JP2010541234A5 - - Google Patents

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Publication number
JP2010541234A5
JP2010541234A5 JP2010526838A JP2010526838A JP2010541234A5 JP 2010541234 A5 JP2010541234 A5 JP 2010541234A5 JP 2010526838 A JP2010526838 A JP 2010526838A JP 2010526838 A JP2010526838 A JP 2010526838A JP 2010541234 A5 JP2010541234 A5 JP 2010541234A5
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JP
Japan
Prior art keywords
radiation
wavelength
filter
filter element
spectral filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010526838A
Other languages
English (en)
Japanese (ja)
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JP5336497B2 (ja
JP2010541234A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/NL2008/050622 external-priority patent/WO2009041818A1/en
Publication of JP2010541234A publication Critical patent/JP2010541234A/ja
Publication of JP2010541234A5 publication Critical patent/JP2010541234A5/ja
Application granted granted Critical
Publication of JP5336497B2 publication Critical patent/JP5336497B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010526838A 2007-09-27 2008-09-26 リソグラフィスペクトルフィルタ、及びリソグラフィ装置 Expired - Fee Related JP5336497B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US97576407P 2007-09-27 2007-09-27
US60/975,764 2007-09-27
PCT/NL2008/050622 WO2009041818A1 (en) 2007-09-27 2008-09-26 Spectral filter, lithographic apparatus including such a spectral filter, device manufacturing method, and device manufactured thereby

Publications (3)

Publication Number Publication Date
JP2010541234A JP2010541234A (ja) 2010-12-24
JP2010541234A5 true JP2010541234A5 (enExample) 2011-11-10
JP5336497B2 JP5336497B2 (ja) 2013-11-06

Family

ID=40185047

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010526838A Expired - Fee Related JP5336497B2 (ja) 2007-09-27 2008-09-26 リソグラフィスペクトルフィルタ、及びリソグラフィ装置

Country Status (8)

Country Link
US (1) US20100259744A1 (enExample)
EP (1) EP2462593A1 (enExample)
JP (1) JP5336497B2 (enExample)
KR (1) KR20100084526A (enExample)
CN (1) CN101836263A (enExample)
NL (1) NL1035979A1 (enExample)
TW (1) TW200921256A (enExample)
WO (1) WO2009041818A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2003303A (en) * 2008-08-29 2010-03-11 Asml Netherlands Bv Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby.
DE102009017440A1 (de) * 2009-04-15 2010-10-28 Siemens Aktiengesellschaft Anordnung zur Aufweitung der Partikelenergieverteilung eines Partikelstrahls, Partikeltherapieanlage sowie Verfahren zur Aufweitung der Partikelenergieverteilung eines Partikelstrahls
CN102792228A (zh) * 2009-09-16 2012-11-21 Asml荷兰有限公司 光谱纯度滤光片、光刻设备、制造光谱纯度滤光片的方法和使用光刻设备制造器件的方法
US8587768B2 (en) 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
DE102010041258A1 (de) * 2010-09-23 2012-03-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik mit einem beweglichen Filterelement
US8455160B2 (en) * 2010-12-09 2013-06-04 Himax Technologies Limited Color filter of liquid crystal on silicon display device
NL2009372A (en) * 2011-09-28 2013-04-02 Asml Netherlands Bv Methods to control euv exposure dose and euv lithographic methods and apparatus using such methods.
DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
DE102013209042A1 (de) * 2013-05-15 2014-05-08 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
NL2013700A (en) * 2013-11-25 2015-05-27 Asml Netherlands Bv An apparatus, a device and a device manufacturing method.
CN109036163B (zh) * 2018-08-31 2021-08-06 京东方科技集团股份有限公司 一种显示装置及其环境光检测方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100358422B1 (ko) * 1993-09-14 2003-01-24 가부시키가이샤 니콘 플래인위치결정장치,주사형노광장치,주사노광방법및소자제조방법
US5483387A (en) * 1994-07-22 1996-01-09 Honeywell, Inc. High pass optical filter
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
TW498184B (en) * 1999-06-04 2002-08-11 Asm Lithography Bv Method of manufacturing a device using a lithographic projection apparatus, and device manufactured in accordance with said method
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
US6906859B2 (en) * 2002-06-05 2005-06-14 Nikon Corporation Epi-illumination apparatus for fluorescent observation and fluorescence microscope having the same
US6809327B2 (en) * 2002-10-29 2004-10-26 Intel Corporation EUV source box
JP2004317693A (ja) * 2003-04-15 2004-11-11 Mitsubishi Electric Corp 波長フィルタ、露光装置および撮像装置
KR20060130543A (ko) * 2003-08-06 2006-12-19 유니버시티 오브 피츠버그 오브 더 커먼웰쓰 시스템 오브 하이어 에듀케이션 표면 플라즈몬-강화 나노-광 소자 및 그의 제조 방법
JP4369256B2 (ja) * 2004-01-22 2009-11-18 日本板硝子株式会社 分光光学素子
US7453645B2 (en) * 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby

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