JP2003114387A5 - - Google Patents
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- JP2003114387A5 JP2003114387A5 JP2001308754A JP2001308754A JP2003114387A5 JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5 JP 2001308754 A JP2001308754 A JP 2001308754A JP 2001308754 A JP2001308754 A JP 2001308754A JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- image
- mirror
- disposed
- catadioptric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Claims (12)
少なくとも1つの凹面ミラーと,少なくとも1つの光路分離用のミラーとを備え,前記第1面の中間像を形成する第1光学系と;
前記中間像からの光に基づいて前記第1面の像を前記第2面上に形成する第2光学系と;
前記第1面と前記凹面ミラーのうちの1つとの間の空間に配置されて前記第2光学系へ光を反射する凹面形状のミラーを有するフィールドミラー対と;を備えることを特徴とする反射屈折光学系。A catadioptric optical system for forming an image of a first surface on a second surface,
A first optical system comprising at least one concave mirror and at least one optical path separating mirror, and forming an intermediate image of the first surface;
A second optical system that forms an image of the first surface on the second surface based on light from the intermediate image;
A pair of field mirrors having a concave mirror disposed in a space between the first surface and one of the concave mirrors for reflecting light to the second optical system. Refractive optical system.
正の屈折力を有する第1レンズ群と;
前記第1レンズ群と前記第2面との間の光路中に配置されて,負の屈折力を有する第2レンズ群と;
前記第2レンズ群と前記第2面との間の光路中に配置された凹面形状の第1ミラーと;
前記第1ミラーと前記第2面との間の光路中に配置されて,前記第1面の方向へ向かう光束を前記第2面の方向に向けて反射する第2ミラーと;
前記第2ミラーと前記第2面との間の光路中に配置された少なくとも1組のフィールドミラー対と;
前記フィールドミラー対と前記第2面との間の光路中に配置されて,開口絞りを含み,正の屈折力を有する第3レンズ群と;
を備え,
前記フィールドミラー対は,前記第1面と前記第1ミラーとの間の空間に配置されて,前記第3レンズ群へ向けて光を反射する凹面形状のミラーを有することを特徴とする反射屈折光学系。A catadioptric optical system for forming an image of a first surface on a second surface,
A first lens group having a positive refractive power;
A second lens group disposed in an optical path between the first lens group and the second surface and having a negative refractive power;
A concave first mirror disposed in an optical path between the second lens group and the second surface;
A second mirror disposed in an optical path between the first mirror and the second surface and reflecting a light beam directed toward the first surface toward the second surface;
At least one pair of field mirrors disposed in an optical path between the second mirror and the second surface;
A third lens group disposed in the optical path between the field mirror pair and the second surface, including an aperture stop, and having a positive refractive power;
With
The field mirror pair has a concave mirror disposed in a space between the first surface and the first mirror and reflecting light toward the third lens group. Optical system.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001308754A JP2003114387A (en) | 2001-10-04 | 2001-10-04 | Cata-dioptic system and projection exposure device equipped with the same system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001308754A JP2003114387A (en) | 2001-10-04 | 2001-10-04 | Cata-dioptic system and projection exposure device equipped with the same system |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2003114387A JP2003114387A (en) | 2003-04-18 |
JP2003114387A5 true JP2003114387A5 (en) | 2005-08-18 |
Family
ID=19128013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001308754A Pending JP2003114387A (en) | 2001-10-04 | 2001-10-04 | Cata-dioptic system and projection exposure device equipped with the same system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003114387A (en) |
Cited By (1)
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---|---|---|---|---|
US7859748B2 (en) | 2000-01-14 | 2010-12-28 | Carl Zeiss Smt Gmbh | Microlithographic reduction projection catadioptric objective |
Families Citing this family (39)
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JP2004333761A (en) * | 2003-05-06 | 2004-11-25 | Nikon Corp | Catadioptric projection optical system, projection aligner, and exposure method |
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US7085075B2 (en) | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
TW201834020A (en) | 2003-10-28 | 2018-09-16 | 日商尼康股份有限公司 | Optical illumination device, exposure device, exposure method and device manufacturing method |
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US7466489B2 (en) | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
JP5102492B2 (en) | 2003-12-19 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Objective lens for microlithography projection with crystal elements |
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US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
TWI412067B (en) | 2004-02-06 | 2013-10-11 | 尼康股份有限公司 | Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method |
WO2005098504A1 (en) | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Imaging system with mirror group |
KR101213831B1 (en) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | Catadioptric projection objective with intermediate images |
DE602005018648D1 (en) | 2004-07-14 | 2010-02-11 | Zeiss Carl Smt Ag | CATADIOPRIC PROJECTION LENS |
JP5065031B2 (en) * | 2004-10-08 | 2012-10-31 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Projection optical system |
DE102005042005A1 (en) | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Objective lens esp. as micro-lithography projection objective, has objective divided into first part-objective with single mirror and second part-objective with primary and secondary mirror |
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US7218453B2 (en) | 2005-02-04 | 2007-05-15 | Carl Zeiss Smt Ag | Projection system, in particular for a microlithographic projection exposure apparatus |
US7324185B2 (en) | 2005-03-04 | 2008-01-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2006309220A (en) | 2005-04-29 | 2006-11-09 | Carl Zeiss Smt Ag | Projection objective |
US8248577B2 (en) | 2005-05-03 | 2012-08-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP3232270A3 (en) | 2005-05-12 | 2017-12-13 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
KR101127346B1 (en) | 2005-09-13 | 2012-03-29 | 칼 짜이스 에스엠티 게엠베하 | Microlithography projection optical system, method for manufacturing a device and method to design an optical surface |
KR101314974B1 (en) | 2006-02-17 | 2013-10-04 | 칼 짜이스 에스엠티 게엠베하 | Illumination system for microlithographic projection exposure apparatus comprising an illumination system of this type |
DE102006014380A1 (en) | 2006-03-27 | 2007-10-11 | Carl Zeiss Smt Ag | Microlithography projection objective for imaging radiation from object plane to image plane, has mirrored entry pupil in mirrored entry pupil plane obtained by mirroring entry pupil at object plane |
US7920338B2 (en) | 2006-03-28 | 2011-04-05 | Carl Zeiss Smt Gmbh | Reduction projection objective and projection exposure apparatus including the same |
US7738188B2 (en) | 2006-03-28 | 2010-06-15 | Carl Zeiss Smt Ag | Projection objective and projection exposure apparatus including the same |
DE102007023411A1 (en) | 2006-12-28 | 2008-07-03 | Carl Zeiss Smt Ag | Field illumination system for microlithographic projection exposure system, has illumination angle variation device influencing intensity and/or phase of light so that intensity contribution of raster units to total intensity is varied |
JP5267029B2 (en) | 2007-10-12 | 2013-08-21 | 株式会社ニコン | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
JP2010026526A (en) * | 2009-10-26 | 2010-02-04 | Nikon Corp | Catadioptric projection optical system, exposure device and exposure method |
JP5877965B2 (en) * | 2011-07-04 | 2016-03-08 | 株式会社ニコン | Projection optical system, exposure apparatus, exposure method, and device manufacturing method |
JP5664697B2 (en) * | 2013-05-13 | 2015-02-04 | 株式会社ニコン | Catadioptric projection optical system, exposure apparatus, and exposure method |
JP2014194552A (en) * | 2014-04-28 | 2014-10-09 | Nikon Corp | Cata-dioptric type projection optical system, exposure device, and exposure method |
JP6358242B2 (en) * | 2015-11-30 | 2018-07-18 | 株式会社ニコン | Exposure apparatus, exposure method, device manufacturing method, and pattern forming method |
-
2001
- 2001-10-04 JP JP2001308754A patent/JP2003114387A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7859748B2 (en) | 2000-01-14 | 2010-12-28 | Carl Zeiss Smt Gmbh | Microlithographic reduction projection catadioptric objective |
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