JP5336497B2 - リソグラフィスペクトルフィルタ、及びリソグラフィ装置 - Google Patents

リソグラフィスペクトルフィルタ、及びリソグラフィ装置 Download PDF

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Publication number
JP5336497B2
JP5336497B2 JP2010526838A JP2010526838A JP5336497B2 JP 5336497 B2 JP5336497 B2 JP 5336497B2 JP 2010526838 A JP2010526838 A JP 2010526838A JP 2010526838 A JP2010526838 A JP 2010526838A JP 5336497 B2 JP5336497 B2 JP 5336497B2
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JP
Japan
Prior art keywords
radiation
wavelength
filter
filter element
spectral filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010526838A
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English (en)
Japanese (ja)
Other versions
JP2010541234A5 (enExample
JP2010541234A (ja
Inventor
ハーペン，マーテン，マリヌス，ヨハネス，ウィルヘルムス ヴァン
バニエ，バディム，エヴィジェンエビッチ
スール，ワウター，アントン
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ASML Netherlands BV
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ASML Netherlands BV
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Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
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Publication of JP2010541234A5 publication Critical patent/JP2010541234A5/ja
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Publication of JP5336497B2 publication Critical patent/JP5336497B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10—Scattering devices; Absorbing devices; Ionising radiation filters
    • H10P76/00—
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/203—Filters having holographic or diffractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010526838A 2007-09-27 2008-09-26 リソグラフィスペクトルフィルタ、及びリソグラフィ装置 Expired - Fee Related JP5336497B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US97576407P 2007-09-27 2007-09-27
US60/975,764 2007-09-27
PCT/NL2008/050622 WO2009041818A1 (en) 2007-09-27 2008-09-26 Spectral filter, lithographic apparatus including such a spectral filter, device manufacturing method, and device manufactured thereby

Publications (3)

Publication Number Publication Date
JP2010541234A JP2010541234A (ja) 2010-12-24
JP2010541234A5 JP2010541234A5 (enExample) 2011-11-10
JP5336497B2 true JP5336497B2 (ja) 2013-11-06

Family

ID=40185047

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010526838A Expired - Fee Related JP5336497B2 (ja) 2007-09-27 2008-09-26 リソグラフィスペクトルフィルタ、及びリソグラフィ装置

Country Status (8)

Country Link
US (1) US20100259744A1 (enExample)
EP (1) EP2462593A1 (enExample)
JP (1) JP5336497B2 (enExample)
KR (1) KR20100084526A (enExample)
CN (1) CN101836263A (enExample)
NL (1) NL1035979A1 (enExample)
TW (1) TW200921256A (enExample)
WO (1) WO2009041818A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110157573A1 (en) * 2008-08-29 2011-06-30 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter and device manufacturing method
DE102009017440A1 (de) * 2009-04-15 2010-10-28 Siemens Aktiengesellschaft Anordnung zur Aufweitung der Partikelenergieverteilung eines Partikelstrahls, Partikeltherapieanlage sowie Verfahren zur Aufweitung der Partikelenergieverteilung eines Partikelstrahls
CN102792228A (zh) * 2009-09-16 2012-11-21 Asml荷兰有限公司 光谱纯度滤光片、光刻设备、制造光谱纯度滤光片的方法和使用光刻设备制造器件的方法
US8587768B2 (en) * 2010-04-05 2013-11-19 Media Lario S.R.L. EUV collector system with enhanced EUV radiation collection
DE102010041258A1 (de) * 2010-09-23 2012-03-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik mit einem beweglichen Filterelement
US8455160B2 (en) * 2010-12-09 2013-06-04 Himax Technologies Limited Color filter of liquid crystal on silicon display device
NL2009372A (en) * 2011-09-28 2013-04-02 Asml Netherlands Bv Methods to control euv exposure dose and euv lithographic methods and apparatus using such methods.
DE102013204444A1 (de) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
DE102013209042A1 (de) * 2013-05-15 2014-05-08 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
NL2013700A (en) * 2013-11-25 2015-05-27 Asml Netherlands Bv An apparatus, a device and a device manufacturing method.
CN109036163B (zh) * 2018-08-31 2021-08-06 京东方科技集团股份有限公司 一种显示装置及其环境光检测方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100358422B1 (ko) * 1993-09-14 2003-01-24 가부시키가이샤 니콘 플래인위치결정장치,주사형노광장치,주사노광방법및소자제조방법
US5483387A (en) * 1994-07-22 1996-01-09 Honeywell, Inc. High pass optical filter
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
TW498184B (en) * 1999-06-04 2002-08-11 Asm Lithography Bv Method of manufacturing a device using a lithographic projection apparatus, and device manufactured in accordance with said method
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
US6906859B2 (en) * 2002-06-05 2005-06-14 Nikon Corporation Epi-illumination apparatus for fluorescent observation and fluorescence microscope having the same
US6809327B2 (en) * 2002-10-29 2004-10-26 Intel Corporation EUV source box
JP2004317693A (ja) * 2003-04-15 2004-11-11 Mitsubishi Electric Corp 波長フィルタ、露光装置および撮像装置
WO2005017570A2 (en) * 2003-08-06 2005-02-24 University Of Pittsburgh Surface plasmon-enhanced nano-optic devices and methods of making same
JP4369256B2 (ja) * 2004-01-22 2009-11-18 日本板硝子株式会社 分光光学素子
US7453645B2 (en) * 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby

Also Published As

Publication number Publication date
TW200921256A (en) 2009-05-16
NL1035979A1 (nl) 2009-03-30
CN101836263A (zh) 2010-09-15
KR20100084526A (ko) 2010-07-26
WO2009041818A1 (en) 2009-04-02
US20100259744A1 (en) 2010-10-14
JP2010541234A (ja) 2010-12-24
EP2462593A1 (en) 2012-06-13

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