JP2009260352A - Exposure apparatus, cleaning method, and device manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing generation of poor exposure. <P>SOLUTION: The exposure apparatus exposes a substrate with exposure light through exposure liquid. The exposure apparatus includes: an optical member which has an emitting surface wherefrom the exposure light is emitted; a first supply port which supplies the exposure liquid; a liquid immersion member which is capable of forming an immersion space so that an optical path of the exposure light that is emitted from the optical member may be filled with the exposure liquid; a second supply port which supplies a cleaning liquid so that it may contact the liquid immersion member; and a preventive apparatus which prevents the cleaning liquid and the optical member from contacting one another. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an exposure apparatus that exposes a substrate with exposure light through a liquid, a cleaning method for the exposure apparatus, and a device manufacturing method.

  As an exposure apparatus used in a photolithography process, an immersion exposure apparatus that exposes a substrate with exposure light through a liquid is known. The following patent document discloses an example of a technique related to an immersion exposure apparatus including an immersion member capable of holding a liquid with a substrate.

US Pat. No. 7119874 US Patent Publication No. 2006/0023185

  In the immersion exposure apparatus, a member in contact with the liquid may be contaminated. For example, if a foreign substance adheres to the liquid contact surface of a member that comes into contact with the liquid, a defective exposure may occur, such as a defect in a pattern formed on the substrate due to the foreign substance. As a result, a defective device may be manufactured.

  An object of an aspect of the present invention is to provide an exposure apparatus that can suppress the occurrence of exposure failure. Another object of the present invention is to provide a cleaning method capable of suppressing the occurrence of exposure failure. Another object of the present invention is to provide a device manufacturing method that can suppress the occurrence of defective devices.

  According to a first aspect of the present invention, an exposure apparatus that exposes a substrate with exposure light through an exposure liquid, the optical member having an exit surface that emits exposure light, and a first supply that supplies the exposure liquid A liquid immersion member capable of forming an immersion space so that an optical path of the exposure light emitted from the optical member is filled with the exposure liquid; and a second supply port for supplying the cleaning liquid so as to contact the liquid immersion member And an prevention device that prevents contact between the cleaning liquid and the optical member.

  According to a second aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the first aspect and developing the exposed substrate.

  According to the third aspect of the present invention, there is provided a cleaning method for an exposure apparatus that exposes a substrate with exposure light emitted from an optical member through an exposure liquid, wherein an optical path of the exposure light emitted from the optical member is exposed. Disposing a predetermined member so as to face an immersion member capable of forming an immersion space so as to be filled with liquid, and supplying a cleaning liquid to a space between the immersion member and the predetermined member. In addition, a cleaning method is provided in which the supply of the cleaning liquid is performed while preventing contact between the cleaning liquid and the optical member.

  According to the fourth aspect of the present invention, the exposure apparatus that exposes the substrate with the exposure light through the exposure liquid is cleaned by the cleaning method of the third aspect, and the substrate is exposed by the exposure apparatus after the cleaning. And developing the exposed substrate. A device manufacturing method is provided.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of the present invention, the occurrence of defective devices can be suppressed.

It is a schematic block diagram which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is a top view which shows the substrate stage and measurement stage which concern on 1st Embodiment. It is a sectional side view which shows the substrate stage and measurement stage which concern on 1st Embodiment. It is a sectional side view parallel to the YZ plane showing the vicinity of the liquid immersion member according to the first embodiment. It is a sectional side view parallel to the XZ plane showing the vicinity of the liquid immersion member according to the first embodiment. It is a partially broken view of the schematic perspective view which shows the liquid immersion member which concerns on 1st Embodiment. It is the perspective view which looked at the liquid immersion member concerning a 1st embodiment from the lower side. It is a schematic diagram which shows an example of the cleaning method which concerns on 1st Embodiment. It is a schematic diagram which shows an example of the cleaning method which concerns on 1st Embodiment. It is a figure which shows an example of the prevention apparatus which concerns on 2nd Embodiment. It is a figure which shows an example of the prevention apparatus which concerns on 3rd Embodiment. It is a figure which shows an example of the prevention apparatus which concerns on 3rd Embodiment. It is a figure which shows an example of the prevention apparatus which concerns on 4th Embodiment. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of a liquid immersion member. It is a figure which shows an example of the exposure apparatus which concerns on 5th Embodiment. It is a flowchart for demonstrating an example of the manufacturing process of a microdevice.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to the XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as the X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as the Y-axis direction, and a direction orthogonal to each of the X-axis direction and Y-axis direction (that is, the vertical direction) is defined as the Z-axis direction. In addition, the rotation (inclination) directions around the X, Y, and Z axes are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the first embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through an exposure liquid LQ. In the present embodiment, the exposure apparatus EX includes a first supply port 41 that supplies the exposure liquid LQ. The exposure apparatus EX exposes the substrate P with the exposure light EL through the exposure liquid LQ supplied from the first supply port 41. In the present embodiment, water (pure water) is used as the exposure liquid LQ. In the following description, the exposure liquid LQ is appropriately referred to as a first liquid LQ.

  In the present embodiment, the members in the exposure apparatus EX are cleaned by the cleaning liquid LC (not shown in FIG. 1). The exposure apparatus EX includes a second supply port 42 that supplies the cleaning liquid LC. The exposure apparatus EX cleans the members in the exposure apparatus EX with the cleaning liquid LC supplied from the second supply port 42. In the following description, the cleaning liquid LC is appropriately referred to as a second liquid LC.

  The second liquid LC is a liquid that can clean the members in the exposure apparatus EX. The second liquid LC is a liquid that can remove foreign matters (contaminants) adhering to members in the exposure apparatus EX, for example. In the present embodiment, an alkali cleaning liquid containing alkali is used as the second liquid LC. The alkaline cleaning liquid contains, for example, ammonia. By using an alkaline cleaning liquid as the second liquid LC, it is possible to satisfactorily remove contaminants such as organic substances adhering to the members in the exposure apparatus EX.

  In the present embodiment, the exposure apparatus EX is capable of holding and moving the substrate stage 1 as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application No. 1713113. An example of an exposure apparatus that includes a movable measuring stage 2 mounted with a measuring instrument C that can perform predetermined measurement related to exposure without holding the substrate P will be described.

  In FIG. 1, an exposure apparatus EX includes a mask stage 3 that can move while holding a mask M, a substrate stage 1, a measurement stage 2, an illumination system IL that illuminates the mask M with exposure light EL, and exposure light EL. A projection optical system PL that projects an image of the pattern of the mask M illuminated by the step P on the substrate P, and a liquid that can form the immersion space LS so that at least a part of the optical path of the exposure light EL is filled with the first liquid LQ. An immersion member 4 and a control device 5 for controlling the operation of the entire exposure apparatus EX are provided.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask in which a predetermined pattern is formed on a transparent plate such as a glass plate using a light shielding film such as chromium. A reflective mask can also be used as the mask M. The substrate P is a substrate for manufacturing a device. The substrate P includes a base material such as a semiconductor wafer such as a silicon wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Further, the substrate P may include another film in addition to the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

The illumination system IL illuminates a predetermined illumination region IR with exposure light EL having a uniform illuminance distribution. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g-line, h-line, i-line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

  The mask stage 3 has a mask holding unit 6 that holds the mask M in a releasable manner. In the present embodiment, the mask holding unit 6 holds the mask M so that the pattern formation surface (lower surface) of the mask M and the XY plane are substantially parallel. The mask stage 3 is movable in the XY plane including the illumination area IR while holding the mask M. In the present embodiment, the mask stage 3 is movable in three directions of the X axis, the Y axis, and the θZ direction by the operation of the first drive system 7 including an actuator such as a linear motor.

  The position information of the mask stage 3 (mask M) is measured by the laser interferometer 8A of the interferometer system 8. The laser interferometer 8 </ b> A measures position information using a reflection mirror 3 </ b> R provided on the mask stage 3. The control device 5 operates the first drive system 7 based on the measurement result of the laser interferometer 8A, and controls the position of the mask M held on the mask stage 3.

  The projection optical system PL irradiates the predetermined projection region PR with the exposure light EL. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. A plurality of optical elements of the projection optical system PL are held by the lens barrel 9. The projection optical system PL of the present embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis AX of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, and a catadioptric system that includes a reflective optical element and a refractive optical element. Further, the projection optical system PL may form either an inverted image or an erect image.

  Each of the substrate stage 1 and the measurement stage 2 is movable on the guide surface 11 of the base member 10. In the present embodiment, the guide surface 11 is substantially parallel to the XY plane.

  The substrate stage 1 is movable along the guide surface 11 in the XY plane including the projection region PR while holding the substrate P. The measurement stage 2 is movable along the guide surface 11 in the XY plane including the projection region PR in a state where at least one measuring instrument C is mounted. In the present embodiment, each of the substrate stage 1 and the measurement stage 2 is moved in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the second drive system 12 including an actuator such as a linear motor. It can move in six directions.

  In the present embodiment, the positions of the projection optical system PL and the liquid immersion member 4 are substantially fixed. Each of the substrate stage 1 and the measurement stage 2 is movable with respect to the projection optical system PL and the liquid immersion member 4.

  Position information of the substrate stage 1 (substrate P) and the measurement stage 2 (measurement device C) is measured by the laser interferometer 8B of the interferometer system 8. The laser interferometer 8B measures position information using a reflection mirror 1R provided on the substrate stage 1 and a reflection mirror 2R provided on the measurement stage 2. Further, position information (position information regarding the Z axis, θX, and θY directions) of the surface of the substrate P held on the substrate stage 1 is detected by a focus / leveling detection system (not shown). The focus / leveling detection system can detect not only the position information of the surface of the substrate P but also the position information of the upper surface 13 of the substrate stage 1 and the upper surface 14 of the measurement stage 2. The control device 5 operates the second drive system 12 based on the measurement result of the laser interferometer 8B and the detection result of the focus / leveling detection system, and controls the position of the substrate P held on the substrate stage 1 and the measurement stage. 2 controls the position of the measuring instrument C mounted on the unit 2.

  FIG. 2 is a plan view of the substrate stage 1 and the measurement stage 2 as viewed from above, and FIG. 3 is a side sectional view. 2 and 3, the substrate stage 1 includes a substrate holding part 15 that holds the substrate P so as to be releasable. The substrate holding unit 15 faces the back surface of the substrate P and holds the back surface of the substrate P. The upper surface 13 of the substrate stage 1 is disposed around the substrate holding unit 15. The substrate holding unit 15 holds the substrate P so that the surface of the substrate P and the XY plane are substantially parallel. In the present embodiment, the surface of the substrate P held by the substrate holding unit 15 and the upper surface 13 of the substrate stage 1 are substantially parallel. In the present embodiment, the surface of the substrate P held by the substrate holding unit 15 and the upper surface 13 of the substrate stage 1 are arranged in substantially the same plane (substantially flush).

  In the present embodiment, the substrate stage 1 includes a plate member T disposed around the substrate P, and a plate member holding unit 16 disposed around the substrate holding unit 15 and configured to releasably hold the plate member T. Have. The plate member holding portion 16 faces the lower surface of the plate member T and holds the lower surface of the plate member T. In the following description, the substrate holding part 15 is appropriately referred to as a first holding part 15, and the plate member holding part 16 is appropriately referred to as a second holding part 16.

  The plate member T has an opening TH in which the substrate P can be disposed. The plate member T held by the second holding unit 16 is disposed around the substrate P held by the first holding unit 15. In the present embodiment, the upper surface 13 of the substrate stage 1 includes the upper surface of the plate member T held by the second holding unit 16.

  In the present embodiment, the inner surface (inner edge) of the opening TH of the plate member T held by the second holding unit 16 and the outer surface (outer edge) of the substrate P held by the first holding unit 15 are predetermined. It arrange | positions so that it may oppose through a gap. The second holding unit 16 holds the plate member T so that the upper surface 13 of the plate member T and the XY plane are substantially parallel. The second holding unit 16 holds the plate member T so that the upper surface 13 of the plate member T and the surface of the substrate P held by the first holding unit 15 are substantially flush with each other.

  Each of the first holding part 15 and the second holding part 16 constitutes at least a part of a so-called pin chuck mechanism. As shown in FIG. 3, the first holding unit 15 is disposed on the first chuck surface 17 of the substrate stage 1, and includes a plurality of convex portions 15 </ b> P that support the back surface of the substrate P, and a plurality of convex portions on the first chuck surface 17. A plurality of first peripheral walls 15A arranged around the portion 15P and a first suction port 15B provided on the first chuck surface 17 inside the first peripheral wall 15A and capable of sucking gas. The second holding unit 16 includes a second peripheral wall 16A formed around the first peripheral wall 15A on the second chuck surface 18 of the substrate stage 1 and a second peripheral wall 16A formed around the second peripheral wall 16A on the second chuck surface 18. A plurality of convex portions 16P formed on the third peripheral wall 16C, the second chuck surface 18 between the second peripheral wall 16A and the third peripheral wall 16C and supporting the lower surface of the plate member T, and the second peripheral wall 16A and the third peripheral wall A plurality of second suction ports 16 </ b> B are provided on the second chuck surface 18 between 16 </ b> C and capable of sucking gas.

  The gas in the space surrounded by the back surface of the substrate P, the first peripheral wall 15A, and the first chuck surface 17 is sucked by the first suction port 15B, and the space becomes negative pressure. Adsorbed and held at 15P. Further, the substrate P can be removed from the first holding unit 15 by stopping the suction operation using the first suction port 15B. Further, the gas in the space surrounded by the lower surface of the plate member T, the second peripheral wall 16A, the third peripheral wall 16C, and the second chuck surface 18 is sucked by the second suction port 16B, and the space becomes negative pressure. The lower surface of the plate member T is attracted and held by the convex portion 16P. Further, the plate member T can be removed from the second holding portion 16 by stopping the suction operation using the second suction port 16B.

  The measurement stage 2 includes a measuring device C that can perform measurement related to exposure. The measuring instrument C includes a measuring member (optical component). In the present embodiment, a slit plate C1 having an opening pattern capable of transmitting the exposure light EL is disposed as a measuring instrument (measuring member) C at a predetermined position on the upper surface 14 of the measuring stage 2. The slit plate C1 constitutes a part of an aerial image measurement system capable of measuring an aerial image by the projection optical system PL as disclosed in, for example, US Patent Application Publication No. 2002/0041377. The aerial image measurement system includes a slit plate C1 and a light receiving element that receives the exposure light EL through the opening pattern of the slit plate C1. The control device 5 irradiates the slit plate C1 with the exposure light EL, receives the exposure light EL through the opening pattern of the slit plate C1 by the light receiving element, and executes the measurement of the imaging characteristics of the projection optical system PL. .

  Further, an upper plate C2 on which a transmission pattern capable of transmitting the exposure light EL is formed as a measuring instrument (measuring member) C is disposed at a predetermined position on the upper surface 14 of the measuring stage 2. The upper plate C2 constitutes a part of an illuminance unevenness measurement system capable of measuring the illuminance unevenness of the exposure light EL as disclosed in, for example, US Pat. No. 4,465,368. The illuminance unevenness measurement system includes an upper plate C2 and a light receiving element that receives exposure light EL through an opening pattern of the upper plate C2. The control device 5 irradiates the upper plate C2 with the exposure light EL, receives the exposure light EL through the opening pattern of the upper plate C2 by the light receiving element, and executes the measurement of the illuminance unevenness of the exposure light EL.

  Note that the upper plate C2 is a measurement system capable of measuring the variation in the transmittance of the exposure light EL of the projection optical system PL, as disclosed in, for example, US Pat. No. 6,721,039, for example, US Pat. Exposure light EL such as a dose measurement system (illuminance measurement system) as disclosed in the specification of 2002/0061469, for example, a wavefront aberration measurement system as disclosed in the specification of European Patent No. 1079223 It may constitute a part of a measurement system capable of measuring information on the exposure energy. In that case, the exposure apparatus EX includes a light receiving element that constitutes a part of the measurement system.

  A reference plate C3 is disposed as a measuring instrument (measuring member) C at a predetermined position on the upper surface 14 of the measuring stage 2. The reference plate C3 has a reference mark measured by an FIA (Field Image Alignment) type alignment system as disclosed in, for example, US Pat. No. 5,493,403.

  Further, an upper plate C4 capable of transmitting light is disposed as a measuring instrument (measuring member) C at a predetermined position on the upper surface 14 of the measuring stage 2. The upper plate C4 constitutes a part of an observation system capable of acquiring optical images (images) such as the projection optical system PL and the liquid immersion member 4 as disclosed in, for example, European Patent Application Publication No. 1791164. To do. The observation system includes an upper plate C4 and an imaging device (observation camera) that acquires an image via the upper plate C4. The control device 5 acquires an image by causing at least one of the projection optical system PL and the liquid immersion member 4 and the upper plate C4 to face each other.

  In the present embodiment, the upper surface of the slit plate C1, the upper surface of the upper plate C2, the upper surface of the reference plate C3, the upper surface of the upper plate C4, and the upper surface 14 of the measurement stage 2 are substantially in the same plane (XY plane). Inside) (almost flush).

  Next, the liquid immersion member 4 will be described with reference to FIGS. 4 is a side sectional view parallel to the YZ plane showing the vicinity of the liquid immersion member 4, FIG. 5 is a side sectional view parallel to the XZ plane, and FIG. 6 is a part of a schematic perspective view showing the liquid immersion member 4. FIG. 7 is a perspective view of the liquid immersion member 4 as viewed from below (−Z side). 4 and 5 show a state in which the substrate P is exposed through the first liquid LQ.

  The liquid immersion member 4 forms the liquid immersion space LS so that at least a part of the optical path of the exposure light EL is filled with the first liquid LQ. The immersion space LS is a portion (space, region) filled with liquid.

  The liquid immersion member 4 is disposed in the vicinity of the terminal optical element 19 closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The last optical element 19 has an emission surface (lower surface) 20 that emits the exposure light EL toward the image plane of the projection optical system PL. In the present embodiment, the liquid immersion member 4 can form the liquid immersion space LS so that the optical path of the exposure light EL emitted from the last optical element 19 is filled with the first liquid LQ.

  The terminal optical element 19 is made of, for example, synthetic quartz. The terminal optical element 19 may be made of fluorite. The liquid immersion member 4 is made of, for example, titanium. The liquid immersion member 4 may be formed of stainless steel.

  The liquid immersion member 4 is configured so that the optical path of the exposure light EL between the terminal optical element 19 and the predetermined member disposed at the irradiation position of the exposure light EL emitted from the emission surface 20 is filled with the first liquid LQ. The immersion space LS is formed. In the present embodiment, the irradiation position (irradiation region) of the exposure light EL emitted from the emission surface 20 includes a position facing the emission surface 20 and includes the projection region PR of the projection optical system PL. In the following description, the irradiation position of the exposure light EL emitted from the emission surface 20 is appropriately referred to as an exposure position.

  The liquid immersion member 4 is disposed around the optical path of the exposure light EL emitted from the emission surface 20, and has a lower surface 21 that can hold the first liquid LQ with the surface of a predetermined member disposed at the exposure position. . In the present embodiment, the predetermined member that can face the emission surface 20 can face the lower surface 21. When the surface of the predetermined member is disposed at a position facing the emission surface 20, at least a part of the lower surface 21 and the surface of the predetermined member are opposed. When the emission surface 20 faces the surface of the predetermined member, the space between the emission surface 20 of the last optical element 19 and the surface of the predetermined member can hold the first liquid LQ. Further, when the lower surface 21 and the surface of the predetermined member are opposed to each other, the space between the lower surface 21 of the liquid immersion member 4 and the surface of the predetermined member can hold the first liquid LQ. Exposure between the exit surface 20 of the last optical element 19 and the surface of the predetermined member is performed by holding the first liquid LQ between the exit surface 20 and the lower surface 21 on the one side and the surface of the predetermined member on the other side. The immersion space LS is formed so that the optical path of the light EL is filled with the first liquid LQ.

  In the present embodiment, the predetermined member that can face the exit surface 20 and the lower surface 21 includes a member that is movable relative to the end optical element 19 and the liquid immersion member 4 on the exit side (image surface side) of the end optical element 19. And a member that can move in a predetermined plane including the exposure position with respect to the optical path of the exposure light EL. In the present embodiment, the predetermined member includes at least one of the substrate stage 1 and the measurement stage 2. The predetermined member includes at least one of the substrate P held on the substrate stage 1 and the measuring instrument C mounted on the measurement stage 2.

  When the substrate P is exposed, the substrate P held on the substrate stage 1 is disposed at the exposure position so as to face the terminal optical element 19 and the liquid immersion member 4. At least during exposure of the substrate P, the one end optical element 19 and the liquid immersion member 4 and the other side are arranged so that the optical path of the exposure light EL emitted from the exit surface 20 of the end optical element 19 is filled with the first liquid LQ. The first liquid LQ is held between the substrate P and the immersion space LS.

  In the present embodiment, when the exposure light EL is irradiated onto the substrate P, the liquid immersion is performed so that a partial region of the surface of the substrate P including the projection region PR of the projection optical system PL is covered with the first liquid LQ. A space LS is formed. That is, at least a part of the interface (meniscus, edge) LG of the first liquid LQ is formed between the lower surface 21 of the liquid immersion member 4 and the surface of the substrate P. That is, the exposure apparatus EX of the present embodiment employs a local liquid immersion method.

  In the following description, in order to simplify the description, the state in which the substrate P is disposed mainly at a position facing the exit surface 20 of the last optical element 19 and the lower surface 21 of the liquid immersion member 4 is taken as an example. I will explain.

  As shown in FIGS. 4 to 7, the liquid immersion member 4 is an annular member. The liquid immersion member 4 is disposed around the optical path of the exposure light EL. In the present embodiment, the liquid immersion member 4 includes a first plate portion 22 disposed around the terminal optical element 19, and at least a part of the exit surface 20 of the terminal optical element 19 and the surface of the substrate P in the Z-axis direction. 2nd plate part 23 arrange | positioned between.

  The first plate portion 22 is opposed to the outer peripheral surface of the last optical element 19 and has an inner peripheral surface formed along the outer peripheral surface. The inner peripheral surface of the liquid immersion member 4 and the outer peripheral surface of the last optical element 19 are opposed to each other with a predetermined gap.

  The second plate portion 23 has an opening 24 at the center. The exposure light EL emitted from the exit surface 20 of the last optical element 19 can pass through the opening 24. For example, during the exposure of the substrate P, the exposure light EL emitted from the emission surface 20 passes through the opening 24 and is irradiated onto the surface of the substrate P through the first liquid LQ. In the present embodiment, the cross-sectional shape of the exposure light EL in the opening 24 is a substantially rectangular shape (slit shape) whose longitudinal direction is the X-axis direction. The opening 24 is formed in a substantially rectangular shape (slit shape) in the XY direction according to the cross-sectional shape of the exposure light EL. The cross-sectional shape of the exposure light EL in the opening 24 and the shape of the projection region PR of the projection optical system PL on the substrate P are substantially the same.

  In the present embodiment, the liquid immersion member 4 has an upper surface 25 that is disposed around the opening 24 and faces the exit surface 20 of the last optical element 19 with a predetermined gap therebetween. In the present embodiment, the upper surface 25 includes the upper surface of the second plate portion 23. In the present embodiment, the upper surface 25 is a flat surface disposed around the opening 24. The upper surface 25 is substantially parallel to the XY plane. The upper surface 25 faces the space 26 above the opening 24 (+ Z side). The space 26 includes a space between the upper surface 25 and the emission surface 20. In the following description, the space 26 is appropriately referred to as the upper space 26. The upper surface 25 may be a curved surface or may have irregularities.

  The lower surface 21 of the liquid immersion member 4 includes a lower surface of the second plate portion 23 and a lower surface of the porous member 27 disposed around the second plate portion 23. In the present embodiment, the outer shape of the lower surface of the second plate portion 23 in the XY plane is substantially square. The porous member 27 is a plate-like member including a plurality of holes (openings or pores). The porous member 27 may be a mesh filter that is a porous member in which a large number of small holes are formed in a mesh shape. In the present embodiment, the shape of the porous member 27 in the XY plane is a rectangular ring shape. The porous member 27 is made of titanium. The porous member 27 may be made of stainless steel.

  The lower surface 21 of the liquid immersion member 4 includes a first region 31 disposed around the opening 24, a second region 32 disposed around the first region 31, and a second region disposed around the second region 32. 3 regions 33. In the present embodiment, the lower surface of the second plate portion 23 includes a first region 31 and a second region 32, and the lower surface of the porous member 27 includes a third region 33.

  The first region 31 is a flat surface disposed around the opening 24. The flat surface (first region) 31 is substantially parallel to the surface (XY plane) of the substrate P. The flat surface 31 faces the space 28 on the lower side (+ Z side) of the opening 24. The space 28 includes a space between the flat surface 31 and the surface of the substrate P. A space between the flat surface 31 and the surface of the substrate P can hold the first liquid LQ. In the following description, the space 28 is appropriately referred to as a lower space 28.

  The second region 32 has a groove 29 disposed around the flat surface 31. In the present embodiment, the shape of the groove 29 in the XY plane is a rectangular ring.

  The third region 33 includes a liquid recovery surface that can recover the liquid. In the present embodiment, the liquid recovery surface (third region) 33 is substantially parallel to the surface (XY plane) of the substrate P. The liquid recovery surface 33 can recover the first liquid LQ on the substrate P facing the liquid recovery surface 33 during the exposure of the substrate P. The liquid recovery surface 33 includes the lower surface of the porous member 27. At least a part of the first liquid LQ on the substrate P arranged at a position facing the liquid recovery surface 33 is recovered through the hole of the porous member 27. The liquid recovery surface 33 can recover the liquid in contact with the liquid recovery surface 33 (the lower surface of the porous member 27).

  In the present embodiment, the position of the flat surface 31 and the position of the liquid recovery surface 33 are different with respect to the Z-axis direction. In the present embodiment, the liquid recovery surface 33 is disposed on the + Z side with respect to the flat surface 31. That is, the liquid recovery surface 33 is disposed at a position farther from the flat surface 31 than the surface of the substrate P. In the present embodiment, a step 30 is formed between the flat surface 31 and the liquid recovery surface 33.

  The flat surface 31 and the liquid recovery surface 33 may be arranged in the same plane. Further, the liquid recovery surface 33 may not be parallel to the XY plane, or may be a curved surface.

  The liquid immersion member 4 includes a first supply port 41 that supplies the first liquid LQ. Further, the liquid immersion member 4 includes a second supply port 42 through which the second liquid LC can be supplied. The first supply port 41 can supply the first liquid LQ to the optical path of the exposure light EL. The second supply port 42 can supply the second liquid LC so as to come into contact with the liquid immersion member 4.

  The first supply port 41 is disposed closer to the last optical element 19 than the second supply port 42. In the present embodiment, the first supply port 41 is disposed above (+ Z side) the second supply port 42.

  The first supply port 41 is disposed at a predetermined position of the liquid immersion member 4 so as to face the optical path in the vicinity of the optical path of the exposure light EL. In the present embodiment, the first supply port 41 is disposed at a predetermined position on the inner peripheral surface of the first plate portion 22. In the present embodiment, the first supply port 41 is disposed in the vicinity of the upper space 26. The first supply port 41 can supply the first liquid LQ to the upper space 26. In the present embodiment, the first supply ports 41 are provided on both sides in the Y-axis direction with respect to the optical path of the exposure light EL.

  The second supply port 42 is disposed at a predetermined position on the lower surface 21 of the liquid immersion member 4. In the present embodiment, the second supply port 42 is disposed outside the flat surface 31 with respect to the opening 24. The second supply port 42 is disposed at least at a part of the periphery of the flat surface 31. In the present embodiment, the second supply port 42 is disposed in the second region 32 of the lower surface 21 of the liquid immersion member 4.

  In the present embodiment, the second supply port 42 is disposed in the groove 29. As shown in FIG. 7 and the like, in the present embodiment, the second supply port 42 is disposed in each of four positions around the flat surface 31 in the groove 29.

  As shown in FIG. 4, the first supply port 41 is connected to the exposure liquid supply device 44 via a flow path 43. In the following description, the exposure liquid supply device 44 is appropriately referred to as a first supply device 44. The first supply device 44 can send out the clean and temperature-adjusted first liquid LQ. The flow path 43 includes a supply flow path formed inside the liquid immersion member 4 and a flow path formed by a supply pipe that connects the supply flow path and the first supply device 44. The first liquid LQ delivered from the first supply device 44 is supplied to the first supply port 41 via the flow path 43. The first supply port 41 supplies the first liquid LQ from the first supply device 44 to the optical path of the exposure light EL.

  The second supply port 42 is connected to the cleaning liquid supply device 46 through the flow path 45. In the following description, the cleaning liquid supply device 46 is appropriately referred to as a second supply device 46. The second supply device 46 can deliver the second liquid LC. The flow path 45 includes a supply flow path formed inside the liquid immersion member 4 and a flow path formed by a supply pipe that connects the supply flow path and the second supply device 46. The second liquid LC delivered from the second supply device 46 is supplied to the second supply port 42 via the flow path 45. The second supply port 42 can supply the second liquid LC from the second supply device 46 to a space between the lower surface 21 of the liquid immersion member 4 and the surface of a predetermined member facing the lower surface 21. A space between the lower surface 21 of the liquid immersion member 4 and the surface of the predetermined member includes a lower space 28.

  In the present embodiment, the flow path 45 can be connected to the first supply device 44 via the connection flow path 60. The channel 45 and the connecting channel 60 are connected via a channel switching mechanism 61 including a valve mechanism, for example. In the present embodiment, the control device 5 controls the first supply device 44, the second supply device 46, and the flow path switching mechanism 61 to supply the first liquid LQ from the first supply device 44 to the flow path 45. The second liquid LC from the second supply device 46 can be supplied to the second supply port 42 via the flow path 45, and the second liquid from the second supply device 46 to the flow path 45 can be supplied. With the supply of LC stopped, the first liquid LQ can be supplied from the first supply device 44 to the second supply port 42 via the flow path 45.

  Further, the liquid immersion member 4 has a liquid recovery port 47 that can recover the liquid. The liquid recovery port 47 recovers the liquid on the predetermined member facing the lower surface 21 of the liquid immersion member 4.

  The liquid recovery port 47 is disposed at a predetermined position of the liquid immersion member 4 so as to face the surface of the substrate P. The liquid recovery port 47 is disposed outside the flat surface 31 and the second supply port 42 (second region 32) with respect to the optical path of the exposure light EL. A porous member 27 is disposed in the liquid recovery port 47. The lower surface of the porous member 27 disposed in the liquid recovery port 47 is a liquid recovery surface 33.

  The liquid recovery port 47 (liquid recovery surface 33) is connected to a liquid recovery device 49 via a flow path. The liquid recovery device 49 includes a vacuum system and can recover the liquid by sucking it. The channel 48 includes a recovery channel formed inside the liquid immersion member 4 and a channel formed by a recovery pipe that connects the recovery channel and the liquid recovery device 49. The liquid recovered from the liquid recovery port 47 (liquid recovery surface 33) is recovered by the liquid recovery device 49 via the flow path.

  In the present embodiment, the liquid immersion member 4 has an exhaust port 50 for communicating the upper space 26 with an external space (ambient environment) around the liquid immersion member 4 (immersion space LS). . The exhaust port 50 is disposed in the vicinity of the upper space 26 and can discharge the gas in the upper space 26. In the present embodiment, the exhaust ports 50 are provided on both sides in the X-axis direction with respect to the optical path of the exposure light EL. The exhaust port 50 is connected to an exhaust passage 51 formed inside the liquid immersion member 4. The opening at the upper end of the exhaust passage 51 is disposed at a position where it can come into contact with the gas in the external space. The gas in the external space can flow into the upper space 26 via the exhaust flow path 51, and the gas in the upper space 26 can flow out to the external space via the exhaust flow path 51. In the present embodiment, gas can always enter and exit through the exhaust passage 51 between the upper space 26 and an external space (atmospheric space) outside the upper space 26, The air is released through the exhaust passage 51. The exhaust passage 51 may be omitted.

  Next, an example of the operation for forming the immersion space LS with the first liquid LQ will be described. In order to form the immersion space LS, the control device 5 supplies the first liquid LQ to the optical path of the exposure light EL using the first supply port 41. When supplying the first liquid LQ, the control device 5 arranges a predetermined member at a position facing the exit surface 20 of the last optical element 19 and the lower surface 21 of the liquid immersion member 4. The first liquid LQ delivered from the first supply device 44 is supplied to the first supply port 41 via the flow path 43. The first supply port 41 supplies the first liquid LQ to the upper space 26. The first liquid LQ flows through the upper space 26 and flows into the lower space 28 through the opening 24. Thus, the immersion space LS is formed so that the optical path of the exposure light EL between the exit surface 20 of the last optical element 19 and the surface of the predetermined member is filled with the first liquid LQ.

  In the present embodiment, the control device 5 executes the recovery operation of the first liquid LQ using the liquid recovery port 47 in parallel with the supply operation of the first liquid LQ using the first supply port 41. At least a part of the first liquid LQ on the predetermined member contacts the liquid contact surface 33 (the lower surface of the porous member 27) and is recovered from the liquid recovery surface 33. The first liquid LQ recovered from the liquid recovery surface 33 is recovered by the liquid recovery device 49 via the flow path 48.

  The control device 5 executes the recovery operation of the first liquid LQ using the liquid recovery port 47 in parallel with the supply operation of the first liquid LQ using the first supply port 41, so that the terminal optical element 19 on one side is performed. And the immersion space LS can be formed with the first liquid LQ between the immersion member 4 and the predetermined member on the other side.

  In this embodiment, as disclosed in, for example, US Patent Application Publication No. 2006/0023186, US Patent Application Publication No. 2007/0127006, and the like, the control device 5 includes the substrate stage 1 and the measurement stage. 2 in a state where the upper surface 13 of the substrate stage 1 and the upper surface 14 of the measurement stage 2 are brought close to or in contact with each other so as to continue to form a space capable of holding a liquid between at least one of the optical elements 19 and the last optical element 19. At least one of the upper surface 13 of the stage 1 and the upper surface 14 of the measurement stage 2 and the exit surface 20 of the last optical element 19 are opposed to each other, and the substrate stage 1 and the measurement stage 2 are placed in the XY directions with respect to the last optical element 19. It can be moved synchronously. Accordingly, the liquid immersion space can be moved from the upper surface 13 of the substrate stage 1 to the upper surface 14 of the measurement stage 2 or from the upper surface 14 of the measurement stage 2 to the upper surface 13 of the substrate stage 1 while suppressing leakage of the liquid. is there.

  Next, an example of a method for exposing the substrate P using the above-described exposure apparatus EX will be described.

  The control device 5 moves the substrate stage 1 to the substrate exchange position, and loads (loads) the substrate P before exposure onto the substrate stage 1 arranged at the substrate exchange position using a transport system (not shown). When the substrate stage 1 is arranged at the substrate exchange position, the measurement stage 2 is arranged at the exposure position, and between the last optical element 19 and the liquid immersion member 4 on one side and the measurement stage 2 on the other side. An immersion space LS is formed by the first liquid LQ. The control device 5 performs predetermined measurement related to exposure using the first liquid LQ and the measurement stage 2 as necessary.

  After the loading of the substrate P to the substrate stage 1 is completed at the substrate exchange position and the measurement using the measurement stage 2 is completed, the control device 5 moves the substrate stage 1 holding the substrate P before exposure to the exposure position. An immersion space LS is formed with the first liquid LQ between the terminal optical element 19 and the liquid immersion member 4 on one side and the substrate stage 1 (substrate P) on the other side.

  The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. At the time of exposure of the substrate P, the control device 5 controls the mask stage 3 and the substrate stage 1 so that the mask M and the substrate P are scanned in the XY plane intersecting the optical axis AX (optical path of the exposure light EL). Move in the direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 5 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the first liquid LQ in the immersion space LS on the substrate P while moving the mask M in the Y-axis direction. Thereby, the pattern image of the mask M is projected onto the substrate P, and the substrate P is exposed with the exposure light EL.

  In the present embodiment, the supply of the second liquid LC from the second supply port 42 is stopped when the substrate P is exposed using the first liquid LQ, or when the measurement is performed by the measuring device C using the first liquid LQ. Has been.

  The exposed substrate P is unloaded from the substrate stage 1. The controller 5 moves the substrate stage 1 to the substrate exchange position in order to unload the exposed substrate P from the substrate stage 1. When the substrate stage 1 is moved to the substrate exchange position, the control device 5 moves the measurement stage 2 to the exposure position, and connects the last optical element 19 and the liquid immersion member 4 on one side and the measurement stage 2 on the other side. An immersion space LS is formed with the first liquid LQ therebetween. The controller 5 unloads the exposed substrate P from the substrate stage 1 arranged at the substrate exchange position using the transport system.

  The control device 5 repeats the loading operation of the substrate P before exposure, the exposure operation of the substrate P, and the unloading operation of the substrate P after exposure to sequentially perform immersion exposure on the plurality of substrates P.

  As described above, in the present embodiment, during the exposure of the substrate P, the first liquid LQ contacts each of the terminal optical element 19, the liquid immersion member 4, the substrate stage 1 (plate member T), and the measurement stage 2. .

  During the exposure of the substrate P, a substance (for example, an organic substance such as a photosensitive material) generated (eluted) from the substrate P may be mixed in the first liquid LQ. The substance mixed in the first liquid LQ may adhere to the lower surface 21 of the liquid immersion member 4 as a foreign substance (contaminant). Further, not only substances generated from the substrate P but also foreign substances floating in the air may be mixed into the first liquid LQ and adhere to the lower surface 21 of the liquid immersion member 4. If the state in which the foreign matter (contaminant) adheres to the lower surface 21 of the liquid immersion member 4 is left as it is, the foreign matter may adhere to the substrate P during exposure or the first supply port 41 may supply the first. There is a possibility of contaminating the liquid LQ. As a result, an exposure failure may occur, for example, a defect may occur in a pattern formed on the substrate P.

  Therefore, in the present embodiment, the control device 5 cleans the liquid immersion member 4 from the second supply port 42 so as to come into contact with the lower surface 21 of the liquid immersion member 4 at a predetermined timing. And the lower surface 21 of the liquid immersion member 4 is cleaned by the second liquid LC. As described above, in the present embodiment, an alkaline cleaning liquid is used as the second liquid LC. By using an alkaline cleaning liquid as the second liquid LC, it is possible to satisfactorily remove organic substances (contaminants) that are attached to the lower surface 21 of the liquid immersion member 4 due to, for example, a photosensitive material.

  In the present embodiment, the contact between the second liquid LC supplied from the second supply port 42 and the terminal optical element 19 using the prevention device 53 capable of preventing the contact between the second liquid LC and the terminal optical element 19. The liquid immersion member 4 is cleaned with the second liquid LC. In the present embodiment, the prevention device 53 includes a first supply port 41.

  When the second liquid LC containing the alkaline cleaning liquid comes into contact with the terminal optical element 19, for example, the surface state of the terminal optical element 19 may change. For example, when the terminal optical element 19 is formed of quartz, when the second liquid LC and the terminal optical element 19 come into contact with each other, there is a possibility that the surface state of the terminal optical element 19 changes or the optical characteristics change. is there.

  Therefore, in the present embodiment, the control device 5 supplies the second liquid LC from the second supply port 42 while preventing the contact between the second liquid LC and the last optical element 19 using the prevention device 53.

  Next, an example of a method for cleaning the liquid immersion member 4 and the like with the second liquid LC will be described with reference to the schematic diagrams of FIGS.

  As shown in FIG. 8, in this embodiment, when cleaning the liquid immersion member 4, the dummy substrate DP is held by the first holding unit 15. The dummy substrate DP is a (clean) member having a high degree of cleanliness that is difficult to release foreign matter, different from the exposure substrate P. The dummy substrate DP has substantially the same outer shape as the substrate P, and the first holding unit 15 can hold the dummy substrate DP.

  The control device 5 arranges at least one of the substrate stage 1 and the measurement stage 2 so as to face the terminal optical element 19 and the liquid immersion member 4. In the present embodiment, the control device 5 connects at least one of the substrate stage 1 and the measurement stage 2 to the second supply port in a state where the upper surface 13 of the substrate stage 1 and the upper surface 14 of the measurement stage 2 are close to or in contact with each other. 42 so as to face 42. FIG. 8 shows an example in which the upper surface 13 of the substrate stage 1 (plate member T) is disposed so as to face the second supply port 42. During the cleaning operation, the upper surface 13 of the substrate stage 1 and the upper surface 14 of the measurement stage 2 do not have to approach or contact each other.

  The control device 5 starts supplying the second liquid LC from the second supply port 42 in order to clean the liquid immersion member 4. The control device 5 controls the flow path switching mechanism 61 so that the first liquid LQ from the first liquid supply device 44 does not flow into the flow path 45, and the second supply device 46 enters the flow path 45. Deliver liquid LC. The second liquid LC sent from the second supply device 46 and flowing through the flow path 45 is supplied to the second supply port 42. The second supply port 42 supplies the second liquid LC so as to come into contact with the liquid immersion member 4.

  In the present embodiment, the control device 5 starts supplying the second liquid LC from the second supply port 42 while executing the supply of the first liquid LQ from the first supply port 41. The second liquid LC from the second supply port 42 is supplied to the lower space 28 between the liquid immersion member 4 and the substrate stage 1 (plate member T).

  In the present embodiment, the control device 5 uses the prevention device 53 including the first supply port 41 to prevent contact between the second liquid LC and the last optical element 19, while preventing the second supply LC from contacting the second supply port 42. The supply operation of the two liquid LC is executed.

  In the present embodiment, the prevention device 53 prevents the second liquid LC supplied to the lower space 28 from the second supply port 42 from flowing into the upper space 26 through the opening 24. Thereby, contact between the last optical element 19 arranged in the upper space 26 and the second liquid LC is prevented.

  In the present embodiment, the prevention device 53 prevents the second liquid LC from flowing into the upper space 26 through the opening 24 by supplying the first liquid LQ from the first supply port 41 to the upper space 26. To do.

  That is, in the present embodiment, the control device 5 executes the supply operation of the second liquid LC using the second supply port 42 in parallel with the supply operation of the first liquid LQ using the first supply port 41. In addition, the controller 5 uses the liquid recovery port 47 (see FIG. 4) in parallel with the supply operation of the first liquid LQ using the first supply port 41 and the supply operation of the second liquid LC using the second supply port 42. A recovery operation of the liquid (including at least one of the first liquid LQ and the second liquid LC) is executed. As a result, as shown in FIG. 8, a liquid immersion space is formed between the last optical element 19 and the liquid immersion member 4 on one side and the substrate stage 1 on the other side.

  The first liquid LQ supplied from the first supply port 41 to the upper space 26 flows through the upper space 26 and flows into the lower space 28 through the opening 24. The flow of the first liquid LQ prevents the second liquid LC supplied from the second supply port 42 to the lower space 28 from flowing into the upper space 26 through the opening 24.

  Thus, in the present embodiment, the prevention device 53 prevents the second liquid LC from contacting the terminal optical element 19 by supplying the first liquid LQ from the first supply port 41.

  The second supply port 42 is disposed outside the flat surface 31 with respect to the opening 24, and the second liquid LC supplied to the lower space 28 from the second supply port 42 is a liquid together with the first liquid LQ. It is recovered from the recovery surface 33.

  The second liquid LC contacts the lower surface (liquid recovery surface 33) of the porous member 27. Thereby, the lower surface of the porous member 27 is cleaned by the second liquid LC. Further, the second liquid LC flows into the flow channel 48 through the hole of the porous member 27, flows through the flow channel 48, and is recovered by the liquid recovery device 49. Therefore, the inner surface of the hole of the porous member 27, the upper surface of the porous member 27, and the inner surface of the flow path 48 are also cleaned by the second liquid LC.

  In the present embodiment, the size of the immersion space (size in the XY plane) formed by the first liquid LQ and the second liquid LC during cleaning is formed by the first liquid LQ during exposure of the substrate P. This is larger than the size of the immersion space (size in the XY plane). Accordingly, a wide range of the lower surface 21 of the liquid immersion member 4 comes into contact with the second liquid LC and is cleaned by the second liquid LC.

  Further, the control device 5 can move the substrate stage 1 with respect to the liquid immersion member 4 in the XY direction under predetermined moving conditions while supplying the second liquid LC from the second supply port 42. Due to the movement of the substrate stage 1 in the XY direction with respect to the liquid immersion member 4, at least a part of the second liquid LC supplied to the lower space 28 from the second supply port 42 comes into contact with the flat surface 31. Thereby, the flat surface 31 is cleaned by the second liquid LC.

  The upper surface 13 of the substrate stage 1 is disposed so as to face the second supply port 42 and is in contact with the second liquid LC from the second supply port 42. Thereby, the upper surface 13 of the substrate stage 1 (plate member T) is cleaned by the second liquid LC.

  Further, the substrate stage 1 is moved in the XY direction with respect to the liquid immersion member 4 while supplying the second liquid LC from the second supply port 42, thereby widening the upper surface 13 of the substrate stage 1 (plate member T). Is cleaned by the second liquid LC.

  In the present embodiment, since the cleaning using the second liquid LC is performed in a state where the dummy substrate DP is held by the first holding unit 15, the contact between the second liquid LC and the first holding unit 15 is prevented. The Note that the second liquid LC may be supplied from the second supply port 42 to clean the lower surface 21 of the liquid immersion member 4 in a state where the dummy substrate DP is disposed at a position facing the second supply port 42.

  Further, the control device 5 arranges the upper surface 14 of the measurement stage 2 including the upper surface of the measuring instrument C so as to face the second supply port 42, and supplies the second liquid LC from the second supply port 42. Thus, the upper surface 14 of the measurement stage 2 can be cleaned with the second liquid LC.

  After the cleaning using the second liquid LC is completed, the control device 5 stops the operation of the second supply device 46 and stops the supply of the second liquid LC using the second supply port 42. Then, before the exposure of the substrate P, the control device 5 performs a process for removing the second liquid LC from the liquid immersion member 4.

  In the present embodiment, the process for removing the second liquid LC from the liquid immersion member 4 includes a flushing process for supplying the first liquid LQ.

  As shown in FIG. 9, the control device 5 arranges the substrate stage 1 holding the dummy substrate DP by the first holding unit 15 so as to face the terminal optical element 19 and the liquid immersion member 4, and the second liquid LC In the state where the supply of the first liquid LQ is stopped, the recovery operation of the first liquid LQ using the liquid recovery port 47 is executed in parallel with the operation of supplying the first liquid LQ using the first supply port 41. As a result, the second liquid LC remaining on the lower surface 21 of the liquid immersion member 4, the porous member 27, the recovery flow path 48, and the like is washed away.

  Further, in the present embodiment, the control device 5 controls the first supply device 44, the second supply device 46, and the flow path switching mechanism 61, so that the second liquid from the second supply device 46 to the flow path 45 is controlled. In a state where the supply of LC is stopped, the first liquid LQ is supplied from the first supply device 44 to the second supply port 42 via the flow path 45. The control device 5 supplies the first liquid LQ to the second supply port 42 via the flow channel 45, thereby removing the second liquid LC remaining in the flow channel 45, the second supply port 42, and the like. It can be washed away with one liquid LQ.

  In addition, the control device 5 arranges the upper surface 13 of the substrate stage 1 (plate member T) so as to face the terminal optical element 19 and the liquid immersion member 4, and stops the supply of the second liquid LC in the state where the second liquid LC is stopped. In parallel with the supply operation of the first liquid LQ using the first supply port 41 and the second supply port 42, the recovery operation of the first liquid LQ using the liquid recovery port 47 is executed, whereby the substrate stage 1 (plate member T ) Can be washed away with the first liquid LQ.

  In addition, the control device 5 arranges the upper surface 14 of the measurement stage 2 so as to face the terminal optical element 19 and the liquid immersion member 4 and stops the supply of the second liquid LC. In parallel with the supply operation of the first liquid LQ using the second supply port 42, the recovery operation of the first liquid LQ using the liquid recovery port 47 is executed, so that the first remaining on the upper surface 14 of the measurement stage 2 is obtained. The two liquid LC can be washed away with the first liquid LQ.

  In this way, after the immersion member 4 and the like are cleaned using the second liquid LC, the second liquid LC is removed using the first liquid LQ, thereby performing the subsequent exposure of the substrate P. The second liquid LC is suppressed from being mixed into the first liquid LQ that satisfies the optical path of the exposure light EL.

  After the cleaning process using the second liquid LC and the flushing process using the first liquid LQ are completed, the substrate P to be exposed next is held by the first holding unit 15 and the exposure process of the substrate P is executed. . The exposed substrate P is subjected to predetermined process processing such as development processing.

  As described above, according to the present embodiment, the liquid immersion member 4 and the like in the exposure apparatus EX can be efficiently and satisfactorily cleaned using the second liquid LC. Therefore, the occurrence of defective exposure due to contamination of the liquid immersion member 4 and the like can be suppressed, and the occurrence of defective devices can be suppressed.

  According to the present embodiment, the contact between the second liquid LC and the terminal optical element 19 is prevented, so that the performance of the terminal optical element 19 can be suppressed from changing. Therefore, occurrence of exposure failure can be suppressed.

  Further, according to the present embodiment, the surfaces (liquid contact surfaces) of predetermined members that contact the first liquid LQ during the exposure of the substrate P, such as the upper surface 13 of the substrate stage 1 and the upper surface 14 of the measurement stage 2, are also the second. The liquid LC can be efficiently and satisfactorily cleaned. Therefore, the occurrence of defective exposure due to contamination of these predetermined members can be suppressed, and the generation of defective devices can be suppressed.

  In the present embodiment, when the liquid immersion member 4 or the like is cleaned using the second liquid LC, a liquid that does not affect the terminal optical element 19 that is different from the first liquid LQ is supplied from the first supply port 41. Then, the contact between the second liquid LC and the last optical element 19 may be prevented.

  In the present embodiment, another liquid supply port is provided in the vicinity of the first supply port 41, and a liquid (for example, the first liquid LQ) is supplied from the further liquid supply port to the upper space 26. The contact between the two liquid LC and the last optical element 19 may be prevented.

Second Embodiment
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  In the following description, the case where the substrate stage 1 is disposed at a position facing the liquid immersion member 4 at the time of cleaning using the second liquid LC will be described as an example. However, as in the above-described embodiment, the first holding unit The dummy substrate DP held by 15 and / or the measurement stage 2 can also be arranged.

  FIG. 10 is a diagram illustrating an example of the prevention device 53B according to the second embodiment. In the present embodiment, the prevention device 53B includes a cover member 70 disposed between the terminal optical element 19 and the substrate stage 1. In the present embodiment, the prevention device 53B includes a holding device 71 that holds the cover member 70 in a releasable manner. In the present embodiment, the holding device 71 is provided on the liquid immersion member 4B.

  In the present embodiment, the cover member 70 is disposed so as to close the opening 24. The holding device 71 holds the cover member 70 in order to close the opening 24 with the cover member 70.

  The cover member 70 is a plate-like member. The cover member 70 has an upper surface 72 that can face the flat surface 31. In the XY plane, the outer shape of the cover member 70 is larger than the opening 24 and smaller than the outer shape of the flat surface 31.

  At least a part of the holding device 71 is disposed in the peripheral area of the flat surface 31. In the present embodiment, the holding device 71 includes a so-called electrostatic chuck mechanism. The holding device 71 including the electrostatic chuck mechanism can hold the cover member 70 so as to be releasable.

  When cleaning the liquid immersion member 4 and the like, as shown in FIG. 10, the holding device 71 holds the cover member 70 so as to close the opening 24 with the cover member 70. The control device 5 supplies the second liquid LC from the second supply port 42 in a state where the opening 24 is closed by the cover member 70. The control device 5 executes the recovery operation of the second liquid LC using the liquid recovery port 47 in parallel with the supply operation of the second liquid LC using the second supply port 42. In the present embodiment, when the second liquid LC is supplied from the second supply port 42, the supply of the first liquid LQ from the first supply port 41 is stopped.

  Also in the present embodiment, it is possible to clean the liquid immersion member 4 and the substrate stage 1 while preventing contact between the terminal optical element 19 and the second liquid LC.

<Third Embodiment>
Next, a third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 11 is a diagram illustrating an example of the prevention device 53C according to the third embodiment. In the present embodiment, the prevention device 53 </ b> C includes a shutter mechanism 74 including shutter members 73 </ b> A and 73 </ b> B disposed between the last optical element 19 and the substrate stage 1. In the present embodiment, the shutter mechanism 74 is provided on the liquid immersion member 4C.

  In the present embodiment, the shutter mechanism 74 includes concave portions 75A and 75B formed on the inner surface that defines the opening 24 of the second plate portion 23, shutter members 73A and 73B that can be disposed in the concave portions 75A and 75B, and a shutter. Actuators 76A and 76B that can move the members 73A and 73B are provided. The recess 75A is formed on the + Y side inner surface that defines the opening 24 of the second plate portion 23, and the recess 75B is formed on the −Y side inner surface that defines the opening 24 of the second plate portion 23. The shutter members 73A and 73B are plate-like members. The shutter members 73A and 73B are movable in the Y-axis direction by the operation of the actuators 76A and 76B. By the operation of the actuators 76A and 76B, the shutter members 73A and 73B can enter and leave the recesses 75A and 75B.

  For example, when the substrate P is exposed, the shutter members 73A and 73B are disposed in the recesses 75A and 75B as shown in FIG. 11A. The control device 5 supplies the first liquid LQ from the first supply port 41 in order to form the immersion space LS.

  When cleaning the liquid immersion member 4C and the like, as shown in FIG. 11B, the control device 5 operates the actuators 76A and 76B to open the shutter members 73A and 73B in order to close the opening 24 with the shutter members 73A and 73B. 24. Thereby, the opening 24 is closed. The control device 5 supplies the second liquid LC from the second supply port 42 in a state where the opening 24 is closed by the shutter members 73A and 73B. When the second liquid LC is supplied from the second supply port 42, the supply of the first liquid LQ from the first supply port 41 is stopped.

  Also in this embodiment, it is possible to clean the liquid immersion member 4C and the like while preventing contact between the last optical element 19 and the second liquid LC.

  In this embodiment, the shutter members 73A and 73B are disposed in the opening 24 so as to close the opening 24. However, the shutter members 73A and 73B are disposed below the flat surface 31 or above the upper surface 25. You may make it arrange | position to.

<Fourth embodiment>
Next, a fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 12 is a diagram illustrating an example of the prevention device 53D according to the fourth embodiment. In the present embodiment, the prevention device 53 </ b> D forms the fluid curtain 77 in the vicinity of the opening 24.

  In the present embodiment, the prevention device 53D includes a fluid supply port 78 disposed on the inner surface on the + Y side that defines the opening 24 of the second plate portion 23, and a −Y side that defines the opening 24 of the second plate portion 23. And a fluid suction port 79 disposed on the inner surface. In the present embodiment, the fluid is a gas. The fluid supply port 78 supplies gas.

  At the time of cleaning the liquid immersion member 4D and the like, as shown in FIG. 12, the prevention device 53D executes a gas suction operation using the fluid suction port 79 in parallel with the gas supply operation using the fluid supply port 78. As a result, a gas flow is generated from the + Y side of the opening 24 where the fluid supply port 78 is disposed on the inner surface of the second plate portion 23 toward the −Y side, and a fluid curtain 77 is formed.

  The control device 5 supplies the second liquid LC from the second supply port 42 in a state where the fluid curtain 77 is formed. When the second liquid LC is supplied from the second supply port 42, the supply of the first liquid LQ from the first supply port 41 is stopped.

  In the present embodiment, the prevention device 53D can clean the liquid immersion member 4D and the like while preventing contact between the last optical element 19 and the second liquid LC by forming a fluid curtain 77 in the opening 24.

  In the present embodiment, the fluid curtain 77 is formed of gas, but may be formed of liquid. A liquid (for example, pure water) having a small influence on the terminal optical element 19 is supplied from the fluid supply port 78 and sucked by the fluid suction port 79, thereby preventing contact between the terminal optical element 19 and the second liquid LC. The liquid immersion member 4D and the like can be cleaned.

  In the first to fourth embodiments described above, the case where the groove 29 in which the second supply port 42 is disposed is a rectangular ring, but may be a circular ring. For example, like the liquid immersion member 4E shown in FIG. 13, a plurality of grooves 29A, 29B, 29C, and 29D are formed around the flat surface 31, and the second supply port 42 is disposed in each of the grooves 29A to 29D. May be.

  Further, like the liquid immersion member 4 </ b> F shown in FIG. 14, the grooves (29) may be omitted, and a plurality of second supply ports 42 </ b> F may be disposed around the flat surface 31. Further, as shown in FIG. 14, the second supply port 42F may be circular.

  In the first to fourth embodiments described above, the second supply port 42 may be provided near the flat surface 31 of the liquid immersion member 4, that is, near the opening 24. By providing the second supply port 42 on the flat surface 31, the second liquid LC and the flat surface 31 can be easily brought into contact with each other without moving a member facing the terminal optical element 19.

  In the first to fourth embodiments described above, the second supply port 42 may not be provided on the lower surface 21 of the liquid immersion member 4. For example, a second supply port 42 may be provided on the inner surface of the second plate portion 23 that defines the opening 24, and the second liquid LC may be supplied toward the optical path of the exposure light EL.

  Further, in each of the above-described embodiments, the case where the liquid immersion member 4 (4B to 4F) including the liquid recovery surface 33 disposed around the flat surface 31 is cleaned has been described as an example. Such a liquid immersion member 4G can also be cleaned. FIG. 15 is a perspective view of the liquid immersion member 4G as viewed from below (−Z side).

  In FIG. 15, the lower surface 21G of the liquid immersion member 4G includes a first region (flat surface) 31G disposed around the opening 24, and a second region 32G including the groove 29 disposed around the first region 31G. The liquid recovery surface 33G disposed outside the first and second regions 31G and 32G with respect to the opening 24, and the inclined surface 34G disposed outside the first and second regions 31G and 32G with respect to the opening 24. It has. A second supply port 42 is disposed in the groove 29. The liquid recovery surface 33G is provided on each of one side (+ X side) and the other side (−X side) in the X-axis direction with respect to the first and second regions 31G and 32G. The slope 34G is provided on each of one side (+ Y side) and the other side (−Y side) in the Y-axis direction with respect to the first and second regions 31G and 32G.

  The inclined surface 34G can hold the first liquid LQ with the surface of the substrate P during the exposure of the substrate P. The slope 34G is disposed at a position farther from the surface of the substrate P than the first and second regions 31G and 32G. The inclined surface 34G is inclined so as to gradually move away from the surface of the substrate P in a direction (radiation direction) away from the optical path of the exposure light EL with respect to the Y-axis direction. The slope 34G cannot collect the first liquid LQ.

  Also in the liquid immersion member 4G shown in FIG. 15, the second liquid LC can be supplied from the second supply port 42 so as to contact the lower surface 21G of the liquid immersion member 4G, and the lower surface 21G can be cleaned.

  The details of the liquid immersion member 4G as shown in FIG. 15 are disclosed in European Patent Application Publication No. 1865542.

  In each of the above-described embodiments, the liquid immersion member 4 has been described as an example in which at least a part is provided with the upper surface 25 facing the exit surface 20 of the last optical element 19, but for example as shown in FIG. In addition, the liquid immersion member 4H from which the upper surface 25 is omitted can be cleaned with the second liquid LC. For example, as in the second embodiment, by disposing the cover member 70H between the terminal optical element 19 and the substrate stage 1, the contact between the second liquid LC and the terminal optical element 19 can be prevented.

  Further, in the liquid immersion member 4H in which the upper surface 25 is omitted, the first liquid LQ is allowed to flow from the first supply port 41 as in the above-described first embodiment, or the terminal optical element 19 as in the above-described third embodiment. A shutter member may be disposed below the end optical element 19 or a fluid curtain may be provided below the last optical element 19 as in the fourth embodiment.

  As described above, also in this embodiment, as in the above-described embodiments, the barrier between the second liquid LC and the terminal optical element 19 can be prevented by providing the barrier below the terminal optical element 19.

<Fifth Embodiment>
Next, a fifth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  In each of the above-described embodiments, the case where the second supply port 42 is disposed in the liquid immersion member 4 has been described as an example. However, a characteristic part of the fifth embodiment is that the lower surface 21 of the liquid immersion member 4J The second supply port 42J is provided in a predetermined member arranged at an opposing position.

  FIG. 17 is a view showing an example of an exposure apparatus EX according to the fifth embodiment. In FIG. 17, the measurement stage 2J includes a second supply port 42J disposed on the upper surface 14. The second supply port 42J can face the lower surface 21 of the liquid immersion member 4J. The second supply port 42J is connected to the second supply device 46J through the flow path 45J. The channel 45J includes a supply channel formed inside the measurement stage 2J and a channel formed by a supply pipe that connects the supply channel and the second supply device 46J.

  In the present embodiment, the prevention device 53J includes a cover member 70 for closing the opening 24 and a holding device 71 that holds the cover member 70 so as to be releasable as described in the second embodiment. Also in this embodiment, the first liquid LQ is allowed to flow from the first supply port 41 as in the above-described first embodiment, or a shutter member is provided below the last optical element 19 as in the above-described third embodiment. Alternatively, a fluid curtain may be provided below the last optical element 19 as in the fourth embodiment.

  The control device 5 supplies the second liquid LC using the second supply port 42J in a state where the lower surface 21 of the liquid immersion member 4J and the second supply port 42J disposed on the upper surface 14 of the measurement stage 2J are opposed to each other. In parallel with this, by performing the recovery operation of the second liquid LC using the liquid recovery port 47J disposed in the liquid immersion member 4J, the lower surface 21 of the liquid immersion member 4J, the upper surface 14 of the measurement stage 2J, and the like are cleaned. can do.

  In the present embodiment, the case where the second supply port 42J is arranged in the measurement stage 2J has been described as an example, but the second supply port may be arranged in the substrate stage 1. In a state where the lower surface 21 of the liquid immersion member and the second supply port arranged on the upper surface 13 of the substrate stage 1 are opposed to each other, a liquid recovery port is provided in parallel with the supply operation of the second liquid LC using the second supply port. By performing the recovery operation of the second liquid LC using the liquid, it is possible to clean the lower surface 21 of the liquid immersion member, the upper surface 13 of the substrate stage 1, and the like.

  In the present embodiment, the liquid supply member 4J is also provided with a second supply port for supplying the second liquid LC, and faces the second supply port of the liquid immersion member 4J and the lower surface 21 of the liquid immersion member 4J. You may use together with the 2nd supply port 42J of the predetermined member (measurement stage 2 etc.) arrange | positioned in a position.

  In the first to fifth embodiments described above, the position facing the lower surface of the liquid immersion member together with the liquid recovery port 47 (liquid recovery surface 33) or without using the liquid recovery port 47 (liquid recovery surface 33). The first liquid LQ and / or the second liquid LC may be recovered using the liquid recovery unit disposed in the. The liquid recovery part disposed at a position facing the lower surface of the liquid immersion member can be provided in the substrate stage 1 and / or the measurement stage 2, for example.

  In the first to fifth embodiments described above, predetermined members (substrate stage 1, measurement stage 2, dummy substrate DP) are disposed at positions facing the lower surface 21 of the liquid immersion member 4. Although the case where the second liquid LC is supplied between the lower surface 21 and the predetermined member and the immersion space is formed by the second liquid LC has been described as an example, as described above, it faces the lower surface of the immersion member. In the case where the liquid recovery unit is disposed at a position where the liquid is to be discharged, the second liquid LC may be sprayed from below the liquid immersion member 4 toward the lower surface of the liquid immersion member 4 with the opening 24 closed by the cover member 70, for example. Good. Further, as described above, when the liquid recovery unit is disposed at a position facing the lower surface of the liquid immersion member, for example, the second liquid LC may be supplied from the liquid recovery port 47 of the liquid immersion member.

  In the above-described embodiment, the second liquid LC containing ammonia is used. However, the present invention is not limited to this. At least one of choline, sodium hydroxide (NaOH), potassium hydroxide (KOH), and tetramethylammonium hydroxide is used. A second liquid LC containing one may be used.

  In each of the above-described embodiments, ultrasonic cleaning that applies vibration (ultrasonic waves) to the second liquid LC may be used in combination.

  In each of the above-described embodiments, the liquid immersion member 4 may be movable with respect to the last optical element 19. Further, in each of the above-described embodiments, the liquid immersion member 4 may be divided into a plurality of members.

  In the projection optical system PL in each of the above-described embodiments, the optical path on the exit side (image plane side) of the last optical element 19 is filled with the first liquid LQ. A projection optical system in which the optical path on the incident side (object plane side) of the last optical element 19 is also filled with liquid as disclosed in the / 019128 pamphlet can be adopted.

  In addition, although the 1st liquid LQ of each above-mentioned embodiment is water, liquids other than water may be sufficient. For example, hydrofluoroether (HFE), perfluorinated polyether (PFPE), fomblin oil, or the like can be used as the first liquid LQ. In addition, various fluids such as a supercritical fluid can be used as the first liquid LQ.

  As the substrate P in each of the above embodiments, not only a semiconductor wafer for manufacturing a semiconductor device, but also a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an original mask or reticle used in an exposure apparatus. (Synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise.

  Furthermore, in the step-and-repeat exposure, after the reduced image of the first pattern is transferred onto the substrate P using the projection optical system PL while the first pattern and the substrate P are substantially stationary, the second pattern In a state where the pattern and the substrate P are substantially stationary, a reduced image of the second pattern may be partially overlapped with the first pattern using the projection optical system PL and may be collectively exposed on the substrate P (stitch-type batch). Exposure equipment). Further, the stitch type exposure apparatus can be applied to a step-and-stitch type exposure apparatus in which at least two patterns are partially transferred on the substrate P, and the substrate P is sequentially moved.

  Further, as disclosed in, for example, US Pat. No. 6,611,316, two mask patterns are synthesized on a substrate via a projection optical system, and one shot area on the substrate is obtained by one scanning exposure. The present invention can also be applied to an exposure apparatus that performs double exposure almost simultaneously. The present invention can also be applied to proximity type exposure apparatuses, mirror projection aligners, and the like.

  The present invention also relates to a twin stage type exposure apparatus having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. It can also be applied to.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern onto the substrate P, but an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). ), An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, a reticle, a mask, or the like.

  In each of the above-described embodiments, the positional information of the mask stage 1 and the substrate stage 2 is measured using an interferometer system including a laser interferometer. An encoder system for detecting a scale (diffraction grating) provided in 2 may be used. In this case, it is good also as a hybrid system provided with both an interferometer system and an encoder system.

  In each of the above embodiments, an ArF excimer laser may be used as a light source device that generates ArF excimer laser light as the exposure light EL. For example, as disclosed in US Pat. No. 7,023,610. A harmonic generator that outputs pulsed light with a wavelength of 193 nm may be used, including a solid-state laser light source such as a DFB semiconductor laser or a fiber laser, an optical amplification unit having a fiber amplifier, a wavelength conversion unit, and the like. Furthermore, in the above-described embodiment, each illumination area and the projection area described above are rectangular, but other shapes such as an arc shape may be used.

  In each of the above-described embodiments, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. As disclosed in Japanese Patent No. 6778257, a variable shaped mask (also known as an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. May be used). The variable shaping mask includes, for example, a DMD (Digital Micro-mirror Device) which is a kind of non-light emitting image display element (spatial light modulator). Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element. As a self-luminous type image display element, for example, CRT (Cathode Ray Tube), inorganic EL display, organic EL display (OLED: Organic Light Emitting Diode), LED display, LD display, field emission display (FED: Field Emission Display) And a plasma display panel (PDP).

  In each of the above embodiments, the exposure apparatus provided with the projection optical system PL has been described as an example, but the present invention can be applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. Even when the projection optical system PL is not used in this way, the exposure light is irradiated onto the substrate via an optical member such as a lens, and an immersion space is formed in a predetermined space between the optical member and the substrate. It is formed.

  Further, as disclosed in, for example, International Publication No. 2001/035168, an exposure apparatus (lithography system) that exposes a line and space pattern on the substrate P by forming interference fringes on the substrate P. The present invention can also be applied to.

  As described above, the exposure apparatus EX of the present embodiment maintains various mechanical subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Manufactured by assembling. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 18, a microdevice such as a semiconductor device includes a step 201 for designing the function and performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate which is a base material of the device. Substrate processing step 204 including substrate processing (exposure processing) including exposing the substrate with exposure light using a mask pattern and developing the exposed substrate according to the above-described embodiment. The device is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a package process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 1 ... Substrate stage, 2 ... Measurement stage, 4 ... Liquid immersion member, 19 ... End optical element, 20 ... Ejection surface, 21 ... Lower surface, 23 ... 2nd plate part, 24 ... Opening, 26 ... Upper space, 28 ... Bottom Side space 33 ... Flat surface 41 ... First supply port 42 ... Second supply port 47 ... Liquid recovery port 53 ... Prevention device 70 ... Cover member 71 ... Holding device 77 ... Fluid curtain DP ... Dummy substrate, EL ... exposure light, EX ... exposure device, LC ... cleaning liquid, LQ ... exposure liquid, P ... substrate

Claims (40)

An exposure apparatus that exposes a substrate with exposure light through an exposure liquid,
An optical member having an exit surface for emitting the exposure light;
A first supply port for supplying the exposure liquid;
An immersion member capable of forming an immersion space so that an optical path of the exposure light emitted from the optical member is filled with the exposure liquid;
A second supply port for supplying a cleaning liquid so as to come into contact with the liquid immersion member;
An exposure apparatus comprising: a prevention device that prevents contact between the cleaning liquid and the optical member. The liquid immersion member includes a plate portion having an opening through which the exposure light emitted from the emission surface can pass.
The cleaning liquid is supplied to a space below the opening;
The exposure apparatus according to claim 1, wherein the prevention device prevents the cleaning liquid from flowing into a space above the opening through the opening.   The exposure apparatus according to claim 2, wherein the prevention device includes a cover member for closing the opening.   4. The exposure apparatus according to claim 3, wherein the prevention device includes a holding device that releasably holds the cover member in order to close the opening with the cover member.   The exposure apparatus according to claim 4, wherein at least a part of the holding device is provided on the liquid immersion member.   The exposure apparatus according to claim 2, wherein the prevention device forms a fluid curtain in the vicinity of the opening.   The exposure apparatus according to claim 6, wherein the fluid curtain is formed by flowing the fluid from one side of the opening toward the other side.   The exposure apparatus according to claim 6, wherein the fluid includes a gas.   The prevention device includes the first supply port, and prevents the cleaning liquid from flowing into the upper space by supplying the exposure liquid from the first supply port to the upper space. 2. The exposure apparatus according to 2. The plate portion is disposed around the opening and includes a flat surface facing a space below the opening;
The exposure apparatus according to claim 9, wherein the second supply port is disposed outside the flat surface with respect to the opening.   The exposure apparatus according to claim 1, wherein the prevention device includes the first supply port, and prevents the cleaning liquid from contacting the optical member by supplying the exposure liquid from the first supply port. .   The exposure apparatus according to claim 11, wherein the first supply port is disposed closer to the optical member than the second supply port.   The exposure apparatus according to claim 11 or 12, wherein the first supply port is disposed above the second supply port.   The exposure apparatus according to claim 2, wherein the cleaning liquid is supplied to a space between the liquid immersion member and a predetermined member.   The exposure apparatus according to claim 1, wherein the cleaning liquid is supplied to a space between the liquid immersion member and a predetermined member.   16. The exposure apparatus according to claim 15, wherein the prevention device prevents contact between the cleaning liquid and the optical member by providing a barrier between the optical member and the predetermined member.   The exposure apparatus according to claim 16, wherein the barrier includes a cover member disposed between the optical member and the predetermined member.   The exposure apparatus according to claim 17, wherein the prevention device includes a holding device that holds the cover member in a releasable manner.   The exposure apparatus according to claim 18, wherein at least a part of the holding device is provided on the liquid immersion member.   The exposure apparatus according to claim 16, wherein the barrier includes a fluid curtain.   The exposure apparatus according to claim 20, wherein the fluid includes a gas.   The exposure apparatus according to any one of claims 14 to 21, wherein the predetermined member is movable with respect to the liquid immersion member. A stage movable with respect to the liquid immersion member;
The exposure apparatus according to claim 22, wherein the predetermined member includes a part of the stage.   The exposure apparatus according to claim 23, wherein the stage includes a substrate stage for holding the substrate.   The exposure apparatus according to claim 23 or 24, wherein the stage includes a measurement stage on which at least one measuring instrument is mounted.   The exposure apparatus according to any one of claims 23 to 25, wherein the second supply port is provided in the stage.   27. The exposure apparatus according to claim 14, wherein the predetermined member is cleaned with the cleaning liquid. The second supply port is disposed in the liquid immersion member,
28. The exposure apparatus according to claim 27, wherein the predetermined member is disposed so as to face the second supply port.   The exposure apparatus according to claim 1, wherein the second supply port is disposed in the liquid immersion member.   30. The exposure apparatus according to claim 1, wherein the liquid immersion member is cleaned with the cleaning liquid.   The exposure apparatus according to claim 1, wherein the first supply port is disposed in the liquid immersion member.   The exposure apparatus according to claim 1, wherein the cleaning liquid contains an alkali.   The exposure apparatus according to claim 1, further comprising a liquid recovery port capable of recovering at least one of the exposure liquid and the cleaning liquid. Exposing the substrate using the exposure apparatus according to any one of claims 1 to 33;
Developing the exposed substrate; and a device manufacturing method. An exposure apparatus cleaning method for exposing a substrate through exposure liquid with exposure light emitted from an optical member,
Disposing a predetermined member to face an immersion member capable of forming an immersion space so that an optical path of the exposure light emitted from the optical member is filled with the exposure liquid;
Supplying a cleaning liquid to a space between the liquid immersion member and the predetermined member,
A cleaning method in which the supply of the cleaning liquid is performed while preventing contact between the cleaning liquid and the optical member.   36. The cleaning method according to claim 35, wherein the predetermined member includes a movable member movable with respect to the liquid immersion member. The exposure apparatus includes a substrate holding unit that holds the substrate in a releasable manner,
37. The cleaning method according to claim 36, wherein the predetermined member includes a dummy substrate held by the substrate holding part. Stopping the supply of the cleaning liquid;
38. The cleaning method according to claim 35, further comprising removing the cleaning liquid from the predetermined member before exposing the substrate.   The cleaning method according to claim 38, wherein the removal of the cleaning liquid includes supply of the exposure liquid. Cleaning an exposure apparatus that exposes a substrate with exposure light through an exposure liquid by the cleaning method according to any one of claims 35 to 39;
After the cleaning, exposing the substrate with the exposure apparatus;
Developing the exposed substrate. A device manufacturing method.

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