JP2006024706A5 - - Google Patents

Download PDF

Info

Publication number
JP2006024706A5
JP2006024706A5 JP2004200917A JP2004200917A JP2006024706A5 JP 2006024706 A5 JP2006024706 A5 JP 2006024706A5 JP 2004200917 A JP2004200917 A JP 2004200917A JP 2004200917 A JP2004200917 A JP 2004200917A JP 2006024706 A5 JP2006024706 A5 JP 2006024706A5
Authority
JP
Japan
Prior art keywords
optical surface
substrate
protection member
exposure apparatus
surface protection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004200917A
Other languages
Japanese (ja)
Other versions
JP4444743B2 (en
JP2006024706A (en
Filing date
Publication date
Application filed filed Critical
Priority to JP2004200917A priority Critical patent/JP4444743B2/en
Priority claimed from JP2004200917A external-priority patent/JP4444743B2/en
Publication of JP2006024706A publication Critical patent/JP2006024706A/en
Publication of JP2006024706A5 publication Critical patent/JP2006024706A5/ja
Application granted granted Critical
Publication of JP4444743B2 publication Critical patent/JP4444743B2/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (14)

光源からの光でレチクルを照明する照明光学系と、 前記レチクルのパターンを基板上に投影する投影光学系とを備え、 前記投影光学系の最も前記基板近くに配置された光学素子と前記基板との間隙に充填された液浸剤を介して、前記パターンで前記基板を露光する露光装置であって、
前記光学素子の光学面を保護するための光学面保護部材と、
該光学面保護部材を前記投影光学系に着脱する保護部材着脱機構とを有することを特徴とする露光装置。 An illumination optical system that illuminates a reticle with light from a light source; and a projection optical system that projects a pattern of the reticle onto a substrate; an optical element disposed closest to the substrate of the projection optical system; and the substrate; An exposure apparatus that exposes the substrate with the pattern via an immersion agent filled in a gap between
An optical surface protection member for protecting the optical surface of the optical element;
An exposure apparatus comprising: a protective member attaching / detaching mechanism for attaching / detaching the optical surface protecting member to / from the projection optical system. 前記基板を駆動する基板駆動系を有し、前記保護部材着脱機構が前記基板駆動系に設けられていることを特徴とする請求項１に記載の露光装置。   The exposure apparatus according to claim 1, further comprising a substrate driving system that drives the substrate, wherein the protective member attaching / detaching mechanism is provided in the substrate driving system. 前記保護部材着脱機構の昇降動作により前記光学面保護部材が前記投影光学系に着脱されることを特徴とする請求項１に記載の露光装置。   The exposure apparatus according to claim 1, wherein the optical surface protection member is attached to and detached from the projection optical system by a lifting operation of the protection member attaching / detaching mechanism. 前記光学面保護部材が、前記保護部材着脱機構に分離可能に結合されていることを特徴とする請求項１に記載の露光装置。   2. The exposure apparatus according to claim 1, wherein the optical surface protection member is detachably coupled to the protection member attaching / detaching mechanism. 前記光学素子の光学面に付着した液浸剤を除去する液浸剤除去機構を有することを特徴とする請求項１に記載の露光装置。   The exposure apparatus according to claim 1, further comprising an immersion agent removing mechanism that removes the immersion agent attached to the optical surface of the optical element. 前記光学面保護部材は、保護用液体を貯留することにより前記光学面を該保護用液体に浸漬可能とされていることを特徴とする請求項１に記載の露光装置。   The exposure apparatus according to claim 1, wherein the optical surface protection member stores the protective liquid so that the optical surface can be immersed in the protective liquid. 前記保護用液体は、前記液浸剤と同一成分であることを特徴とする請求項６に記載の露光装置。   The exposure apparatus according to claim 6, wherein the protective liquid is the same component as the immersion agent. 前記保護用液体は、前記液浸剤と異なる成分の洗浄剤であることを特徴とする請求項６に記載の露光装置。   The exposure apparatus according to claim 6, wherein the protective liquid is a cleaning agent having a component different from that of the immersion agent. 前記光学面を、前記光学面保護部材に貯留された前記保護用液体に浸漬するか、又は液浸剤除去機構により前記光学面に付着した液浸剤を除去するかを選択する選択手段を有することを特徴とする請求項６に記載の露光装置。   And a selection means for selecting whether to immerse the optical surface in the protective liquid stored in the optical surface protection member or to remove the immersion agent attached to the optical surface by an immersion agent removal mechanism. The exposure apparatus according to claim 6, characterized in that: 前記光学面保護部材に貯留された前記保護用液体に前記基板が浸積可能とされていることを特徴とする請求項６に記載の露光装置。   The exposure apparatus according to claim 6, wherein the substrate can be immersed in the protective liquid stored in the optical surface protection member. 前記基板を駆動する基板駆動系を有し、
前記光学面保護部材に前記保護用液体を供給する供給路と、前記光学面保護部材から前記保護用液体を回収する回収路とが、前記基板駆動系に設けられていることを特徴とする請求項６に記載の露光装置。 A substrate driving system for driving the substrate;
The substrate driving system is provided with a supply path for supplying the protective liquid to the optical surface protection member and a recovery path for recovering the protective liquid from the optical surface protection member. Item 7. The exposure apparatus according to Item 6. 前記供給路から少なくとも２種類の液体を供給するための供給液体切替え手段が備えられていることを特徴とする請求項１１に記載の露光装置。 An apparatus according to claim 11, characterized in that the supply liquid switching means is provided for supplying a liquid of at least two types from the supply passage. レチクルを照明光学系によって光源からの光で照明し、かつ該レチクルのパターンを投影光学系によって基板の上に投影する露光装置の非露光時に、
前記投影光学系の最も前記基板の近くに配置された光学素子の光学面を保護するための光学面保護部材を、前記基板を駆動する基板駆動系によって移動させて前記投影光学系の直下に位置させるステップと、
前記光学面保護部材と結合され、前記光学面保護部材を昇降させることにより該光学面保護部材を前記投影光学系に着脱する保護部材着脱機構によって前記光学面保護部材を上昇させ、前記投影光学系に前記光学面保護部材を装着するステップとを有することを特徴とする光学面の保護方法。 Illuminated with light from the light source to the reticle by the illumination optical system, and at the time of non-exposure of an exposure apparatus for projecting on a substrate by the pattern of the reticle projection optical system,
An optical surface protection member for protecting an optical surface of an optical element disposed closest to the substrate of the projection optical system is moved by a substrate driving system for driving the substrate, and is positioned immediately below the projection optical system. Step to
The projection optical system is coupled with the optical surface protection member and lifts the optical surface protection member to raise and lower the optical surface protection member by a protection member attaching / detaching mechanism for attaching / detaching the optical surface protection member to / from the projection optical system. Attaching the optical surface protection member to the optical surface. 請求項１から請求項１２のうちいずれか１項に記載の露光装置によって基板にパターンを露光する工程と、
露光された前記基板に光学面保護のプロセスを行う工程とを有するデバイスの製造方法。 A step of exposing a pattern to the substrate by the exposure apparatus according to any one of claims 1 to 12,
And a step of performing an optical surface protection process on the exposed substrate.
JP2004200917A 2004-07-07 2004-07-07 Exposure apparatus and device manufacturing method Expired - Fee Related JP4444743B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004200917A JP4444743B2 (en) 2004-07-07 2004-07-07 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004200917A JP4444743B2 (en) 2004-07-07 2004-07-07 Exposure apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2006024706A JP2006024706A (en) 2006-01-26
JP2006024706A5 true JP2006024706A5 (en) 2007-08-23
JP4444743B2 JP4444743B2 (en) 2010-03-31

Family

ID=35797772

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004200917A Expired - Fee Related JP4444743B2 (en) 2004-07-07 2004-07-07 Exposure apparatus and device manufacturing method

Country Status (1)

Country Link
JP (1) JP4444743B2 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TWI474132B (en) 2003-10-28 2015-02-21 尼康股份有限公司 Optical illumination device, projection exposure device, exposure method and device manufacturing method
TWI385414B (en) 2003-11-20 2013-02-11 尼康股份有限公司 Optical illuminating apparatus, illuminating method, exposure apparatus, exposure method and device fabricating method
TWI366219B (en) 2004-02-06 2012-06-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
EP3255652B1 (en) * 2004-06-21 2018-07-25 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
JP4961709B2 (en) * 2004-10-13 2012-06-27 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
US7583357B2 (en) * 2004-11-12 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4784513B2 (en) * 2004-12-06 2011-10-05 株式会社ニコン Maintenance method, maintenance equipment, exposure apparatus, and device manufacturing method
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20090046268A1 (en) 2005-05-12 2009-02-19 Yasuhiro Omura Projection optical system, exposure apparatus, and exposure method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
JP2012078439A (en) * 2010-09-30 2012-04-19 Olympus Corp Immersion objective lens and inverted microscope using the same
US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium

Similar Documents

Publication Publication Date Title
JP2006024706A5 (en)
HK1087782A1 (en) Apparatus and method for maintaining immersion fluid under a lithographic projection lens
JP2010093298A5 (en)
HK1145547A1 (en) Cleanup method for optics in immersion lithography
JP2005085789A5 (en)
DE602004027162D1 (en) EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
JP2016053721A5 (en)
JP2005072404A (en) Aligner and manufacturing method of semiconductor device
JP2006032750A5 (en)
SG148994A1 (en) Exposure apparatus, exposure method, method for producing device, and optical part
ATE513309T1 (en) EXPOSURE DEVICE AND METHOD FOR PRODUCING COMPONENTS
TW200509205A (en) Exposure method and device-manufacturing method
KR20090060270A (en) Cleaning member, cleaning method and device manufacturing method
TW200707562A (en) Contaminant removal apparatus and method therefor
TW201030479A (en) Exposure apparatus, exposure method, and device manufacturing method
JP2005101487A5 (en)
JP4444743B2 (en) Exposure apparatus and device manufacturing method
JP2006135111A5 (en)
JP2009260352A5 (en)
JP2010021370A (en) Immersion exposure equipment and method of manufacturing device
JP2006332100A5 (en)
KR20080008237A (en) A high index liquid circulating system in a pattern forming apparatus
KR100609220B1 (en) Apparatus for providing a liquid, and exposing system including the same
KR20090064644A (en) Apparatus for removing particles on reticle
KR20090000877A (en) Apparatus for exposure device for immersion lithography having sub-holder