JP2010157726A - Exposure apparatus, exposure method, and device manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing exposure defects. <P>SOLUTION: The exposure apparatus includes: an optical system that includes an emission surface from which exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface; a second surface that is disposed in at least a part of a surrounding of the first surface and below the first surface; a space portion into which a liquid can flow via a first aperture between the first surface and the second surface and which is opened to the atmosphere via a second aperture different from the first aperture; and a first recovery portion that recovers at least a part of the liquid flowing into the space portion. Here, the surface of the substrate faces the emission surface and the first and second surfaces in at least a part of the exposure of the substrate, and the substrate is exposed with the exposure light from the emission surface via the liquid between the emission surface and the surface of the substrate. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an exposure apparatus, an exposure method, and a device manufacturing method.

  In a manufacturing process of a micro device such as a semiconductor device or an electronic device, an immersion exposure apparatus that exposes a substrate with exposure light through a liquid, for example, as disclosed in the following patent document is known.

US Patent Application Publication No. 2006/0221315 US Patent Application Publication No. 2007/0081140 US Patent Application Publication No. 2008/0174748

  In the immersion exposure apparatus, a member in contact with the liquid may be contaminated. For example, if a foreign substance adheres to the member, exposure failure may occur, such as a defect formed in a pattern formed on the substrate due to the foreign substance. As a result, a defective device may occur.

  An object of an aspect of the present invention is to provide an exposure apparatus and an exposure method that can suppress the occurrence of exposure failure. Another object of the present invention is to provide a device manufacturing method that can suppress the occurrence of defective devices.

  According to the first aspect of the present invention, in an exposure apparatus that exposes a substrate, an optical system having an exit surface that emits exposure light, and at least part of the periphery of the optical path of the exposure light that exits from the exit surface Through the first opening between the first surface and the second surface, the second surface disposed at least part of the periphery of the first surface and below the first surface, and the first surface A substrate, comprising: a gap portion into which liquid can flow in and opened to the atmosphere through a second opening different from the first opening; and a first collection portion for collecting at least a part of the liquid flowing into the gap portion, In at least a part of the exposure, the surface of the substrate faces the exit surface, the first surface, and the second surface, and the substrate is exposed to exposure light from the exit surface through the liquid between the exit surface and the surface of the substrate. An exposure apparatus for exposing is provided.

  According to the second aspect of the present invention, in an exposure apparatus that exposes a substrate, an optical system having an exit surface that emits exposure light, and at least part of the periphery of the optical path of the exposure light that exits from the exit surface Liquid is allowed to flow in through the first surface formed, the second surface disposed at least partially around the first surface, and the first opening between the first surface and the second surface, At least a part is provided on the outer side of the upper end in the radial direction with respect to the optical axis of the optical system, a gap opened to the atmosphere through a second opening different from the first opening, an upper end defining the upper end of the gap And a first recovery unit that recovers at least a part of the liquid that has flowed into the gap, and the surface of the substrate faces the emission surface, the first surface, and the second surface in at least a part of the exposure of the substrate Exposure light from the exit surface through the liquid between the exit surface and the surface of the substrate. Exposure apparatus is provided for exposing the plate.

  According to the third aspect of the present invention, in an exposure apparatus that exposes a substrate, an optical system having an exit surface that emits exposure light, and a first opening disposed at least partly around the optical path of the exposure light. A liquid is allowed to flow in, and is provided with a gap opened to the atmosphere through a second opening different from the first opening, and a first collecting part for collecting the liquid from the gap, and the first collecting part Has a reserve portion for storing liquid from the gap portion so as not to return to the gap portion, and reserves at least part of the liquid on the substrate from the first opening through the gap portion in at least part of the exposure of the substrate. An exposure apparatus is provided that exposes the substrate with exposure light from the exit surface via a liquid between the exit surface and the substrate.

  According to a fourth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the exposure apparatus according to the first, second, and third aspects; and developing the exposed substrate. Provided.

  According to the fifth aspect of the present invention, the first surface disposed at least in the periphery of the optical path of the exposure light emitted from the exit surface of the optical system and the substrate are opposed to each other through the first gap. The liquid is held between the first surface and the substrate, and the second surface disposed at least at a part of the periphery of the first surface is opposed to the substrate through a second gap smaller than the first gap. And recovering at least a part of the liquid that has flowed from the first opening between the first surface and the second surface into the gap that is open to the atmosphere through a second opening different from the first opening. And exposing the substrate with exposure light from the exit surface via a liquid between the exit surface and the substrate.

  According to the sixth aspect of the present invention, the first surface disposed on at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical system is opposed to the substrate via the first gap. Holding the liquid between the first surface and the substrate, opposing the substrate to the second surface disposed at least part of the periphery of the first surface, and the first surface and the second surface At least part of the liquid that has flowed from the first opening to the gap that is open to the atmosphere via the second opening that is different from the first opening, in the radial direction with respect to the optical axis of the optical system. And exposing the substrate with exposure light from the exit surface via a liquid between the exit surface and the substrate.

  According to the seventh aspect of the present invention, the optical path of the exposure light between the exit surface of the optical system and the substrate is filled with the liquid, and the exposure from the exit surface through the liquid between the exit surface and the substrate. Exposing the substrate with light, and at least part of the liquid on the substrate is released from the first opening disposed at least part of the periphery of the optical path to the atmosphere through a second opening different from the first opening. Recovering through the gap, and the collection includes storing the liquid from the gap in the reserve so that the recovered liquid does not return to the gap. .

  According to an eighth aspect of the present invention, there is provided a device manufacturing method comprising: exposing a substrate using the exposure method according to the fifth, sixth, and seventh aspects; and developing the exposed substrate. Provided.

  According to the aspect of the present invention, it is possible to suppress the occurrence of exposure failure. Moreover, according to the aspect of this invention, generation | occurrence | production of a defective device can be suppressed.

It is a schematic block diagram which shows an example of the exposure apparatus which concerns on 1st Embodiment. It is the figure which expanded a part of exposure apparatus which concerns on 1st Embodiment. It is the figure which looked at the liquid immersion member concerning a 1st embodiment from the upper part. It is a figure which shows the vicinity of the liquid immersion member which concerns on 1st Embodiment. It is a figure which shows the vicinity of the 1st collection | recovery part which concerns on 1st embodiment. It is a figure which shows the vicinity of the liquid immersion member which concerns on 2nd Embodiment. It is a figure which shows the vicinity of the liquid immersion member which concerns on 3rd Embodiment. It is a figure which shows the vicinity of the liquid immersion member which concerns on 4th Embodiment. It is a figure which shows the vicinity of the liquid immersion member which concerns on 5th Embodiment. It is a figure which shows the vicinity of the liquid immersion member which concerns on 6th Embodiment. It is a figure which shows the vicinity of the liquid immersion member which concerns on 7th Embodiment. It is a figure which shows the vicinity of the liquid immersion member which concerns on 8th Embodiment. It is a figure which shows the vicinity of the liquid immersion member which concerns on 9th Embodiment. It is a flowchart for demonstrating an example of the manufacturing process of a microdevice.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. In addition, the rotation (inclination) directions around the X axis, the Y axis, and the Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the first embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL through a liquid LQ. In the present embodiment, water (pure water) is used as the liquid LQ.

  In FIG. 1, an exposure apparatus EX optically positions a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and the positions of the mask stage 1 and the substrate stage 2. Interferometer system 3 for measuring, illumination system IL for illuminating mask M with exposure light EL, projection optical system PL for projecting a pattern image of mask M illuminated with exposure light EL onto substrate P, and exposure light EL A liquid immersion member 4 capable of forming an immersion space LS so that at least a part of the optical path of the liquid crystal is filled with the liquid LQ, a chamber device 5 that houses at least the projection optical system PL, and a body that supports at least the projection optical system PL. 6 and a control device 7 for controlling the overall operation of the exposure apparatus EX.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

  The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a multilayer film formed on the base material. The multilayer film is a film in which a plurality of films including at least a photosensitive film are stacked. The photosensitive film is a film formed of a photosensitive material. Further, the multilayer film may include, for example, an antireflection film and a protective film (topcoat film) that protects the photosensitive film.

  The chamber device 5 includes a chamber member 5A that forms a substantially closed internal space 8, and an environment control device 5B that controls the environment (temperature, humidity, cleanliness, pressure, etc.) of the internal space 8. The body 6 is disposed in the internal space 8. The body 6 includes a first column 9 provided on the support surface FL and a second column 10 provided on the first column 9. The first column 9 includes a first support member 11 and a first surface plate 13 supported by the first support member 11 via a vibration isolator 12. The second column 10 includes a second support member 14 provided on the first surface plate 13 and a second surface plate 16 supported by the second support member 14 via a vibration isolator 15. In the present embodiment, the third surface plate 18 is disposed on the support surface FL via the vibration isolator 17.

The illumination system IL irradiates the predetermined illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g-line, h-line, i-line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F ₂ laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light that is ultraviolet light (vacuum ultraviolet light) is used as the exposure light EL.

  The mask stage 1 has a mask holding part 19 that holds the mask M so as to be releasable, and is movable on the guide surface 16G of the second surface plate 16 while holding the mask M. The mask stage 1 can move while holding the mask M with respect to the illumination region IR by the operation of the drive system 20. The drive system 20 includes a planar motor having a mover 20 </ b> A disposed on the mask stage 1 and a stator 20 </ b> B disposed on the second surface plate 16. A flat motor capable of moving the mask stage 1 is disclosed in, for example, US Pat. No. 6,452,292. The mask stage 1 can be moved in six directions, that is, the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions by the operation of the drive system 20.

  The projection optical system PL irradiates the predetermined projection region PR with the exposure light EL. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. The projection optical system PL of the present embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis AX of the projection optical system PL is parallel to the Z axis. The projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, and a catadioptric system that includes a reflective optical element and a refractive optical element. Further, the projection optical system PL may form either an inverted image or an erect image.

  A plurality of optical elements of the projection optical system PL are held by a holding member (lens barrel) 21. The holding member 21 has a flange 21F. The projection optical system PL is supported by the first surface plate 13 via the flange 21F. A vibration isolator can be provided between the first surface plate 13 and the holding member 21.

  The projection optical system PL has an exit surface 23 that emits the exposure light EL toward the image plane of the projection optical system PL. The exit surface 23 is disposed on the terminal optical element 22 closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The projection region PR includes a position where the exposure light EL emitted from the emission surface 23 can be irradiated. In the present embodiment, the exit surface 23 faces the −Z direction and is parallel to the XY plane. The exit surface 23 facing the −Z direction may be a convex surface or a concave surface.

  In the present embodiment, the optical axis (optical axis in the vicinity of the image plane of the projection optical system PL) AX of the terminal optical element 22 is substantially parallel to the Z axis. Note that the optical axis defined by the optical element adjacent to the terminal optical element 22 may be regarded as the optical axis of the terminal optical element 22. In the present embodiment, the image plane of the projection optical system PL is substantially parallel to the XY plane including the X axis and the Y axis. In the present embodiment, the image plane is substantially horizontal. However, the image plane may not be parallel to the XY plane or may be a curved surface.

  The substrate stage 2 has a substrate holding portion 24 that holds the substrate P so as to be releasable, and is movable on the guide surface 18G of the third surface plate 18. The substrate stage 2 can move while holding the substrate P with respect to the projection region PR by the operation of the drive system 25. The drive system 25 includes a planar motor having a mover 25 </ b> A disposed on the substrate stage 2 and a stator 25 </ b> B disposed on the third surface plate 18. A flat motor capable of moving the substrate stage 2 is disclosed in, for example, US Pat. No. 6,452,292. The substrate stage 2 can be moved in six directions, that is, the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions by the operation of the drive system 25.

  The substrate stage 2 has an upper surface 26 that is disposed around the substrate holding unit 24 and can face the emission surface 23. In the present embodiment, the substrate stage 2 is disposed at least at a part of the periphery of the substrate holding portion 24 as disclosed in US Patent Application Publication No. 2007/0177125 and the like, and the lower surface of the plate member T is disposed on the lower surface of the plate member T. It has the plate member holding | maintenance part 27 hold | maintained so that release is possible. In the present embodiment, the upper surface 26 of the substrate stage 2 includes the upper surface of the plate member T. The upper surface 26 is flat.

  In the present embodiment, the substrate holding unit 24 holds the substrate P so that the surface of the substrate P and the XY plane are substantially parallel. The plate member holding portion 27 holds the plate member T so that the upper surface 26 of the plate member T and the XY plane are substantially parallel.

  The interferometer system 3 optically measures the position of the first interferometer unit 3A capable of optically measuring the position of the mask stage 1 (mask M) in the XY plane and the position of the substrate stage 2 (substrate P) in the XY plane. And a second interferometer unit 3B capable of measuring. When executing the exposure process of the substrate P or when executing the predetermined measurement process, the control device 7 operates the drive systems 20 and 25 based on the measurement result of the interferometer system 3 to thereby perform the mask stage 1 (mask M) and position control of the substrate stage 2 (substrate P) are executed.

  The liquid immersion member 4 is disposed on at least a part of the periphery of the optical path of the exposure light EL so that the optical path of the exposure light EL emitted from the emission surface 23 is filled with the liquid LQ. The liquid immersion member 4 forms the liquid immersion space LS so that the optical path of the exposure light EL between the emission surface 23 and an object disposed at a position facing the emission surface 23 is filled with the liquid LQ. The immersion space LS is a portion (space, region) filled with the liquid LQ. In the present embodiment, the object includes at least one of the substrate stage 2 (plate member T) and the substrate P held on the substrate stage 2. During the exposure of the substrate P, the liquid immersion member 4 forms the liquid immersion space LS so that the optical path of the exposure light EL between the last optical element 22 and the substrate P is filled with the liquid LQ.

  In the present embodiment, the liquid immersion member 4 includes a first member 31 and a second member 32. The first member 31 and the second member 32 are disposed in the vicinity of the last optical element 22. In the present embodiment, the first member 31 is supported by the first support mechanism 28. The second member 32 is supported by the second support mechanism 29. In the present embodiment, the first and second support mechanisms 28 and 29 are supported by the first surface plate 13. In the present embodiment, the first member 31 is suspended from the first surface plate 13 via the first support mechanism 28. The second member 32 is suspended from the first surface plate 13 via the second support mechanism 29.

  The exposure apparatus EX of the present embodiment is a scanning exposure apparatus (so-called scanning stepper) that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. At the time of exposure of the substrate P, the control device 7 controls the mask stage 1 and the substrate stage 2 to perform predetermined scanning in the XY plane that intersects the optical axis AX (optical path of the exposure light EL) with the mask M and the substrate P. Move in the direction. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the Y-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the Y-axis direction. The control device 7 moves the substrate P in the Y-axis direction with respect to the projection region PR of the projection optical system PL, and in the illumination region IR of the illumination system IL in synchronization with the movement of the substrate P in the Y-axis direction. On the other hand, the substrate P is irradiated with the exposure light EL through the projection optical system PL and the liquid LQ in the immersion space LS on the substrate P while moving the mask M in the Y-axis direction. Thereby, the pattern image of the mask M is projected onto the substrate P, and the substrate P is exposed with the exposure light EL.

  2 is a side sectional view showing the vicinity of the liquid immersion member 4, FIG. 3 is a view of the liquid immersion member 4 seen from above, and FIG. 4 is an enlarged view of a part of FIG.

  As shown in FIGS. 2, 3, and 4, in the present embodiment, each of the first member 31 and the second member 32 is an annular member. At least a part of the first member 31 is disposed around a part of the optical path of the exposure light EL and the terminal optical element 22. At least a part of the second member 23 is disposed around the first member 31. As shown in FIG. 3, in the present embodiment, the outer shape of the first member 31 and the second member 32 in the XY plane is a circle. The outer shape of the first member 31 and the second member 32 may be other shapes (for example, a rectangle).

  The liquid immersion member 4 includes a first surface 41 disposed at least part of the periphery of the optical path of the exposure light EL emitted from the emission surface 23, at least part of the periphery of the first surface 41, and the first surface 41. The liquid LQ can flow in through the second surface 42 disposed further downward (on the −Z side) and the first opening 33 between the first surface 41 and the second surface 42. A gap 80 opened to the atmosphere through a different second opening 34 and a first recovery part 60 for recovering at least a part of the liquid LQ flowing into the gap 80 are provided. In the present embodiment, the first surface 41 is disposed on the first member 31. The second surface 42 is disposed on the second member 32. The first surface 41 and the second surface 42 can face the surface (upper surface) of an object disposed below the liquid immersion member 4. In the present embodiment, the outer shapes of the first surface 41 and the second surface 42 in the XY plane are circular. Further, the inner edge of the second surface 42 in the XY plane is also circular.

  In the present embodiment, the first surface 41 and the second surface 42 cannot collect the liquid LQ. That is, in the present embodiment, the first surface 41 and the second surface 42 are not provided with a liquid recovery port. In the present embodiment, the first surface 41 and the second surface 42 are flat. The first space 51 between the first surface 41 and the surface (upper surface) of the object can hold the liquid LQ. In the present embodiment, the first surface 41 and the second surface 42 are each parallel to the XY plane (horizontal plane), but at least a part of the first surface 41 and / or the second surface 42 is the XY plane. The first surface 41 and the second surface 42 may not be parallel to each other. In the present embodiment, at least one of the first surface 41 and the second surface 42 may include a curved surface.

  In at least a part of the exposure of the substrate P, the surface of the substrate P faces the emission surface 23, the first surface 41, and the second surface 42. In at least part of the exposure of the substrate P, the space between the emission surface 23 and the surface of the substrate P is filled with the liquid LQ. In at least a part of the exposure of the substrate P, the liquid LQ is held in the first space 51 between the first surface 41 and the surface of the substrate P. The substrate P is exposed with the exposure light EL from the emission surface 23 via the liquid LQ between the emission surface 23 and the surface of the substrate P.

  In the present embodiment, a part of the immersion space LS is formed by the liquid LQ held between the first surface 41 and the object. In the present embodiment, the immersion space LS is formed so that a part of the surface of the substrate P including the projection region PR is covered with the liquid LQ when the substrate P is irradiated with the exposure light EL. . The gas-liquid interface (meniscus, edge) LG1 of the liquid LQ in the immersion space LS can be formed between at least one of the first surface 41 and the second surface 42 and the surface of the substrate P. It is desirable to form between the inner edge of 42 and the substrate P. The exposure apparatus EX of the present embodiment employs a local liquid immersion method.

  Hereinafter, for simplicity, the substrate P is disposed at a position facing the emission surface 23, the first surface 41, and the second surface 42, and the liquid LQ is held between the liquid immersion member 4 and the substrate P so that the liquid immersion is performed. A case where the space LS is formed will be described as an example. As described above, the liquid immersion space LS can be formed between the emission surface 23 and the liquid immersion member 4 and other members (such as the plate member T of the substrate stage 2).

  As described above, in the present embodiment, each of the first surface 41 and the second surface 42 is substantially parallel to the XY plane. As shown in FIG. 4 and the like, the first surface 41 faces the surface of the substrate P through the first gap G1, and the second surface 42 faces through the second gap G2. The second gap G2 is smaller than the first gap G1.

  In the present embodiment, the first member 31 includes a first surface 41 that can face the surface of the substrate P, a third surface 43 that faces in the opposite direction to the first surface 41 and faces at least a part of the emission surface 23. The fourth surface 44 disposed around the third surface 43 and facing the side surface 35 of the last optical element 22, and the fifth surface 45 disposed around the fourth surface 44 and facing the outer surface 36 of the holding member 21. And have. The first member 31 includes a plate portion 37 disposed so that at least a part thereof faces the emission surface 23, and a main body portion 38 disposed at least around the terminal optical element 22. The first surface 41 and the third surface 43 are disposed on the plate portion 37. The fourth surface 44 and the fifth surface 45 are disposed in the main body portion 38. Further, the plate portion 37 has an opening 39 through which the exposure light EL emitted from the emission surface 23 can pass. During the exposure of the substrate P, the exposure light EL emitted from the emission surface 23 is irradiated on the surface of the substrate P through the opening 39. As shown in FIG. 3, in the present embodiment, the opening 39 is long in the X-axis direction intersecting the scanning direction (Y-axis direction) of the substrate P.

  The third surface 43 opposes the emission surface 23 via the third gap G3. The fourth surface 44 faces the side surface 35 via the fourth gap G4. The fifth surface 45 faces the outer surface 36 via the fifth gap G5.

  The side surface 35 of the last optical element 22 is a surface different from the exit surface 23 and is a surface through which the exposure light EL does not pass. The side surface 35 is disposed around the emission surface 23. The side surface 35 is disposed so as to extend upward (+ Z direction) from the periphery of the emission surface 23. The side surface 35 is provided so as to extend from the periphery of the emission surface 23 in a radiation direction with respect to the optical axis AX (a direction perpendicular to the optical axis AX). That is, the side surface 35 is inclined so as to extend upward in the radial direction with respect to the optical axis AX.

  In the present embodiment, the third surface 43 and the exit surface 23 are substantially parallel. Further, the fourth surface 44 and the side surface 35 are substantially parallel. Further, the fifth surface 45 and the outer surface 36 are substantially parallel. In addition, the 3rd surface 43 and the injection | emission surface 23 do not need to be parallel. Further, the fourth surface 44 and the side surface 35 may not be parallel. Further, the fifth surface 45 and the outer surface 36 may not be parallel.

  A space between the last optical element 22 and the holding member 21 and the first member 31 is defined by a third space 53 defined by the emission surface 23 and the third surface 43, and a side surface 35 and a fourth surface 44. A fourth space 54 and a fifth space 55 defined by the outer surface 36 and the fifth surface 45. The fourth space 54 is a space inclined so as to extend in the radial direction with respect to the optical axis AX, in a direction away from the image plane of the projection optical system PL, and in the + Z direction. The fifth space 55 is a space extending in the radiation direction (direction perpendicular to the optical axis AX) with respect to the optical axis AX.

  In the present embodiment, the fourth surface 44 faces the side surface 35 of the last optical element 22, but at least a part of the fourth surface 44 may face the outer surface of the holding member 21. In the present embodiment, the fifth surface 45 faces the outer surface 36 of the holding member 21, but the lower surface of the terminal optical element 22 is exposed around the side surface 35 of the terminal optical element 22. In this case, at least a part of the fifth surface 45 may face the lower surface of the last optical element 22.

  The fourth space 54 may be parallel to the optical axis AX. Further, the fifth space 55 may not be perpendicular to the optical axis AX.

  The first member 31 has a sixth surface 46 disposed around the first surface 41 and a seventh surface 47 disposed around the sixth surface 46. The sixth surface 46 and the seventh surface 47 are disposed on the main body portion 38. In the present embodiment, the fourth surface 44 and the sixth surface 46 are substantially parallel. Further, the fifth surface 45 and the seventh surface 47 are substantially parallel. The fourth surface 44 and the sixth surface 46 do not have to be parallel. Further, the fifth surface 45 and the seventh surface 47 may not be parallel.

  In the present embodiment, the second member 32 includes a second surface 42 that can face the surface of the substrate P, an eighth surface 48 that faces the sixth surface 46, and a ninth surface 49 that faces the seventh surface 47. Have

  The eighth surface 48 faces the sixth surface 46 via the sixth gap G6. The ninth surface 49 faces the seventh surface 47 via the seventh gap G7. In the present embodiment, the eighth surface 48 and the sixth surface 46 are substantially parallel. Further, the ninth surface 49 and the seventh surface 47 are substantially parallel. The eighth surface 48 and the sixth surface 46 do not have to be parallel. Further, the ninth surface 49 and the seventh surface 47 may not be parallel.

  A space between the first member 31 and the second member 32 is defined by a sixth space 56 defined by the sixth surface 46 and the eighth surface 48, and a seventh surface 47 and a ninth surface 49. 7th space 57 is included. The sixth space 56 is a space inclined so as to extend in the direction away from the image plane of the projection optical system PL (+ Z direction) in the radial direction with respect to the optical axis AX. The seventh space 57 is a space extending in the radiation direction (direction perpendicular to the optical axis AX) with respect to the optical axis AX. Note that the sixth space 56 may be parallel to the optical axis AX. Further, the seventh space 57 may not be perpendicular to the optical axis AX.

  In the present embodiment, the gap 80 includes a sixth space 56. The lower end of the gap 80 (sixth space 56) is fluidly connected to the first space 51 and the second space 52. The upper end of the gap 80 is connected to the seventh space 57. In the present embodiment, the first opening 33 is disposed at the lower end of the gap 80, and the second opening 34 is disposed at the upper end of the gap 80. In the present embodiment, the lower end portion 48 </ b> B of the eighth surface 48 defines the lower end of the gap portion 80. The upper end 48T of the eighth surface 48 defines the upper end of the gap 80.

  In at least a part of the exposure of the substrate P, the first opening 33 faces the surface of the substrate P. At least a part of the liquid LQ on the substrate P can flow into the gap 80 through the first opening 33. In the present embodiment, the first opening 33 is formed substantially flush with the first surface 41. The first opening 33 may not face downward (−Z direction). For example, the first opening 33 may be provided on a twelfth surface 79 described later. Moreover, the 1st opening 33 may be one opening provided cyclically | annularly, and may be formed from several opening arrange | positioned cyclically | annularly at predetermined intervals. Similarly, the gap 80 may be formed of a plurality of gaps arranged in a ring around the optical axis AX at a predetermined interval.

  The first recovery unit 60 recovers the liquid LQ from the gap 80. The first recovery unit 60 recovers the liquid LQ that has overflowed from the gap 80. At least a part of the first recovery unit 60 is disposed outside the upper end 48T in the radial direction with respect to the optical axis AX.

  In the present embodiment, the first recovery unit 60 has a first recess 61 provided on the outer side of the gap 80 in the radial direction with respect to the optical axis AX and facing upward (+ Z direction). The first recess 61 has an opening 61K facing upward. The first recovery unit 60 recovers the liquid LQ that has flowed into the first recess 61 through the opening 61K.

  The first recess 61 is provided outside the upper end 48T in the radial direction with respect to the optical axis AX. In the present embodiment, the first recess 61 is disposed around the ninth surface 49. In the XY plane, the first recess 61 is annular. In addition, the 1st recessed part 61 may be formed from the several recessed part arrange | positioned cyclically | annularly at predetermined intervals. In the present embodiment, the second member 32 has a tenth surface 70 arranged around the first recess 61. The tenth surface 70 is substantially parallel to the XY plane. In the present embodiment, the tenth surface 70 is disposed in substantially the same plane as the ninth surface 49. Note that the tenth surface 70 may be arranged above the ninth surface 49 (on the + Z side).

  The first recess 61 includes a first inner surface 611 connected to the ninth surface 49, a second inner surface 612 facing the first inner surface 611 and connected to the tenth surface 70, and the first inner surface 611 and the second inner surface. 612 and a bottom surface 613 disposed between 612 and 612. The bottom surface 613 faces upward (+ Z direction). The bottom surface 613 is disposed below (−Z side) from the upper end portion 48T. In the present embodiment, the bottom surface 613 is substantially parallel to the XY plane. Note that the bottom surface 613 may not be parallel to the XY plane. For example, the bottom surface 613 may be inclined with respect to the XY plane. Further, the bottom surface 613 may include a curved surface.

  The first recovery unit 60 includes a liquid guide unit 81 that guides the liquid LQ from the gap 80 to the first recess 61. In the present embodiment, the liquid guide portion 81 includes a ninth surface 49. In the present embodiment, the liquid guide portion 81 includes the seventh space 57. The liquid guide portion 81 is formed so as to extend in the radial direction with respect to the optical axis AX from the upper end portion 48T. In the present embodiment, the liquid guide portion 81 is provided perpendicular to the optical axis AX (parallel to the XY plane), but may not be perpendicular to the optical axis AX. For example, the ninth surface 49 may be inclined downward from the upper end portion 48T.

  The first concave portion 61 is provided outside the liquid guide portion 81 in the radial direction from the upper end portion 48T to the optical axis AX. The liquid LQ that has overflowed from the upper end of the gap 80 is guided by the liquid guide 81 and flows into the first recess 61.

  The first recess 61 can store the liquid LQ from the gap 80. The 1st recessed part 61 suppresses that the liquid LQ from the space | gap part 80 returns to the space | gap part 80 by storing the liquid LQ which flowed in. That is, the first recess 61 functions as at least a part of a reserve portion that stores the liquid LQ from the gap 80 so as not to return to the gap 80.

  The first recovery unit 60 has a recovery port 62 that recovers the liquid LQ that has flowed into the first recess 61. The recovery port 62 recovers the liquid LQ stored in the first recess 61.

  In the present embodiment, the recovery port 62 is disposed so as to face the bottom surface 613. In the present embodiment, the recovery port 62 is disposed inside the first recess 61. In other words, the recovery port 62 is disposed below (−Z side) from the opening 61 </ b> K of the first recess 61.

  In the present embodiment, the recovery port 62 is annular in the XY plane. The collection port 62 may be divided and arranged at a plurality of positions around the optical axis AX.

  In the present embodiment, the recovery port 62 is disposed in the first member 31. The first member 31 has a convex portion 63 that is disposed around the seventh surface 47 and protrudes downward. The collection port 62 is disposed at the lower end of the convex portion 63.

  A porous member 64 is disposed in the recovery port 62. The porous member 64 is a plate-like member including a plurality of holes (openings or pores). The porous member 64 may be a mesh filter that is a porous member in which a large number of small holes are formed in a mesh shape.

  In the present embodiment, the outer surface of the convex portion 63 including the lower surface of the porous member 64 is separated from the inner surface of the first concave portion 61 including the bottom surface 613, the first inner surface 611, and the second inner surface 612. That is, the eighth space 58 is formed between the convex portion 63 and the first concave portion 61.

  The first member 31 has an eleventh surface 71 that faces the tenth surface 70. The ninth space 59 between the tenth surface 70 and the eleventh surface 71 is open to the atmosphere via the third opening 72.

  The gap 80 is open to the atmosphere through the second opening 34. The second opening 34 is connected to the third opening 72 through the seventh space 57, the eighth space 58, and the ninth space 59. In the present embodiment, the gap 80 is open to the atmosphere via the second opening 34, the seventh, eighth, and ninth spaces 57, 58, 59, and the third opening 72. That is, the gap 80 is opened to the space around the liquid immersion member 4 through the second opening 34 different from the first opening 33. In other words, the gap 80 is opened to the gas space that is in contact with the interface of the liquid LQ of the immersion space LS via the second opening 34.

  In the present embodiment, the “atmosphere” is a gas surrounding the liquid immersion member 4. In the present embodiment, the gas surrounding the liquid immersion member 4 is a gas in the internal space 8 formed by the chamber device 5. In the present embodiment, the chamber device 5 fills the internal space 8 with clean air using the environment control device 5B. Moreover, the chamber apparatus 5 adjusts the internal space 8 to substantially atmospheric pressure using the environment control apparatus 5B. Of course, the internal space 8 may be set higher than the atmospheric pressure.

  In the present embodiment, the third space 53, the fourth space 54, and the fifth space 55 are also open to the gas space (internal space 8) around the liquid immersion member 4.

  In the present embodiment, the second surface 42 is liquid repellent with respect to the liquid LQ. In the second surface 42, the contact angle of the liquid LQ is 90 ° or more, and may be 100 ° or more. In the present embodiment, the second surface 42 is formed of a film 73 that is liquid repellent with respect to the liquid LQ. The film 73 is formed of a liquid repellent material containing, for example, fluorine. Examples of the liquid repellent material include PFA (Tetrafluoroethylene-perfluoroalkylvinylether copolymer), PTFE (Polytetrafluoroethylene), PEEK (polyetheretherketone), and Teflon (registered trademark).

  In the present embodiment, the second member 32 has a twelfth surface 79 that is connected to the inner edge of the second surface 42 and is disposed so as to face the optical path of the exposure light EL. The twelfth surface 79 is also liquid repellent with respect to the liquid LQ. The twelfth surface 79 is also formed of the film 73. Note that at least one of the second surface 42 and the twelfth surface may not be the surface of the liquid repellent film. For example, the second member 32 may be formed of a liquid repellent material.

  In the present embodiment, the liquid immersion member 4 includes an air supply port 74 disposed at least at a part around the first opening 33. In the present embodiment, the air supply port 74 is disposed on the second surface 42. The air supply port 74 supplies gas toward the surface of the object (substrate P) facing the second surface 42.

  In the present embodiment, the air supply port 74 is annular in the XY plane. The air supply port 74 may be divided and arranged at a plurality of positions around the optical axis AX.

  In the present embodiment, the liquid immersion member 4 includes a supply port 75 that supplies the liquid LQ to the optical path of the exposure light EL. The supply port 75 is disposed at a position facing the surface of the last optical element 22 through which the exposure light EL does not pass. In the present embodiment, the supply port 75 is disposed at a position facing the side surface 35 of the last optical element 22. The supply port 75 does not have to face the surface of the last optical element 22. For example, the supply port 75 may be arranged in the first member 31 so as to face the third space 53 between the third surface 43 and the emission surface 23.

  As shown in FIG. 3, in the present embodiment, one supply port 75 is arranged on each of the + Y side and the −Y side with respect to the optical axis AX. One supply port 75 may be arranged on each of the + X side and the −X side with respect to the optical axis AX. The number of supply ports 75 may be three or more.

  In the present embodiment, the supply port 75 supplies the liquid LQ to the fourth space 54. The liquid LQ supplied to the fourth space 54 flows downward through the fourth space 54, and then is supplied to the optical path of the exposure light EL emitted from the emission surface 23 through the third space 53. Further, at least a part of the liquid LQ supplied from the supply port 75 to the third space 53 via the fourth space 54 is supplied to the first space 51 via the opening 39.

  As shown in FIG. 2, the supply port 75 is connected to the liquid supply device 76 via a supply channel. In the present embodiment, the supply flow path includes a flow path formed inside the first member 31 and a flow path formed inside the first support mechanism 28. The liquid supply device 76 can supply clean and temperature-adjusted liquid LQ to the supply port 75. Note that a part of the supply flow path may not be provided inside the first support mechanism 28 that supports the first member 31.

  The recovery port 62 is connected to the liquid recovery device 77 via a recovery flow path. In the present embodiment, the recovery channel includes a channel formed inside the first member 31 and a channel formed inside the first support mechanism 28. The liquid recovery device 77 includes a vacuum system (such as a valve that controls the connection state between the vacuum source and the recovery port 62), and can recover the liquid LQ by suction from the recovery port 62. Note that a part of the recovery channel may not be provided inside the first support mechanism 28 that supports the first member 31.

  The air supply port 74 is connected to a gas supply device 78 via an air supply channel. In the present embodiment, the air supply flow path includes a flow path formed inside the second member 32 and a flow path formed inside the second support mechanism 29. The gas supply device 78 can supply clean and temperature-controlled humidity and gas to the air supply port 74. Note that the humidity of the gas supplied from the air supply port 74 is preferably the same as or higher than the humidity of the gas supplied to the internal space 8 by the environment control device 5B. In addition, it is not necessary to provide a part of the air supply channel inside the second support mechanism 29 that supports the second member 32.

  The control device 7 controls the liquid recovery device 77 so that only the liquid LQ passes from the lower surface side space (eighth space 58) of the porous member 64 to the upper surface side space (recovery flow path). The pressure difference between the lower surface side and the upper surface side can be controlled. In the present embodiment, the pressure in the eighth space 58 on the lower surface side is released to the atmosphere and is controlled by the chamber device 5. The control device 7 controls the liquid recovery device 77 so that only the liquid LQ passes from the lower surface side to the upper surface side of the porous member 64, and adjusts the pressure on the upper surface side according to the pressure on the lower surface side. That is, the control device 7 collects only the liquid LQ from the eighth space 58 through the hole of the porous member 64 and adjusts the gas so as not to pass through the hole of the porous member 64. A technique of adjusting only the pressure difference between one side and the other side of the porous member 64 and allowing only the liquid LQ to pass from one side to the other side of the porous member 64 is disclosed in, for example, US Pat. No. 7,292,313. Yes.

  Next, a method for exposing the substrate P using the exposure apparatus EX having the above-described configuration will be described.

  First, the control device 7 makes the first surface 41 and the second surface 42 face the surface of the substrate P (or the upper surface 26 of the substrate stage 2). The first surface 41 and the surface of the substrate P face each other via the first gap G1, and the second surface 42 and the surface of the substrate P face each other via the second gap G2.

  The control device 7 delivers the liquid LQ from the liquid supply device 76 with the first surface 41 and the second surface 42 facing the surface of the substrate P. Further, the control device 7 operates the liquid recovery device 77. Further, the control device 7 operates the gas supply device 78.

  The liquid LQ delivered from the liquid supply device 76 is supplied to the fourth space 54 from the supply port 75. The liquid LQ supplied to the fourth space 54 flows downward through the fourth space 54, and then is supplied to the optical path of the exposure light EL emitted from the emission surface 23 through the third space 53. Thereby, the optical path of the exposure light EL is filled with the liquid LQ.

  Further, at least a part of the liquid LQ supplied from the supply port 75 to the third space 53 via the fourth space 54 is supplied to the first space 51 via the opening 39, and the first surface 41 and the substrate P are supplied. Is held between the surfaces. In the present embodiment, the immersion space LS is formed so that the space surrounded by the surface of the substrate P, the first surface 41, and the twelfth surface 79 is substantially filled with the liquid LQ. The interface of the liquid LQ (immersion space LS) is formed between the inner edge of the second surface 42 (the lower end of the twelfth surface 79) and the surface of the substrate P.

  At least a part of the liquid LQ supplied from the opening 39 to the first space 51 flows into the gap 80 through the first opening 31.

  In the present embodiment, the liquid LQ supplied to the first space 51 through the opening 39 is suppressed from flowing into the second space 52. In other words, in the present embodiment, movement of the interface LG1 of the liquid LQ in the immersion space LS in the XY plane from the twelfth surface 79 is suppressed, and expansion of the immersion space LS is suppressed. Yes.

  In the present embodiment, the first surface 41 is opposed to the surface of the substrate P via the first gap G1, and the second surface 42 disposed around the first surface 41 is the surface of the substrate P and the second gap. Opposite via G2. The second gap G2 is smaller than the first gap G1, and is about 0.1 to 0.3 mm, for example. Therefore, the movement of the interface LG1 to the outside of the first opening 33 is suppressed in the radial direction with respect to the optical axis AX. That is, since the second gap G2 is minute, the position of the interface LG1 is maintained between the inner edge of the second surface 42 and the surface of the substrate P by the surface tension of the liquid LQ as shown in FIG. The Thereby, the liquid LQ in the immersion space LS is suppressed from flowing into the second space 52.

  In the present embodiment, since the second surface 42 is liquid repellent with respect to the liquid LQ, the liquid LQ is more effectively prevented from flowing into the second space 52. In the present embodiment, since the twelfth surface 79 is provided so as to extend upward from the inner edge of the second surface 42 and to face the optical path, the immersion space LS is enlarged. Is suppressed. Further, since the twelfth surface 79 is liquid repellent with respect to the liquid LQ, this also suppresses the expansion of the immersion space LS.

  In the present embodiment, an air supply port 74 is provided, and gas is supplied toward the surface of the substrate P outside the inner edge of the second surface 42 with respect to the optical axis AX. Thereby, the expansion of the immersion space LS is suppressed by the force of the gas supplied from the air supply port 74. That is, the air supply port 74 forms a gas seal between the surface of the substrate P and the second surface 42. Accordingly, the liquid LQ is prevented from flowing out, and the movement of the interface LG1 is restricted.

  In the present embodiment, the outer shape of the first surface 41 and the inner edge of the second surface 42 are circular, and the outer shape of the immersion space LS in the XY plane is also approximately circular. As a result, the restraining force from all directions of the interface LG1 of the immersion space LS toward the center acts almost evenly. Thereby, the expansion of the immersion space LS is effectively suppressed.

  A gap opened to the atmosphere by supplying the liquid LQ from the supply port 75 in a state in which the expansion of the immersion space LS formed by the liquid LQ flowing into the first space 51 through the opening 39 is suppressed. The liquid LQ flows into the portion 80, and the position of the surface of the liquid LQ in the gap portion 80 moves (rises) in the + Z direction. When the gap 80 is filled with the liquid LQ, at least a part of the liquid LQ in the gap 80 overflows from the upper end (the upper end 48T) of the gap 80. The liquid LQ that has overflowed from the gap 80 is collected by the first collection unit 60 disposed outside the upper end of the gap 80.

  The liquid LQ that has overflowed from the gap 80 is guided by the liquid guide 81 and then flows into the first recess 61. The liquid LQ that has flowed into the first recess 61 is stored in the first recess 61.

  FIG. 5A shows a state where the surface of the liquid LQ in the first recess 61 is disposed at the first position Z1, and FIG. 5B shows a state where the surface is disposed at the second position Z2. As shown in FIG. 5A, for example, when the surface of the liquid LQ is disposed at the first position Z1 and the liquid LQ and the recovery port 62 (porous member 64) are not in contact with each other, the second opening 34 is provided. Is open to the atmosphere through the seventh, eighth, and ninth spaces 57, 58, 59, and the third opening 72. Thereby, the liquid LQ in the first space 51 flows smoothly into the gap 80 through the first opening 33. Further, the liquid LQ that flows into the gap 80 and overflows from the gap 80 smoothly flows into the first recess 61. The amount of the liquid LQ stored in the first recess 61 gradually increases.

  As shown in FIG. 5B, the amount of the liquid LQ stored in the first recess 61 increases, the surface of the liquid LQ is arranged at the second position Z2, and the liquid LQ and the recovery port 62 (porous member 64) , The liquid LQ stored in the first recess 61 is recovered from the recovery port 62 (the porous member 64). By recovering the liquid LQ from the recovery port 62, the amount of the liquid LQ in the first recess 61 decreases, and the position of the surface of the liquid LQ in the first recess 61 moves (lowers) in the -Z direction. When the liquid LQ from the gap 80 flows into the first recess 61, the amount of the liquid LQ in the first recess 61 increases again, the liquid LQ and the porous member 64 come into contact with each other, and the liquid LQ is collected in the recovery port. 62 is recovered.

  In the present embodiment, since the pressure difference between the lower surface side and the upper surface side of the porous member 64 is controlled so that only the liquid LQ passes from the lower surface side to the upper surface side of the porous member 64, the first recovery unit 60. The liquid LQ can be recovered while suppressing the occurrence of vibration and the generation of vaporization heat.

  In the present embodiment, the first collection unit 60 stores the liquid LQ on the substrate P collected through the first opening 33 and the gap 80 in the first recess 61, and is thus collected through the gap 80. It is possible to prevent the liquid LQ from returning to the gap 80. In addition, the first recovery unit 60 recovers the liquid LQ stored in the first recess 61 by a predetermined amount or more at the recovery port 62. Therefore, the liquid LQ collected through the gap 80 can be more reliably suppressed from returning to the gap 80. By storing the liquid LQ from the gap 80 in the first recess 61 so that the liquid LQ collected through the gap 80 does not return to the gap 80, for example, the liquid LQ that has contacted the porous member 64 can be Returning to the first space 51 and the optical path of the exposure light EL through the portion 80 is suppressed.

  Next, a method for exposing the substrate P will be described. As described above, the control device 7 supplies the liquid LQ from the supply port 75, and the liquid LQ is provided between the first surface 41 and the surface of the substrate P so that the optical path of the exposure light EL is filled with the liquid LQ. And the immersion space LS is formed. Further, at least a part of the liquid LQ on the substrate P flows into the gap 80 through the first opening 33. The first recovery unit 60 stores the liquid LQ from the gap 80 in the first recess 61 and recovers the liquid LQ that has reached a predetermined amount in the first recess 61 at the recovery port 62. In parallel with the liquid supply operation using the supply port 75, the control device 7 executes the liquid recovery operation using the first recovery unit 60, and the immersion space LS so that the optical path of the exposure light EL is filled with the liquid LQ. Form. Moreover, the control apparatus 7 supplies gas from the air supply port 74, and forms a gas seal.

  The control device 7 stores at least a part of the liquid LQ on the substrate P in the first recess 61 from the first opening 33 via the gap 80, and collects the liquid LQ recovered from the gap 80 to the first recovery unit 60. Exposure to the substrate P is started while suppressing the return to the gap 80 and restraining the expansion of the immersion space LS using the second gap G2 or the like.

  The control device 7 emits the exposure light EL from the illumination system IL, and illuminates the mask M with the exposure light EL. The exposure light EL from the mask M is emitted from the emission surface 23 of the projection optical system PL. The control device 7 irradiates the substrate P with the exposure light EL from the emission surface 23 via the liquid LQ between the emission surface 23 and the substrate P. Thereby, the pattern image of the mask M is projected onto the substrate P, and the substrate P is exposed with the exposure light EL. Even during the exposure of the substrate P, the liquid LQ supplied from the supply port 75 flows from the first opening 33 and is recovered by the recovery unit 60 via the gap 80.

  As described above, according to the present embodiment, the gap 80 opened to the atmosphere is provided, and the liquid LQ that has flowed into the gap 80 is collected by the first collection unit 60. The structure of the lower surface of the liquid immersion member 4 facing the surface can be simplified. Therefore, it is possible to prevent foreign matter from adhering to the lower surface of the liquid immersion member 4 in contact with the liquid LQ and the lower surface from being contaminated.

  For example, when the structure (shape) is complicated by providing a recovery port for recovering the liquid LQ on the lower surface of the liquid immersion member 4 facing the surface of the substrate P or providing a porous member at the recovery port, the lower surface There is a possibility that foreign matter is likely to adhere to the surface. For example, when the porous member is disposed at a position facing the surface of the substrate P, foreign matter generated from the substrate P (for example, a part of the photosensitive film or the top coat film forming the surface of the substrate P) is porous. There is a possibility of adhering to the member. When the adhered foreign matter is emitted into the optical path of the exposure light EL during exposure of the substrate P or mixed into the liquid LQ of the immersion space LS, an exposure defect such as a pattern defect occurs in the substrate P. there's a possibility that. In addition, when the structure (shape) of the lower surface is complicated, for example, even when there are many uneven portions, foreign matter generated from the substrate P may easily adhere to the lower surface.

  According to the present embodiment, the void 80 that is open to the atmosphere is provided, and the liquid LQ that has flowed into the void 80 via the first opening 33 is disposed at a position that does not face the surface of the substrate P. The lower surface of the liquid immersion member 4 that is recovered by the portion 60 and faces the surface of the substrate P has a simple structure. Accordingly, it is possible to suppress foreign matter from adhering to the lower surface of the liquid immersion member 4. Moreover, since the structure of the lower surface of the liquid immersion member 4 is simple, even if a foreign object adheres to the lower surface of the liquid immersion member 4, the lower surface of the liquid immersion member 4 can be cleaned smoothly and satisfactorily.

  In the present embodiment, the gap 80 (sixth space 56) and the liquid guide part 81 (seventh space 57) that form a flow path through which the liquid LQ flowing into the first opening 33 flows are separable. It is formed between the first member 31 and the second member 32. Therefore, the sixth surface 46 of the first member 31 and the eighth surface 48 of the second member 32 that form the gap 80, and the seventh surface 47 and the second member 32 of the first member 31 that form the liquid guide portion 81. The ninth surface 49 can be cleaned smoothly and satisfactorily.

  In the present embodiment, the first recovery unit 60 is configured such that the liquid LQ recovered from the gap 80 does not return to the gap 80. That is, the liquid LQ from the gap 80 is stored in the first recess 61. Therefore, for example, even when the porous member 64 of the first recovery unit 60 is contaminated, the liquid LQ that has contacted the porous member 64 (the liquid LQ that may be contaminated) passes through the gap portion 80. It is possible to suppress return (reverse flow) to the optical path of the space 51 and the exposure light EL. Therefore, occurrence of exposure failure can be suppressed.

Further, when the porous member 64 is contaminated, the contamination of the liquid LQ that contacts the porous member 64 can be suppressed by replacing the contaminated porous member 64 with a new porous member 64.
The liquid guide portion 81 (the ninth surface 49) provided between the upper end portion 48T and the first concave portion 61 may be omitted. That is, the first recess 61 may be provided adjacent to the upper end portion 48T.

<Second Embodiment>
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 6 is a diagram illustrating an example of the liquid immersion member 4B according to the second embodiment. In FIG. 6, the liquid immersion member 4B is a member different from the first member 31B having the first surface 41, the second member 32 having the second surface 42, and the first member 31B and the second member 32. And a third member 82 having a recovery port 62 and a porous member 64. The third member 82 can be attached to and detached from the first member 31B.

  The third member 82 has a main body portion 82A and a flange portion 82B disposed at the upper end of the main body portion 82A. The main body portion 82A can be disposed in the opening 83A provided in the first member 31B. By supporting the flange portion 82B on the support surface 83B provided on the first member 31B, the position of the third member 82 relative to the first member 31B is fixed. In a state where the flange portion 82B is supported by the support surface 83B, the recovery port 62 disposed at the lower end of the third member 82 and the porous member 64 disposed in the recovery port 62 are disposed inside the first recess 61. Is done.

  For example, the third member 82 can be removed from the first member 31B by pulling the third member 82 upward. Further, the third member 82 can be attached to the first member 31B by inserting the main body portion 82A of the third member 82 into the opening 83A from above the opening 83A and supporting the flange portion 82B with the support surface 83B. Since the third member 82 can be easily replaced, for example, when the porous member 64 is contaminated or at least a part of the third member 82 is contaminated, the third member 82 can be replaced with a new one. The contaminated third member 32 can be easily cleaned and reattached to the first member 31B. Therefore, contamination of the liquid LQ that contacts the third member 82 (porous member 64) can be suppressed.

  The third member 82 is detached from the first member 31B and / or the third member 82 is attached to the first member 31B in a state where the first member 31B is attached to the exposure apparatus EX (first support mechanism). 28 may be performed in a state where the first member 31B is removed from the exposure apparatus EX (a state where the first member 31B is released from the first support mechanism 28).

<Third Embodiment>
Next, a third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 7 is a diagram illustrating an example of the liquid immersion member 4C according to the third embodiment. In FIG. 7, the liquid immersion member 4 </ b> C includes a first member 31 </ b> C having a first surface 41 and a second member 32 </ b> C having a second surface 42. The first recovery unit 60C includes a first recess 61C provided in the second member 32C, and a recovery port 62C that recovers the liquid LQ that has flowed into the first recess 61C. Also in the present embodiment, the recovery port 62C is disposed inside the first recess 61C. However, the second member 32C includes the recovery port 62C and a part of the recovery flow path, and the above-described first. 1. Different from the second embodiment. In the present embodiment, the recovery port 62C is disposed at the bottom 613C of the first recess 61C. That is, the bottom 613C of the first recess 61 includes at least a part of the recovery port 62C.

  Also in the present embodiment, the porous member 64C is disposed in the recovery port 62C. The upper surface of the porous member 64C is disposed below (−Z side) from the upper end portion 48T.

  Also in the present embodiment, the liquid LQ can be recovered satisfactorily by the first recovery unit 60C.

  Instead of the recovery port 62C, or in addition to the recovery port 62C, a recovery port for recovering the liquid LQ may be disposed on at least one of the first inner surface 611C and the second inner surface 612C of the first recess 61C.

  Further, as in the second embodiment described above, the recovery port 62C (the porous member 64C) is held by a member different from the first member and the second member so that the attachment / detachment (exchange) can be facilitated. Good.

  In addition to the recovery port 62 of the first and second embodiments described above, a recovery port 62C of the present embodiment may be provided.

<Fourth embodiment>
Next, a fourth embodiment will be described. The fourth embodiment is a modification of the first embodiment. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 8 is a diagram illustrating an example of the liquid immersion member 4D according to the fourth embodiment. In FIG. 8, the liquid immersion member 4 </ b> D includes a first member 31 having a first surface 41 and a second member 32 </ b> D having a second surface 42. In the present embodiment, the liquid immersion member 4D has a supply port 84 arranged at a position facing the first space 51 facing the first surface 41 outside the first opening 33 in the radial direction with respect to the optical axis AX. Have. The supply port 84 supplies the liquid LQ to the optical path of the exposure light EL. In the present embodiment, the supply port 84 is provided in the second member 32D. In the present embodiment, the supply port 84 is disposed on the twelfth surface 79 extending upward (+ Z direction) from the inner edge of the second surface 42.

  Also in this embodiment, the immersion space LS can be formed satisfactorily.

  In the present embodiment, both the supply port 75 and the supply port 84 are arranged, but the supply port 75 may be omitted.

  In the second embodiment and the third embodiment described above, a supply port for supplying the liquid LQ to the second member having the second surface 42 may be provided as in the present embodiment.

<Fifth Embodiment>
Next, a fifth embodiment will be described. The fifth embodiment is a modification of the first embodiment. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 9 is a diagram illustrating an example of the liquid immersion member 4E according to the fifth embodiment. In FIG. 9, the liquid immersion member 4 </ b> E includes a first member 31 </ b> E having a first surface 41 and a second member 32 having a second surface 42. In the present embodiment, the liquid immersion member 4E includes a second recovery part 85 that recovers the liquid LQ that has overflowed from the fourth space 54 that the side surface 35 of the last optical element 22 faces. The second recovery unit 85 includes a second recess 86 provided on the fifth surface 45 of the first member 31E, and a recovery port 87 disposed inside the second recess 86. A porous member 88 is disposed in the recovery port 87. The second recovery part 85 recovers the liquid LQ that has overflowed from the upper end part 44T that defines the upper end of the fourth space 54. A part of the fifth surface 45 between the upper end 44T and the second recess 86 functions as a liquid guide portion that guides the liquid LQ overflowed from the upper end portion 44T to the second recess 86. A part of the fifth surface 45 may not be formed between the upper end 44T and the second recess 86. Further, the second recovery unit 85 may not include the second recess 86. That is, the upper end of the recovery port 87 (the upper surface of the porous member 88) may be flush with the fifth surface 45.

  According to the present embodiment, the liquid LQ that has overflowed from the fourth space 54 is prevented from flowing out of the first member 31E in the radial direction with respect to the optical axis AX. Thereby, generation | occurrence | production of exposure defect can be suppressed.

  In the second to fourth embodiments described above, a second recovery unit that recovers the liquid LQ that has overflowed from the fourth space 54 may be provided in the first member as in the present embodiment.

<Sixth Embodiment>
Next, a sixth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 10 is a diagram illustrating an example of the liquid immersion member 4F according to the sixth embodiment. In FIG. 10, the liquid immersion member 4 </ b> F includes a first member 31 </ b> F having a first surface 41 and a second member 32 </ b> F having a second surface 42.

  In the present embodiment, the second opening 34 is disposed at a position facing the outer surface 36 of the holding member 21. The space that the outer surface 36 of the holding member 21 faces is open to the atmosphere (inner space 8) of the liquid immersion member 4F, and the gap 80 is formed in the atmosphere around the liquid immersion member 4F via the second opening 34. It is open to. Further, the fourth space 54 facing the side surface 35 is also opened to the atmosphere around the liquid immersion member 4F.

  In the present embodiment, the first recovery unit 60F that recovers the liquid LQ from the gap 80 has a ninth surface 49F extending in the radial direction with respect to the optical axis AX from the upper end 1048T that defines the upper end of the gap 80, and the optical axis AX. The first concave portion 61F provided on the outer side of the ninth surface 49F in the radial direction relative to the first concave portion 61F, the recovery port 62F disposed inside the first concave portion 61F, and the porous member 64F disposed in the recovery port 62F. In the present embodiment, the ninth surface 49F is disposed below the fifth surface 45F of the first member 31F and at a position facing the outer surface 36. The first recess 61F is disposed below the ninth surface 49F.

  In the present embodiment, the supply port 75F is disposed on the fifth surface 45F of the first member 31F facing the outer surface 36. The liquid LQ supplied from the supply port 75F flows through the fourth space 54 and is then supplied to the first space 51 through the third space 53 and the opening 39. At least a part of the liquid LQ in the first space 51 flows into the gap 80 through the first opening 33. The liquid LQ that has overflowed from the gap 80 is recovered by the first recovery unit 60F.

  Also in the present embodiment, the liquid immersion space LS is improved while recovering the liquid LQ from the gap 80 so as not to return to the optical path of the exposure light EL through the spaces 53 and 54 of the liquid LQ from the gap 80. Can be formed.

  Even if the liquid LQ overflows from the fourth space 54, the liquid LQ can be recovered by the first recovery unit 60F.

  The liquid LQ supply port may be provided on the fourth surface 44F of the first member 31F. The supply port provided on the fourth surface 44 </ b> F may face the side surface 35 or may not face the side surface 35.

  Further, the ninth surface 49F of the second member 32F may be the same height (level) as the fifth surface 45F of the first member 31F.

  Further, as in the second embodiment described above, the recovery port 62F (the porous member 64F) is held by a member different from the first member 31F and the second member 32F so that the attachment / detachment (exchange) can be easily performed. May be.

  Further, as in the fourth embodiment described above, a supply port for the liquid LQ may be provided on the twelfth surface 79F of the second member 32F instead of or in addition to the supply port 75F.

  Further, a recovery unit that recovers the liquid LQ that has overflowed from the fourth space 54 may be provided on the fifth surface 45F of the first member 31F. In this way, by providing the recovery portion for the liquid LQ on the fifth surface 45F, the liquid LQ from the gap portion 80 toward the fourth space 54 can be recovered.

<Seventh embodiment>
Next, a seventh embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 11 is a diagram illustrating an example of the liquid immersion member 4G according to the seventh embodiment. In FIG. 11, the liquid immersion member 4 </ b> G includes a first member 31 </ b> G having a first surface 41 and a second member 32 </ b> G having a second surface 42.

  The liquid immersion member 4G according to the present embodiment is a modification of the liquid immersion member 4F according to the above-described sixth embodiment. Therefore, the description described in the sixth embodiment is omitted. As shown in FIG. 11, in the seventh embodiment, the second opening 34 is disposed so as to face the side surface 35, and the supply port 75 </ b> F that supplies the liquid LQ is formed on the emission surface 23, the third surface 43, and the like. It is different from the sixth embodiment in that it faces the third space 53 between.

  Also in the present embodiment, the liquid LQ that has overflowed from the gap 80 (the upper end 1148T) is recovered by the first recovery part 60F via the ninth surface 49F.

  Also in this embodiment, the immersion space LS can be formed satisfactorily.

<Eighth Embodiment>
Next, an eighth embodiment will be described. This embodiment is a modification of the first embodiment. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 12 is a diagram illustrating an example of the liquid immersion member 4H according to the eighth embodiment. In FIG. 12, the liquid immersion member 4 </ b> H includes a first member 31 having a first surface 41 and a second member 32 </ b> H having a second surface 42.

  In the present embodiment, the liquid immersion member 4 </ b> H includes a second concave portion 90 disposed between the first opening 33 and the second surface 42. In at least part of the exposure of the substrate P, the second recess 90 faces the surface of the substrate P.

  The liquid immersion member 4H includes an air supply port 92 that is disposed on the inner surface that defines the second recess 90, supplies gas to the second recess 90, and increases the pressure of the second recess 90. In the present embodiment, the inner surface of the second recess 90 includes an inner surface 91A close to the optical axis AX and an inner surface 91B disposed on the outer side of the inner surface 91A with respect to the optical axis AX, and the air inlet 92 is formed on the inner surface 91B. Has been placed.

  In the radiation direction with respect to the optical axis AX, since the second concave portion 90 having a high pressure is disposed outside the first opening 33, the expansion of the immersion space LS can be suppressed. That is, the gas-liquid interface LG1 of the immersion space LS is formed between the lower end of the inner surface 91A and the surface of the substrate P by the high-pressure space formed in the second recess 90, and movement outside the interface LG1 is suppressed. The Thereby, the outflow of the liquid LQ can be suppressed.

  In the second to seventh embodiments, the second recess 90 (high-pressure space) can be provided between the first opening 33 and the second surface 42 as in the present embodiment.

<Ninth Embodiment>
Next, a ninth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 13 is a diagram illustrating an example of the liquid immersion member 4I according to the ninth embodiment. In FIG. 13, the liquid immersion member 4 </ b> I includes a first member 31 having a first surface 41 and a second member 32 </ b> I having a second surface 42.

  The liquid immersion member 4I is provided outside the air supply port 74 in the radial direction with respect to the optical axis AX, and includes a suction port 93 that can suck at least one of the liquid LQ and the gas. The suction port 93 can connect the suction channel to a suction device including a vacuum system. The control device 7 performs a suction operation using the suction port 93 in at least a part of the exposure of the substrate P.

  Since the suction port 93 is provided, even when the liquid LQ in the immersion space LS flows into the second space 52, the liquid LQ can be sucked and collected by the suction port 93. Accordingly, it is possible to prevent the liquid LQ from flowing out of the second member 32I and the liquid LQ from remaining on the substrate P. Further, the suction port 93 may be used only when almost all of the liquid LQ is collected from the first space 51 below the first surface 41 without using the suction port 93 during the exposure of the substrate P. .

  In the first to ninth embodiments described above, the porous member is disposed in the recovery port (62 and the like) of the first recovery unit and the recovery port 87 of the second recovery unit, and the one side from the porous member to the other side. However, the recovery port may recover the liquid LQ together with the gas. Moreover, it is not necessary to arrange a porous member at the recovery port.

  In each of the above-described embodiments, the first member (31) having the first surface 41 and the second member (32) having the second surface 42 are parallel to the optical axis AX and / or light. Relative movement may be possible in a direction perpendicular to the axis AX. That is, at least one of the first member (31) and the second member (32) may be movably supported. For example, an actuator may be provided in the second support mechanism 29, and the position of the second member (32) may be moved by the driving force of the actuator. The second gap G2 can be adjusted by moving the position of the second member in the Z direction.

  In each embodiment described above, the air supply port 74 may be omitted.

  Further, in each of the above-described embodiments, for example, when the movement of the interface LG1 of the liquid LQ can be suppressed by the gas from the air supply port 74, the second surface 42 is not disposed below the first surface 41. Also good.

  In each of the above-described embodiments, at least a part of the second surface 42 may not be liquid repellent with respect to the liquid LQ.

  Further, in each of the above-described embodiments, if the gap (80) can be formed so as to be released from the atmosphere around the liquid immersion member (4) through the second opening 34 different from the first opening 33, You may form the 1st surface 41, the 2nd surface 42, a space | gap part (80), etc. in one member.

  In the above-described embodiments, the first surface 41 may not be disposed between the emission surface 23 and the substrate P. In this case, the first surface 41 may be disposed flush with the emission surface 23 or above the emission surface 23.

  Further, in each of the above-described embodiments, the surface through which the exposure light EL of the last optical element 22 does not need to have a surface (side surface 35) extending upward (+ Z direction) from the periphery of the emission surface 23. For example, the surface of the last optical element 22 through which the exposure light EL does not pass may extend substantially parallel to the exit surface 23 (in a direction perpendicular to the optical axis AX).

  In each of the above-described embodiments, the liquid immersion member (4 and the like) can be provided with a temperature adjustment mechanism as disclosed in, for example, US Patent Application Publication No. 2008/0106707. For example, the temperature of the liquid immersion member can be adjusted by flowing a temperature adjustment liquid through a flow path formed inside the liquid immersion member.

  In each of the above-described embodiments, the optical path on the exit side (image plane side) of the terminal optical element 22 of the projection optical system PL is filled with the liquid LQ. For example, this is disclosed in International Publication No. 2004/019128. As described above, a projection optical system in which the optical path on the incident side (object plane side) of the last optical element 22 is also filled with the liquid LQ may be employed.

  In addition, although the liquid LQ of each above-mentioned embodiment is water, liquids other than water may be sufficient. For example, hydrofluoroether (HFE), perfluorinated polyether (PFPE), fomblin oil, or the like can be used as the liquid LQ. In addition, various fluids such as a supercritical fluid can be used as the liquid LQ.

  As the substrate P in each of the above embodiments, not only a semiconductor wafer for manufacturing a semiconductor device, but also a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an original mask or reticle used in an exposure apparatus. (Synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise.

  Furthermore, in the step-and-repeat exposure, after the reduced image of the first pattern is transferred onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary, the second pattern With the projection optical system, the reduced image of the second pattern may be partially overlapped with the first pattern and collectively exposed on the substrate P (stitch type batch exposure apparatus). ). Further, the stitch type exposure apparatus can be applied to a step-and-stitch type exposure apparatus in which at least two patterns are partially transferred on the substrate P, and the substrate P is sequentially moved.

  Further, as disclosed in, for example, US Pat. No. 6,611,316, two mask patterns are synthesized on a substrate via a projection optical system, and one shot on the substrate is obtained by one scanning exposure. The present invention can also be applied to an exposure apparatus that performs double exposure of a region almost simultaneously. The present invention can also be applied to proximity type exposure apparatuses, mirror projection aligners, and the like.

  The present invention also relates to a twin stage type exposure apparatus having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. It can also be applied to.

  Further, for example, as disclosed in US Pat. No. 6,897,963, US Patent Application Publication No. 2007/0127006, etc., a reference stage on which a reference mark is formed, and / or a substrate stage for holding a substrate, and / or The present invention can also be applied to an exposure apparatus that includes various photoelectric sensors and a measurement stage that does not hold a substrate to be exposed. The present invention can also be applied to an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, but an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). ), An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, a reticle, a mask, or the like.

  In each of the above-described embodiments, an ArF excimer laser may be used as a light source device that generates ArF excimer laser light as exposure light EL. For example, as disclosed in US Pat. No. 7,023,610. A harmonic generator that outputs pulsed light with a wavelength of 193 nm may be used, including a solid-state laser light source such as a DFB semiconductor laser or a fiber laser, an optical amplification unit having a fiber amplifier, a wavelength conversion unit, and the like. Furthermore, in the above-described embodiment, each illumination area and the projection area described above are rectangular, but other shapes such as an arc shape may be used.

  In each of the above-described embodiments, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. As disclosed in Japanese Patent No. 6778257, a variable shaped mask (also known as an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. May be used). The variable shaping mask includes, for example, a DMD (Digital Micro-mirror Device) which is a kind of non-light emitting image display element (spatial light modulator). Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element. As a self-luminous type image display element, for example, CRT (Cathode Ray Tube), inorganic EL display, organic EL display (OLED: Organic Light Emitting Diode), LED display, LD display, field emission display (FED: Field Emission Display) And a plasma display panel (PDP).

  In each of the above embodiments, the exposure apparatus provided with the projection optical system PL has been described as an example. However, the present invention can be applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. Even when the projection optical system PL is not used in this way, the exposure light is irradiated onto the substrate via an optical member such as a lens, and an immersion space is formed in a predetermined space between the optical member and the substrate. It is formed.

  Further, as disclosed in, for example, International Publication No. 2001/035168, an exposure apparatus (lithography system) that exposes a line and space pattern on the substrate P by forming interference fringes on the substrate P. The present invention can also be applied to.

  As described above, the exposure apparatus EX of the present embodiment maintains various mechanical subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Manufactured by assembling. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 14, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a base material of the device. Manufacturing step 203, substrate processing step 204 including exposing the substrate with exposure light using a mask pattern according to the above-described embodiment, and developing the exposed substrate, device assembly step (dicing process, (Including processing processes such as a bonding process and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 2 ... Substrate stage, 4 ... Liquid immersion member, 7 ... Control apparatus, 22 ... Terminal optical element, 23 ... Ejection surface, 33 ... 1st opening, 34 ... 2nd opening, 35 ... Side surface, 36 ... Outer surface, 41 ... 1st 1 surface, 42 ... 2nd surface, 48T ... upper end part, 60 ... 1st collection | recovery part, 61 ... 1st recessed part, 62 ... collection | recovery port, 64 ... porous member, 74 ... air supply port, 75 ... supply port, 80 ... Cavity, 81 ... Liquid guide part, 85 ... Second recovery part, 90 ... Second recess, 91 ... Air inlet, 92 ... Suction port, AX ... Optical axis, EL ... Exposure light, EX ... Exposure apparatus, LQ ... Liquid, LS ... Immersion space, P ... Substrate, PL ... Projection optical system

Claims (35)

In an exposure apparatus that exposes a substrate,
An optical system having an exit surface for emitting exposure light;
A first surface disposed on at least a part of the periphery of the optical path of the exposure light emitted from the emission surface;
A second surface disposed on at least a portion of the periphery of the first surface and below the first surface;
A liquid is allowed to flow in through a first opening between the first surface and the second surface, and a void is opened to the atmosphere through a second opening different from the first opening;
A first recovery part for recovering at least a part of the liquid flowing into the gap part,
In at least a part of the exposure of the substrate, the surface of the substrate faces the emission surface, the first surface, and the second surface,
An exposure apparatus that exposes the substrate with the exposure light from the emission surface via a liquid between the emission surface and the surface of the substrate.   The exposure apparatus according to claim 1, wherein the first recovery unit recovers the liquid overflowed from the gap.   The first recovery portion has a first recess provided facing outward from the gap in the radial direction with respect to the optical axis of the optical system, and recovers the liquid that has flowed into the first recess. The exposure apparatus according to claim 1 or 2. Further comprising an upper end defining the upper end of the gap,
3. The exposure apparatus according to claim 1, wherein at least a part of the first recovery unit is provided outside the upper end in a radial direction with respect to the optical axis of the optical system. In an exposure apparatus that exposes a substrate,
An optical system having an exit surface for emitting exposure light;
A first surface disposed on at least a part of the periphery of the optical path of the exposure light emitted from the emission surface;
A second surface disposed on at least a part of the periphery of the first surface;
A liquid is allowed to flow in through a first opening between the first surface and the second surface, and a void is opened to the atmosphere through a second opening different from the first opening;
An upper end defining the upper end of the gap,
A first recovery part that recovers at least a part of the liquid that is provided at least in part on the outer side of the upper end part in the radial direction with respect to the optical axis of the optical system and flows into the gap part;
In at least a part of the exposure of the substrate, the surface of the substrate faces the emission surface, the first surface, and the second surface,
An exposure apparatus that exposes the substrate with the exposure light from the emission surface via a liquid between the emission surface and the surface of the substrate.   The first recovery part has a first recess having a bottom part formed below the upper end part outside the upper end part in the radial direction with respect to the optical axis of the optical system, and the liquid flowing into the first recess part The exposure apparatus according to claim 4 or 5, wherein the exposure apparatus is recovered. The first recovery part has a liquid guide part extending in a radial direction with respect to the optical axis of the optical system from the upper end part,
The exposure apparatus according to claim 6, wherein the first recess is provided outside the liquid guide in a radial direction from the upper end to the optical axis of the optical system.   The exposure apparatus according to claim 3, wherein the first recovery unit has a recovery port that recovers the liquid that has flowed into the first recess.   The exposure apparatus according to claim 8, wherein the recovery port faces a bottom portion of the first recess.   The exposure apparatus according to claim 8, wherein the recovery port is disposed inside the first recess.   The exposure apparatus according to claim 9 or 10, wherein the recovery port is disposed at a bottom of the first recess.   The exposure apparatus according to any one of claims 8 to 11, further comprising a porous member disposed at the recovery port.   The exposure apparatus according to claim 12, wherein a pressure difference between one side and the other side of the porous member is controlled so that only liquid passes from one side of the porous member to the other side.   The exposure apparatus according to any one of claims 8 to 13, wherein the recovery port recovers the liquid that has flowed into the first recess together with the gas.   The exposure apparatus according to claim 8, wherein the member having the first surface and the member having the first recess are relatively movable.   The exposure apparatus according to claim 1, wherein the first surface and the second surface cannot recover a liquid.   The exposure apparatus according to claim 1, wherein the second surface is liquid repellent with respect to the liquid.   The exposure apparatus according to claim 1, wherein the first opening faces the surface of the substrate in at least a part of the exposure of the substrate.   The exposure apparatus according to claim 1, further comprising an air supply port disposed at least at a part of the periphery of the first opening.   The exposure apparatus according to claim 19, wherein the air supply port is disposed on the second surface. A second recess disposed between the first opening and the second surface;
In at least part of the exposure of the substrate, the second recess faces the surface of the substrate;
The exposure apparatus according to claim 19, wherein the air supply port is disposed on an inner surface that defines the second recess and supplies the gas to increase the pressure of the second recess.   The exposure according to any one of claims 19 to 21, further comprising a suction port disposed outside the air supply port and capable of sucking at least one of the liquid and the gas in a radial direction with respect to the optical axis of the optical system. apparatus.   The exposure apparatus according to claim 1, further comprising a supply port that supplies the liquid to the optical path. The optical system includes an optical member having the exit surface,
The exposure apparatus according to claim 23, wherein the supply port is disposed at a position facing a surface of the optical member through which the exposure light does not pass.   25. The exposure apparatus according to claim 24, wherein a surface of the optical member through which the exposure light does not pass includes a side surface of the optical member that extends upward from a peripheral edge of the emission surface.   The said supply port is arrange | positioned in the radiation direction with respect to the optical axis of the said optical system in the position which faces the 1st space which the said 1st surface faces outside the said 1st opening. The exposure apparatus according to one item. The optical system includes an optical member having the exit surface,
27. The exposure apparatus according to any one of claims 1 to 26, further comprising a second recovery unit that recovers the overflowed liquid from a space facing a side surface of the optical member that extends upward from a peripheral edge of the emission surface. In an exposure apparatus that exposes a substrate,
An optical system having an exit surface for emitting exposure light;
A liquid that can flow through a first opening disposed at least at a part of the periphery of the optical path of the exposure light, and a gap that is opened to the atmosphere through a second opening different from the first opening;
A first recovery part for recovering the liquid from the gap part,
The first recovery part has a reserve part for storing liquid from the gap part so as not to return to the gap part,
In at least a part of the exposure of the substrate, at least a part of the liquid on the substrate is stored in the reserve part through the gap from the first opening,
An exposure apparatus that exposes the substrate with the exposure light from the emission surface via a liquid between the emission surface and the substrate.   29. The exposure apparatus according to claim 28, wherein the first recovery part has a recovery port for recovering the liquid stored in the reserve part.   30. The exposure apparatus according to claim 28 or 29, wherein the first opening faces the surface of the substrate in at least a part of the exposure of the substrate. Exposing the substrate using the exposure apparatus according to any one of claims 1 to 30;
Developing the exposed substrate; and a device manufacturing method. Between the first surface and the substrate, the first surface disposed on at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical system is opposed to the substrate through the first gap. Holding the liquid with,
A second surface disposed at least partially around the first surface is opposed to the substrate via a second gap smaller than the first gap;
Recovering at least a portion of the liquid that has flowed from the first opening between the first surface and the second surface into the gap that is open to the atmosphere through a second opening different from the first opening; When,
Exposing the substrate with the exposure light from the exit surface through a liquid between the exit surface and the substrate. Between the first surface and the substrate, the first surface disposed on at least a part of the periphery of the optical path of the exposure light emitted from the exit surface of the optical system is opposed to the substrate through the first gap. Holding the liquid with,
Opposing the substrate with a second surface disposed at least in part around the first surface;
At least a part of the liquid that has flowed from the first opening between the first surface and the second surface into the gap that is open to the atmosphere through a second opening different from the first opening In the radial direction relative to the optical axis of the system, collecting outside the upper end of the gap,
Exposing the substrate with the exposure light from the exit surface through a liquid between the exit surface and the substrate. Filling the optical path of the exposure light between the exit surface of the optical system and the substrate with a liquid;
Exposing the substrate with the exposure light from the exit surface via a liquid between the exit surface and the substrate;
At least a part of the liquid on the substrate is passed from a first opening arranged in at least a part of the periphery of the optical path through a gap part opened to the atmosphere through a second opening different from the first opening. Collecting, and
The recovery includes an exposure method including storing the liquid from the gap in a reserve portion so that the collected liquid does not return to the gap. Exposing the substrate using the exposure method according to any one of claims 32 to 34;
Developing the exposed substrate; and a device manufacturing method.

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