JP2005037896A5 - - Google Patents

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Publication number
JP2005037896A5
JP2005037896A5 JP2004139679A JP2004139679A JP2005037896A5 JP 2005037896 A5 JP2005037896 A5 JP 2005037896A5 JP 2004139679 A JP2004139679 A JP 2004139679A JP 2004139679 A JP2004139679 A JP 2004139679A JP 2005037896 A5 JP2005037896 A5 JP 2005037896A5
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JP
Japan
Prior art keywords
optical system
projection optical
imaging optical
imaging
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004139679A
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Japanese (ja)
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JP2005037896A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2004139679A priority Critical patent/JP2005037896A/en
Priority claimed from JP2004139679A external-priority patent/JP2005037896A/en
Priority to US10/851,869 priority patent/US6995833B2/en
Priority to CNB2004100453671A priority patent/CN1307456C/en
Priority to EP04012075A priority patent/EP1480065A3/en
Priority to TW093114474A priority patent/TWI282487B/en
Priority to KR1020040036790A priority patent/KR100678484B1/en
Publication of JP2005037896A publication Critical patent/JP2005037896A/en
Priority to US11/267,858 priority patent/US7053986B2/en
Publication of JP2005037896A5 publication Critical patent/JP2005037896A5/ja
Pending legal-status Critical Current

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Claims (9)

第１の物体側からの光路に沿って、
屈折系であり、第１の物体の第１中間像を形成する第１結像光学系と、
２つのミラーを有し、前記第１の物体の第２中間像を形成する第２結像光学系と、
レンズを有し、前記第１の物体の像を第２の物体上に形成する第３結像光学系と、
を備え、前記第１の物体の像を前記第２の物体上に結像する投影光学系であって、
前記第１結像光学系の近軸倍率をβ１、前記第２結像光学系の近軸倍率をβ２としたとき、
０．８０＜｜β１・β２｜＜２．０
を満足し、
前記２つのミラーは、凹面ミラーを含み、
前記第１結像光学系と前記凹面ミラーとは、共通の直線光軸を持つ投影光学系。 Along the optical path from the first object side,
A first imaging optical system that is a refractive system and forms a first intermediate image of the first object;
A second imaging optical system having two mirrors and forming a second intermediate image of the first object;
Has a lens, and a third imaging optical system for forming an image of the first object onto the second object,
The provided, a projection optical system for forming an image of said first object to said second on the object,
When the paraxial magnification of the first imaging optical system is β1, and the paraxial magnification of the second imaging optical system is β2,
0. 8 0 <| β1 · β2 | < 2 . 0
Satisfied ,
The two mirrors include concave mirrors;
The first imaging optical system and the concave mirror are projection optical systems having a common linear optical axis . 瞳の中心部が遮光されていないことを特徴とする請求項１記載の投影光学系。2. The projection optical system according to claim 1, wherein the central part of the pupil is not shielded from light. 前記第１結像光学系の近軸倍率は、等倍以上であることを特徴とする請求項１記載の投影光学系。The projection optical system according to claim 1, wherein a paraxial magnification of the first imaging optical system is equal to or greater than 1 ×. 前記第１，第２の物体は、互いに平行に配置されることを特徴とする請求項１記載の投影光学系。 The projection optical system according to claim 1, wherein the first and second objects are arranged in parallel to each other . 前記凹面ミラーは、前記第１の物体と対向して配置されていることを特徴とする請求項１記載の投影光学系。 The projection optical system according to claim 1, wherein the concave mirror is disposed to face the first object. 前記第１，第２，または第３結像光学系は、回折光学素子を有することを特徴とする請求項１記載の投影光学系。The projection optical system according to claim 1, wherein the first, second, or third imaging optical system includes a diffractive optical element. 前記第２結像光学系は、レンズを有することを特徴とする請求項１記載の投影光学系。The projection optical system according to claim 1, wherein the second imaging optical system includes a lens. 光源からの光で前記第１の物体を照明する照明光学系と、前記第１の物体からの光を前記第２の物体へ投影する、請求項１乃至７いずれかに記載の投影光学系とを有することを特徴とする露光装置。 An illumination optical system that illuminates the first object with light from a light source, and a projection optical system according to any one of claims 1 to 7 that projects light from the first object onto the second object. An exposure apparatus comprising: 請求項８に記載の露光装置を用いて前記第２の物体を露光する露光工程と、前記露光された第２の物体を現像する現像工程とを有することを特徴とするデバイスの製造方法。 A device manufacturing method comprising: an exposure step of exposing the second object using the exposure apparatus according to claim 8; and a developing step of developing the exposed second object.
JP2004139679A 2003-05-23 2004-05-10 Projection optical system, exposure apparatus and device manufacturing method Pending JP2005037896A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2004139679A JP2005037896A (en) 2003-05-23 2004-05-10 Projection optical system, exposure apparatus and device manufacturing method
US10/851,869 US6995833B2 (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
CNB2004100453671A CN1307456C (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
EP04012075A EP1480065A3 (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
TW093114474A TWI282487B (en) 2003-05-23 2004-05-21 Projection optical system, exposure apparatus, and device manufacturing method
KR1020040036790A KR100678484B1 (en) 2003-05-23 2004-05-24 Projection optical system, exposure apparatus, and device manufacturing method
US11/267,858 US7053986B2 (en) 2003-05-23 2005-11-03 Projection optical system, exposure apparatus, and device manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003146442 2003-05-23
JP2003189594 2003-07-01
JP2004139679A JP2005037896A (en) 2003-05-23 2004-05-10 Projection optical system, exposure apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
JP2005037896A JP2005037896A (en) 2005-02-10
JP2005037896A5 true JP2005037896A5 (en) 2007-04-12

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004139679A Pending JP2005037896A (en) 2003-05-23 2004-05-10 Projection optical system, exposure apparatus and device manufacturing method

Country Status (1)

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JP (1) JP2005037896A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007005558A (en) * 2005-06-23 2007-01-11 Canon Inc Catadioptric projection optical system and exposure device having it
JP2007242774A (en) 2006-03-07 2007-09-20 Canon Inc Exposure equipment and method therefor, and device manufacturing method
JP5462625B2 (en) * 2006-08-14 2014-04-02 カール・ツァイス・エスエムティー・ゲーエムベーハー Catadioptric projection objective with pupil mirror, projection exposure apparatus and method
EP1890191A1 (en) 2006-08-14 2008-02-20 Carl Zeiss SMT AG Catadioptric projection objective with pupil mirror
WO2018047832A1 (en) 2016-09-06 2018-03-15 Nikon Corporation Catadioptric unit-magnification afocal pupil relay and optical imaging system employing the same

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