200937138 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種空間光調變器、照明光學系統、曝 光裝置、及元件製造方法。更詳細而言，本發明係關於一 種適於以微影製程製造半導體元件、攝影元件、液晶顯示 元件、薄膜磁頭等之元件之曝光裝置之照明光學系統的空 間光調變器。 【先前技術】200937138 VI. Description of the Invention: [Technical Field] The present invention relates to a spatial light modulator, an illumination optical system, an exposure apparatus, and a component manufacturing method. More specifically, the present invention relates to a spatial light modulator suitable for an illumination optical system of an exposure apparatus for manufacturing a semiconductor element, a photographic element, a liquid crystal display element, a thin film magnetic head or the like by a lithography process. [Prior Art]
於此種典型曝光裝置中，從光源射出之光束，透過作 為光學積分器的複眼透鏡，形成由多數個光源構成之實質 面光源的二次光源（一般而言，照明光瞳中之既定光強度分 布）。以下，將照明光瞳中之光強度分布稱為「光瞳強度分 布」又，照明光曈，係定義在藉由照明光瞳與被照射面（曝 光裝置之情形為光罩或晶圓)之間之光學系統之作用，被照 射面成為照明光瞳之傅立葉轉換面的位置。 自一次光源之光束，在藉由聚光透鏡聚光後，重疊 ㈣形成有既定圖㈣光罩。透射過光罩之光係透過投影 光學系統成像於晶圓上’在晶圓上投影曝光（轉印）光罩圖 案。形成於光罩之圖案係高度集成化，為了將此微細圖案 正確轉印於晶圓上，必須於晶®上獲得均-的照度分布。 ' 揭示有不使用變焦光學系統即能連續變更光瞳 強度分布（或照明條件）的照明光學系統（參照專利文獻^。 料利文獻1所揭示之照明光學系統中，使用由排列成陣 列狀且個別驅動控制傾斜角及傾斜方向之多數個微小反射 3 200937138 鏡元件構成之可動多面反射鏡（一般而言為空間光調變 器），將入射光束分割成各反射面之微小單位並使其偏向， 以將光束截面轉換成所欲之形狀或所欲之大小，進而實現 所欲之光曈強度分布。 專利文獻1 :日本特開2002- 3 53105號公報 【發明内容】 於專利文獻1所揭示之照明光學系統中，由於使用個 別控制姿勢之多數個微小反射鏡元件，因此關於光瞳強度 分布之形狀及大小之變更的自由度高。然而，由於從設於 規則配置之多數個反射鏡元件之間之格子狀反射鏡框之上 面產生之繞射光於照明光瞳面形成繞射干涉條紋，因此會 有因該繞射干涉條紋的影響而不易形成所欲光瞳強度分布 的情形。 又’專利文獻1所揭示之空間光調變器中，會有反射 鏡框之側面等所反射之光射入電極般之特定之構造部而使 其損傷的情形。再者，即使是未設置反射鏡框之類型的空 間光調變器’亦會有從複數個反射鏡元件之微小格子狀的 間隙射入而被基座表面等反射之光，射入電極般之特定之 構造部而使其損傷的情形。 本發明係有鐘於上述課題而構成，其目的在於提供電 極般之特定之構造部不易受到光照射造成的損傷，耐久性 高的空間光調變器。又，本發明之目的在於提供使用耐久 性高的空間光調變器，能穩定實現所欲之光瞳強度分布的 照明光學系統。又，本發明之目的在於提供使用穩定實現 200937138 所欲之光瞳強度分布的照明光學系統，能在適當之照明條 件下進行良好曝光的曝光裝置。 又，本發明之目的在於提供能抑制例如從規則配置之 多數個微小反射鏡元件之周圍產生之繞射光的影響，以實 現所欲之光曈強度分布的照明光學系統。又，本發明之目 的在於提供使用抑制繞射光的影響而實現所欲之光曈強度 为布的照明光學系統，能在適當之照明條件下進行良好曝 光的曝光裝置。 為了解決上述課題，本發明第1形態之空間光調變器， 係將入射光加以調變後使其射出，其特徵在於：具備二維 排列且個別控制之複數個光學元件；該複數個光學元件以 外之光入射區域中之至少部分區域，具有使入射光擴散的 擴散面。 本發明第2形態之照明光學系統，係根據來自光源之 光照明被照射面，其特徵在於，具備：第丨形態之空間光 調變器；以及分布形成光學系統，根據透射過該空間光調 變器之光束，纟該照明光學系統之照明光瞳形成既定光強 度分布。 本發明第3形態之曝光裝置，其特徵在於：具備用以 照明既定圖案之第2形態之照明光學系統，將該既定圖案 #光於感光性基板^ x' 本發明第4形態之元件製造方法，其特徵在於，包含. 曝光步驟’使用第3形態之曝光裝置，將該既定圖案曝光 於該感光性基板；顯影步驟，使轉印有該既定圖案之該感 5 200937138 光性基板顯影，將對應該既定圖案之形狀之光罩層形成於 該感光性基板的表面；以及加工步驟，透過該光罩層加工 該感光性基板的表面。 於本發明之照明光學系統，例如在反射型之空間光調 變器中’在複數個反射鏡元件以外之光入射區域中於反 射鏡框之上面或基座之表面等形成擴散面。是以，射入此 等之面之光產生擴散而降低反射繞射光的產生，亦降低從 複數個反射鏡元件之周圍產生之繞射光對光曈強度分布的 影響。以此方式，於本發明之照明光學系統，能抑制例如 從規則配置之多數個微小反射鏡元件之周圍產生之繞射光 的影響，以實現所欲之光瞳強度分布。又，於本發明之曝 光裝置’使用抑制繞射光的影響而實現所欲之光瞳強度分 布的照明光學系統，能在適當之照明條件下進行良好曝 光’或能製造良好元件。 又’於本發明，例如在反射型之空間光調變器中，在 複數個反射鏡元件以外之光入射區域中，於反射鏡框之側 面或基座之表面等形成擴散面。是以，射入此等之面之光 產生擴散，降低射入電極般之特定之構造部之光。以此方 式’於本發明’能實現電極般之特定之構造部不易受到光 照射造成的損傷，耐久性高的空間光調變器。是以，本發 明之照明光學系統，使用耐久性高的空間光調變器，能穩 定實現所欲之光瞳強度分布。又，本發明之曝光裝置，使 用穩定實現所欲之光瞳強度分布的照明光學系統，能在適 當之照明條件下進行良好曝光，或能製造良好元件。 200937138 【實施方式】 根據附加圖式以說明本發明之實施形態。圖1係概略 顯示本發明之實施形態之曝光裝置的構成圖。圖1中，將 沿著感光性基板之晶圓w的曝光面的法線方向設定為2 軸’將在晶圓W之曝光面内平行於圖1之紙面的方向設定 為X軸’將在晶圓W之曝光面内垂直於圖1之紙面的方向 設定為Y轴。 參照圖1，本實施形態之曝光裝置，沿著裝置之光抽 ® ΑΧ ’具備包含空間光調變單元3的照明光學系統IL、支持 光罩Μ的光罩載台MS、投影光學系統PL、及支持晶圓w 的晶圓載台WS。於本實施形態之曝光裝置，使用來自光源 1之照明光（曝光用光）透過照明光學系統IL照明光罩M。 透射過光罩Μ之光，係透過投影光學系統PL將光罩M < 圖案像形成於晶圓W上。 根據來自光源1之光照明光罩Μ之圖案面（被照射面） 之照明光學系統IL，藉由空間光調變單元3的作用，進行 複數極照明（2極照明、4極照明等）、輪帶照明等的變形照 明。照明光學系統IL，沿著光軸ΑΧ，從光源1側依序具備 光束送光部2、空間光調變單元3、變焦光學系統4、複眼 透鏡5、聚光光學系統6、照明視野光闌（光罩遮板）7、視野 光闌成像光學系統8。 空間光調變單元3,根據透射過光束送光部2之來自光 源1之光，於其遠視野區域（夫朗和斐繞射區域）形成所欲光 強度分布（光瞳強度分布）。空間光調變單元3之構成及作用 7 200937138 將於後述。光束送光部2,將來自光源1之入射光束轉換成 具有適當大小及形狀之截面的光束並導向空間光調變單元 3’且具有主動修正射入空間光調變單元3之光束之位置變 動及角度變動的功能。變焦光學系統4,將來自空間光調變 單元3之光聚光，導向複眼透鏡5。 複眼透鏡5 ’係由例如緊密排列之複數個透鏡元件構成 之波面分割型光學積分器。複眼透鏡5，將射入之光束進行 波面分割，在其後側焦點面形成由與透鏡元件相同數目之 光源像構成的二次光源（實質面光源）。複眼透鏡5之入射 面’係配置於變焦光學系統4之後側焦點位置或其附近。 作為複眼透鏡5,可使用例如圓柱形微複眼透鏡。圓柱形微 複眼透鏡之構成及作用，例如揭示於美國專利第69丨3373 號公報。又，作為複眼透鏡，亦可使用例如美國專利第 6741394號公報所揭示之微複眼透鏡。此處，援引美國專利 第6913373號公報及美國專利第6741394號公報以作為參 照。 於本實施形態，以由複眼透鏡5形成之二次光源為光 源，對配置於照明光學系統IL之被照射面之光罩m進行科 勒（Kohler)照明。因此，形成二次光源的位置係與投影光學 系統PL之孔徑光闌入8之位置光學共軛，能將二次光源的 形成面稱為照明光學系統IL之照明光瞳面。典型上，相對 於照明光瞳面，被照射面（配置光罩M的面、或考量包含投 影光學系統PL之照明光學系統之情形為配置晶圓w的？ 成為光學上的傅立葉轉換面。 200937138 此外，光瞳強度分布，係照明光學系統IL之照明光瞳 面或與該照明光曈面光學共輛之面的光強度分布（亮度分 布）。複眼透鏡5之波面分割數較大時’形成於複眼透鏡5 之入射面之大部分光強度分布、及二次光源整體之大部分 光強度分布（光曈強度分布）具有高的相關。因此，亦可將複 眼透鏡5之入射面及與該入射面光學共軛之面之光強度分 布稱為光曈強度分布。 聚光光學系統6,將從複眼透鏡5射出之光聚光，，重疊 ® 照明照明視野光闌7。通過照明視野光闌7之光，係透過視 野光闌成像光學系統8,在光罩Μ之圖案形成區域之至少 一部分形成照明視野光闌7之孔徑部之像之照明區域。此 外’圖1中，雖省略用以彎折光轴（或光路）之光路彎折鏡的 設置’但視需要亦可將光路彎折鏡適當配置於照明光路中。 在光罩載台MS沿著ΧΥ平面（例如水平面）裝載光罩 M ’在晶圓載台WS沿著XY平面裝載晶圓w。投影光學系 ❹統PL根據由照明光學系統IL形成於光罩μ之圖案面上 之來自照明區域的光，在晶圓…之曝光面（投影面）上形成 光罩Μ的圖案像。以此方式，在與投影光學系統pL之光軸 AX正交的平面（χγ平面）内，一邊二維驅動控制晶圓載台 ws ’或一邊二維驅動控制晶圓w 一邊進行一次曝光或掃描 曝光，以將光罩Μ之圖案依序曝光於晶圓％之各曝光區域。 接著，參照圖2及圖3,說明空間光調變單元3之構成 及作用。圖2係概略顯示空間光調變單元3及變焦光學系 統4之構成的圖。圖3係空間光調變單元3所具備之空間 9 200937138 光調變器3a的部分立體圖。空間光調變單元3,如圖2所 示，具備例如由螢石般之光學材料形成的稜鏡讣、及接近 與棱鏡3b之YZ平面平行之側自3ba而安褒的反射型空間 光調變器3a。形成稜鏡扑之光學材料並不限於螢石，$據 光源1供應之光的波長等，可為石英亦可為其他光學材料。 稜鏡3b，具有將長方體之！個側面（與接近安裝空間光 調變器3a之側面3ba相對向的側面）取代成v字狀凹陷之侧 面3bb及3bc的形態，因沿著又2平面之截面形狀而稱為κ 稜鏡。棱鏡3b之V字狀凹陷之側面3此及3bc，係藉由交❹ 叉成鈍角之2個平面P1及P2來規定。2個平面？1及p2 皆與XZ平面正交，沿著χζ平面呈v字狀。 在2個平面P1及P2之切線（延伸於γ方向之直線） 接觸之2個側面3bb及3bc的内面，具有反射面幻及R2 的功能。亦即，反射面R1位於平面ρι上，反射面R2位於 平面P2上，反射面ri&R2之構成角度為鈍角。舉一例而 言，能設反射面R1及R2之構成角度為12〇度，垂直於光 軸AX之稜鏡3b之入射面1?與反射面^之構成角度為⑹ 〇 度，垂直於光轴AX之稜鏡3b之射出面〇p與反射面尺2之 構成角度為60度。 於棱鏡3b ’接近安裝空間光調變器3a之侧面3ba與光 轴AX平行，且反射面R1位於光源丨側（曝光裝置之上游 側：圖2中左側），反射面R2位於複眼透鏡5側（曝光裝置 之下游側：圖2中右側）。更詳細而言，反射面ri相對光 轴AX斜向設置，反射面R2於通過切線p3且與χγ平面平 10 200937138 行之面與反射©R1對稱地相對光#AX斜向設置。棱鏡孙 之側面加，如後述，係與空間光調變器3a之複數個反射 鏡元件SE之排列面相對向的光學面。 稜鏡3b之反射面R1 ’將透過入射面ιρ射入之光反射 向空間光調變器空間光調變器3a，係配置於反射面ri 及反射面R2之間之光路中，將經由反射面R1射入之光反 射。稜鏡3b之反射面R2，將經由空間光調變器3a射入之 光反射，透過射出面OP導向變焦光學系統4。圖2雖例示 © 以1個光學塊體一體形成稜鏡3b，但如後述，使用複數個 光學塊體構成棱鏡3b亦可。 空間光調變器3a，對經由反射面rj射入之光，賦予對 應其入射位置之空間調變後射出。空間光調變器3a，如圖3 所示，具備二維排列之複數個微小反射鏡元件（光學元 件）SE。為了使說明及圖示簡單，圖2及圖3中雖顯示空間 光調變器3a具備4x4=16個反射鏡元件SE的構成例，但 實際上具備遠多於16個之複數個反射鏡元件se。 ® 參照圖2 ’沿著與光軸ΑΧ平行之方向射入空間光調變 單元3之光線群之中，光線L1射入複數個反射鏡元件SE 之中之反射鏡元件SEa，光線L2射入與反射鏡元件sEa不 同之反射鏡元件SEb。同樣地，光線L3射入與反射鏡元件 SEa, SEb不同之反射鏡元件SEc ’光線L4射入與反射鏡元 件SEa〜SEc不同之反射鏡元件SEd。反射鏡元件sEa〜 SEd ’將對應其位置設定之空間調變賦予光L1〜L4。 於空間光調變單元3,在空間光調變器3a之所有反射 11 200937138 鏡儿件SE之反射面設定成與γζ彳面平行之基準狀態下， 沿著與光軸ΑΧ平行之方向射入反射面R1之光線，在經過 空間光調變器3a後，藉由反射面R2反射向與光軸Αχ平行 之方向。又，空間光調變單元3,係構成為從稜鏡扑之入 射面ip經過反射鏡元件SEa〜SEd至射出面〇p為止之空氣 換算長、與稜鏡3b未配置於光路中時之從相當於入射面卩 之位置至相當於射出面0P之位置為止之空氣換算長相等。 此處，空氣換算長，係將光學系統中之光路長換算成折射 率1之空氣中之光路長者，折射率n之介質中之空氣換算 ◎ 長，係將其光路長乘上1/η者。 空間光調變器3a，係配置於變焦光學系統4之前侧焦 點位置或其附近《藉由空間光調變器3a之複數個反射鏡元 件SEa〜SEd反射而賦予既定角度分布之光，在變焦光學系 統4之後側焦點面4a形成既定光強度分布sp 1〜SP4。亦 即，變焦光學系統4,將空間光調變器3&之複數個反射鏡 元件SEa〜SEd賦予射出光之角度，轉換成空間光調變器h 之遠視野區域（夫朗和斐繞射區域）之面4a上的位置。 〇 再次參照圖1，在具有聚光光學系統之功能之變焦光學 系統4之後側焦點面4a之位置或其附近，定位複眼透鏡5 的入射面。是以，複眼透鏡5形成之二次光源的光強度分 布（亮度分布），係對應空間光調變器3a及變焦光學系統4 形成之光強度分布SP1〜SP4的分布。空間光調變器3a，如 圖3所示’係包含在平面形狀之反射面為上面之狀態下， 沿著1個平面規則且二維排列之多數個微小反射元件之反 12 200937138 射鏡元件SE的可動多面反射鏡。 各反射鏡元件SE係可動，其反射面之傾斜、亦即反射 面之傾斜角及傾斜方向，係藉由根據控制部CR(圖3中未圖 示）之指令作動之驅動部3c(圖3中未圖示）之作用而獨立控 制。各反射鏡元件SE，以與其反射面平行之二方向、且彼 此正交之〕方向（Y方向及Z方向）為旋轉軸，能連續或離散 旋轉所欲之旋轉角度。亦即’能二維控制各反射鏡元件π 之反射面的傾斜。In such a typical exposure apparatus, a light beam emitted from a light source is transmitted through a fly-eye lens as an optical integrator to form a secondary light source of a substantial surface light source composed of a plurality of light sources (generally, a predetermined light intensity in an illumination pupil) distributed). Hereinafter, the light intensity distribution in the illumination pupil is referred to as "the pupil intensity distribution", and the illumination pupil is defined by the illumination pupil and the illuminated surface (in the case of an exposure device, a mask or a wafer) The role of the optical system between the two is that the illuminated surface becomes the position of the Fourier transition surface of the illumination pupil. The light beam from the primary light source is superimposed by the collecting lens, and is overlapped (4) to form a predetermined picture (4) mask. The light transmitted through the reticle is imaged onto the wafer through a projection optical system' projection (exposure) reticle pattern on the wafer. The pattern formed on the reticle is highly integrated, and in order to properly transfer the fine pattern onto the wafer, a uniform illuminance distribution must be obtained on the crystal®. An illumination optical system capable of continuously changing the pupil intensity distribution (or illumination condition) without using a zoom optical system is disclosed (see Patent Document). In the illumination optical system disclosed in the document 1, the use is arranged in an array and Individual drive controls a large number of small reflections in the tilt and tilt directions. 200937138 A movable polygon mirror (generally a spatial light modulator) composed of mirror elements divides the incident beam into tiny units of the respective reflecting surfaces and deflects them. In order to convert the beam section into a desired shape or a desired size, and to achieve a desired pupil intensity distribution. Patent Document 1: Japanese Laid-Open Patent Publication No. 2002-3553105. In the illumination optical system, since a plurality of minute mirror elements of individual control postures are used, the degree of freedom in changing the shape and size of the pupil intensity distribution is high. However, since a plurality of mirror elements are arranged in a regular arrangement The diffracted light generated on the upper side of the lattice mirror frame forms a diffraction interference fringe on the illumination pupil plane, thus In the spatial light modulator disclosed in Patent Document 1, the light reflected by the side surface of the mirror frame is incident on the electrode, and the diffraction intensity distribution is not easily formed. In the case where the structure is damaged by the specific structure, even a spatial light modulator of the type in which the mirror frame is not provided may be injected from a small lattice-like gap of a plurality of mirror elements. The light reflected by the surface of the pedestal is incident on a specific structural portion such as an electrode and is damaged. The present invention is constituted by the above-described problem, and an object thereof is to provide a structure in which a specific structure such as an electrode is less susceptible to light irradiation. The present invention aims to provide an illumination optical system capable of stably achieving a desired pupil intensity distribution by using a spatial light modulator having high durability. It is an object of the present invention to provide an illumination apparatus that uses a illumination optical system that stably achieves the desired pupil intensity distribution of 200937138, and that is capable of performing good exposure under appropriate illumination conditions. Further, an object of the present invention is to provide an illumination optical system capable of suppressing the influence of diffracted light generated around a plurality of minute mirror elements arranged in a regular manner to achieve a desired pupil intensity distribution. Provided is an exposure apparatus that can achieve an excellent illumination condition under an appropriate illumination condition by using an illumination optical system that suppresses the influence of diffracted light and realizes a desired pupil intensity as a cloth. In order to solve the above problems, the spatial light of the first aspect of the present invention is provided. a modulator that modulates incident light and emits it, and is characterized in that: a plurality of optical elements that are two-dimensionally arranged and individually controlled; and at least a portion of the light incident regions other than the plurality of optical elements have A illuminating surface that diffuses incident light. The illuminating optical system according to the second aspect of the present invention is characterized in that the illuminating surface is illuminated by light from a light source, and is characterized in that: a spatial light modulator of a second aspect; and a distribution forming optical system According to the light beam transmitted through the spatial light modulator, the illumination diaphragm of the illumination optical system is formed Light intensity distribution. An exposure apparatus according to a third aspect of the present invention is characterized in that the illumination optical system of the second aspect for illuminating a predetermined pattern is provided, and the predetermined pattern is lighted on the photosensitive substrate. The exposure step includes: exposing the predetermined pattern to the photosensitive substrate using an exposure apparatus according to the third aspect; and developing the photosensitive substrate on which the predetermined pattern is transferred by the development step; A mask layer corresponding to the shape of the predetermined pattern is formed on the surface of the photosensitive substrate; and a processing step of processing the surface of the photosensitive substrate through the mask layer. In the illumination optical system of the present invention, for example, in a reflective spatial light modulator, a diffusion surface is formed on the upper surface of the reflection frame or the surface of the susceptor in a light incident region other than the plurality of mirror elements. Therefore, the light incident on the surface of the surface diffuses to reduce the generation of the reflected diffracted light, and also reduces the influence of the diffracted light generated from the periphery of the plurality of mirror elements on the intensity distribution of the pupil. In this manner, in the illumination optical system of the present invention, it is possible to suppress the influence of the diffracted light generated, for example, from the periphery of a plurality of minute mirror elements which are regularly arranged to achieve a desired pupil intensity distribution. Further, in the exposure apparatus of the present invention, an illumination optical system that achieves the desired pupil intensity distribution by suppressing the influence of the diffracted light can perform good exposure under appropriate illumination conditions or can manufacture a good component. Further, in the present invention, for example, in a reflective spatial light modulator, a diffusing surface is formed on a side surface of a mirror frame or a surface of a susceptor in a light incident region other than a plurality of mirror elements. Therefore, the light incident on these surfaces is diffused, and the light incident on the specific structure portion like the electrode is lowered. According to the present invention, it is possible to realize a space light modulator having high durability, which is not susceptible to damage by light irradiation, and is particularly durable. Therefore, the illumination optical system of the present invention can stably achieve the desired pupil intensity distribution by using a highly durable spatial light modulator. Further, the exposure apparatus of the present invention uses an illumination optical system which stably realizes the desired pupil intensity distribution, can perform good exposure under appropriate illumination conditions, or can manufacture a good component. [Embodiment] An embodiment of the present invention will be described based on additional drawings. Fig. 1 is a view schematically showing the configuration of an exposure apparatus according to an embodiment of the present invention. In FIG. 1, the normal direction of the exposure surface of the wafer w along the photosensitive substrate is set to 2 axes 'the direction in which the plane of the wafer W is parallel to the plane of FIG. 1 is set to the X-axis' will be The direction perpendicular to the paper surface of FIG. 1 in the exposure surface of the wafer W is set to the Y axis. Referring to Fig. 1, an exposure apparatus according to the present embodiment includes an illumination optical system IL including a spatial light modulation unit 3, a mask holder MS supporting a mask 、, a projection optical system PL, and a light extraction device ΑΧ And a wafer stage WS supporting the wafer w. In the exposure apparatus of the present embodiment, illumination light M (illumination light) from the light source 1 is used to illuminate the mask M through the illumination optical system IL. The light transmitted through the mask is formed on the wafer W through the projection optical system PL to form a mask M < According to the illumination optical system IL from the pattern surface (irradiated surface) of the light illumination mask 光源 of the light source 1, the complex light illumination (2-pole illumination, 4-pole illumination, etc.) and the wheel are performed by the action of the spatial light modulation unit 3. Deformed illumination with illumination, etc. The illumination optical system IL is provided with a beam light transmitting unit 2, a spatial light modulation unit 3, a zoom optical system 4, a fly-eye lens 5, a collecting optical system 6, and an illumination field of view from the light source 1 side along the optical axis 依. (Photomask Shield) 7. Field-of-view aperture imaging optical system 8. The spatial light modulation unit 3 forms a desired light intensity distribution (a pupil intensity distribution) in the far field of view region (Fran and Fiji diffraction regions) based on the light from the light source 1 transmitted through the beam light transmitting portion 2. The composition and function of the spatial light modulation unit 3 7 200937138 will be described later. The beam light transmitting unit 2 converts the incident light beam from the light source 1 into a light beam having a cross section of an appropriate size and shape and guides it to the spatial light modulation unit 3' and has an active correction of the positional variation of the light beam incident on the spatial light modulation unit 3. And the function of angle change. The zoom optical system 4 condenses the light from the spatial light modulation unit 3 to the fly-eye lens 5. The fly-eye lens 5' is a wavefront-divided optical integrator composed of, for example, a plurality of lens elements closely arranged. The fly-eye lens 5 performs wavefront division of the incident light beam, and forms a secondary light source (substantial surface light source) composed of the same number of light source images as the lens elements on the rear focal plane. The incident surface of the fly-eye lens 5 is disposed at or near the rear focus position of the zoom optical system 4. As the fly-eye lens 5, for example, a cylindrical micro fly's eye lens can be used. The constitution and function of a cylindrical micro-eye lens are disclosed, for example, in U.S. Patent No. 6,037,337. Further, as the fly-eye lens, for example, a micro-fold eye lens disclosed in U.S. Patent No. 674,1394 can be used. U.S. Patent No. 6,933,373 and U.S. Patent No. 674,1394 are incorporated herein by reference. In the present embodiment, the secondary light source formed by the fly-eye lens 5 is used as a light source, and the mask m disposed on the illuminated surface of the illumination optical system IL is subjected to Kohler illumination. Therefore, the position at which the secondary light source is formed is optically conjugate with the position of the aperture light entrance 8 of the projection optical system PL, and the formation surface of the secondary light source can be referred to as the illumination pupil plane of the illumination optical system IL. Typically, the illuminated surface (the surface on which the mask M is placed or the illumination optical system including the projection optical system PL is considered to be the optical wafer Fourier conversion surface) with respect to the illumination pupil plane. 200937138 Further, the pupil intensity distribution is a light intensity distribution (luminance distribution) of the illumination pupil plane of the illumination optical system IL or the surface of the illumination pupil plane optically shared. When the number of divisions of the wavefront of the fly-eye lens 5 is large, the formation The light intensity distribution on the incident surface of the fly-eye lens 5 and the majority of the light intensity distribution (the pupil intensity distribution) of the entire secondary light source have a high correlation. Therefore, the incident surface of the fly-eye lens 5 can also be The light intensity distribution on the plane of the optical conjugate of the incident surface is called the pupil intensity distribution. The collecting optical system 6 condenses the light emitted from the fly-eye lens 5, and superimposes the illumination illumination field illuminator 7. Through the illumination field illuminator The light of 7 passes through the field-of-view aperture imaging optical system 8 to form an illumination region of the image of the aperture portion of the illumination field stop 7 at least a part of the pattern formation region of the mask. In the case of 1 , the arrangement of the optical path bending mirror for bending the optical axis (or optical path) is omitted. However, the optical path bending mirror may be appropriately disposed in the illumination optical path as needed. The reticle stage MS is along the pupil plane ( For example, the horizontal plane) loading the mask M' loads the wafer w along the XY plane on the wafer stage WS. The projection optical system PL is based on light from the illumination area formed on the pattern surface of the mask μ by the illumination optical system IL, A pattern image of the mask Μ is formed on the exposure surface (projection surface) of the wafer. In this manner, the control crystal is driven two-dimensionally in a plane (χγ plane) orthogonal to the optical axis AX of the projection optical system pL. The circular stage ws ' or one-time driving control wafer w is subjected to one exposure or scanning exposure to sequentially expose the mask pattern to each exposure area of the wafer %. Next, with reference to FIG. 2 and FIG. Fig. 2 is a view schematically showing the configuration of the spatial light modulation unit 3 and the zoom optical system 4. Fig. 3 is a space 9 of the spatial light modulation unit 3; 200937138 Partial perspective view of the device 3a. Space As shown in FIG. 2, the modulation unit 3 includes, for example, a crucible made of a fluorite-like optical material, and a reflective spatial light modulator that is mounted close to the YZ plane parallel to the YZ plane of the prism 3b. 3a. The optical material forming the slap is not limited to fluorite, and may be quartz or other optical materials depending on the wavelength of light supplied from the light source 1. 稜鏡3b, having a side of the rectangular parallelepiped (close to The side faces 3bb and 3bc of the v-shaped recess are replaced with the side faces 3bb and 3bc of the v-shaped recessed surface, and the cross-sectional shape along the other two planes is called κ 稜鏡. The V-shape of the prism 3b The sides 3 and 3bc of the depression are defined by two planes P1 and P2 which are intersecting the obtuse angle. The two planes ?1 and p2 are orthogonal to the XZ plane and v-shaped along the plane of the ridge. The inner faces of the two side faces 3bb and 3bc which are in contact with the tangent of the two planes P1 and P2 (the straight line extending in the γ direction) have a function of reflecting the surface and R2. That is, the reflecting surface R1 is located on the plane ρι, the reflecting surface R2 is located on the plane P2, and the reflecting angle of the reflecting surface ri & R2 is an obtuse angle. For example, the angle of formation of the reflecting surfaces R1 and R2 can be 12 degrees, and the angle of the incident surface 1 of the 稜鏡3b perpendicular to the optical axis AX and the reflecting surface can be (6) ,, perpendicular to the optical axis. The angle of the exit surface 〇p of the AX 3b and the reflection surface scale 2 is 60 degrees. The side surface 3ba of the prism 3b' close to the installation space light modulator 3a is parallel to the optical axis AX, and the reflection surface R1 is located on the side of the light source (on the upstream side of the exposure device: the left side in FIG. 2), and the reflection surface R2 is located on the side of the fly-eye lens 5 (The downstream side of the exposure device: the right side in Fig. 2). More specifically, the reflecting surface ri is obliquely disposed with respect to the optical axis AX, and the reflecting surface R2 is obliquely disposed with respect to the light #AX symmetrically opposite to the reflection ©R1 by the line passing through the tangent line p3 and being parallel to the χγ plane 10 200937138. The side surface of the prism and the like is an optical surface opposed to the array surface of the plurality of mirror elements SE of the spatial light modulator 3a as will be described later. The reflecting surface R1' of the 稜鏡3b reflects the light incident through the incident surface ιρ to the spatial light modulator spatial light modulator 3a, and is disposed in the optical path between the reflecting surface ri and the reflecting surface R2, and is reflected. The light incident on the surface R1 is reflected. The reflection surface R2 of the crucible 3b reflects the light incident through the spatial light modulator 3a, and is guided to the zoom optical system 4 through the emission surface OP. In Fig. 2, 稜鏡3b is integrally formed by one optical block. However, as will be described later, the prism 3b may be formed using a plurality of optical blocks. The spatial light modulator 3a emits light incident on the reflecting surface rj with a spatial modulation corresponding to the incident position, and emits the light. The spatial light modulator 3a, as shown in Fig. 3, has a plurality of micro mirror elements (optical elements) SE arranged in two dimensions. In order to simplify the description and the illustration, in FIGS. 2 and 3, the spatial light modulator 3a is provided with a configuration example of 4x4=16 mirror elements SE, but actually has a plurality of mirror elements of far more than 16 Se. Referring to Fig. 2', a light ray L1 is incident on the ray group of the spatial light modulation unit 3 in a direction parallel to the optical axis ,, and the light ray L1 is incident on the mirror element SEa among the plurality of mirror elements SE, and the light L2 is incident. A mirror element SEb that is different from the mirror element sEa. Similarly, the light ray L3 enters the mirror element SEc' ray L4 which is different from the mirror elements SEa, SEb, and enters the mirror element SEd which is different from the mirror elements SEa to SEc. The mirror elements sEa to SEd' are spatially modulated to light L1 to L4 corresponding to their position settings. In the spatial light modulation unit 3, in the reference state in which all the reflections of the spatial light modulator 3a are set to be parallel to the optical axis, the reflection surface of the mirror member SE is set to be parallel to the optical axis ΑΧ. After passing through the spatial light modulator 3a, the light of the reflecting surface R1 is reflected by the reflecting surface R2 in a direction parallel to the optical axis 。. Further, the spatial light modulation unit 3 is configured such that the air conversion length from the incident surface ip of the slap through the mirror elements SEa to SEd to the exit surface 〇p is long, and the 稜鏡3b is not disposed in the optical path. The air conversion length corresponding to the position of the entrance surface 至 to the position corresponding to the exit surface 0P is equal. Here, the air conversion is long, and the optical path length in the optical system is converted into the optical path length in the air having the refractive index 1, and the air in the medium having the refractive index n is converted to ◎ long, and the optical path length is multiplied by 1/η. . The spatial light modulator 3a is disposed at or near the front focus position of the zoom optical system 4. "The light is reflected by the plurality of mirror elements SEa to SEd of the spatial light modulator 3a to impart a predetermined angular distribution. The rear side focal plane 4a of the optical system 4 forms a predetermined light intensity distribution sp 1 to SP4. That is, the zoom optical system 4 applies the plurality of mirror elements SEa to SEd of the spatial light modulator 3& to the angle of the emitted light to be converted into the far field of view of the spatial light modulator h (Fran and Fiji diffraction) The position on the face 4a of the area). Referring again to Fig. 1, the incident surface of the fly-eye lens 5 is positioned at or near the position of the rear focal plane 4a of the zoom optical system 4 having the function of the collecting optical system. Therefore, the light intensity distribution (brightness distribution) of the secondary light source formed by the fly-eye lens 5 corresponds to the distribution of the light intensity distributions SP1 to SP4 formed by the spatial light modulator 3a and the zoom optical system 4. The spatial light modulator 3a, as shown in FIG. 3, is a counter element of a plurality of minute reflective elements arranged in a regular and two-dimensional arrangement along a plane in a state in which the reflective surface of the planar shape is above. The movable multifaceted mirror of the SE. Each of the mirror elements SE is movable, and the inclination of the reflection surface, that is, the inclination angle and the inclination direction of the reflection surface are driven by the drive unit 3c according to the command of the control unit CR (not shown in FIG. 3) (FIG. 3) Independently controlled by the action of not shown in the figure. Each of the mirror elements SE has a rotation axis that is continuous or discretely rotated in a direction in which two directions are parallel to the reflection surface and that are orthogonal to each other (Y direction and Z direction). That is, the inclination of the reflecting surface of each of the mirror elements π can be controlled two-dimensionally.
圖4係概略顯示空間光，器3a之複數個反射鏡元件 SE之中之工個反射鏡元件SE之構成例的圖。又，圖5係 圖4之AA，截面圖。參照圖4及圖5,反射鏡元件se具備 基座30、肢基座30上的支柱31、於與基座3q側相反側 連接於支柱31的板狀構件32、由形成於板狀構件32上之 反射膜職較射面33、及在基座3Q上配置成圍繞支柱 31的4個電極34a〜34d。 ❹=件32,以與基柱31之連接部位為支點之方式， =與基座30平行之面上繞彼此正交之2條轴線傾斜。電 mm，係分別配置於與板狀構件32之4個角落部對 上的位置。以此方式，藉由對電極—d 予電位，在各電極34a〜34d與板狀構件n之間產生靜電 ^使各電極34a〜34d與板狀構件32之間 板狀構件32以支柱31之 變化藉此 構件32上之反射面33傾斜端為支點傾斜，或形成於板狀 此外’使各反射鏡元件沾之反射面離散旋轉時，將旋 13 200937138 轉角以複數個狀態（例如，…、—2·5度、—2 〇度...... 度、+ 〇.5度.....+2·5度、…）切換控制為佳。圖3雖顯 不外形為正方形之反射鏡元件SE，但反射鏡元件SE之外 形形狀不限於正方形。然而，從光利用效率之觀點觀之， 亦可為可排列成反射鏡元件SE之間隙變少的形狀（可最密 填充的形狀）。又，從光利用效率之觀點觀之，將相鄰之2 個反射鏡元件SE之間隔抑制在必要最小限亦可。 於本實施形態，作為空間光調變器3a，係使用分別使 二維排列之複數個反射鏡元件SE之面向連績（或離散）變化 的空間光調變器。此種空間光調變器，能使用例如日本特 表平10 — 503300號公報及與其對應之歐洲專利公開第 779530號公報、日本特開2004 — 78136號公報及與其對應 之美國專利第6900915號公報、日本特表2006— 524349號 公報及與其對應之美國專利第7095546號公報、以及曰本 特開2006 — 1 13437號公報所揭示的空間光調變器。此處， 援引歐洲專利公開第77953〇號公報、美國專利第69〇〇915 號公報、及美國專利第7095546號公報以作為參照。 於空間光調變器3a’藉由根據來自控制部CR之控制訊 號而作動之驅動部3c的作用，複數個反射鏡元件se之姿 勢分別變化，各反射鏡元件SE分別設定於既定方向。藉由 空間光調變器3a之複數個反射鏡元件Se分別以既定角度 反射之光，透過變焦光學系統4，在複眼透鏡5之後側焦點 位置或其附近之照明光瞳，形成複數極狀（2極、4極等）、 輪帶狀等的光強度分布（光瞳強度分布）。此光瞳強度分布， 200937138 係藉由變焦光學系統4的作用，相似（等向）變化。 亦即’變焦光學系統4及複眼透鏡5,根據透射過空間 光調變單元3中之空間光調變器3a的光束，構成在照明光 學系統IL之照明光瞳形成既定光強度分布的分布形成光學 系統。再者，在複眼透鏡5之後側焦點位置或與其附近之 照明光瞳光學共輕之另一照明光瞳位置，亦即視野光闌成 像光學系統8之光瞳位置及投影光學系統Pl之光瞳位置 (孔徑光闌AS之位置），亦形成對應光曈強度分布的光強度 分布。 於曝光裝置’為了將光罩Μ之圖案高精度且忠實轉印 於晶圓W，例如在對應光罩Μ之圖案特性之適當照明條件 下進行曝光是相當重要的。於本實施形態，由於使用具備 複數個反射鏡元件SE之姿勢個別變化之空間光調變器3a 的空間光調變單元3，因此能使空間光調變器3 a之作用所 形成之光瞳強度分布自在且迅速的變化。 然而’於使用空間光調變器3a之本實施形態之照明光 ® 學系統IL，如後述般’從設於規則配置之複數個反射鏡元 件S E之間之格子狀之反射鏡框之上面產生的繞射光在照明 光瞳面形成繞射干涉條紋。其結果，由於此繞射干涉條紋 的影響，會有不易形成所欲光瞳強度分布的情形。以下， 參照圖6 ’說明設有反射鏡框之空間光調變器之繞射干涉條 紋之產生及影響。 圖6係以示意方式顯示設有反射鏡框之空間光調變器 之典型構成的截面圖。如圖6所示，於反射鏡框型之空間 15 200937138 光調變器之典型構成例，複數個反射鏡元件Se係透過鉸鏈 (未圖示）安裝於基座BA上，在複數個反射鏡元件SE之間 設有反射鏡框FR。反射鏡元件SE，具有例如正方形之微小 反射面’且規則配置。是以’設於反射鏡元件SE之間之反 射鏡框FR的上面（圖6中反射鏡框FR之圖中上侧之面 FRa) ’例如整體具有格子狀的形態。 此時’光L41(圖中以實線表示）射入反射鏡框fr之規 則配置之微小上面時，從反射鏡框FR之上面產生反射繞射 光L42(圖中以虛線表示）。此外，圖6中，為了簡化圖示， 〇 僅顯示射入左端之反射鏡框FR之上面的入射光L41，但入 射光L41實際上以相同角度射入空間光調變器3a之整體。 此時’反射鏡元件SE之間距P、光之波長；I、射入反射鏡 框FR之上面的光L41的入射角0〇、及來自反射鏡框FR之 上面之N次繞射光之繞射角0 N之間，下式（1)所示的關係 會成立。 sin Θ sin θ 〇= Νχ λ /Ρ (1) 以此方式’於本實施形態之照明光學系統IL，獲得由 ◎ 複數個反射鏡元件SE所反射之所需光形成於照明光瞳之原 本的光強度分布、及從反射鏡框FR之上面產生之不需要之 光之繞射光形成於照明光曈的光強度分布（繞射干涉條紋） 構成的光瞳強度分布。亦即，於本實施形態之照明光學系 統IL，若不施加特別對策，由於來自反射鏡框FR之上面之 繞射光所形成的繞射干涉條紋，無法獲得所欲光瞳強度分 布0 16 200937138 於圖6所示之構成例，在複數個反射鏡元件SE之間設 有反射鏡框FR，反射鏡框FR之上面，構成在各複數個反 射鏡元件SE之周圍產生繞射光的繞射光產生區域。此外， 即使於未設有反射鏡框之構成例’從複數個反射鏡元件SE 之微小格子狀的間隙到達基座BA表面（圖6中基座BA之 圖中上側之面B Aa)之光會產生繞射光，或在照明光瞳形成 繞射干涉條紋。此時，對應複數個反射鏡元件SE之微小間 隙的格子狀基座表面區域’構成在各複數個反射鏡元件SE © 之周圍產生繞射光的繞射光產生區域。 於本實施形態，在複數個反射鏡元件以外之光入射區 域中之與上述繞射光產生區域對應的區域，例如反射鏡框 之上面或基座之表面等形成擴散面。是以，射入此等之面 之光產生擴散而降低反射繞射光的產生，亦降低從複數個 反射鏡元件之周圍產生之繞射光對光曈強度分布的影響。 其結果，於本實施形態之照明光學系統，能抑制例如從規 則配置之多數個微小反射鏡元件之周圍產生之繞射光的影 ® 響’以實現所欲之光曈強度分布。又，於本實施形態之曝 光裝置’使用抑制繞射光的影響而實現所欲之光瞳強度分 布的照明光學系統，能在例如對應光罩之圖案特性而實現 之適當之照明條件下進行良好曝光。 然而’於反射鏡框之類型之空間光調變器，會有被反 射鏡框之側面（於圖6之反射鏡框FR延伸於圖中錯垂方向 的面FRb)等反射之光’射入電極般之特定之内部構造部分 而使其損傷的情形。再者，即使是未設置反射鏡框之類型 17 200937138 的空間光調變器’亦會有從複數個反射鏡元件之微小格子 狀的間隙射入而被基座表面等反射之光，射入電極般之特 定之内部構造部分而使其損傷的情形。 於本實施形態之空間光調變器，在複數個反射鏡元件 以外之光入射區域中之反射鏡框的侧面等，亦與反射鏡框 之上面或基座之表面專同樣地形成擴散面。是以，射入此 等之面之光產生擴散’降低射入電極般之特定之構造部之 光。其結果，於本實施形態之空間光調變器，電極般之特 定之構造部不易受到光照射造成的損傷，可提升耐久性。 是以，本實施形態之照明光學系統，使用耐久性高的空間 光調變器，能穩定實現所欲之光瞳強度分布。又，本實施 形態之曝光裝置，使用穩定實現所欲之光曈強度分布的照 明光學系統，能在例如對應光罩之圖案特性而實現之適當 之照明條件下進行良好曝光。 又，於本實施形態，由於使用例如蝕刻方法（視情形為 粗滑加工的方法）在所欲區域形成擴散面，因此有當形成擴 散面時不需要使空間光調變器暴露於高溫環境的優點。由 於反射繞射光之強度取決於反射面的反射率，因此在反射 鏡框之上面或基座之表面等施加反射防止覆膜，可降低反 射繞射光的產生。然而，此時，產生當形成反射防止覆膜 時必需使空間光調變器暴露於高溫環境的問題，從確保所 欲精度之觀點等觀之，較不佳。 此外，於本實施形態，在反射鏡框之上面或基座之表 面等，如繞射光學面般形成依既定指向性使入射光擴散的 200937138 擴散面，藉由將擴散後不需要光的大部分導向照明光路 外’可進一步降低從多數個微小反射鏡元件之周圍產生之 繞射光對光瞳強度分布的影響。或，使依既定指向性從繞 射光學面擴散之光射向照明光瞳面上的既定區域（例如以光 軸為中心之較小的區域），由於擴散光有助於光瞳強度分布 的形成，因此可謀求原本有害之不需要光的有效活用。 又’於本實施形態，在反射鏡框之侧面或基座之表面 等，形成繞射光學面般的擴散面，依既定指向性控制擴散 光的進路，藉此可進一步降低射入電極般之特定之構造部 之光。亦即，藉由形成於反射鏡框之側面或基座之表面等 之繞射光學面的作用，依既定指向性使擴散光不射入特定 之構造部亦可。 此外’上述說明中，作為具有與空間光調變器3 3之複 數個反射鏡元件排列之面相對向之光學面的稜鏡構件係 使用以1個光學塊體一體形成的尺稜鏡3be然而，並不限 ❹於此，藉由一對稜鏡構成具有與K稜鏡3b相同功能的稜鏡 構件亦可。又，藉由！個平行平面板及一對三角稜鏡構成 具有與K稜鏡3b相同功能的稜鏡構件亦可。又，藉由1個 平行平面板及一對平面鏡構成具有與尺稜鏡3b相同功能的 組裝光學元件亦可。 又，上述說明中，作為具有二維排列且個別控制之複 數個光學元件的空間光調變器，係使用可個別控制二維排 列之複數個反射面之方向（角度：傾斜）的空間光調變器。然 而，並不限於此，亦可使用例如可個別控制二維排列之複 19 200937138 數個反射面之高度（位置）的空間光調變器。此種空間光調變 器，能使用以下所揭示之空間光調變器，例如揭示於日本 特開平6 — 281869號公報及與此對應之美國專利第5312513 號公報、及日本特表2004— 52〇618號公報及與此對應之美 國專利第6885493號公報之圖ld。該等空間光調變器中， 藉由形成二維之高度分布’能將與繞射面同樣之作用提供 給入射光。此外，亦能將具有上述二維排列之複數個反射 面之空間光調變器依照以下所揭示之公報加以變形，例如 揭示於日本特表2006— 513442號公報及與此對應之美國專 ◎ 利第6891655號公報、或日本特表2〇〇5— 5241 12號公報及 與此對應之美國專利公開第2005/0095749號公報。 又’上述說明中’雖使用具有複數個反射鏡元件之反 射型空間光調變器，但並不限於此，亦可使用例如美國專 利第5229872號公報所揭示之透射型空間光調變器。 此處’援引美國專利第53 12513號公報、美國專利第 6885493號公報、美國專利第6891655號公報、美國專利公 開第2005/0095749號公報、及美國專利第5229872號公報 ❹ 以作為參照。 此外，上述實施形態中，在使用空間光調變單元以形 成光瞳強度分布時，亦可以光瞳亮度分布測量裝置來測量 光曈強度分布，並依該測量結果來控制空間光調變單元中 之空間光調變器。此種技術已揭示於例如日本特開2006 — 54328號公報、或日本特開2〇〇3_ 22967號公報及與此對應 之美國專利公開第2003/003 8225號公報。此處，援引美國 20 200937138 專利公開第2003/003 8225號公報以作為參照。 又，上述實施形態中，亦可使用根據既定電子資料來 形成既定圖案的可變圖案形成裝置以取代光罩。若使用此 種可變圖案形成裝置，則圖案即使是縱置亦可將對同步精 度所造成之影響減少至最低限度。此外，可變圖案形成裝 置可使用例如DMD(Digital Micro-Mirror Device :數位微鏡 元件），其係包含根據既定電子資料來驅動的複數個反射元 件。使用DMD之曝光裝置已揭示於例如曰本特開2〇〇4 — © 304135號公報、國際專利公開第2006/080285號小冊子及 與此對應之美國專利公開第2007/0296936號公報。又，除 了 DMD等非發光型反射型空間光調變器以外，亦可使用透 射型空間光調變器，或亦可使用自發光型影像顯示元件。 此外，即使圖案面為橫置之情況下，亦可使用可變圖案形 成裝置。此處，援引美國專利公開第2007/0296936號公報 以作為參照。 ❹ 此外，於上述實施形態，光學積分器雖使用複眼透鏡 5,但亦可使用内面反射型光學積分器（典型而言為棒狀積分 器）來取代之。此時，在變焦光學系統4之後侧配置聚光透 鏡i以使其前側焦點位置與變焦光學系統4之後側焦點位 置一致，在此聚光透鏡之後側焦點位置或其附近配置棒狀 積分器以定位入射端。此時’棒狀積分器之射出端成為照 明視野光$ 7的位置。使用棒狀積分器時，此棒狀積分器 之下游之視野光闌成像光學系統8内之與投影光學系統pL 之孔彳二光闌AS之位置光學共軛的位置，可稱為照明光曈 21 200937138 面。又’由於在棒狀積分器之入射面之位置，形成照明光 瞳面之二次光源的虛像，因此該位置及與該位置光學共軛 的位置，亦可稱為照明光曈面。此處，變焦光學系統4與 上述聚光透鏡，可視為配置於光學積分器與空間光調變器 之間之光路中的聚光光學系統，變焦光學系統4、上述聚光 透鏡、及棒狀積分器可視為分布形成光學系統。 上述實施形態之曝光裝置’係藉由組裝包含本專利申 請範圍所列舉之各構成元件的各種次系統，以能保持既定 之機械精度、電氣精度、光學精度之方式所製造。為確保 ❹ 此等各種精度，於此組裝前後係對各種光學系統進行用以 達成光學精度之調整、對各種機械系統進行用以達成機械 精度之調整、對各種電氣系統進行用以達成電氣精度之調 整。從各種次系統至曝光裝置之組裝製程，係包含各種次 系統彼此之機械連接、電路之配線連接、氣壓迴路之配管 連接等。當然，從各種次系統至曝光裝置之組裝製程前， 係有各次系統個別之組裝製程。當各種次系統至曝光裝置 之組裝製程結束後，即進行綜合調整，以確保曝光裝置整 ❹ 體之各種精度《此外，曝光裝置之製造可在溫度及潔淨度 等皆受到管理之無塵室進行。 其次，針對使用上述實施形態之曝光裝置的元件製造 方法作說明。圖7係表示半導體元件之製造步驟的流程圖。 如圖7所示，半導體元件之製造步驟中，係將金屬膜蒸鍍 於構成半導體元件之基板的晶圓w(步驟S4〇)，並將感光性 材料之光阻塗布於該蒸鍍後之金屬膜上（步驟S42)〇接著， 22 200937138 使用上述實施形態之投影曝光裝置，將形成於光罩（標線 片）M之圖案轉印於晶圓W上之各照射區域（步驟S44:曝光 步驟），並進行完成該轉印後之晶圓w的顯影，亦即進行轉 印有圖案之光阻的顯影（步驟S46 :顯影步驟）。之後，藉由 步驟S46以產生於晶圓w表面之光阻圖案為光罩對晶圓 w表面進行蝕刻等之加工（步驟S48 :加工步驟）。 此處，光阻圖案係指產生對應藉由上述實施形態之投 衫曝光裝置所轉印之圖案的形狀的凹凸之光阻層，且其凹 ® °卩係貫通光阻層者。步驟S48中，係透過該光阻圖案來進 行晶圓W表面之加工。於步驟S48所進行之加工中，包含 例如晶圓W表面之蝕刻或金屬膜等之成膜十之至少一者。 此外’步驟S44中，上述實施形態之投影曝光裝置，係以 塗布有光阻之晶圓W為感光性基板亦即基板p來進行圖案 之轉印。 圖8係表示液晶顯示元件等液晶元件之製造步驟的流 ^ 程圖。如圖8所示，液晶元件之製造步驟中，係依序進行 圖案形成步驟（步驟S50)、濾色器形成步驟（步驟S52)、單 元組裝步驟（步驟S54)、以及模組組裝步驟（步驟S56)。 步驟S50之圖案形成步驟中，係使用上述實施形態之 投影曝光裝置，將電路圖案及電極圖案等既定圖案形成於 塗布有光阻之玻璃基板上作為基板Ρ»於該圖案形成步驟 中’包含曝光步驟，係使用上述實施形態之投影曝光裝置， 於光阻層進行圖案轉印；顯影步驟，進行轉印有圖案之基 板P的顯影亦即進行玻璃基板上之光阻層的顯影，以產生 23 200937138 透過該顯影後之 對應圖案形狀的光阻層；以及加工步驟 光阻層來進行玻璃基板表面之加工。 步驟S52之濾色器形成步驟中，係形成濾色器，其係 將多數個對應R(Red :紅）、G(Green :綠）、及寧ue :藍） 之3個點之組排列成陣列狀，或將複數個R、g' b之3條 條紋之濾色器之組排列於水平掃描方向。Fig. 4 is a view schematically showing an example of the configuration of the mirror elements SE among the plurality of mirror elements SE of the spatial light 3a. Further, Fig. 5 is a cross-sectional view taken along line AA of Fig. 4. 4 and 5, the mirror element se includes a susceptor 30, a pillar 31 on the limb base 30, a plate-like member 32 connected to the pillar 31 on the side opposite to the susceptor 3q side, and a plate-like member 32 formed on the slab member 32. The upper reflective film job surface 33 and the four electrodes 34a to 34d disposed around the support 31 on the susceptor 3Q. The ❹=piece 32 is inclined at two points orthogonal to each other on the plane parallel to the susceptor 30 with the joint portion with the base post 31 as a fulcrum. The electric mm is disposed at a position opposed to the four corner portions of the plate member 32, respectively. In this manner, by applying a potential to the electrode -d, static electricity is generated between each of the electrodes 34a to 34d and the plate member n, so that the plate member 32 between the electrodes 34a to 34d and the plate member 32 is strut 31. The variation is such that the inclined end of the reflecting surface 33 on the member 32 is inclined as a fulcrum, or is formed in a plate shape and the rotating surface of each reflecting mirror element is discretely rotated, and the rotating corner of the corner of 200937138 is in a plurality of states (for example, ... —2·5 degrees, —2 〇 degrees... degrees, + 〇.5 degrees.....+2·5 degrees,...) Switching control is better. Although Fig. 3 shows a mirror element SE having a square shape, the shape of the mirror element SE is not limited to a square. However, from the viewpoint of light use efficiency, it is also possible to have a shape in which the gap of the mirror element SE is reduced (a shape that can be most closely filled). Further, from the viewpoint of light use efficiency, the interval between the adjacent two mirror elements SE may be suppressed to the minimum necessary. In the present embodiment, as the spatial light modulator 3a, a spatial light modulator that changes the direction (or discrete) of the plurality of mirror elements SE arranged two-dimensionally is used. For such a spatial light modulator, for example, Japanese Patent Publication No. Hei 10-503300, and the corresponding European Patent Publication No. 779530, Japanese Patent Laid-Open No. 2004-78136, and the corresponding U.S. Patent No. 6,090,915 The space light modulator disclosed in Japanese Laid-Open Patent Publication No. 2006-524349, and the corresponding Japanese Patent No. 7,095,546, and Japanese Patent Laid-Open No. Hei. Here, reference is made to the European Patent Publication No. 77953 、, the U.S. Patent No. 69,915, and the U.S. Patent No. 7,095,546. The spatial light modulator 3a' changes the posture of the plurality of mirror elements se by the action of the driving unit 3c that is actuated by the control signal from the control unit CR, and each of the mirror elements SE is set in a predetermined direction. The plurality of mirror elements Se of the spatial light modulator 3a are respectively reflected at a predetermined angle, transmitted through the zoom optical system 4, and formed at a plurality of poles at or near the focus position of the rear focus position of the fly-eye lens 5. Light intensity distribution (optical intensity distribution) of 2 poles, 4 poles, etc., belts, and the like. This pupil intensity distribution, 200937138, is similar (isotropic) change by the action of the zoom optical system 4. That is, the zoom optical system 4 and the fly-eye lens 5 form a distribution of a predetermined light intensity distribution in the illumination pupil of the illumination optical system IL according to the light beam transmitted through the spatial light modulator 3a in the spatial light modulation unit 3. Optical system. Furthermore, another illumination pupil position optically lightly at the rear focus position of the fly-eye lens 5 or the illumination pupil in the vicinity thereof, that is, the pupil position of the field stop imaging optical system 8 and the aperture of the projection optical system P1 The position (position of the aperture stop AS) also forms a light intensity distribution corresponding to the pupil intensity distribution. In order to expose the pattern of the mask to the wafer W with high precision and faithfulness to the exposure apparatus, it is important to perform exposure, for example, under appropriate illumination conditions corresponding to the pattern characteristics of the mask. In the present embodiment, since the spatial light modulation unit 3 including the spatial light modulator 3a having a plurality of postures of the plurality of mirror elements SE is used, the aperture formed by the action of the spatial light modulator 3a can be formed. The intensity distribution changes freely and rapidly. However, the illumination light metering system IL of the present embodiment using the spatial light modulator 3a is generated from the upper side of the lattice mirror frame provided between the plurality of mirror elements SE arranged in a regular manner as will be described later. The diffracted light forms a diffraction interference fringe on the pupil plane of the illumination. As a result, due to the influence of the diffraction interference fringes, there is a case where it is difficult to form a desired pupil intensity distribution. Hereinafter, the generation and influence of the diffraction interference fringes of the spatial light modulator provided with the mirror frame will be described with reference to Fig. 6'. Fig. 6 is a cross-sectional view showing a typical configuration of a spatial light modulator provided with a mirror frame in a schematic manner. As shown in FIG. 6, in a typical configuration example of the mirror frame type space 15 200937138 optical modulator, a plurality of mirror elements Se are mounted on the susceptor BA through a hinge (not shown) at a plurality of mirror elements. A mirror frame FR is provided between the SEs. The mirror element SE has, for example, a square small reflecting surface' and is regularly arranged. For example, the upper surface of the reflection frame FR provided between the mirror elements SE (the upper surface FRa of the mirror frame FR in Fig. 6) has a lattice shape as a whole. At this time, when the light L41 (shown by a solid line in the drawing) is incident on the minute surface of the mirror frame fr, the reflected diffracted light L42 (indicated by a broken line in the figure) is generated from the upper surface of the mirror frame FR. Further, in Fig. 6, in order to simplify the illustration, only the incident light L41 incident on the upper side of the mirror frame FR at the left end is displayed, but the incident light L41 actually enters the entire spatial light modulator 3a at the same angle. At this time, the distance between the mirror elements SE and the wavelength of the light; I, the incident angle 0 光 of the light L41 incident on the upper side of the mirror frame FR, and the diffraction angle of the N times of the diffracted light from the upper side of the mirror frame FR are 0. Between N, the relationship shown by the following formula (1) will hold. Sin Θ sin θ 〇 = Νχ λ / Ρ (1) In this manner, in the illumination optical system IL of the present embodiment, the desired light reflected by the plurality of mirror elements SE is formed in the original illumination pupil. The light intensity distribution and the diffracted light of the unnecessary light generated from the upper surface of the mirror frame FR form a pupil intensity distribution formed by the light intensity distribution (diffraction interference fringe) of the illumination pupil. That is, in the illumination optical system IL of the present embodiment, if no special countermeasure is applied, the desired diffraction intensity distribution cannot be obtained due to the diffraction interference fringes formed by the diffracted light from the upper surface of the mirror frame FR 0 16 200937138 In the configuration example shown in Fig. 6, a mirror frame FR is provided between the plurality of mirror elements SE, and the upper surface of the mirror frame FR constitutes a diffracted light generating region in which diffracted light is generated around each of the plurality of mirror elements SE. Further, even in the configuration example in which the mirror frame is not provided, the light from the minute lattice-like gap of the plurality of mirror elements SE reaches the surface of the susceptor BA (the upper surface B Aa in the figure of the susceptor BA in Fig. 6). A diffracted light is generated or a diffraction fringe is formed in the illumination pupil. At this time, the lattice-like pedestal surface region ‘ corresponding to the minute gap of the plurality of mirror elements SE constitutes a diffracted light generating region that generates diffracted light around each of the plurality of mirror elements SE © . In the present embodiment, a region corresponding to the above-described diffracted light generating region in a light incident region other than the plurality of mirror elements, for example, a surface of the mirror frame or a surface of the pedestal or the like forms a diffusing surface. Therefore, the light incident on these surfaces diffuses to reduce the generation of the reflected diffracted light, and also reduces the influence of the diffracted light generated from the periphery of the plurality of mirror elements on the pupil intensity distribution. As a result, in the illumination optical system of the present embodiment, for example, the influence of the diffracted light generated around the plurality of minute mirror elements arranged in a regular manner can be suppressed to achieve the desired pupil intensity distribution. Further, in the exposure apparatus of the present embodiment, an illumination optical system that achieves a desired pupil intensity distribution by suppressing the influence of the diffracted light can perform good exposure under appropriate illumination conditions, for example, corresponding to the pattern characteristics of the mask. . However, the spatial light modulator of the type of the mirror frame may be reflected by the side of the mirror frame (the surface FRb of the mirror frame FR in FIG. 6 extending in the direction perpendicular to the figure). A situation in which a specific internal structural part is damaged. Furthermore, even a spatial light modulator of the type 17 200937138 in which the mirror frame is not provided has light which is incident from a small lattice-like gap of a plurality of mirror elements and is reflected by the surface of the base or the like, and is incident on the electrode. A situation in which a specific internal structural part is damaged. In the spatial light modulator of the present embodiment, the side surface of the mirror frame in the light incident region other than the plurality of mirror elements also forms a diffusion surface in the same manner as the upper surface of the mirror frame or the surface of the susceptor. Therefore, the light incident on the surface of the surface is diffused to reduce the light of the specific structure portion which is incident on the electrode. As a result, in the spatial light modulator of the present embodiment, the structure portion which is specific to the electrode is less likely to be damaged by the light irradiation, and the durability can be improved. Therefore, in the illumination optical system of the present embodiment, the spatial intensity modulator having high durability can be used to stably achieve the desired pupil intensity distribution. Further, in the exposure apparatus of the present embodiment, the illumination optical system which stably realizes the desired pupil intensity distribution can perform good exposure under appropriate illumination conditions, for example, corresponding to the pattern characteristics of the mask. Further, in the present embodiment, since the diffusion surface is formed in a desired region by, for example, an etching method (a method of rough processing as appropriate), there is a case where it is not necessary to expose the spatial light modulator to a high temperature environment when forming the diffusion surface. advantage. Since the intensity of the reflected diffracted light depends on the reflectance of the reflecting surface, the reflection preventing film is applied to the upper surface of the mirror frame or the surface of the susceptor, and the generation of the reflected diffracted light can be reduced. However, at this time, there is a problem that it is necessary to expose the spatial light modulator to a high temperature environment when forming the reflection preventing film, and it is not preferable from the viewpoint of ensuring the desired accuracy. Further, in the present embodiment, the 200937138 diffusion surface which diffuses the incident light according to the predetermined directivity is formed on the upper surface of the mirror frame or the surface of the pedestal such as the diffraction optical surface, and most of the light is not required after the diffusion. Directing the illumination out of the light path' further reduces the effect of the diffracted light generated from the periphery of the plurality of tiny mirror elements on the pupil intensity distribution. Or, directing the light diffused from the diffractive optical surface according to the predetermined directivity toward a predetermined area on the illumination pupil plane (for example, a smaller area centered on the optical axis), since the diffused light contributes to the pupil intensity distribution. It is formed so that it can be effectively used without the need for light. Further, in the present embodiment, a diffusing surface such as a diffractive optical surface is formed on the side surface of the mirror frame or the surface of the susceptor, and the path of the diffused light is controlled according to the predetermined directivity, whereby the specificity of the incident electrode can be further reduced. The light of the structure. In other words, by the action of the diffractive optical surface formed on the side surface of the mirror frame or the surface of the susceptor, the diffused light may not be incident on the specific structure portion in accordance with the predetermined directivity. Further, in the above description, as the 稜鏡 member having the optical surface facing the plane in which the plurality of mirror elements of the spatial light modulator 33 are arranged, a ruler 3be integrally formed of one optical block body is used. It is not limited thereto, and a pair of crucibles may be used to constitute a crucible member having the same function as K稜鏡3b. Again, by! A parallel flat plate and a pair of triangular cymbals may be formed of a cymbal member having the same function as the K 稜鏡 3b. Further, the assembled optical element having the same function as the ruler 3b may be constituted by one parallel plane plate and a pair of plane mirrors. Further, in the above description, as a spatial light modulator having a plurality of optical elements which are two-dimensionally arranged and individually controlled, a spatial light tone which can individually control the direction (angle: tilt) of a plurality of two-dimensionally arranged reflecting surfaces is used. Transformer. However, it is not limited thereto, and a spatial light modulator which can individually control the height (position) of a plurality of reflecting surfaces of the two-dimensional array can be used. For the spatial light modulator, the spatial light modulator disclosed below can be used, for example, in Japanese Laid-Open Patent Publication No. Hei. No. Hei. 6-281869, and the corresponding Japanese Patent No. 5,312,513, and Japanese Patent Publication No. 2004-52. U.S. Patent No. 618 and U.S. Patent No. 6,885,493, the disclosure of which is incorporated herein by reference. In the spatial light modulators, the same effect as the diffraction surface can be supplied to the incident light by forming a two-dimensional height distribution '. In addition, the spatial light modulator having the plurality of reflective surfaces of the two-dimensional array described above can also be modified in accordance with the publication disclosed below, for example, as disclosed in Japanese Laid-Open Patent Publication No. 2006-513442 and the corresponding US Patent No. Japanese Laid-Open Patent Publication No. 2005-0095749, and Japanese Patent Publication No. 2005-0095749. Further, in the above description, a reflective spatial light modulator having a plurality of mirror elements is used. However, the present invention is not limited thereto, and a transmissive spatial light modulator disclosed in, for example, U.S. Patent No. 5,229,792 may be used. Hereby, reference is made to U.S. Patent No. 5, 312, 513, U.S. Patent No. 6,885, 493, U.S. Patent No. 6,891, 655, U.S. Patent Publication No. 2005/0095749, and U.S. Patent No. 5,228,872. In addition, in the above embodiment, when the spatial light modulation unit is used to form the pupil intensity distribution, the pupil intensity distribution device may be used to measure the pupil intensity distribution, and the spatial light modulation unit is controlled according to the measurement result. Space light modulator. Such a technique is disclosed, for example, in Japanese Laid-Open Patent Publication No. 2006-54328, or Japanese Patent Laid-Open No. Hei. No. Hei. Hereby, reference is made to U.S. Patent Application Serial No. 2003/003, the disclosure of which is incorporated herein by reference. Further, in the above embodiment, a variable pattern forming device that forms a predetermined pattern based on predetermined electronic data may be used instead of the photomask. If such a variable pattern forming device is used, the effect of the synchronization accuracy can be minimized even if the pattern is vertically positioned. Further, the variable pattern forming device may use, for example, a DMD (Digital Micro-Mirror Device) including a plurality of reflection elements driven in accordance with a predetermined electronic material. An exposure apparatus using a DMD is disclosed, for example, in Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. Further, in addition to a non-light-emitting reflective spatial light modulator such as a DMD, a transmissive spatial light modulator may be used, or a self-luminous image display element may be used. Further, even in the case where the pattern surface is horizontal, a variable pattern forming device can be used. U.S. Patent Publication No. 2007/0296936 is incorporated herein by reference. Further, in the above embodiment, the optical integrator uses the fly-eye lens 5, but an internal reflection type optical integrator (typically a rod integrator) may be used instead. At this time, the condensing lens i is disposed on the rear side of the zoom optical system 4 such that its front side focus position coincides with the rear side focus position of the zoom optical system 4, and a rod integrator is disposed at or near the rear focus position of the condensing lens to Position the incident end. At this time, the exit end of the rod integrator becomes the position of the luminous field of view light $7. When a rod integrator is used, a position in the field-of-view aperture imaging optical system 8 downstream of the rod integrator that is optically conjugate with the position of the aperture 彳 阑 AS of the projection optical system pL may be referred to as an illumination aperture. 21 200937138 Noodles. Further, since the virtual image of the secondary light source of the illumination pupil plane is formed at the position of the incident surface of the rod integrator, the position and the position optically conjugate with the position can also be referred to as an illumination pupil plane. Here, the zoom optical system 4 and the condensing lens may be regarded as a collecting optical system disposed in an optical path between the optical integrator and the spatial light modulator, the zoom optical system 4, the condensing lens, and the rod shape. The integrator can be viewed as a distributed optical system. The exposure apparatus of the above-described embodiment is manufactured by assembling various sub-systems including the respective constituent elements exemplified in the scope of the present application, and capable of maintaining predetermined mechanical precision, electrical precision, and optical precision. In order to ensure these various precisions, various optical systems are used to adjust the optical precision before and after the assembly, to adjust the mechanical precision for various mechanical systems, and to achieve electrical precision for various electrical systems. Adjustment. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection of various subsystems, wiring connection of circuits, piping connection of pneumatic circuits, and the like. Of course, before the assembly process of various subsystems to the exposure device, there are individual assembly processes for each system. After the assembly process of various subsystems to the exposure device is completed, comprehensive adjustment is performed to ensure various precisions of the exposure device. In addition, the exposure device can be manufactured in a clean room where temperature and cleanliness are managed. . Next, a method of manufacturing an element using the exposure apparatus of the above embodiment will be described. Fig. 7 is a flow chart showing the manufacturing steps of the semiconductor element. As shown in FIG. 7, in the manufacturing process of the semiconductor device, a metal film is deposited on the wafer w constituting the substrate of the semiconductor element (step S4), and a photoresist of the photosensitive material is applied to the vapor-deposited layer. On the metal film (step S42), 22 200937138, using the projection exposure apparatus of the above embodiment, the pattern formed on the mask (reticle) M is transferred to each of the irradiation regions on the wafer W (step S44: exposure) Step), and development of the wafer w after the transfer is completed, that is, development of the photoresist to which the pattern is transferred (step S46: development step). Thereafter, the surface of the wafer w is etched by the mask by the photoresist pattern generated on the surface of the wafer w in step S46 (step S48: processing step). Here, the photoresist pattern refers to a photoresist layer which produces irregularities corresponding to the shape of the pattern transferred by the shirt exposure apparatus of the above-described embodiment, and which is recessed through the photoresist layer. In step S48, the surface of the wafer W is processed through the photoresist pattern. The processing performed in the step S48 includes, for example, at least one of the etching of the surface of the wafer W or the film formation of the metal film or the like. Further, in the step S44, the projection exposure apparatus of the above-described embodiment transfers the pattern by using the wafer W to which the photoresist is applied as the substrate p which is a photosensitive substrate. Fig. 8 is a flow chart showing a manufacturing procedure of a liquid crystal element such as a liquid crystal display element. As shown in FIG. 8, in the manufacturing step of the liquid crystal element, the pattern forming step (step S50), the color filter forming step (step S52), the unit assembling step (step S54), and the module assembling step (step) are sequentially performed. S56). In the pattern forming step of the step S50, a predetermined pattern such as a circuit pattern and an electrode pattern is formed on a glass substrate coated with a photoresist as a substrate 投影 in the pattern forming step of the embodiment, and the exposure is included in the pattern forming step. The step of performing pattern transfer on the photoresist layer by using the projection exposure apparatus of the above embodiment; and developing the substrate P on which the pattern is transferred, that is, developing the photoresist layer on the glass substrate to produce 23 200937138 The surface of the glass substrate is processed by the photoresist layer corresponding to the pattern shape after the development; and the photoresist layer of the processing step. In the color filter forming step of step S52, a color filter is formed which arranges a plurality of groups of three points corresponding to R (Red: red), G (Green: green), and Ning: blue: Array-like, or a group of a plurality of color strips of three stripes of R, g'b arranged in a horizontal scanning direction.
步驟S54之單το組裝步驟中，係使用藉由步驟S5〇形 成有既定圖案之玻璃基板與藉由步驟S52所形成之濾色器 來組裝液晶面板（液晶單元）。具體而言，例如係將液晶注入 玻璃基板與濾色器之間，藉此形成液晶面板。步驟S56之 模組組裝步驟中，係對藉由步驟S54所組裝之液晶面板安 裝使該液晶面板進行顯示動作之電氣電路及背光等各種零 件。 又，本發明並不限於應用在半導體元件製造用之曝光 裝置，亦可廣泛應用於例如形成於方形玻璃板之液晶顯示 元件或電漿顯示器等顯示裝置用的曝光裝置、或用以製造 攝影元件（CCD等）、微型裝置、薄膜磁頭、以及DNA晶片 〇 等各種元件的曝光裝置。此外，本發明亦可應用於使用光 微影步驟來製造形成有各種元件之光罩圖案之光罩（光罩、 標線片等）時的曝光步驟（曝光裝置）。 此外，上述實施形態中’可使用ArF準分子雷射光（波 # 長：193nm)或KrF準分子雷射光（波長：248 nm)作為曝光用 光。又，並不限於此，對其他適當之雷射光源，例如供應 波長為157nm之雷射光的F2.射光源等亦可應用本發明。 24 200937138 又，在上述實施形態中，亦能適用所謂的液浸法以 具有較1.1大之折射率之介質（典型為液體）充滿投影光學系 統與感光性基板間之光路中之方法。此時，作為於投影光 學系統與感光性基板間之光路中充滿液體之方法，能採用 揭示於國際公開第W〇99/495〇4號小冊子之局部充滿液體 之方法、或揭示於日本特開平6_ 124873號公報之在液槽 中使保持曝光對象之基板之載台移動之方法、或揭示於曰 本特開平10— 3031 14號公報之於載台上形成既定深度之液 © 體槽，於其中保持基板之方法等。此處，援引國際公開第 WO99/49504號小冊子、日本特開平6_ 124873號公報及日 本特開平10— 3031 14號公報以作為參照。 又’在上述之實施形態中，亦能適用揭示於美國專利 公開第2006/0170901號公報及美國專利公開第 2007/0146676號公報之所謂偏光照明方法。此處，援引美 國專利公開第2006/0170901號公報及美國專利公開第 2007/0146676號公報以作為參照。 又’上述實施形態中，雖在曝光裝置中對照明光罩之 照明光學系統應用本發明，但並不限於此，對照明光罩以 外之被照射面的一般照明光學系統亦可應用本發明。 【圖式簡單說明】 圖1係概略顯示本發明實施形態之曝光裝置之構成的 圖。 圖2係概略顯示空間光調變單元及變焦光學系統之構 成的圖。 25 200937138 ® 3係空間光調變單元所具備之空間光調冑器的部分 立艎圖。 圖4係概略顯示空間光調變器之複數個反射鏡元件之 中之1個反射鏡元件之構成例的圖。 圖5係圖4之AA，截面圖。 圖6係以示意方式顯示設有反射鏡框之空間光調變器 之典型構成的截面圖。 圖7係顯示半導體元件之製程的流程圖。 圖圖8係顯不液晶顯示元件等之液晶元件之製程的流程❹ 【主要元件符號說明】 1 光源 2 光束送光部 3 空間光調變單元 3a 空間光調變器 3b K稜鏡 3c 驅動部 4 變焦光學系統 5 複眼透鏡 6 聚光光學系統 7 照明視野光闌（光罩遮板） 8 視野光闌成像光學系統 IL 照明光學系統 CR控制部 26 200937138 Μ 光罩 PL 投影光學系統 W 晶圓In the assembly step of step S54, the liquid crystal panel (liquid crystal cell) is assembled by using the glass substrate having the predetermined pattern formed in step S5 and the color filter formed in step S52. Specifically, for example, liquid crystal is injected between the glass substrate and the color filter, thereby forming a liquid crystal panel. In the module assembly step of the step S56, the liquid crystal panel assembled in the step S54 is mounted with various components such as an electric circuit and a backlight for causing the liquid crystal panel to display. Further, the present invention is not limited to application to an exposure apparatus for manufacturing a semiconductor element, and can be widely applied to, for example, an exposure apparatus for a display device such as a liquid crystal display element or a plasma display formed on a square glass plate, or for manufacturing a photographic element. Exposure devices for various components such as (CCD, etc.), micro devices, thin film magnetic heads, and DNA wafer cassettes. Further, the present invention is also applicable to an exposure step (exposure device) when a photomask (photomask, reticle, etc.) in which a mask pattern of various elements is formed is produced using a photolithography step. Further, in the above embodiment, ArF excimer laser light (wave length: 193 nm) or KrF excimer laser light (wavelength: 248 nm) can be used as the light for exposure. Further, the present invention is not limited thereto, and the present invention can also be applied to other suitable laser light sources such as an F2.light source that supplies laser light having a wavelength of 157 nm. Further, in the above embodiment, a so-called liquid immersion method can be applied to a method in which a medium (typically a liquid) having a refractive index of 1.1 is filled in the optical path between the projection optical system and the photosensitive substrate. In this case, as a method of filling the optical path between the projection optical system and the photosensitive substrate, a method of partially filling the liquid disclosed in the pamphlet of International Publication No. WO99/495〇4, or disclosed in Japanese Patent Laid-Open In the method of moving the stage of the substrate to be exposed in the liquid bath in the liquid bath, or in the liquid-body groove of the predetermined depth on the stage of the Japanese Patent Publication No. 10-3031, A method in which a substrate is held, and the like. Japanese Patent Publication No. WO99/49504, Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. Further, in the above-described embodiment, a so-called polarized illumination method disclosed in U.S. Patent Publication No. 2006/0170901 and U.S. Patent Publication No. 2007/0146676 is also applicable. Here, reference is made to U.S. Patent Publication No. 2006/0170901 and U.S. Patent Publication No. 2007/0146676. Further, in the above embodiment, the present invention is applied to the illumination optical system of the illumination mask in the exposure apparatus. However, the present invention is not limited thereto, and the present invention can also be applied to a general illumination optical system other than the illumination mask. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view schematically showing the configuration of an exposure apparatus according to an embodiment of the present invention. Fig. 2 is a view schematically showing the configuration of a spatial light modulation unit and a zoom optical system. 25 Part of the 200937138 ® 3 Series Spatial Light Modulation Unit with a spatial light modulator. Fig. 4 is a view schematically showing an example of the configuration of one of a plurality of mirror elements of a spatial light modulator. Figure 5 is a cross-sectional view taken along line AA of Figure 4. Fig. 6 is a cross-sectional view showing a typical configuration of a spatial light modulator provided with a mirror frame in a schematic manner. Fig. 7 is a flow chart showing the process of the semiconductor element. Fig. 8 is a flow chart showing the process of liquid crystal elements such as liquid crystal display elements. [Main element symbol description] 1 Light source 2 Beam light transmitting unit 3 Space light modulation unit 3a Space light modulator 3b K稜鏡3c Driving unit 4 Zoom optical system 5 Compound eye lens 6 Converging optical system 7 Illuminated field of view diaphragm (mask mask) 8 Field of view diaphragm imaging optical system IL Illumination optical system CR control unit 26 200937138 Μ Photomask PL projection optical system W Wafer
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