JP6420864B2 - スペクトル純度フィルタ、放射システム、及びコレクタ - Google Patents
スペクトル純度フィルタ、放射システム、及びコレクタ Download PDFInfo
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- H—ELECTRICITY
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- G—PHYSICS
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- H—ELECTRICITY
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- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Filters (AREA)
Description
[0001] 本願は、2011年3月4日に出願した米国仮出願第61/449,381号の優先権を主張し、その全体を本願に参考として組み込む。
深くエッチングすることを含む。アパーチャ141を空けるために、例えばKOHエッチング技術を用いて窓がシリコンウェーハの裏側へとエッチングされる。しかしながら、あらゆる既知のグリッドスペクトル純度フィルタが本発明で使用されてもよいことが理解されるであろう。
Claims (7)
- 交互層の多層スタックであって、該多層スタックに対して第1方向に第1波長の放射を反射する、交互層の多層スタックと、
前記多層スタックの頂面における第1複数の凹所であって、前記多層スタックに対して前記第1方向とは異なる第2方向に第2波長の放射が反射するように配置された第1格子を形成する第1複数の凹所と、
前記第1複数の凹所より小さい第2複数の凹所であって、前記第1複数の凹所のうちの凹所と凹所と間の前記多層スタックの頂面および前記第1複数の凹所のうちの前記凹所の下面に形成され、また、前記多層スタックに対して前記第1方向とは異なる第3方向に第3波長の放射が反射するように配置された少なくとも1つの第2格子を形成する、第2複数の凹所と、を備える、スペクトル純度フィルタ。 - 前記第1複数の凹所は、1.5μm〜3μmの間の深さを有する、請求項1に記載のスペクトル純度フィルタ。
- 前記第2複数の凹所は、25nm〜75nmの間の深さを有する、請求項1又は2に記載のスペクトル純度フィルタ。
- 前記第2複数の凹所は、長方形および三角形のうちのいずれかである断面を有する、請求項1〜3のいずれか1項に記載のスペクトル純度フィルタ。
- 前記第2方向および前記第3方向は同じである、請求項1〜3のいずれか1項に記載のスペクトル純度フィルタ。
- 放射ビームを提供する放射システムであって、
請求項1〜5のいずれかに記載のスペクトル純度フィルタを備え、
前記スペクトル純度フィルタは前記放射システムのコレクタの少なくとも一部の各反射面上に形成される、
放射システム。 - 放射システムに使用されるためのコレクタであって、反射面と、該反射面上に形成された請求項1〜5のいずれかに記載のスペクトル純度フィルタとを備える、コレクタ。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161449381P | 2011-03-04 | 2011-03-04 | |
US61/449,381 | 2011-03-04 |
Related Parent Applications (1)
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JP2013555773A Division JP2014508414A (ja) | 2011-03-04 | 2011-12-21 | リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法 |
Publications (2)
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JP2017126086A JP2017126086A (ja) | 2017-07-20 |
JP6420864B2 true JP6420864B2 (ja) | 2018-11-07 |
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JP2017078096A Active JP6420864B2 (ja) | 2011-03-04 | 2017-04-11 | スペクトル純度フィルタ、放射システム、及びコレクタ |
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Country Status (5)
Country | Link |
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US (2) | US9594306B2 (ja) |
EP (1) | EP2681625A1 (ja) |
JP (2) | JP2014508414A (ja) |
TW (1) | TWI534557B (ja) |
WO (1) | WO2012119672A1 (ja) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2014508414A (ja) | 2011-03-04 | 2014-04-03 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置、スペクトル純度フィルタおよびデバイス製造方法 |
CN104254789B (zh) * | 2012-01-19 | 2017-07-28 | 苏普瑞亚·杰斯瓦尔 | 与光刻及其他应用中的超紫外辐射联用的材料、组件以及方法 |
US10216093B2 (en) * | 2013-01-28 | 2019-02-26 | Asml Netherlands B.V. | Projection system and minor and radiation source for a lithographic apparatus |
US10228615B2 (en) * | 2014-07-04 | 2019-03-12 | Asml Netherlands B.V. | Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane |
EP3257054B1 (en) * | 2015-02-10 | 2019-10-16 | Carl Zeiss SMT GmbH | Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror |
JP2018527612A (ja) * | 2015-08-25 | 2018-09-20 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置のための抑制フィルタ、放射コレクタ及び放射源、並びに抑制フィルタの少なくとも2つの反射面レベル間の分離距離を決定する方法 |
DE102016213247A1 (de) * | 2016-07-20 | 2017-05-18 | Carl Zeiss Smt Gmbh | Optisches Element, insbesondere Kollektorspiegel einer EUV-Lichtquelle einer mikrolithographischen Projektionsbelichtungsanlage |
US10691024B2 (en) * | 2018-01-26 | 2020-06-23 | Kla-Tencor Corporation | High-power short-pass total internal reflection filter |
DE102018220629A1 (de) * | 2018-11-29 | 2020-06-04 | Carl Zeiss Smt Gmbh | Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel |
WO2020234043A1 (en) * | 2019-05-21 | 2020-11-26 | Asml Netherlands B.V. | Mirror for use in a lithographic apparatus |
DE102019212017A1 (de) * | 2019-08-09 | 2021-02-11 | Carl Zeiss Smt Gmbh | Optisches Beleuchtungssystem zur Führung von EUV-Strahlung |
DE102019213063A1 (de) * | 2019-08-30 | 2021-03-04 | Carl Zeiss Smt Gmbh | Optische Beugungskomponente |
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US9594306B2 (en) | 2017-03-14 |
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US20140085619A1 (en) | 2014-03-27 |
JP2014508414A (ja) | 2014-04-03 |
JP2017126086A (ja) | 2017-07-20 |
TWI534557B (zh) | 2016-05-21 |
US20170160646A1 (en) | 2017-06-08 |
EP2681625A1 (en) | 2014-01-08 |
US10001709B2 (en) | 2018-06-19 |
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