JP2009260352A5 - - Google Patents

Claims (33)

An exposure apparatus that exposes a substrate with exposure light through an exposure liquid,
An optical member having an exit surface for emitting the exposure light;
A first supply port for supplying the exposure liquid;
An immersion member capable of forming an immersion space so that an optical path of the exposure light emitted from the optical member is filled with the exposure liquid;
A second supply port for supplying a cleaning liquid so as to come into contact with the liquid immersion member;
An exposure apparatus comprising: a prevention device that prevents contact between the cleaning liquid and the optical member. The liquid immersion member has an opening through which the exposure light emitted from the emission surface can pass.
The cleaning liquid is supplied to a space below the opening;
The exposure apparatus according to claim 1, wherein the prevention device prevents the cleaning liquid from flowing into a space above the opening through the opening.   The prevention device includes the first supply port, and prevents the cleaning liquid from flowing into the upper space by supplying the exposure liquid from the first supply port to the upper space. 2. The exposure apparatus according to 2. The liquid immersion member includes a flat surface disposed around the opening and facing a space below the opening;
The exposure apparatus according to claim 3, wherein the second supply port is disposed outside the flat surface with respect to the opening.   The exposure apparatus according to claim 1, wherein the prevention device includes the first supply port, and prevents the cleaning liquid from contacting the optical member by supplying the exposure liquid from the first supply port. .   The exposure apparatus according to claim 5, wherein the first supply port is disposed closer to the optical member than the second supply port. The exposure apparatus according to claim 5, wherein the first supply port is disposed above the second supply port.   The exposure apparatus according to claim 2, wherein the prevention device forms a fluid curtain in the vicinity of the opening.   The exposure apparatus according to claim 8, wherein the fluid curtain is formed by flowing a fluid from one side of the opening toward the other side.   The exposure apparatus according to claim 9, wherein the fluid includes a gas. A stage movable with respect to the liquid immersion member,
The exposure apparatus according to claim 1, wherein the second supply port is provided in the stage.   The exposure apparatus according to claim 1, wherein the cleaning liquid is supplied to a space between the liquid immersion member and a predetermined member.   The exposure apparatus according to claim 12, wherein the predetermined member is movable with respect to the liquid immersion member. A stage movable with respect to the liquid immersion member;
The exposure apparatus according to claim 13, wherein the predetermined member includes a part of the stage.   The exposure apparatus according to claim 14, wherein the stage includes a substrate stage that holds the substrate. A substrate stage movable with respect to the liquid immersion member;
The exposure apparatus according to claim 12, wherein the predetermined member includes a substrate held by a substrate holding part of the substrate stage.   The exposure apparatus according to claim 12, wherein the predetermined member is cleaned with the cleaning liquid. The second supply port is disposed in the liquid immersion member,
The exposure apparatus according to claim 17, wherein the predetermined member is disposed to face the second supply port.   The exposure apparatus according to claim 1, wherein the second supply port is disposed in the liquid immersion member.   The exposure apparatus according to claim 1, wherein the liquid immersion member is cleaned with the cleaning liquid.   The exposure apparatus according to claim 1, wherein the first supply port is disposed in the liquid immersion member.   The exposure apparatus according to claim 1, wherein the cleaning liquid contains an alkali.   The exposure apparatus according to any one of claims 1 to 22, further comprising a liquid recovery port capable of recovering at least one of the exposure liquid and the cleaning liquid. Exposing the substrate using the exposure apparatus according to any one of claims 1 to 23;
Developing the exposed substrate; and a device manufacturing method. An exposure apparatus cleaning method for exposing a substrate through exposure liquid with exposure light emitted from an optical member,
Disposing a predetermined member so as to face an immersion member capable of forming an immersion space so that an optical path of the exposure light emitted from the optical member is filled with the exposure liquid;
Supplying a cleaning liquid to a space between the liquid immersion member and the predetermined member,
A cleaning method in which the supply of the cleaning liquid is performed while preventing contact between the cleaning liquid and the optical member.   26. The cleaning method according to claim 25, wherein the predetermined member includes a movable member movable with respect to the liquid immersion member. The exposure apparatus includes a substrate holding unit that holds the substrate in a releasable manner,
27. The cleaning method according to claim 26, wherein the predetermined member includes a dummy substrate held by the substrate holding part. Stopping the supply of the cleaning liquid;
The cleaning method according to any one of claims 25 to 27, further comprising: removing the cleaning liquid from the predetermined member before exposing the substrate.   29. The cleaning method according to claim 28, wherein the removal of the cleaning liquid includes supply of the exposure liquid. The liquid immersion member has an opening through which the exposure light emitted from the emission surface can pass.
The cleaning liquid is supplied to a space below the opening;
30. The cleaning method according to claim 25, wherein the cleaning liquid is supplied while preventing the cleaning liquid from flowing into the space above the opening through the opening.   31. The cleaning liquid is prevented from flowing into the upper space by supplying the exposure liquid from the first supply port to the upper space from a first supply port capable of supplying the exposure liquid. Cleaning method. The liquid immersion member includes a flat surface disposed around the opening and facing a space below the opening;
32. The cleaning method according to claim 31, wherein the second supply port for supplying the cleaning liquid is provided in the liquid immersion member and is disposed outside the flat surface with respect to the opening. Cleaning an exposure apparatus that exposes a substrate with exposure light through an exposure liquid by the cleaning method according to any one of claims 25 to 32;
After the cleaning, exposing the substrate with the exposure apparatus;
Developing the exposed substrate. A device manufacturing method.