HK1097048A1 - Projection optical system and exposure apparatus with the same - Google Patents

Projection optical system and exposure apparatus with the same

Info

Publication number
HK1097048A1
HK1097048A1 HK07102046.3A HK07102046A HK1097048A1 HK 1097048 A1 HK1097048 A1 HK 1097048A1 HK 07102046 A HK07102046 A HK 07102046A HK 1097048 A1 HK1097048 A1 HK 1097048A1
Authority
HK
Hong Kong
Prior art keywords
optical system
reflector
projection optical
imaging optical
reflective imaging
Prior art date
Application number
HK07102046.3A
Other languages
English (en)
Inventor
Tomowaki Takahashi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34708866&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HK1097048(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1097048A1 publication Critical patent/HK1097048A1/xx

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
HK07102046.3A 2003-12-24 2007-02-23 Projection optical system and exposure apparatus with the same HK1097048A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003426617A JP2005189247A (ja) 2003-12-24 2003-12-24 投影光学系および該投影光学系を備えた露光装置
PCT/JP2004/019097 WO2005062101A1 (ja) 2003-12-24 2004-12-21 投影光学系および該投影光学系を備えた露光装置

Publications (1)

Publication Number Publication Date
HK1097048A1 true HK1097048A1 (en) 2007-06-15

Family

ID=34708866

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07102046.3A HK1097048A1 (en) 2003-12-24 2007-02-23 Projection optical system and exposure apparatus with the same

Country Status (9)

Country Link
US (1) US7692767B2 (zh)
EP (1) EP1701194B1 (zh)
JP (1) JP2005189247A (zh)
KR (1) KR101118498B1 (zh)
CN (1) CN100439965C (zh)
AT (1) ATE501454T1 (zh)
DE (1) DE602004031766D1 (zh)
HK (1) HK1097048A1 (zh)
WO (1) WO2005062101A1 (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4957548B2 (ja) * 2005-08-24 2012-06-20 株式会社ニコン 投影光学系、および露光装置
US7470033B2 (en) 2006-03-24 2008-12-30 Nikon Corporation Reflection-type projection-optical systems, and exposure apparatus comprising same
JP2008258461A (ja) * 2007-04-06 2008-10-23 Canon Inc 反射型縮小投影光学系、露光装置及びデバイスの製造方法
KR101515663B1 (ko) 2007-10-26 2015-04-27 칼 짜이스 에스엠티 게엠베하 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 갖는 마이크로리소그래피용 투영 노광 장치
CN102402135B (zh) * 2011-12-07 2013-06-05 北京理工大学 一种极紫外光刻投影物镜设计方法
DE102015221983A1 (de) * 2015-11-09 2017-05-11 Carl Zeiss Smt Gmbh Abbildende Optik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen abbildenden Optik

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6021004A (en) * 1995-02-28 2000-02-01 Canon Kabushiki Kaisha Reflecting type of zoom lens
US5815310A (en) * 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
JPH09211322A (ja) 1996-02-01 1997-08-15 Fuji Photo Optical Co Ltd 画像読取用結像レンズ
US5686728A (en) 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements
US6985210B2 (en) * 1999-02-15 2006-01-10 Carl Zeiss Smt Ag Projection system for EUV lithography
US7151592B2 (en) * 1999-02-15 2006-12-19 Carl Zeiss Smt Ag Projection system for EUV lithography
EP1035445B1 (de) * 1999-02-15 2007-01-31 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US6600552B2 (en) * 1999-02-15 2003-07-29 Carl-Zeiss Smt Ag Microlithography reduction objective and projection exposure apparatus
US6033079A (en) * 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
US6867913B2 (en) * 2000-02-14 2005-03-15 Carl Zeiss Smt Ag 6-mirror microlithography projection objective
KR100787525B1 (ko) * 2000-08-01 2007-12-21 칼 짜이스 에스엠티 아게 6 거울-마이크로리소그래피 - 투사 대물렌즈
JP2002116382A (ja) * 2000-10-05 2002-04-19 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
DE10052289A1 (de) * 2000-10-20 2002-04-25 Zeiss Carl 8-Spiegel-Mikrolithographie-Projektionsobjektiv
TW573234B (en) * 2000-11-07 2004-01-21 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit device manufacturing method
JP2002162566A (ja) * 2000-11-27 2002-06-07 Nikon Corp 光学系の設計方法，光学系および投影露光装置
JP4134544B2 (ja) * 2001-10-01 2008-08-20 株式会社ニコン 結像光学系および露光装置
JP3938040B2 (ja) * 2002-12-27 2007-06-27 キヤノン株式会社 反射型投影光学系、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
EP1701194B1 (en) 2011-03-09
KR20060124674A (ko) 2006-12-05
ATE501454T1 (de) 2011-03-15
US7692767B2 (en) 2010-04-06
DE602004031766D1 (de) 2011-04-21
CN1894615A (zh) 2007-01-10
WO2005062101A1 (ja) 2005-07-07
KR101118498B1 (ko) 2012-03-12
US20070126990A1 (en) 2007-06-07
EP1701194A4 (en) 2008-07-16
EP1701194A1 (en) 2006-09-13
JP2005189247A (ja) 2005-07-14
CN100439965C (zh) 2008-12-03

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20201222