7336416B2 (en) 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
US20070170379A1 (en) 2006-01-24 2007-07-26 Nikon Corporation Cooled optical filters and optical systems comprising same
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JP2008288299A (ja) * 2007-05-16 2008-11-27 Nikon Corp 多層膜反射鏡、照明装置、露光装置、及びデバイス製造方法
JP5534647B2 (ja) 2008-02-28 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
NL1036891A1 (nl) 2008-05-02 2009-11-03 Asml Netherlands Bv Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor.
JP5061063B2 (ja) 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光用ミラーおよび極端紫外光源装置
WO2009144117A1 (en) 2008-05-30 2009-12-03 Asml Netherlands B.V. Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter
KR101602373B1 (ko) 2008-07-11 2016-03-21 에이에스엠엘 네델란즈 비.브이. 스펙트럼 퓨리티 필터, 방사선 소스, 리소그래피 장치, 및 디바이스 제조 방법
NL2003152A1 (nl) 2008-08-14 2010-02-16 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
NL2003303A (en) 2008-08-29 2010-03-11 Asml Netherlands Bv Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby.
JP2010087312A (ja) 2008-09-30 2010-04-15 Canon Inc 露光装置およびデバイス製造方法
NL2004815A (en) 2009-06-17 2010-12-20 Asml Netherlands Bv Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell.
NL2004787A (en) 2009-06-30 2011-01-04 Asml Netherlands Bv Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter.
NL2005111A (en) * 2009-08-21 2011-02-22 Asml Netherlands Bv Spectral purity filters for use in a lithographic apparatus.
WO2011023454A1 (en) 2009-08-27 2011-03-03 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
CN102792228A (zh) 2009-09-16 2012-11-21 Asml荷兰有限公司 光谱纯度滤光片、光刻设备、制造光谱纯度滤光片的方法和使用光刻设备制造器件的方法
CN102918463B (zh) * 2010-05-27 2016-01-06 Asml荷兰有限公司 多层反射镜
JP2014508414A (ja) 2011-03-04 2014-04-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法

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