US20160259232A1 - Method and apparatus for making a high resolution light pattern generator on a transparent substrate - Google Patents
Method and apparatus for making a high resolution light pattern generator on a transparent substrate Download PDFInfo
- Publication number
- US20160259232A1 US20160259232A1 US15/065,555 US201615065555A US2016259232A1 US 20160259232 A1 US20160259232 A1 US 20160259232A1 US 201615065555 A US201615065555 A US 201615065555A US 2016259232 A1 US2016259232 A1 US 2016259232A1
- Authority
- US
- United States
- Prior art keywords
- layer
- coating
- transparent plate
- laser
- light beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims description 25
- 239000000758 substrate Substances 0.000 title description 20
- 230000003287 optical effect Effects 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims description 32
- 239000011248 coating agent Substances 0.000 claims description 30
- 230000005855 radiation Effects 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- 239000006097 ultraviolet radiation absorber Substances 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
- 240000005528 Arctium lappa Species 0.000 abstract description 19
- 239000011521 glass Substances 0.000 description 8
- 238000003860 storage Methods 0.000 description 6
- 238000010330 laser marking Methods 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 239000011358 absorbing material Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V11/00—Screens not covered by groups F21V1/00, F21V3/00, F21V7/00 or F21V9/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21W—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO USES OR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS
- F21W2131/00—Use or application of lighting devices or systems not provided for in codes F21W2102/00-F21W2121/00
- F21W2131/40—Lighting for industrial, commercial, recreational or military use
- F21W2131/406—Lighting for industrial, commercial, recreational or military use for theatres, stages or film studios
Definitions
- a significant feature of stage lighting systems is the projection of images by stage lighting instruments. Images are typically formed by passing a light beam through a light pattern generator or “gobo” and projecting the image formed thereby. A gobo therefore operates as a light stencil, blocking certain portions of the light beam and passing other portions.
- a typical configuration for projecting a pattern of light has a gobo placed in a projection gate located at a focal plane of a projection lens and illuminated by a light source.
- a typical theatrical lighting projector, also called a luminaire comprises a light source, a reflector which focuses light rays to the focal plane, and one or more lenses to project an image of the gobo at the focal plane.
- heat resistant gobos have been fabricated as a layer of light reflective materials, such as aluminum deposited on a surface of a transparent plate such as heat resistant glass.
- the light reflective layer has an opening which is in the shape of the image. A portion of the light beam passes through the opening to produce a beam having the shape of the image.
- the reflective layer serves to reflect a portion of the light beam which does not pass through the opening.
- Glass gobos of this type are very resistant to the intense heat present at the projection lens focal plane. Glass gobos of this type are manufactured by a relatively expensive and time-consuming process, e.g., that described in U.S. Pat. No. 4,779,176.
- This process requires fabricating a photo mask having the desired image formed therein to facilitate deposition of the photo resist layer. Due to the significant lead times required to manufacture the photo mask, and thus the finished gobos, this process is not typically suitable for small, “made-to-order” production runs.
- a light reflective layer is deposited on a surface of a transparent plate.
- a laser marking system writes an image onto the transparent plate having a reflective layer bonded thereto.
- the reflective layer is highly reflective to visible light and is absorptive of certain wavelengths of near infra-red radiation, in the range of 850 to 2000 nm.
- the reflective layer of the blank gobo absorbs the energy of the laser beam and is ablated away from the transparent plate, leaving an opening in the shape of the desired image.
- the reflective layer can be a four-layer stack of enhanced aluminum, applied by a vacuum-deposition process to produce a coating that is highly reflective of visible light, absorptive of near infra-red radiation at 1.06 micrometers, and stable at high temperatures.
- This prior art operated by depositing on a transparent plate a layer of reflective material which reflects visible light and absorbs certain wavelengths of near infra-red radiation; generating a laser beam having a given beam diameter at a certain infra-red wavelength. It may also direct the laser beam onto the transparent plate; steering the laser beam across a surface of the transparent plate; allowing the energy of the beam to ablate reflective material from certain areas of the reflective layer; and switching the laser beam on and off to control which areas of the reflective layer are affected by the laser beam.
- 1.06 micron lasers are large, and require water cooling. Therefore they are expensive to maintain, and the minimum spot size is governed by the wavelength of the laser. Typically, this can be, for example, 0.001′′ when written over a 1.0′′ diameter field of view. The resulting imagery is coarse.
- the minimum diameter of a spot of focused laser energy is directly dependent on the laser wavelength.
- the inventors recognize that use of a UV laser allows for smaller spot sizes than IR lasers and therefore produce ablated gobo images with higher resolution.
- Embodiments describe projection optical systems, particularly used the projection of images by stage lighting equipment and to a method and apparatus for making a high resolution light pattern generator on a transparent substrate for use in such equipment.
- FIG. 1 shows an embodiment of a substrate for gobos
- FIG. 2 shows an alternate configuration which ablates from the same side as the light beam is incident
- FIG. 3 shows a system of forming the gobo
- FIG. 4 shows an alternative configuration
- An embodiment describes a light pattern generator for projecting an image with a light beam, where the object to be imaged is a gobo which shapes the light beam.
- the generator 100 includes a transparent substrate 105 for placement in the light beam with selective coatings on certain areas to form the image.
- the transparent substrate 105 may be a borosilicate glass of approximately 1.1 mm thickness, having a transmission of about 95% at 355 mm.
- This substrate 105 is coated on the front side with a high efficiency anti-reflective (“HEAR”) coating that is highly transmissive in the 355 nm to 700 nm range.
- the transparent substrate 105 is coated on the rear side with a “release layer” 115 that is highly light absorptive (e.g., greater than 90%) at 355 nm.
- a dark mirror coating 120 that is highly absorptive in the 400 nm to 700 nm region of the spectrum is coated on the release layer 115 . This is covered by a dielectric reflector 125 .
- a laser 140 produces laser light 145 at 355 nm which is focused on the front side 101 of the coated substrate 100 .
- the laser light is conveyed through the substrate, due to the high transmittance of the HEAR coating 110 .
- the laser radiation then contacts the release layer 115 , which is vaporized in the location of the laser application. This thus ablates the release layer, the dark mirror coating, and the highly reflective coating.
- an image is written onto the generator 100 , thereby forming a gobo from the substrate.
- An alternative embodiment may be similar to that in the above, with the HEAR and UV absorber layers removed.
- FIG. 4 shows an embodiment where there is a “simplified” configuration.
- a substrate of borosilicate glass 400 is formed with a top surface 402 that faces to the incident light beam, and a bottom uncoated surface 404 .
- the borosilicate substrate has a transmission at 355 nm of greater than 95%.
- the top surface 402 is covered with a UV absorbing dark coating 420 that absorbs most of the incoming light, e.g, reflects less than 5% of incoming light (355-700 nm).
- the coating 420 is covered with a multi layer reflector layer 430 which is formed of multiple layers of reflector elements. The multi layer reflector may reflect more than 93% of 400-700 nm radiation.
- Yet another embodiment 200 shown in FIG. 2 , includes a transparent substrate 205 for placement in the light beam.
- the transparent substrate 205 is uncoated on the front side 206 (which is the side that receives the incident light beam).
- the transparent substrate is coated on the rear side with a “release layer” 210 that is highly absorptive at 355 nm.
- a “release layer” 210 that is highly absorptive at 355 nm.
- a reflective coating 215 that is highly reflective in the region of 400 nm to 700 nm.
- a dark mirror coating 220 that is highly absorptive in the 355 nm to 700 nm region of the spectrum.
- a UV laser 230 creates laser light 235 at 355 nm which is focused on the front side 206 of the coated substrate.
- the laser light is conveyed through the substrate and contacts the release layer 210 .
- the laser vaporizes and ablates the release layer, the highly reflective coating, and the dark mirror coating.
- By pulsing the laser and moving the beam an image is written onto the device, thus forming a gobo.
- FIG. 3 Another aspect of shown in FIG. 3 comprises an apparatus for making a light pattern generator.
- the apparatus includes a general purpose computer 300 , a laser marking system 310 at operating in the UV region at 355 nm, and a galvo system 320 for steering the focused laser beam across the substrate 330 .
- the general purpose computer 300 serves as a host computer interface to the laser marking system and galvo systems.
- the laser marking system writes an image onto a transparent plate having a reflective layer bonded thereto, the image being dependent upon digital computer data selected at the host computer interface and loaded into a control unit of the laser marking system.
- the laser beam has a very narrow beam diameter and a characteristic wavelength in the near UV region.
- the absorbing layer of the blank gobo is absorptive to the energy of the laser beam and is ablated away from the transparent plate, along with the reflective coating, leaving an opening in the shape of the desired image.
- Another aspect comprises a method for making a light pattern generator.
- the method includes the steps of: depositing on a transparent plate a layer of reflective material which reflects visible light, absorbing material that absorbs visible light, a release layer that absorbs certain wavelengths of near UV radiation, and a HEAR layer, and; generating a laser beam having a very small beam diameter at a certain UV wavelength; directing the laser beam onto the transparent plate; steering the laser beam across a surface of the transparent plate; allowing the energy of the beam to ablate absorbing material from certain areas of the reflective layer, which in turn blows off the reflective material; and switching the laser beam on and off to control which areas of the reflective layer are affected by the laser beam.
- DSP Digital Signal Processor
- ASIC Application Specific Integrated Circuit
- FPGA Field Programmable Gate Array
- a general purpose processor may be a microprocessor, but in the alternative, the processor may be any conventional processor, controller, microcontroller, or state machine.
- a processor may also be implemented as a combination of computing devices, e.g., a combination of a DSP and a microprocessor, a plurality of microprocessors, one or more microprocessors in conjunction with a DSP core, or any other such configuration. These devices may also be used to select values for devices as described herein.
- the functions described may be implemented in hardware, software, firmware, or any combination thereof. If implemented in software, the functions may be stored on or transmitted over as one or more instructions or code on a computer-readable medium.
- Computer-readable media includes both computer storage media and communication media including any medium that facilitates transfer of a computer program from one place to another.
- a storage media may be any available media that can be accessed by a computer.
- such computer-readable media can comprise RAM, ROM, EEPROM, CD-ROM or other optical disk storage, magnetic disk storage or other magnetic storage devices, or any other medium that can be used to carry or store desired program code in the form of instructions or data structures and that can be accessed by a computer.
- any connection is properly termed a computer-readable medium.
- the software is transmitted from a website, server, or other remote source using a coaxial cable, fiber optic cable, twisted pair, digital subscriber line (DSL), or wireless technologies such as infrared, radio, and microwave
- the coaxial cable, fiber optic cable, twisted pair, DSL, or wireless technologies such as infrared, radio, and microwave are included in the definition of medium.
- Disk and disc includes compact disc (CD), laser disc, optical disc, digital versatile disc (DVD), floppy disk and blu-ray disc where disks usually reproduce data magnetically, while discs reproduce data optically with lasers. Combinations of the above should also be included within the scope of computer-readable media.
- the computers described herein may be any kind of computer, either general purpose, or some specific purpose computer such as a workstation.
- the programs may be written in C, or Java, Brew or any other programming language.
- the programs may be resident on a storage medium, e.g., magnetic or optical, e.g. the computer hard drive, a removable disk or media such as a memory stick or SD media, or other removable medium.
- the programs may also be run over a network, for example, with a server or other machine sending signals to the local machine, which allows the local machine to carry out the operations described herein.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Laser Beam Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
A light pattern generator that can be used to form a gobo for use in a projection optical system. A transparent plate is coated with a stack that is absorptive and reflective. The stack is formed to be ablatable in the form of a pattern. The stack can have multiple different layers with multiple different characteristics, all of which are ablated by the laser.
Description
- This application is a divisional application of U.S. Ser. No. 13/675,063, filed Nov. 13, 2012, which is a divisional of Ser. No. 12/495,484 filed Jun. 30, 2009, now U.S. Pat. No. 8,310,751 issued Nov. 13, 2012, which claims priority from provisional application Ser. No. 61/076,822, filed Jun. 30, 2008, the entire contents of which are herewith incorporated by reference in its entirety.
- A significant feature of stage lighting systems is the projection of images by stage lighting instruments. Images are typically formed by passing a light beam through a light pattern generator or “gobo” and projecting the image formed thereby. A gobo therefore operates as a light stencil, blocking certain portions of the light beam and passing other portions. A typical configuration for projecting a pattern of light has a gobo placed in a projection gate located at a focal plane of a projection lens and illuminated by a light source. A typical theatrical lighting projector, also called a luminaire comprises a light source, a reflector which focuses light rays to the focal plane, and one or more lenses to project an image of the gobo at the focal plane.
- It is desirable to make the projector, and thus the gobos, as small as possible. For this reason, it is often necessary to focus the source's energy into a very small area. This creates intense heat at the focal plane. Typically, heat resistant gobos have been fabricated as a layer of light reflective materials, such as aluminum deposited on a surface of a transparent plate such as heat resistant glass. The light reflective layer has an opening which is in the shape of the image. A portion of the light beam passes through the opening to produce a beam having the shape of the image. The reflective layer serves to reflect a portion of the light beam which does not pass through the opening.
- Glass gobos of this type are very resistant to the intense heat present at the projection lens focal plane. Glass gobos of this type are manufactured by a relatively expensive and time-consuming process, e.g., that described in U.S. Pat. No. 4,779,176.
- The process described in U.S. Pat. No. 4,779,176 requires a layer of positive photoresist material to be deposited in the shape of a desired image onto a large, thin sheet of transparent glass. A thin layer of aluminum is then deposited over the glass and the photo resist layer. A multi-layer dielectric coating deposited over the aluminum layer forms a “dark mirror”, which is a low reflectivity surface that absorbs visible light. The glass sheet and the various coatings are then exposed to solvents which dissolves the photo resist and lifts all the layers of material immediately over the photo resist while having no effect on the glass. The solvents etch process produces an opening through the deposited layers which is in the shape of the desired image.
- This process requires fabricating a photo mask having the desired image formed therein to facilitate deposition of the photo resist layer. Due to the significant lead times required to manufacture the photo mask, and thus the finished gobos, this process is not typically suitable for small, “made-to-order” production runs.
- In an effort to overcome the expense and time required to quickly produce glass gobos, prior art methods have employed a laser operating in the near IR to ablate reflective material from a transparent substrate. Such methods are described in U.S. Pat. No. 5,728,994.
- As described in U.S. Pat. No. 5,728,994, a light reflective layer is deposited on a surface of a transparent plate. A laser marking system writes an image onto the transparent plate having a reflective layer bonded thereto. The reflective layer is highly reflective to visible light and is absorptive of certain wavelengths of near infra-red radiation, in the range of 850 to 2000 nm. The reflective layer of the blank gobo absorbs the energy of the laser beam and is ablated away from the transparent plate, leaving an opening in the shape of the desired image. The reflective layer can be a four-layer stack of enhanced aluminum, applied by a vacuum-deposition process to produce a coating that is highly reflective of visible light, absorptive of near infra-red radiation at 1.06 micrometers, and stable at high temperatures.
- This prior art operated by depositing on a transparent plate a layer of reflective material which reflects visible light and absorbs certain wavelengths of near infra-red radiation; generating a laser beam having a given beam diameter at a certain infra-red wavelength. It may also direct the laser beam onto the transparent plate; steering the laser beam across a surface of the transparent plate; allowing the energy of the beam to ablate reflective material from certain areas of the reflective layer; and switching the laser beam on and off to control which areas of the reflective layer are affected by the laser beam.
- 1. Back reflections
- 2. Low resolution
- 3. Requires the use of a high maintenance laser, water cooled, etc.
- 1.06 micron lasers are large, and require water cooling. Therefore they are expensive to maintain, and the minimum spot size is governed by the wavelength of the laser. Typically, this can be, for example, 0.001″ when written over a 1.0″ diameter field of view. The resulting imagery is coarse.
- The minimum diameter of a spot of focused laser energy is directly dependent on the laser wavelength. The inventors recognize that use of a UV laser allows for smaller spot sizes than IR lasers and therefore produce ablated gobo images with higher resolution.
- Embodiments describe projection optical systems, particularly used the projection of images by stage lighting equipment and to a method and apparatus for making a high resolution light pattern generator on a transparent substrate for use in such equipment.
- In the Drawings:
-
FIG. 1 shows an embodiment of a substrate for gobos; -
FIG. 2 shows an alternate configuration which ablates from the same side as the light beam is incident; -
FIG. 3 shows a system of forming the gobo; and -
FIG. 4 shows an alternative configuration. - An embodiment describes a light pattern generator for projecting an image with a light beam, where the object to be imaged is a gobo which shapes the light beam.
- The
generator 100 includes atransparent substrate 105 for placement in the light beam with selective coatings on certain areas to form the image. Thetransparent substrate 105 may be a borosilicate glass of approximately 1.1 mm thickness, having a transmission of about 95% at 355 mm. Thissubstrate 105 is coated on the front side with a high efficiency anti-reflective (“HEAR”) coating that is highly transmissive in the 355 nm to 700 nm range. Thetransparent substrate 105 is coated on the rear side with a “release layer” 115 that is highly light absorptive (e.g., greater than 90%) at 355 nm. On top of that is adark mirror coating 120 that is highly absorptive in the 400 nm to 700 nm region of the spectrum is coated on therelease layer 115. This is covered by adielectric reflector 125. - A
laser 140 produceslaser light 145 at 355 nm which is focused on thefront side 101 of thecoated substrate 100. The laser light is conveyed through the substrate, due to the high transmittance of the HEARcoating 110. The laser radiation then contacts therelease layer 115, which is vaporized in the location of the laser application. This thus ablates the release layer, the dark mirror coating, and the highly reflective coating. By pulsing the laser and moving the beam, an image is written onto thegenerator 100, thereby forming a gobo from the substrate. - An alternative embodiment may be similar to that in the above, with the HEAR and UV absorber layers removed.
-
FIG. 4 shows an embodiment where there is a “simplified” configuration. A substrate ofborosilicate glass 400 is formed with atop surface 402 that faces to the incident light beam, and a bottomuncoated surface 404. The borosilicate substrate has a transmission at 355 nm of greater than 95%. Thetop surface 402 is covered with a UV absorbingdark coating 420 that absorbs most of the incoming light, e.g, reflects less than 5% of incoming light (355-700 nm). Thecoating 420 is covered with a multilayer reflector layer 430 which is formed of multiple layers of reflector elements. The multi layer reflector may reflect more than 93% of 400-700 nm radiation. - Yet another
embodiment 200, shown inFIG. 2 , includes atransparent substrate 205 for placement in the light beam. Thetransparent substrate 205 is uncoated on the front side 206 (which is the side that receives the incident light beam). The transparent substrate is coated on the rear side with a “release layer” 210 that is highly absorptive at 355 nm. On top of therelease layer 210 is areflective coating 215 that is highly reflective in the region of 400 nm to 700 nm. On top of that is adark mirror coating 220 that is highly absorptive in the 355 nm to 700 nm region of the spectrum. - A
UV laser 230 createslaser light 235 at 355 nm which is focused on thefront side 206 of the coated substrate. The laser light is conveyed through the substrate and contacts therelease layer 210. The laser vaporizes and ablates the release layer, the highly reflective coating, and the dark mirror coating. By pulsing the laser and moving the beam, an image is written onto the device, thus forming a gobo. - Another aspect of shown in
FIG. 3 comprises an apparatus for making a light pattern generator. The apparatus includes ageneral purpose computer 300, alaser marking system 310 at operating in the UV region at 355 nm, and agalvo system 320 for steering the focused laser beam across thesubstrate 330. Thegeneral purpose computer 300 serves as a host computer interface to the laser marking system and galvo systems. The laser marking system writes an image onto a transparent plate having a reflective layer bonded thereto, the image being dependent upon digital computer data selected at the host computer interface and loaded into a control unit of the laser marking system. The laser beam has a very narrow beam diameter and a characteristic wavelength in the near UV region. - The absorbing layer of the blank gobo is absorptive to the energy of the laser beam and is ablated away from the transparent plate, along with the reflective coating, leaving an opening in the shape of the desired image.
- Another aspect comprises a method for making a light pattern generator. The method includes the steps of: depositing on a transparent plate a layer of reflective material which reflects visible light, absorbing material that absorbs visible light, a release layer that absorbs certain wavelengths of near UV radiation, and a HEAR layer, and; generating a laser beam having a very small beam diameter at a certain UV wavelength; directing the laser beam onto the transparent plate; steering the laser beam across a surface of the transparent plate; allowing the energy of the beam to ablate absorbing material from certain areas of the reflective layer, which in turn blows off the reflective material; and switching the laser beam on and off to control which areas of the reflective layer are affected by the laser beam.
- Although only a few embodiments have been disclosed in detail above, other embodiments are possible and the inventors intend these to be encompassed within this specification. The specification describes specific examples to accomplish a more general goal that may be accomplished in another way. This disclosure is intended to be exemplary, and the claims are intended to cover any modification or alternative which might be predictable to a person having ordinary skill in the art. For example, other forms of lighting devices can be used and other materials can be used.
- Those of skill would further appreciate that the various illustrative logical blocks, modules, circuits, and algorithm steps described in connection with the embodiments disclosed herein may be implemented as electronic hardware, computer software, or combinations of both. For example, this can be used for the blocks that control the laser to make the pattern on the substrate. To clearly illustrate this interchangeability of hardware and software, various illustrative components, blocks, modules, circuits, and steps have been described above generally in terms of their functionality. Whether such functionality is implemented as hardware or software depends upon the particular application and design constraints imposed on the overall system. Skilled artisans may implement the described functionality in varying ways for each particular application, but such implementation decisions should not be interpreted as causing a departure from the scope of the exemplary embodiments of the invention.
- The various illustrative logical blocks, modules, and circuits described in connection with the embodiments disclosed herein, may be implemented or performed with a general purpose processor, a Digital Signal Processor (DSP), an Application Specific Integrated Circuit (ASIC), a Field Programmable Gate Array (FPGA) or other programmable logic device, discrete gate or transistor logic, discrete hardware components, or any combination thereof designed to perform the functions described herein. A general purpose processor may be a microprocessor, but in the alternative, the processor may be any conventional processor, controller, microcontroller, or state machine. A processor may also be implemented as a combination of computing devices, e.g., a combination of a DSP and a microprocessor, a plurality of microprocessors, one or more microprocessors in conjunction with a DSP core, or any other such configuration. These devices may also be used to select values for devices as described herein.
- In one or more exemplary embodiments, the functions described may be implemented in hardware, software, firmware, or any combination thereof. If implemented in software, the functions may be stored on or transmitted over as one or more instructions or code on a computer-readable medium. Computer-readable media includes both computer storage media and communication media including any medium that facilitates transfer of a computer program from one place to another. A storage media may be any available media that can be accessed by a computer. By way of example, and not limitation, such computer-readable media can comprise RAM, ROM, EEPROM, CD-ROM or other optical disk storage, magnetic disk storage or other magnetic storage devices, or any other medium that can be used to carry or store desired program code in the form of instructions or data structures and that can be accessed by a computer. Also, any connection is properly termed a computer-readable medium. For example, if the software is transmitted from a website, server, or other remote source using a coaxial cable, fiber optic cable, twisted pair, digital subscriber line (DSL), or wireless technologies such as infrared, radio, and microwave, then the coaxial cable, fiber optic cable, twisted pair, DSL, or wireless technologies such as infrared, radio, and microwave are included in the definition of medium. Disk and disc, as used herein, includes compact disc (CD), laser disc, optical disc, digital versatile disc (DVD), floppy disk and blu-ray disc where disks usually reproduce data magnetically, while discs reproduce data optically with lasers. Combinations of the above should also be included within the scope of computer-readable media.
- Also, the inventors intend that only those claims which use the words “means for” are intended to be interpreted under 35 USC 112, sixth paragraph. Moreover, no limitations from the specification are intended to be read into any claims, unless those limitations are expressly included in the claims. The computers described herein may be any kind of computer, either general purpose, or some specific purpose computer such as a workstation. The programs may be written in C, or Java, Brew or any other programming language. The programs may be resident on a storage medium, e.g., magnetic or optical, e.g. the computer hard drive, a removable disk or media such as a memory stick or SD media, or other removable medium. The programs may also be run over a network, for example, with a server or other machine sending signals to the local machine, which allows the local machine to carry out the operations described herein.
- Where a specific numerical value is mentioned herein, it should be considered that the value may be increased or decreased by 20%, while still staying within the teachings of the present application, unless some different range is specifically mentioned. Where a specified logical sense is used, the opposite logical sense is also intended to be encompassed.
- The previous description of the disclosed exemplary embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these exemplary embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (12)
1. A method comprising: forming an optical structure comprising a transparent plate with front and rear sides, and having a coating stack bonded to one of said sides of the transparent plate, said coating stack comprising: a release layer that is an ultraviolet absorber that is vaporized by application of ultraviolet radiation, a dark coating which absorbs ultraviolet; and a reflector layer, coupled to said dark coating;
Processing said optical structure by using a UV laser that passes through said transparent plate to said coating stack, to vaporize said release layer and ablate a portion of said dark coating adjacent to a location of vaporizing said release layer.
2. A method as in claim 1 , further comprising producing a light beam through said optical structure after said processing, to shape said light beam.
3. A method as in claim 1 , wherein said reflector layer has multiple layers of reflector material.
4. The method as in claim 1 , wherein said processing forms a shape in said coating stack which changes a shape of said light beam.
5. A method as in claim 1 , wherein said forming further comprising using an anti-reflection coating on the front side of the transparent plate, said coating being substantially transmissive to radiation.
6. A method as in claim 5 , wherein said coating stack is on said rear side of said transparent plate.
7. A method as in claim 1 , wherein said coating stack is on said front side of said transparent plate.
8. A method comprising:
directing a UV laser through an optical structure formed of a transparent plate with front and rear sides and which has a coating stack bonded to the rear side of the transparent plate, said coating stack comprising:
a first layer which is vaporized by UV radiation;
a second layer substantially absorptive to radiation in a second range; and
a third layer substantially reflective to radiation in a third range; and
using said UV laser to vaporize areas of said first layer and ablate portions of said second layer and third layer which are adjacent to said areas of said first layer.
9. A method as in claim 8 , wherein said second range and said third range are the same.
10. A method as in claim 8 , further comprising producing a light beam through said optical structure after said using, to shape said light beam.
11. A method as in claim 10 , wherein said directing forms a shape in said coating stack which changes a shape of said light beam.
12. A method as in claim 8 , further comprising using an anti-reflection coating on the front side of the transparent plate, said coating being substantially transmissive to radiation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/065,555 US20160259232A1 (en) | 2008-06-30 | 2016-03-09 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US7682208P | 2008-06-30 | 2008-06-30 | |
| US12/495,484 US8310751B2 (en) | 2008-06-30 | 2009-06-30 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
| US13/675,063 US20130070212A1 (en) | 2008-06-30 | 2012-11-13 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
| US15/065,555 US20160259232A1 (en) | 2008-06-30 | 2016-03-09 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US13/675,063 Division US20130070212A1 (en) | 2008-06-30 | 2012-11-13 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20160259232A1 true US20160259232A1 (en) | 2016-09-08 |
Family
ID=41446987
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US12/495,484 Active 2031-03-01 US8310751B2 (en) | 2008-06-30 | 2009-06-30 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
| US13/675,063 Abandoned US20130070212A1 (en) | 2008-06-30 | 2012-11-13 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
| US15/065,555 Abandoned US20160259232A1 (en) | 2008-06-30 | 2016-03-09 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
Family Applications Before (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US12/495,484 Active 2031-03-01 US8310751B2 (en) | 2008-06-30 | 2009-06-30 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
| US13/675,063 Abandoned US20130070212A1 (en) | 2008-06-30 | 2012-11-13 | Method and apparatus for making a high resolution light pattern generator on a transparent substrate |
Country Status (4)
| Country | Link |
|---|---|
| US (3) | US8310751B2 (en) |
| EP (1) | EP2310894A4 (en) |
| CA (1) | CA2729352A1 (en) |
| WO (1) | WO2010002917A2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6410030B2 (en) * | 2014-09-24 | 2018-10-24 | 日本電気硝子株式会社 | Optical imaging member and method of manufacturing optical imaging member |
| JP2018093180A (en) * | 2016-11-03 | 2018-06-14 | アイメック・ヴェーゼットウェーImec Vzw | Method for patterning amorphous semiconductor layer |
| US10718486B2 (en) | 2017-05-06 | 2020-07-21 | Richard S. Belliveau | Theatre light projector incorporating a plurality of light sources and improvements to blending the light output |
| US10344944B2 (en) | 2017-05-06 | 2019-07-09 | Richard S. Belliveau | Theatre light projector incorporating a plurality of light sources and improvements to blending the light output |
| CN108050477B (en) * | 2017-12-26 | 2024-01-30 | 广州市浩洋电子股份有限公司 | Color temperature compensation pattern piece, color temperature compensation system and color temperature compensation method thereof |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4241355A (en) * | 1977-09-29 | 1980-12-23 | Rca Corporation | Ablative optical recording medium |
| US4245003A (en) | 1979-08-17 | 1981-01-13 | James River Graphics, Inc. | Coated transparent film for laser imaging |
| US4779176A (en) * | 1986-07-16 | 1988-10-18 | Vari-Lite, Inc. | Light pattern generator |
| JPH01267092A (en) | 1988-04-19 | 1989-10-24 | Miyachi Electric Co | Laser marking method |
| US5171650A (en) * | 1990-10-04 | 1992-12-15 | Graphics Technology International, Inc. | Ablation-transfer imaging/recording |
| US6027849A (en) * | 1992-03-23 | 2000-02-22 | Imation Corp. | Ablative imageable element |
| USRE35512F1 (en) * | 1992-07-20 | 1998-08-04 | Presstek Inc | Lithographic printing members for use with laser-discharge imaging |
| GB9217392D0 (en) * | 1992-08-15 | 1992-09-30 | Light & Sound Design Ltd | Colour image protection apparatus |
| EP0652400B1 (en) * | 1993-11-05 | 2000-09-20 | Vari-Lite, Inc. | Light pattern generator (gobo) and laser ablation method and apparatus for making it |
| US6461973B1 (en) * | 2000-02-11 | 2002-10-08 | Advanced Micro Devices, Inc. | Method for forming high quality multiple thickness oxide layers by reducing descum induced defects |
| US6578987B1 (en) * | 2000-05-03 | 2003-06-17 | Vari-Lite, Inc. | Intra-lens color and dimming apparatus |
| US6962765B2 (en) * | 2003-10-20 | 2005-11-08 | Kodak Polychrome Graphics Llc | Laser-generated ultraviolet radiation mask |
| KR100998670B1 (en) * | 2007-10-31 | 2010-12-06 | 주식회사 하이닉스반도체 | Masks, manufacturing methods and exposure methods used in extreme ultraviolet lithography |
| US8081367B2 (en) * | 2008-06-24 | 2011-12-20 | Production Resource Group, Llc | Layered dimmer system |
-
2009
- 2009-06-30 CA CA2729352A patent/CA2729352A1/en not_active Abandoned
- 2009-06-30 EP EP09774367A patent/EP2310894A4/en not_active Withdrawn
- 2009-06-30 WO PCT/US2009/049296 patent/WO2010002917A2/en active Application Filing
- 2009-06-30 US US12/495,484 patent/US8310751B2/en active Active
-
2012
- 2012-11-13 US US13/675,063 patent/US20130070212A1/en not_active Abandoned
-
2016
- 2016-03-09 US US15/065,555 patent/US20160259232A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| EP2310894A2 (en) | 2011-04-20 |
| WO2010002917A3 (en) | 2010-03-11 |
| US20130070212A1 (en) | 2013-03-21 |
| CA2729352A1 (en) | 2010-01-07 |
| US8310751B2 (en) | 2012-11-13 |
| EP2310894A4 (en) | 2012-08-01 |
| WO2010002917A2 (en) | 2010-01-07 |
| US20090323032A1 (en) | 2009-12-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20160259232A1 (en) | Method and apparatus for making a high resolution light pattern generator on a transparent substrate | |
| JP2510069B2 (en) | Method for manufacturing laser ablation mask | |
| US7061582B2 (en) | Exposure apparatus including micro mirror array and exposure method using the same | |
| TWI577924B (en) | Lighting arrangement | |
| JP2007306004A (en) | Apparatus for projecting pattern on substrate from euv mask, and method of manufacturing same | |
| Smith et al. | Imaging with diffractive axicons rapidly milled on sapphire by femtosecond laser ablation | |
| US5323208A (en) | Projection exposure apparatus | |
| US6667837B1 (en) | Method and apparatus for configuring an aperture edge | |
| US20120170113A1 (en) | Infrared transmission optics formed with anti-reflection pattern, and manufacturing method thereof | |
| TW201337475A (en) | Non-planar lithography mask and system and methods | |
| TWI550361B (en) | Lithography process and extreme ultraviolet lithography process | |
| JP2005340459A5 (en) | ||
| JP2010060587A (en) | Polarizing element and method for producing the same | |
| US8556468B2 (en) | Layered dimmer system | |
| US8289605B2 (en) | Layered dimmer system | |
| TW201106106A (en) | Optical etching device for laser machining | |
| JP2015197560A (en) | Optical device, original plate, method of manufacturing the same, and imaging apparatus | |
| US7205076B2 (en) | Mask for laser irradiation and apparatus for laser crystallization using the same | |
| JPH10263871A (en) | Manufacture of dielectric mask for laser machining | |
| US7605979B2 (en) | Device for directing radiation to a layer, apparatus with such device and method using such apparatus | |
| JP2007123897A (en) | Photolithography system for manufacturing semiconductor and method therefor | |
| JP3905759B2 (en) | Optical transceiver module and manufacturing method thereof | |
| JPH08203799A (en) | Exposure apparatus and pattern forming method | |
| JP3192533B2 (en) | Optical element manufacturing method | |
| JP2014013303A (en) | Exposure device for color filter and method for manufacturing color filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |