JP2005037896A5 - - Google Patents

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Publication number
JP2005037896A5
JP2005037896A5 JP2004139679A JP2004139679A JP2005037896A5 JP 2005037896 A5 JP2005037896 A5 JP 2005037896A5 JP 2004139679 A JP2004139679 A JP 2004139679A JP 2004139679 A JP2004139679 A JP 2004139679A JP 2005037896 A5 JP2005037896 A5 JP 2005037896A5
Authority
JP
Japan
Prior art keywords
optical system
projection optical
imaging optical
imaging
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004139679A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005037896A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004139679A priority Critical patent/JP2005037896A/ja
Priority claimed from JP2004139679A external-priority patent/JP2005037896A/ja
Priority to US10/851,869 priority patent/US6995833B2/en
Priority to EP04012075A priority patent/EP1480065A3/en
Priority to TW093114474A priority patent/TWI282487B/zh
Priority to CNB2004100453671A priority patent/CN1307456C/zh
Priority to KR1020040036790A priority patent/KR100678484B1/ko
Publication of JP2005037896A publication Critical patent/JP2005037896A/ja
Priority to US11/267,858 priority patent/US7053986B2/en
Publication of JP2005037896A5 publication Critical patent/JP2005037896A5/ja
Pending legal-status Critical Current

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JP2004139679A 2003-05-23 2004-05-10 投影光学系、露光装置及びデバイスの製造方法 Pending JP2005037896A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2004139679A JP2005037896A (ja) 2003-05-23 2004-05-10 投影光学系、露光装置及びデバイスの製造方法
US10/851,869 US6995833B2 (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
EP04012075A EP1480065A3 (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
TW093114474A TWI282487B (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
CNB2004100453671A CN1307456C (zh) 2003-05-23 2004-05-21 投影光学系统、曝光装置及器件的制造方法
KR1020040036790A KR100678484B1 (ko) 2003-05-23 2004-05-24 투영광학계, 노광장치 및 디바이스의 제조방법
US11/267,858 US7053986B2 (en) 2003-05-23 2005-11-03 Projection optical system, exposure apparatus, and device manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003146442 2003-05-23
JP2003189594 2003-07-01
JP2004139679A JP2005037896A (ja) 2003-05-23 2004-05-10 投影光学系、露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2005037896A JP2005037896A (ja) 2005-02-10
JP2005037896A5 true JP2005037896A5 (enExample) 2007-04-12

Family

ID=34222133

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004139679A Pending JP2005037896A (ja) 2003-05-23 2004-05-10 投影光学系、露光装置及びデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP2005037896A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007005558A (ja) * 2005-06-23 2007-01-11 Canon Inc 反射屈折型投影光学系及びそれを有する露光装置
JP2007242774A (ja) 2006-03-07 2007-09-20 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
EP1890191A1 (en) 2006-08-14 2008-02-20 Carl Zeiss SMT AG Catadioptric projection objective with pupil mirror
CN101523294B (zh) * 2006-08-14 2012-08-08 卡尔蔡司Smt有限责任公司 具有光瞳镜的反射折射投影物镜、投影曝光设备和方法
JP6819773B2 (ja) 2016-09-06 2021-01-27 株式会社ニコン 反射屈折等倍アフォーカル瞳孔リレー及びこれを採用した光学撮影系

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