JP2005294706A5 - - Google Patents

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Publication number
JP2005294706A5
JP2005294706A5 JP2004110338A JP2004110338A JP2005294706A5 JP 2005294706 A5 JP2005294706 A5 JP 2005294706A5 JP 2004110338 A JP2004110338 A JP 2004110338A JP 2004110338 A JP2004110338 A JP 2004110338A JP 2005294706 A5 JP2005294706 A5 JP 2005294706A5
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JP
Japan
Prior art keywords
light
optical system
illumination optical
light source
branching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004110338A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005294706A (ja
JP4332460B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004110338A priority Critical patent/JP4332460B2/ja
Priority claimed from JP2004110338A external-priority patent/JP4332460B2/ja
Priority to US11/095,889 priority patent/US7126673B2/en
Publication of JP2005294706A publication Critical patent/JP2005294706A/ja
Publication of JP2005294706A5 publication Critical patent/JP2005294706A5/ja
Application granted granted Critical
Publication of JP4332460B2 publication Critical patent/JP4332460B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004110338A 2004-04-02 2004-04-02 照明光学系及び当該照明光学系を有する露光装置 Expired - Fee Related JP4332460B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004110338A JP4332460B2 (ja) 2004-04-02 2004-04-02 照明光学系及び当該照明光学系を有する露光装置
US11/095,889 US7126673B2 (en) 2004-04-02 2005-03-31 Illumination optical system and exposure apparatus having the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004110338A JP4332460B2 (ja) 2004-04-02 2004-04-02 照明光学系及び当該照明光学系を有する露光装置

Publications (3)

Publication Number Publication Date
JP2005294706A JP2005294706A (ja) 2005-10-20
JP2005294706A5 true JP2005294706A5 (enExample) 2007-05-24
JP4332460B2 JP4332460B2 (ja) 2009-09-16

Family

ID=35053894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004110338A Expired - Fee Related JP4332460B2 (ja) 2004-04-02 2004-04-02 照明光学系及び当該照明光学系を有する露光装置

Country Status (2)

Country Link
US (1) US7126673B2 (enExample)
JP (1) JP4332460B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1910522B (zh) 2004-01-16 2010-05-26 卡尔蔡司Smt股份公司 偏振调制光学元件
US8270077B2 (en) * 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US7324280B2 (en) 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
US7414409B1 (en) * 2005-08-19 2008-08-19 Vladimir Faifer Non-contact method and apparatus for measurement of leakage current of p-n junctions in IC product wafers
JP5032972B2 (ja) * 2007-12-28 2012-09-26 キヤノン株式会社 計算機ホログラム、生成方法及び露光装置
US8531747B2 (en) * 2009-06-24 2013-09-10 Canon Kabushiki Kaisha Hologram, hologram data generation method, and exposure apparatus
US9116303B2 (en) * 2010-03-05 2015-08-25 Canon Kabushiki Kaisha Hologram with cells to control phase in two polarization directions and exposure apparatus
KR102219069B1 (ko) 2013-06-18 2021-02-23 에이에스엠엘 네델란즈 비.브이. 리소그래피 방법 및 시스템
TWI676083B (zh) * 2013-09-25 2019-11-01 荷蘭商Ａｓｍｌ荷蘭公司 光束傳遞裝置及方法
JP6743372B2 (ja) * 2015-11-19 2020-08-19 大日本印刷株式会社 光広角照射装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3451604B2 (ja) * 1994-06-17 2003-09-29 株式会社ニコン 走査型露光装置
JPH1070064A (ja) * 1996-08-27 1998-03-10 Nikon Corp 投影露光装置
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
JP2000277413A (ja) 1999-03-24 2000-10-06 Canon Inc 露光量制御方法、露光装置およびデバイス製造方法
JP3710321B2 (ja) * 1999-04-01 2005-10-26 キヤノン株式会社 露光量制御方法、露光装置およびデバイス製造方法
DE10010131A1 (de) * 2000-03-03 2001-09-06 Zeiss Carl Mikrolithographie - Projektionsbelichtung mit tangentialer Polarisartion

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