JP2008533709A - 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系 - Google Patents

取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系 Download PDF

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Publication number
JP2008533709A
JP2008533709A JP2008500101A JP2008500101A JP2008533709A JP 2008533709 A JP2008533709 A JP 2008533709A JP 2008500101 A JP2008500101 A JP 2008500101A JP 2008500101 A JP2008500101 A JP 2008500101A JP 2008533709 A JP2008533709 A JP 2008533709A
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Prior art keywords
optical system
projection optical
use area
microlithographic projection
stop
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JP2008500101A
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English (en)
Japanese (ja)
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JP2008533709A5 (enExample
Inventor
ハンス−ユルゲン マン
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カール ツァイス エスエムテー アーゲー
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Publication of JP2008533709A publication Critical patent/JP2008533709A/ja
Publication of JP2008533709A5 publication Critical patent/JP2008533709A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2008500101A 2005-03-08 2006-03-04 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系 Pending JP2008533709A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65966005P 2005-03-08 2005-03-08
PCT/EP2006/002005 WO2006094729A2 (en) 2005-03-08 2006-03-04 Microlithography projection system with an accessible diaphragm or aperture stop

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012137567A Division JP5793470B2 (ja) 2005-03-08 2012-06-19 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系

Publications (2)

Publication Number Publication Date
JP2008533709A true JP2008533709A (ja) 2008-08-21
JP2008533709A5 JP2008533709A5 (enExample) 2009-04-30

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JP2008500101A Pending JP2008533709A (ja) 2005-03-08 2006-03-04 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系
JP2012137567A Expired - Fee Related JP5793470B2 (ja) 2005-03-08 2012-06-19 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系

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JP2012137567A Expired - Fee Related JP5793470B2 (ja) 2005-03-08 2012-06-19 取扱い可能な絞り又は開口絞りを備えたマイクロリソグラフィー投影光学系

Country Status (6)

Country Link
US (3) US7999913B2 (enExample)
EP (2) EP2192446B1 (enExample)
JP (2) JP2008533709A (enExample)
KR (1) KR101176686B1 (enExample)
DE (1) DE602006014368D1 (enExample)
WO (1) WO2006094729A2 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011503831A (ja) * 2006-12-14 2011-01-27 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための照明光学ユニット及び露光装置
CN102341738A (zh) * 2009-03-06 2012-02-01 卡尔蔡司Smt有限责任公司 成像光学部件以及具有该类型成像光学部件的用于微光刻的投射曝光装置
CN103283238A (zh) * 2011-01-04 2013-09-04 Sk电信有限公司 利用按照编码单元的并行帧内预测进行编码和解码的方法和装置

Families Citing this family (8)

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EP2192446B1 (en) 2005-03-08 2011-10-19 Carl Zeiss SMT GmbH Microlithography projection system with an accessible aperture stop
WO2009052932A1 (en) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Imaging optical system and projection exposure installation for micro-lithography with an imaging optical system of this type
DE102007051671A1 (de) * 2007-10-26 2009-05-07 Carl Zeiss Smt Ag Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik
DE102011077784A1 (de) 2011-06-20 2012-12-20 Carl Zeiss Smt Gmbh Projektionsanordnung
WO2013118615A1 (ja) 2012-02-06 2013-08-15 株式会社ニコン 反射結像光学系、露光装置、およびデバイス製造方法
WO2014019617A1 (en) 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Imaging optical unit for a projection exposure apparatus
DE102012218221A1 (de) 2012-10-05 2014-04-10 Carl Zeiss Smt Gmbh Monitorsystem zum Bestimmen von Orientierungen von Spiegelelementen und EUV-Lithographiesystem
JP7459523B2 (ja) * 2020-01-23 2024-04-02 セイコーエプソン株式会社 投写光学系およびプロジェクター

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JP2004325649A (ja) * 2003-04-23 2004-11-18 Canon Inc 反射型投影光学系、露光装置及びデバイスの製造方法

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JP2000100694A (ja) * 1998-09-22 2000-04-07 Nikon Corp 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
JP2001185480A (ja) * 1999-10-15 2001-07-06 Nikon Corp 投影光学系及び該光学系を備える投影露光装置
JP2003015040A (ja) * 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2003107354A (ja) * 2001-10-01 2003-04-09 Nikon Corp 結像光学系および露光装置
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011503831A (ja) * 2006-12-14 2011-01-27 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための照明光学ユニット及び露光装置
CN102341738A (zh) * 2009-03-06 2012-02-01 卡尔蔡司Smt有限责任公司 成像光学部件以及具有该类型成像光学部件的用于微光刻的投射曝光装置
JP2012519872A (ja) * 2009-03-06 2012-08-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 結像光学系及び該結像光学系を有するマイクロリソグラフィ用の投影露光装置
CN102341738B (zh) * 2009-03-06 2015-11-25 卡尔蔡司Smt有限责任公司 成像光学部件以及具有该类型成像光学部件的用于微光刻的投射曝光装置
US9639004B2 (en) 2009-03-06 2017-05-02 Carl Zeiss Smt Gmbh Imaging optics and projection exposure installation for microlithography with an imaging optics
CN103283238A (zh) * 2011-01-04 2013-09-04 Sk电信有限公司 利用按照编码单元的并行帧内预测进行编码和解码的方法和装置
CN103283238B (zh) * 2011-01-04 2016-08-03 Sk电信有限公司 利用按照编码单元的并行帧内预测进行编码和解码的方法和装置

Also Published As

Publication number Publication date
WO2006094729A2 (en) 2006-09-14
WO2006094729A3 (en) 2006-12-28
EP1856578A2 (en) 2007-11-21
EP1856578B1 (en) 2010-05-19
DE602006014368D1 (de) 2010-07-01
US20080024746A1 (en) 2008-01-31
US8614785B2 (en) 2013-12-24
US20110261338A1 (en) 2011-10-27
KR101176686B1 (ko) 2012-08-23
KR20070115940A (ko) 2007-12-06
JP5793470B2 (ja) 2015-10-14
US20140071414A1 (en) 2014-03-13
EP2192446A1 (en) 2010-06-02
EP2192446B1 (en) 2011-10-19
US9146472B2 (en) 2015-09-29
US7999913B2 (en) 2011-08-16
JP2012212910A (ja) 2012-11-01

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