JP2006032750A - 液浸型投影露光装置、及びデバイス製造方法 - Google Patents

液浸型投影露光装置、及びデバイス製造方法 Download PDF

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Publication number
JP2006032750A
JP2006032750A JP2004211031A JP2004211031A JP2006032750A JP 2006032750 A JP2006032750 A JP 2006032750A JP 2004211031 A JP2004211031 A JP 2004211031A JP 2004211031 A JP2004211031 A JP 2004211031A JP 2006032750 A JP2006032750 A JP 2006032750A
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JP
Japan
Prior art keywords
exposure apparatus
immersion
agent
cleaning
immersion agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004211031A
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English (en)
Japanese (ja)
Other versions
JP2006032750A5 (enExample
Inventor
Hirohisa Ota
裕久 太田
Atsushi Kitaoka
厚志 北岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004211031A priority Critical patent/JP2006032750A/ja
Publication of JP2006032750A publication Critical patent/JP2006032750A/ja
Publication of JP2006032750A5 publication Critical patent/JP2006032750A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004211031A 2004-07-20 2004-07-20 液浸型投影露光装置、及びデバイス製造方法 Pending JP2006032750A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004211031A JP2006032750A (ja) 2004-07-20 2004-07-20 液浸型投影露光装置、及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004211031A JP2006032750A (ja) 2004-07-20 2004-07-20 液浸型投影露光装置、及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006032750A true JP2006032750A (ja) 2006-02-02
JP2006032750A5 JP2006032750A5 (enExample) 2007-09-06

Family

ID=35898712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004211031A Pending JP2006032750A (ja) 2004-07-20 2004-07-20 液浸型投影露光装置、及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2006032750A (enExample)

Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006073951A (ja) * 2004-09-06 2006-03-16 Toshiba Corp 液浸光学装置及び洗浄方法
WO2006062065A1 (ja) * 2004-12-06 2006-06-15 Nikon Corporation メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
WO2007135990A1 (ja) * 2006-05-18 2007-11-29 Nikon Corporation 露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
WO2007136089A1 (ja) * 2006-05-23 2007-11-29 Nikon Corporation メンテナンス方法、露光方法及び装置、並びにデバイス製造方法
JP2007318129A (ja) * 2006-05-22 2007-12-06 Asml Netherlands Bv リソグラフィ装置およびリソグラフィ装置洗浄方法
WO2008001871A1 (en) * 2006-06-30 2008-01-03 Nikon Corporation Maintenance method, exposure method and apparatus and device manufacturing method
WO2008026593A1 (en) * 2006-08-30 2008-03-06 Nikon Corporation Exposure apparatus, device production method, cleaning method, and cleaning member
JP2008277819A (ja) * 2007-05-04 2008-11-13 Asml Netherlands Bv クリーニングデバイス、リソグラフィ装置およびリソグラフィ装置のクリーニング方法
WO2008146819A1 (ja) * 2007-05-28 2008-12-04 Nikon Corporation 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
JP2009016421A (ja) * 2007-07-02 2009-01-22 Nikon Corp 露光装置、デバイス製造方法、及びクリーニング方法
JP2009088509A (ja) * 2007-09-27 2009-04-23 Asml Netherlands Bv リソグラフィ装置およびリソグラフィ装置を清浄する方法
JPWO2008029884A1 (ja) * 2006-09-08 2010-01-21 株式会社ニコン クリーニング用部材、クリーニング方法、並びにデバイス製造方法
WO2011046174A1 (ja) * 2009-10-14 2011-04-21 株式会社ニコン 露光装置、露光方法、メンテナンス方法、及びデバイス製造方法
JP2011124569A (ja) * 2009-12-02 2011-06-23 Asml Netherlands Bv リソグラフィ装置および表面洗浄方法
US8011377B2 (en) 2007-05-04 2011-09-06 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
JP2012134512A (ja) * 2004-06-21 2012-07-12 Nikon Corp 露光装置、及びその部材の洗浄方法、露光装置のメンテナンス方法、メンテナンス機器、並びにデバイス製造方法
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8947629B2 (en) 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US10175585B2 (en) 2008-04-24 2019-01-08 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
US10451973B2 (en) 2005-05-03 2019-10-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US10495980B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Citations (5)

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JP2005012195A (ja) * 2003-05-23 2005-01-13 Nikon Corp 露光装置、並びにデバイス製造方法
JP2005136404A (ja) * 2003-10-15 2005-05-26 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法
WO2005122218A1 (ja) * 2004-06-09 2005-12-22 Nikon Corporation 露光装置及びデバイス製造方法
JP2006523031A (ja) * 2003-04-11 2006-10-05 株式会社ニコン 液浸リソグラフィにおける光学素子の洗浄方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006523031A (ja) * 2003-04-11 2006-10-05 株式会社ニコン 液浸リソグラフィにおける光学素子の洗浄方法
JP2005012195A (ja) * 2003-05-23 2005-01-13 Nikon Corp 露光装置、並びにデバイス製造方法
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法
JP2005136404A (ja) * 2003-10-15 2005-05-26 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
WO2005122218A1 (ja) * 2004-06-09 2005-12-22 Nikon Corporation 露光装置及びデバイス製造方法

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US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
JP2012134512A (ja) * 2004-06-21 2012-07-12 Nikon Corp 露光装置、及びその部材の洗浄方法、露光装置のメンテナンス方法、メンテナンス機器、並びにデバイス製造方法
US8174669B2 (en) 2004-09-06 2012-05-08 Kabushiki Kaisha Toshiba Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor device
JP2006073951A (ja) * 2004-09-06 2006-03-16 Toshiba Corp 液浸光学装置及び洗浄方法
JP2014033224A (ja) * 2004-12-06 2014-02-20 Nikon Corp メンテナンス方法、露光装置、及びデバイス製造方法
US8456608B2 (en) 2004-12-06 2013-06-04 Nikon Corporation Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
WO2006062065A1 (ja) * 2004-12-06 2006-06-15 Nikon Corporation メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
JP2010171453A (ja) * 2004-12-06 2010-08-05 Nikon Corp メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
US7804576B2 (en) 2004-12-06 2010-09-28 Nikon Corporation Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
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US8891055B2 (en) 2004-12-06 2014-11-18 Nikon Corporation Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
JP2012044204A (ja) * 2004-12-06 2012-03-01 Nikon Corp メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
JP4784513B2 (ja) * 2004-12-06 2011-10-05 株式会社ニコン メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
US10495981B2 (en) 2005-03-04 2019-12-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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