JP2003114387A5 - - Google Patents

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Publication number
JP2003114387A5
JP2003114387A5 JP2001308754A JP2001308754A JP2003114387A5 JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5 JP 2001308754 A JP2001308754 A JP 2001308754A JP 2001308754 A JP2001308754 A JP 2001308754A JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5
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JP
Japan
Prior art keywords
optical system
image
mirror
disposed
catadioptric
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Pending
Application number
JP2001308754A
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Japanese (ja)
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JP2003114387A (en
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Priority to JP2001308754A priority Critical patent/JP2003114387A/en
Priority claimed from JP2001308754A external-priority patent/JP2003114387A/en
Publication of JP2003114387A publication Critical patent/JP2003114387A/en
Publication of JP2003114387A5 publication Critical patent/JP2003114387A5/ja
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Claims (12)

第1面の像を第2面上に形成する反射屈折光学系であって,
少なくとも1つの凹面ミラーと,少なくとも1つの光路分離用のミラーとを備え,前記第1面の中間像を形成する第1光学系と;
前記中間像からの光に基づいて前記第1面の像を前記第2面上に形成する第2光学系と;
前記第1面と前記凹面ミラーのうちの1つとの間の空間に配置されて前記第2光学系へ光を反射する凹面形状のミラーを有するフィールドミラー対と;を備えることを特徴とする反射屈折光学系。
A catadioptric optical system for forming an image of a first surface on a second surface,
A first optical system comprising at least one concave mirror and at least one optical path separating mirror, and forming an intermediate image of the first surface;
A second optical system that forms an image of the first surface on the second surface based on light from the intermediate image;
A pair of field mirrors having a concave mirror disposed in a space between the first surface and one of the concave mirrors for reflecting light to the second optical system. Refractive optical system.
第1面の像を第2面上に形成する反射屈折光学系であって,
正の屈折力を有する第1レンズ群と;
前記第1レンズ群と前記第2面との間の光路中に配置されて,負の屈折力を有する第2レンズ群と;
前記第2レンズ群と前記第2面との間の光路中に配置された凹面形状の第1ミラーと;
前記第1ミラーと前記第2面との間の光路中に配置されて,前記第1面の方向へ向かう光束を前記第2面の方向に向けて反射する第2ミラーと;
前記第2ミラーと前記第2面との間の光路中に配置された少なくとも1組のフィールドミラー対と;
前記フィールドミラー対と前記第2面との間の光路中に配置されて,開口絞りを含み,正の屈折力を有する第3レンズ群と;
を備え,
前記フィールドミラー対は,前記第1面と前記第1ミラーとの間の空間に配置されて,前記第3レンズ群へ向けて光を反射する凹面形状のミラーを有することを特徴とする反射屈折光学系。
A catadioptric optical system for forming an image of a first surface on a second surface,
A first lens group having a positive refractive power;
A second lens group disposed in an optical path between the first lens group and the second surface and having a negative refractive power;
A concave first mirror disposed in an optical path between the second lens group and the second surface;
A second mirror disposed in an optical path between the first mirror and the second surface and reflecting a light beam directed toward the first surface toward the second surface;
At least one pair of field mirrors disposed in an optical path between the second mirror and the second surface;
A third lens group disposed in the optical path between the field mirror pair and the second surface, including an aperture stop, and having a positive refractive power;
With
The field mirror pair has a concave mirror disposed in a space between the first surface and the first mirror and reflecting light toward the third lens group. Optical system.
前記反射屈折光学系を構成する光学部材は全て単一光軸上に配置されることを特徴とする請求項1または2に記載の反射屈折光学系  3. The catadioptric optical system according to claim 1, wherein all of the optical members constituting the catadioptric optical system are arranged on a single optical axis. 前記第1面上に光軸から外れた視野を有し,かつ前記第2面上の光軸から外れた領域内に前記像を形成することを特徴とする請求項1乃至3の何れか一項に記載の反射屈折光学系。  4. The image according to claim 1, wherein the image is formed in a region off the optical axis on the second surface and on the first surface. The catadioptric optical system according to item. 前記第1面の縮小像を第2面上に形成することを特徴とする請求項1乃至4の何れか一項に記載の反射屈折光学系。  The catadioptric optical system according to claim 1, wherein a reduced image of the first surface is formed on the second surface. 前記フィールドミラー対を構成するミラーは,いずれも平面または凹面形状を有することを特徴とする請求項1乃至5の何れか一項に記載の反射屈折光学系。  The catadioptric optical system according to any one of claims 1 to 5, wherein each of the mirrors constituting the field mirror pair has a planar or concave shape. 屈折光学材料は全て蛍石からなることを特徴とする請求項1乃至6の何れか一項に記載の反射屈折光学系。  The catadioptric optical system according to any one of claims 1 to 6, wherein the refractive optical material is made of fluorite. 前記第2面上の光軸から外れた領域であって,かつ長方形状または円弧形状の領域内に前記像を形成することを特徴とする請求項1乃至7の何れか一項に記載の反射屈折光学系。8. The reflection according to claim 1, wherein the image is formed in a region off the optical axis on the second surface and in a rectangular or arcuate region. Refractive optical system. 前記第1面上に配置された所定のパターンの像を前記第2面上に配置された感光性基板上へ投影するための請求項1乃至の何れか一項に記載の反射屈折光学系を備えることを特徴とする投影露光装置。Catadioptric according to any one of claims 1 to 8 for projecting into the first image of the arranged predetermined pattern on the surface disposed on the second surface a photosensitive substrate projection exposure apparatus, characterized in that it comprises a system. 前記反射屈折光学系は,前記第2面上の光軸から外れた領域に長方形状または円弧形状の露光領域を形成することを特徴とする請求項に記載の投影露光装置。10. The projection exposure apparatus according to claim 9 , wherein the catadioptric optical system forms a rectangular or arcuate exposure region in a region off the optical axis on the second surface. 前記所定のパターンを有するマスクと前記感光性基板とを同期的に移動させるための手段をさらに備えていることを特徴とする請求項9または10に記載の投影露光装置。The projection exposure apparatus according to claim 9, further comprising means for moving the mask having the predetermined pattern and the photosensitive substrate synchronously. 前記第1面上に配置された所定のパターンの像を,請求項1乃至8の何れか一項に記載の反射屈折光学系を介して前記第2面上に配置された感光性基板上へ投影することを特徴とする投影露光方法。An image of a predetermined pattern disposed on the first surface is transferred onto a photosensitive substrate disposed on the second surface via the catadioptric optical system according to any one of claims 1 to 8. A projection exposure method characterized by projecting.
JP2001308754A 2001-10-04 2001-10-04 Cata-dioptic system and projection exposure device equipped with the same system Pending JP2003114387A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (en) 2001-10-04 2001-10-04 Cata-dioptic system and projection exposure device equipped with the same system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (en) 2001-10-04 2001-10-04 Cata-dioptic system and projection exposure device equipped with the same system

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JP2003114387A JP2003114387A (en) 2003-04-18
JP2003114387A5 true JP2003114387A5 (en) 2005-08-18

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7859748B2 (en) 2000-01-14 2010-12-28 Carl Zeiss Smt Gmbh Microlithographic reduction projection catadioptric objective

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US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
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US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
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Cited By (1)

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Publication number Priority date Publication date Assignee Title
US7859748B2 (en) 2000-01-14 2010-12-28 Carl Zeiss Smt Gmbh Microlithographic reduction projection catadioptric objective

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