TWI534557B - 微影裝置、光譜純度濾光器及元件製造方法 - Google Patents

微影裝置、光譜純度濾光器及元件製造方法 Download PDF

Info

Publication number
TWI534557B
TWI534557B TW101100714A TW101100714A TWI534557B TW I534557 B TWI534557 B TW I534557B TW 101100714 A TW101100714 A TW 101100714A TW 101100714 A TW101100714 A TW 101100714A TW I534557 B TWI534557 B TW I534557B
Authority
TW
Taiwan
Prior art keywords
radiation
spectral purity
purity filter
radiation beam
grating
Prior art date
Application number
TW101100714A
Other languages
English (en)
Chinese (zh)
Other versions
TW201237565A (en
Inventor
凡丁 葉弗真葉米希 白尼
艾瑞克 羅勒夫 洛卜史塔
喬漢斯 哈博特 喬瑟菲那 莫斯
沙特 珍 伯納德 波萊奇莫斯 凡
格爾達斯 哈柏特斯 彼佐斯 瑪利亞 史溫克斯
安卓 米克哈洛維奇 亞庫寧
迪及西爾當克 安東尼爾斯 喬漢尼司 喬瑟夫司 凡
邦伊 威海明司 派特斯 丹
Original Assignee
Ａｓｍｌ荷蘭公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ａｓｍｌ荷蘭公司 filed Critical Ａｓｍｌ荷蘭公司
Publication of TW201237565A publication Critical patent/TW201237565A/zh
Application granted granted Critical
Publication of TWI534557B publication Critical patent/TWI534557B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/283—Interference filters designed for the ultraviolet
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/061—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements characterised by a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Filters (AREA)
TW101100714A 2011-03-04 2012-01-06 微影裝置、光譜純度濾光器及元件製造方法 TWI534557B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201161449381P 2011-03-04 2011-03-04

Publications (2)

Publication Number Publication Date
TW201237565A TW201237565A (en) 2012-09-16
TWI534557B true TWI534557B (zh) 2016-05-21

Family

ID=45420654

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101100714A TWI534557B (zh) 2011-03-04 2012-01-06 微影裝置、光譜純度濾光器及元件製造方法

Country Status (5)

Country Link
US (2) US9594306B2 (enExample)
EP (1) EP2681625A1 (enExample)
JP (2) JP2014508414A (enExample)
TW (1) TWI534557B (enExample)
WO (1) WO2012119672A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2681625A1 (en) 2011-03-04 2014-01-08 ASML Netherlands BV Lithograpic apparatus, spectral purity filter and device manufacturing method
KR102176709B1 (ko) * 2012-01-19 2020-11-10 수프리야 자이스왈 리소그래피 및 다른 적용분야에서 극자외 방사선을 이용하는 재료, 성분 및 사용을 위한 방법
KR102278351B1 (ko) * 2013-01-28 2021-07-19 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 방사선 소스, 거울 및 투영 시스템
CA3165053A1 (en) * 2014-07-04 2016-01-07 Asml Netherlands B.V. Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane
JP6731415B2 (ja) * 2015-02-10 2020-07-29 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖ多層ミラー、多層ミラーを含む光学系及び多層ミラーを製造する方法
NL2017272A (en) * 2015-08-25 2017-03-01 Asml Netherlands Bv Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter
DE102016213247A1 (de) * 2016-07-20 2017-05-18 Carl Zeiss Smt Gmbh Optisches Element, insbesondere Kollektorspiegel einer EUV-Lichtquelle einer mikrolithographischen Projektionsbelichtungsanlage
US10691024B2 (en) * 2018-01-26 2020-06-23 Kla-Tencor Corporation High-power short-pass total internal reflection filter
DE102018220629A1 (de) * 2018-11-29 2020-06-04 Carl Zeiss Smt Gmbh Spiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage mit einem Spektralfilter in Form einer Gitterstruktur und Verfahren zur Herstellung eines Spektralfilters in Form einer Gitterstruktur auf einem Spiegel
KR102880792B1 (ko) * 2019-05-21 2025-11-05 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치에서 사용하기 위한 미러
DE102019212017A1 (de) * 2019-08-09 2021-02-11 Carl Zeiss Smt Gmbh Optisches Beleuchtungssystem zur Führung von EUV-Strahlung
DE102019213063A1 (de) * 2019-08-30 2021-03-04 Carl Zeiss Smt Gmbh Optische Beugungskomponente
JP7403271B2 (ja) * 2019-10-10 2023-12-22 ギガフォトン株式会社 極端紫外光集光ミラー、極端紫外光生成装置、及び電子デバイスの製造方法
CN118063105A (zh) * 2020-03-11 2024-05-24 莱博创新公司 无线通信信号可穿透的节能窗镀膜及其制造方法
EP4208755A1 (en) * 2020-09-03 2023-07-12 ASML Netherlands B.V. Pellicle membrane for a lithographic apparatus
DE102020212367A1 (de) * 2020-09-30 2022-03-31 Carl Zeiss Smt Gmbh Optische Komponente
DE102021214237A1 (de) 2021-12-13 2022-12-22 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine EUV-Projektionsbelichtungsanlage
DE102022202059A1 (de) * 2022-03-01 2023-09-07 Carl Zeiss Smt Gmbh Verfahren zum Bearbeiten eines Werkstücks
US12645148B2 (en) * 2023-05-03 2026-06-02 Taiwan Semiconductor Manufacturing Company Ltd. Extreme ultraviolet (EUV) radiation source apparatus, EUV lithography system, and method for generating extreme ultraviolet radiation
US20260050112A1 (en) * 2024-08-14 2026-02-19 Kla Corporation Blazed grating based reflective spectral purity filter for euv imaging systems

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6469827B1 (en) * 1998-08-06 2002-10-22 Euv Llc Diffraction spectral filter for use in extreme-UV lithography condenser
TWI240151B (en) 2000-10-10 2005-09-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6577442B2 (en) * 2001-09-27 2003-06-10 Intel Corporation Reflective spectral filtering of high power extreme ultra-violet radiation
KR100748447B1 (ko) * 2002-08-23 2007-08-10 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치 및 상기 장치에 사용하기 위한파티클 배리어
US7230703B2 (en) 2003-07-17 2007-06-12 Tokyo Electron Limited Apparatus and method for measuring overlay by diffraction gratings
EP1515188A1 (en) * 2003-09-10 2005-03-16 ASML Netherlands B.V. Method for protecting an optical element, and optical element
SG112034A1 (en) 2003-11-06 2005-06-29 Asml Netherlands Bv Optical element, lithographic apparatus comprising such optical element and device manufacturing method
US7453645B2 (en) 2004-12-30 2008-11-18 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
US7196343B2 (en) * 2004-12-30 2007-03-27 Asml Netherlands B.V. Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
US7336416B2 (en) 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
US20070170379A1 (en) 2006-01-24 2007-07-26 Nikon Corporation Cooled optical filters and optical systems comprising same
JP2008130914A (ja) * 2006-11-22 2008-06-05 Nikon Corp 露光装置、及びデバイス製造方法
US20080259298A1 (en) * 2007-04-19 2008-10-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008288299A (ja) * 2007-05-16 2008-11-27 Nikon Corp 多層膜反射鏡、照明装置、露光装置、及びデバイス製造方法
JP5534647B2 (ja) 2008-02-28 2014-07-02 ギガフォトン株式会社 極端紫外光源装置
NL1036891A1 (nl) 2008-05-02 2009-11-03 Asml Netherlands Bv Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor.
JP5061063B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光用ミラーおよび極端紫外光源装置
WO2009144117A1 (en) * 2008-05-30 2009-12-03 Asml Netherlands B.V. Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter
US8390788B2 (en) 2008-07-11 2013-03-05 Asml Netherlands B.V. Spectral purity filters for use in a lithographic apparatus
NL2003152A1 (nl) 2008-08-14 2010-02-16 Asml Netherlands Bv Radiation source, lithographic apparatus and device manufacturing method.
US20110157573A1 (en) 2008-08-29 2011-06-30 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus including such a spectral purity filter and device manufacturing method
JP2010087312A (ja) * 2008-09-30 2010-04-15 Canon Inc 露光装置およびデバイス製造方法
WO2010145951A2 (en) 2009-06-17 2010-12-23 Asml Netherlands B.V. Method of overlay measurement, lithographic apparatus, inspection apparatus, processing apparatus and lithographic processing cell
NL2004787A (en) 2009-06-30 2011-01-04 Asml Netherlands Bv Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter.
NL2005111A (en) * 2009-08-21 2011-02-22 Asml Netherlands Bv Spectral purity filters for use in a lithographic apparatus.
WO2011023454A1 (en) 2009-08-27 2011-03-03 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
US20120170015A1 (en) 2009-09-16 2012-07-05 Asml Netherlands B.V. Spectral purity filter, lithographic apparatus, method for manufacturing a spectral purity filter and method of manufacturing a device using lithographic apparatus
EP2577398A1 (en) * 2010-05-27 2013-04-10 ASML Netherlands B.V. Multilayer mirror
EP2681625A1 (en) 2011-03-04 2014-01-08 ASML Netherlands BV Lithograpic apparatus, spectral purity filter and device manufacturing method

Also Published As

Publication number Publication date
US20170160646A1 (en) 2017-06-08
US20140085619A1 (en) 2014-03-27
US10001709B2 (en) 2018-06-19
JP2014508414A (ja) 2014-04-03
JP6420864B2 (ja) 2018-11-07
US9594306B2 (en) 2017-03-14
JP2017126086A (ja) 2017-07-20
WO2012119672A1 (en) 2012-09-13
EP2681625A1 (en) 2014-01-08
TW201237565A (en) 2012-09-16

Similar Documents

Publication Publication Date Title
JP6420864B2 (ja) スペクトル純度フィルタ、放射システム、及びコレクタ
TWI528116B (zh) 形成光譜純度濾光器之方法
JP5406602B2 (ja) 多層ミラー及びリソグラフィ装置
JP6005069B2 (ja) かすめ入射リフレクタ、リソグラフィ装置、かすめ入射リフレクタ製造方法、およびデバイス製造方法
US20040109149A1 (en) Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP5336497B2 (ja) リソグラフィスペクトルフィルタ、及びリソグラフィ装置
JP2012501073A (ja) スペクトル純度フィルタおよびリソグラフィ装置
JP5528449B2 (ja) スペクトル純度フィルタ、このスペクトル純度フィルタを備えたリソグラフィ装置、およびデバイス製造方法
TWI510821B (zh) 光譜純度濾光器
KR101625934B1 (ko) 다층 미러 및 리소그래피 장치
JP2013505593A (ja) スペクトル純度フィルタ、リソグラフィ装置、及びデバイス製造方法
JP5162560B2 (ja) フライアイインテグレータ、イルミネータ、リソグラフィ装置および方法
JP2006194764A (ja) 多層膜反射鏡および露光装置
NL2006604A (en) Lithographic apparatus, spectral purity filter and device manufacturing method.