DE602006014368D1 - Mikrolithographie-projektionssystem mit einer zugänglichen membran- oder aperturblende - Google Patents
Mikrolithographie-projektionssystem mit einer zugänglichen membran- oder aperturblendeInfo
- Publication number
- DE602006014368D1 DE602006014368D1 DE200660014368 DE602006014368T DE602006014368D1 DE 602006014368 D1 DE602006014368 D1 DE 602006014368D1 DE 200660014368 DE200660014368 DE 200660014368 DE 602006014368 T DE602006014368 T DE 602006014368T DE 602006014368 D1 DE602006014368 D1 DE 602006014368D1
- Authority
- DE
- Germany
- Prior art keywords
- projection system
- microlithography projection
- aperture panel
- accessible membrane
- accessible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US65966005P | 2005-03-08 | 2005-03-08 | |
PCT/EP2006/002005 WO2006094729A2 (en) | 2005-03-08 | 2006-03-04 | Microlithography projection system with an accessible diaphragm or aperture stop |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602006014368D1 true DE602006014368D1 (de) | 2010-07-01 |
Family
ID=36282861
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE200660014368 Active DE602006014368D1 (de) | 2005-03-08 | 2006-03-04 | Mikrolithographie-projektionssystem mit einer zugänglichen membran- oder aperturblende |
Country Status (6)
Country | Link |
---|---|
US (3) | US7999913B2 (de) |
EP (2) | EP1856578B1 (de) |
JP (2) | JP2008533709A (de) |
KR (1) | KR101176686B1 (de) |
DE (1) | DE602006014368D1 (de) |
WO (1) | WO2006094729A2 (de) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1856578B1 (de) | 2005-03-08 | 2010-05-19 | Carl Zeiss SMT AG | Mikrolithographie-projektionssystem mit einer zugänglichen membran- oder aperturblende |
DE102006059024A1 (de) * | 2006-12-14 | 2008-06-19 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie, Beleuchtungsoptik für eine derartige Projektionsbelichtungsanlage, Verfahren zum Betrieb einer derartigen Projektionsbelichtungsanlage, Verfahren zur Herstellung eines mikrostrukturierten Bauteils sowie durch das Verfahren hergestelltes mikrostrukturiertes Bauteil |
DE102007051671A1 (de) | 2007-10-26 | 2009-05-07 | Carl Zeiss Smt Ag | Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik |
KR101592136B1 (ko) * | 2007-10-26 | 2016-02-04 | 칼 짜이스 에스엠티 게엠베하 | 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 갖는 마이크로리소그래피용 투영 노광 장치 |
CN102341738B (zh) | 2009-03-06 | 2015-11-25 | 卡尔蔡司Smt有限责任公司 | 成像光学部件以及具有该类型成像光学部件的用于微光刻的投射曝光装置 |
KR101739579B1 (ko) * | 2011-01-04 | 2017-05-24 | 에스케이 텔레콤주식회사 | 코딩 유닛 단위 병렬 인트라예측을 이용한 부호화/복호화 방법 및 장치 |
DE102011077784A1 (de) | 2011-06-20 | 2012-12-20 | Carl Zeiss Smt Gmbh | Projektionsanordnung |
KR102330570B1 (ko) | 2012-02-06 | 2021-11-25 | 가부시키가이샤 니콘 | 반사 결상 광학계, 노광 장치, 및 디바이스 제조 방법 |
WO2014019617A1 (en) | 2012-08-01 | 2014-02-06 | Carl Zeiss Smt Gmbh | Imaging optical unit for a projection exposure apparatus |
DE102012218221A1 (de) * | 2012-10-05 | 2014-04-10 | Carl Zeiss Smt Gmbh | Monitorsystem zum Bestimmen von Orientierungen von Spiegelelementen und EUV-Lithographiesystem |
JP7459523B2 (ja) * | 2020-01-23 | 2024-04-02 | セイコーエプソン株式会社 | 投写光学系およびプロジェクター |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4701035A (en) * | 1984-08-14 | 1987-10-20 | Canon Kabushiki Kaisha | Reflection optical system |
JPS61123812A (ja) * | 1984-11-20 | 1986-06-11 | Canon Inc | 反射光学系 |
US5686728A (en) | 1996-05-01 | 1997-11-11 | Lucent Technologies Inc | Projection lithography system and method using all-reflective optical elements |
US5956192A (en) * | 1997-09-18 | 1999-09-21 | Svg Lithography Systems, Inc. | Four mirror EUV projection optics |
US6199991B1 (en) * | 1997-11-13 | 2001-03-13 | U.S. Philips Corporation | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
US5973826A (en) * | 1998-02-20 | 1999-10-26 | Regents Of The University Of California | Reflective optical imaging system with balanced distortion |
US6859328B2 (en) | 1998-05-05 | 2005-02-22 | Carl Zeiss Semiconductor | Illumination system particularly for microlithography |
EP0955641B1 (de) | 1998-05-05 | 2004-04-28 | Carl Zeiss | Beleuchtungssystem insbesondere für die EUV-Lithographie |
US6255661B1 (en) | 1998-05-06 | 2001-07-03 | U.S. Philips Corporation | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
US6142641A (en) * | 1998-06-18 | 2000-11-07 | Ultratech Stepper, Inc. | Four-mirror extreme ultraviolet (EUV) lithography projection system |
US6213610B1 (en) | 1998-09-21 | 2001-04-10 | Nikon Corporation | Catoptric reduction projection optical system and exposure apparatus and method using same |
JP2000100694A (ja) * | 1998-09-22 | 2000-04-07 | Nikon Corp | 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法 |
US6600552B2 (en) | 1999-02-15 | 2003-07-29 | Carl-Zeiss Smt Ag | Microlithography reduction objective and projection exposure apparatus |
EP1035445B1 (de) | 1999-02-15 | 2007-01-31 | Carl Zeiss SMT AG | Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
US6985210B2 (en) * | 1999-02-15 | 2006-01-10 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
EP1093021A3 (de) * | 1999-10-15 | 2004-06-30 | Nikon Corporation | Projektionsbelichtungssystem sowie ein solches System benutzendes Gerät und Verfahren |
JP2001185480A (ja) * | 1999-10-15 | 2001-07-06 | Nikon Corp | 投影光学系及び該光学系を備える投影露光装置 |
KR100787525B1 (ko) * | 2000-08-01 | 2007-12-21 | 칼 짜이스 에스엠티 아게 | 6 거울-마이크로리소그래피 - 투사 대물렌즈 |
DE10052289A1 (de) * | 2000-10-20 | 2002-04-25 | Zeiss Carl | 8-Spiegel-Mikrolithographie-Projektionsobjektiv |
TW573234B (en) | 2000-11-07 | 2004-01-21 | Asml Netherlands Bv | Lithographic projection apparatus and integrated circuit device manufacturing method |
JP2002162566A (ja) | 2000-11-27 | 2002-06-07 | Nikon Corp | 光学系の設計方法,光学系および投影露光装置 |
JP2003015040A (ja) * | 2001-07-04 | 2003-01-15 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
JP4134544B2 (ja) | 2001-10-01 | 2008-08-20 | 株式会社ニコン | 結像光学系および露光装置 |
JP2003233002A (ja) | 2002-02-07 | 2003-08-22 | Canon Inc | 反射型投影光学系、露光装置及びデバイス製造方法 |
JP2003233005A (ja) | 2002-02-07 | 2003-08-22 | Canon Inc | 反射型投影光学系、露光装置及びデバイス製造方法 |
JP2003233001A (ja) | 2002-02-07 | 2003-08-22 | Canon Inc | 反射型投影光学系、露光装置及びデバイス製造方法 |
JP2004138926A (ja) | 2002-10-21 | 2004-05-13 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
JP3938040B2 (ja) * | 2002-12-27 | 2007-06-27 | キヤノン株式会社 | 反射型投影光学系、露光装置及びデバイス製造方法 |
JP2004325649A (ja) * | 2003-04-23 | 2004-11-18 | Canon Inc | 反射型投影光学系、露光装置及びデバイスの製造方法 |
JP2004140390A (ja) * | 2003-12-01 | 2004-05-13 | Canon Inc | 照明光学系、露光装置及びデバイス製造方法 |
JP4711437B2 (ja) * | 2004-06-23 | 2011-06-29 | 株式会社ニコン | 投影光学系、露光装置および露光方法 |
US7312851B2 (en) | 2004-06-23 | 2007-12-25 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method in which a reflective projection optical system has a non-circular aperture stop |
DE102005042005A1 (de) * | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges Objektiv mit obskurierter Pupille |
WO2006087978A1 (ja) * | 2005-02-15 | 2006-08-24 | Nikon Corporation | 投影光学系、露光装置、およびデバイスの製造方法 |
EP1856578B1 (de) | 2005-03-08 | 2010-05-19 | Carl Zeiss SMT AG | Mikrolithographie-projektionssystem mit einer zugänglichen membran- oder aperturblende |
-
2006
- 2006-03-04 EP EP20060723220 patent/EP1856578B1/de not_active Expired - Fee Related
- 2006-03-04 JP JP2008500101A patent/JP2008533709A/ja active Pending
- 2006-03-04 KR KR20077020465A patent/KR101176686B1/ko active IP Right Grant
- 2006-03-04 DE DE200660014368 patent/DE602006014368D1/de active Active
- 2006-03-04 EP EP20100002198 patent/EP2192446B1/de not_active Expired - Fee Related
- 2006-03-04 WO PCT/EP2006/002005 patent/WO2006094729A2/en not_active Application Discontinuation
-
2007
- 2007-09-07 US US11/851,852 patent/US7999913B2/en active Active
-
2011
- 2011-06-30 US US13/173,560 patent/US8614785B2/en active Active
-
2012
- 2012-06-19 JP JP2012137567A patent/JP5793470B2/ja not_active Expired - Fee Related
-
2013
- 2013-11-14 US US14/080,224 patent/US9146472B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP5793470B2 (ja) | 2015-10-14 |
US20140071414A1 (en) | 2014-03-13 |
WO2006094729A3 (en) | 2006-12-28 |
EP2192446A1 (de) | 2010-06-02 |
US7999913B2 (en) | 2011-08-16 |
EP2192446B1 (de) | 2011-10-19 |
KR20070115940A (ko) | 2007-12-06 |
JP2012212910A (ja) | 2012-11-01 |
JP2008533709A (ja) | 2008-08-21 |
WO2006094729A2 (en) | 2006-09-14 |
US20080024746A1 (en) | 2008-01-31 |
US20110261338A1 (en) | 2011-10-27 |
US8614785B2 (en) | 2013-12-24 |
EP1856578A2 (de) | 2007-11-21 |
KR101176686B1 (ko) | 2012-08-23 |
EP1856578B1 (de) | 2010-05-19 |
US9146472B2 (en) | 2015-09-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE |
|
8364 | No opposition during term of opposition |