JP2006120675A5 - - Google Patents

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Publication number
JP2006120675A5
JP2006120675A5 JP2004303902A JP2004303902A JP2006120675A5 JP 2006120675 A5 JP2006120675 A5 JP 2006120675A5 JP 2004303902 A JP2004303902 A JP 2004303902A JP 2004303902 A JP2004303902 A JP 2004303902A JP 2006120675 A5 JP2006120675 A5 JP 2006120675A5
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JP
Japan
Prior art keywords
optical
prism
illumination
light
illumination optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004303902A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006120675A (ja
JP4535260B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2004303902A external-priority patent/JP4535260B2/ja
Priority to JP2004303902A priority Critical patent/JP4535260B2/ja
Priority to EP05793150A priority patent/EP1811544A4/en
Priority to CNB2005800281803A priority patent/CN100536071C/zh
Priority to PCT/JP2005/018809 priority patent/WO2006043458A1/ja
Priority to HK07109311.6A priority patent/HK1101221B/xx
Priority to US11/665,669 priority patent/US8004658B2/en
Publication of JP2006120675A publication Critical patent/JP2006120675A/ja
Priority to KR1020077002542A priority patent/KR101391384B1/ko
Publication of JP2006120675A5 publication Critical patent/JP2006120675A5/ja
Publication of JP4535260B2 publication Critical patent/JP4535260B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004303902A 2004-10-19 2004-10-19 照明光学装置、露光装置、および露光方法 Expired - Fee Related JP4535260B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2004303902A JP4535260B2 (ja) 2004-10-19 2004-10-19 照明光学装置、露光装置、および露光方法
HK07109311.6A HK1101221B (en) 2004-10-19 2005-10-12 Lighting optical device, exposure system, and exposure method
CNB2005800281803A CN100536071C (zh) 2004-10-19 2005-10-12 照明光学装置、曝光装置和曝光方法
PCT/JP2005/018809 WO2006043458A1 (ja) 2004-10-19 2005-10-12 照明光学装置、露光装置、および露光方法
EP05793150A EP1811544A4 (en) 2004-10-19 2005-10-12 OPTICAL LIGHTING DEVICE, EXPOSURE SYSTEM, AND EXPOSURE METHOD
US11/665,669 US8004658B2 (en) 2004-10-19 2005-10-12 Lighting optical device, exposure system, and exposure method
KR1020077002542A KR101391384B1 (ko) 2004-10-19 2007-01-31 조명 광학 장치, 노광 장치 및 노광 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004303902A JP4535260B2 (ja) 2004-10-19 2004-10-19 照明光学装置、露光装置、および露光方法

Publications (3)

Publication Number Publication Date
JP2006120675A JP2006120675A (ja) 2006-05-11
JP2006120675A5 true JP2006120675A5 (enExample) 2008-10-30
JP4535260B2 JP4535260B2 (ja) 2010-09-01

Family

ID=36202874

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004303902A Expired - Fee Related JP4535260B2 (ja) 2004-10-19 2004-10-19 照明光学装置、露光装置、および露光方法

Country Status (6)

Country Link
US (1) US8004658B2 (enExample)
EP (1) EP1811544A4 (enExample)
JP (1) JP4535260B2 (enExample)
KR (1) KR101391384B1 (enExample)
CN (1) CN100536071C (enExample)
WO (1) WO2006043458A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101320216B (zh) * 2008-06-18 2010-06-09 上海微电子装备有限公司 一种微光刻照明光瞳的整形结构
JP2010109242A (ja) * 2008-10-31 2010-05-13 Canon Inc 照明光学系及び露光装置
CN102495536B (zh) * 2011-12-30 2015-08-05 上海集成电路研发中心有限公司 光刻机
CN103293863B (zh) * 2012-02-24 2015-11-18 上海微电子装备有限公司 一种光刻照明系统
CN102937778B (zh) * 2012-11-20 2015-04-22 北京理工大学 一种确定光刻照明系统中各元件之间匹配关系的方法
JP2014145982A (ja) * 2013-01-30 2014-08-14 Toshiba Corp 光学装置、固体撮像装置及び光学装置の製造方法
JP6168822B2 (ja) * 2013-04-04 2017-07-26 オリンパス株式会社 パターン照射装置
CN103399414B (zh) * 2013-07-22 2016-04-13 中国科学院上海光学精密机械研究所 消除衍射光学元件零级衍射光斑的方法
CN104154495B (zh) * 2014-05-20 2017-12-15 广州市浩洋电子股份有限公司 混合型光学积分器组件及其光学系统
JP6840540B2 (ja) 2014-11-14 2021-03-10 株式会社ニコン 造形装置
EP3219411B1 (en) 2014-11-14 2020-08-19 Nikon Corporation Shaping device and shaping method
JP6881472B2 (ja) * 2016-12-28 2021-06-02 大日本印刷株式会社 照明装置
EP3610971A4 (en) 2017-03-31 2021-02-17 Nikon Corporation PROCESSING METHOD AND PROCESSING SYSTEM
WO2018181334A1 (ja) 2017-03-31 2018-10-04 株式会社ニコン 造形システム及び造形方法
JP7538016B2 (ja) * 2020-11-30 2024-08-21 株式会社Ｓｃｒｅｅｎホールディングス 光学装置および３次元造形装置
US11300524B1 (en) * 2021-01-06 2022-04-12 Kla Corporation Pupil-plane beam scanning for metrology

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69132120T2 (de) 1990-11-15 2000-09-21 Nikon Corp., Tokio/Tokyo Verfahren und Vorrichtung zur Projektionsbelichtung
JP3200894B2 (ja) 1991-03-05 2001-08-20 株式会社日立製作所 露光方法及びその装置
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
DE4301574B4 (de) 1993-01-21 2004-07-08 Bernhard Prof. Dr. Lau Vorrichtung zur Beobachtung des Augenhintergrundes, insbesondere Ophthalmoskop
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
JPH08203801A (ja) * 1995-01-23 1996-08-09 Nikon Corp 投影露光装置
JP3426087B2 (ja) * 1996-06-10 2003-07-14 シャープ株式会社 光学式記録再生装置
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
JP2001338861A (ja) * 2000-05-26 2001-12-07 Nikon Corp 照明光学装置並びに露光装置及び方法
US6741394B1 (en) 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP2001176766A (ja) * 1998-10-29 2001-06-29 Nikon Corp 照明装置及び投影露光装置
US6563567B1 (en) 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
DE10062579A1 (de) 1999-12-15 2001-06-21 Nikon Corp Optischer Integrierer,optische Beleuchtungseinrichtung, Photolithographie-Belichtungseinrichtung,und Beobachtungseinrichtung
JP4545874B2 (ja) * 2000-04-03 2010-09-15 キヤノン株式会社 照明光学系、および該照明光学系を備えた露光装置と該露光装置によるデバイスの製造方法
JP2002158157A (ja) * 2000-11-17 2002-05-31 Nikon Corp 照明光学装置および露光装置並びにマイクロデバイスの製造方法
EP1434092A1 (en) 2002-12-23 2004-06-30 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7030966B2 (en) * 2003-02-11 2006-04-18 Asml Netherlands B.V. Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations
WO2005071474A2 (en) * 2004-01-20 2005-08-04 Sharp Kabushiki Kaisha Directional backlight and multiple view display device
JP2005243904A (ja) * 2004-02-26 2005-09-08 Nikon Corp 照明光学装置、露光装置及び露光方法
DE102004040535A1 (de) 2004-08-20 2006-02-23 Carl Zeiss Ag Polarisationsselektiv geblazetes diffraktives optisches Element

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