JP2005101487A5 - - Google Patents

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JP2005101487A5
JP2005101487A5 JP2003410472A JP2003410472A JP2005101487A5 JP 2005101487 A5 JP2005101487 A5 JP 2005101487A5 JP 2003410472 A JP2003410472 A JP 2003410472A JP 2003410472 A JP2003410472 A JP 2003410472A JP 2005101487 A5 JP2005101487 A5 JP 2005101487A5
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substrate
liquid
exposure apparatus
exposure
image
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パターンの像を液体を介して基板上に転写して基板を露光する露光装置であって、
パターンの像を基板に投影する投影光学系と、
露光された基板を処理する処理装置との接続部と、
前記接続部を介して基板が処理装置へ搬出される前に、基板に付着した液体を除去する液体除去装置とを備える露光装置。 An exposure apparatus that exposes a substrate by transferring an image of a pattern onto the substrate via a liquid,
A projection optical system that projects an image of the pattern onto the substrate;
A connection with a processing apparatus for processing the exposed substrate;
An exposure apparatus comprising: a liquid removal apparatus that removes liquid attached to the substrate before the substrate is carried out to the processing apparatus via the connection portion. パターンの像を液体を介して基板上に転写して基板を露光する露光装置であって、
パターンの像を基板に投影する投影光学系と、
露光された基板に付着した液体を除去する液体除去装置と、
露光された基板を液体除去装置に搬送する第１搬送部材と、
液体除去装置により液体が除去された基板を液体除去装置から搬送する第２搬送部材とを備える露光装置。 An exposure apparatus that exposes a substrate by transferring an image of a pattern onto the substrate via a liquid,
A projection optical system that projects an image of the pattern onto the substrate;
A liquid removing device for removing the liquid adhering to the exposed substrate;
A first transport member that transports the exposed substrate to a liquid removal apparatus;
An exposure apparatus comprising: a second transport member that transports the substrate from which the liquid has been removed by the liquid removal apparatus, from the liquid removal apparatus. 前記第１搬送部材は、その表面の少なくとも一部が撥液性であることを特徴とする請求項２に記載の露光装置。   The exposure apparatus according to claim 2, wherein at least a part of the surface of the first transport member is liquid repellent. パターンの像を液体を介して基板上に転写して基板を露光する露光装置であって、
パターンの像を基板に投影する投影光学系と、
露光された基板を搬送する搬送システムと、
基板の搬送経路に設けられ、基板に付着した液体を除去する液体除去装置とを備え、
液体除去装置は、液体の除去を行うときに液体が飛散することを防止するように基板周囲の少なくとも一部を覆うカバーを有する露光装置。 An exposure apparatus that exposes a substrate by transferring an image of a pattern onto the substrate via a liquid,
A projection optical system that projects an image of the pattern onto the substrate;
A transport system for transporting the exposed substrate;
A liquid removal device that is provided in the substrate conveyance path and removes the liquid adhering to the substrate;
The liquid removing apparatus is an exposure apparatus having a cover that covers at least a part of the periphery of the substrate so as to prevent the liquid from scattering when the liquid is removed. 前記カバー機構はチャンバを含むことを特徴とする請求項４に記載の露光装置。   The exposure apparatus according to claim 4, wherein the cover mechanism includes a chamber. 前記液体除去装置は、前記露光後の基板を洗浄する洗浄装置を備え、
前記洗浄装置による前記基板の洗浄後に、前記基板に付着した洗浄液を除去することを特徴とする請求項１〜５のいずれか一項記載の露光装置。 The liquid removing device includes a cleaning device for cleaning the substrate after the exposure,
6. The exposure apparatus according to claim 1, wherein the cleaning liquid attached to the substrate is removed after the cleaning of the substrate by the cleaning apparatus. パターンの像を液体を介して基板上に転写して基板を露光する露光装置であって、
パターンの像を基板に投影する投影光学系と、
基板を保持する基板ステージと、
基板ステージから露光された基板を搬出する前に、基板に付着した液体を除去する液体除去装置とを備える露光装置。 An exposure apparatus that exposes a substrate by transferring an image of a pattern onto the substrate via a liquid,
A projection optical system that projects an image of the pattern onto the substrate;
A substrate stage for holding the substrate;
An exposure apparatus comprising: a liquid removing device that removes liquid adhered to a substrate before unloading the exposed substrate from the substrate stage. 前記露光後に、前記液体が付着した基板は水平面に対して所定角度で搬送されることを特徴とする請求項１〜７のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein after the exposure, the substrate to which the liquid adheres is transported at a predetermined angle with respect to a horizontal plane. 前記液体除去装置は、前記基板上の液体を吸引することを特徴とする請求項１〜８のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the liquid removing apparatus sucks the liquid on the substrate. 前記液体除去装置は、前記基板上の液体を乾燥させることを特徴とする請求項１〜９のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the liquid removing apparatus dries the liquid on the substrate. 前記液体除去装置は、前記基板上の液体を飛ばすことを特徴とする請求項１〜１０のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the liquid removing apparatus blows off the liquid on the substrate. 前記液体除去装置は、前記液体が付着した基板を回転させる回転機構を含むことを特徴とする請求項１１に記載の露光装置。   The exposure apparatus according to claim 11, wherein the liquid removal apparatus includes a rotation mechanism that rotates the substrate to which the liquid is attached. 前記液体除去装置は、前記液体が付着した基板を傾けることを特徴とする請求項１〜１２、２、４及び７のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the liquid removing apparatus tilts the substrate to which the liquid is attached. 前記液体除去装置は、前記基板の両面に付着した液体を除去することを特徴とする請求項１〜１３のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the liquid removing apparatus removes the liquid adhering to both surfaces of the substrate. 前記液体除去装置は、前記基板の裏面に付着した液体を除去することを特徴とする請求項１〜１３のいずれか一項に記載の露光装置。   The exposure apparatus according to claim 1, wherein the liquid removing apparatus removes liquid adhering to the back surface of the substrate. 前記液体を供給する液体供給装置と、
前記液体供給装置によって供給された液体を回収する液体回収装置とをさらに備え、
前記液体除去装置は、前記基板の露光完了後に、前記液体回収装置によって回収されずに、前記基板表面に残留した液体の除去を行うことを特徴とする請求項１〜１５のいずれか一項に記載の露光装置。 A liquid supply device for supplying the liquid;
A liquid recovery device for recovering the liquid supplied by the liquid supply device;
16. The liquid removing apparatus according to claim 1, wherein after the exposure of the substrate is completed, the liquid remaining on the substrate surface is removed without being collected by the liquid collecting apparatus. The exposure apparatus described. 基板を保持する第１保持部材と、基板を保持する第２保持部材とをさらに備え、
前記液体除去装置は、一方の保持部材に保持された基板の露光中に、他方の保持部材に保持された基板に付着した液体の除去を行うことを特徴とする請求項１６に記載の露光装置。 A first holding member that holds the substrate; and a second holding member that holds the substrate;
17. The exposure apparatus according to claim 16, wherein the liquid removing apparatus removes the liquid adhering to the substrate held by the other holding member during the exposure of the substrate held by the one holding member. . 基板を保持する第１保持部材と、基板を保持する第２保持部材とをさらに備え、
前記液体除去装置は、一方の保持部材に保持された基板の露光中に、他方の保持部材に保持された基板に付着した液体の除去を行うことを特徴とする請求項１〜１５のいずれか一項に記載の露光装置。 A first holding member that holds the substrate; and a second holding member that holds the substrate;
16. The liquid removing apparatus according to claim 1, wherein the liquid attached to the substrate held by the other holding member is removed during exposure of the substrate held by the one holding member. The exposure apparatus according to one item. さらに、基板ステージを備え、基板ステージに前記液体除去装置が設けられている請求項１に記載の露光装置。   The exposure apparatus according to claim 1, further comprising a substrate stage, wherein the liquid removal device is provided on the substrate stage. 前記基板ステージに前記液体除去装置が設けられている請求項７に記載の露光装置。   The exposure apparatus according to claim 7, wherein the liquid removal apparatus is provided on the substrate stage. パターンの像を液体を介して基板上に転写して基板を露光する露光装置であって、
パターンの像を基板に投影する投影光学系と、
露光された基板を搬送する搬送システムと、
基板の搬送経路の下の少なくとも一部に、露光後の基板から落下した液体を処理する液体処理機構とを備える露光装置。 An exposure apparatus that exposes a substrate by transferring an image of a pattern onto the substrate via a liquid,
A projection optical system that projects an image of the pattern onto the substrate;
A transport system for transporting the exposed substrate;
An exposure apparatus comprising a liquid processing mechanism for processing a liquid dropped from a substrate after exposure at least at a part under a substrate transport path. 前記液体処理機構は、前記搬送経路の下の少なくとも一部に配置された樋部材と、該樋部材を介して回収された液体を排出する排出機構とを有することを特徴とする請求項２１に記載の露光装置。   23. The liquid processing mechanism according to claim 21, further comprising: a gutter member disposed at least at a part below the transport path; and a discharge mechanism that ejects the liquid collected through the gutter member. The exposure apparatus described. パターンの像を液体を介して基板上に転写して基板を露光する露光装置であって、
パターンの像を基板に投影する投影光学系と、
液体が付着した基板を搬送する第１搬送部材と、
液体が付着していない基板を搬送する第２搬送部材とを備える露光装置。 An exposure apparatus that exposes a substrate by transferring an image of a pattern onto the substrate via a liquid,
A projection optical system that projects an image of the pattern onto the substrate;
A first transport member that transports the substrate to which the liquid is attached;
An exposure apparatus comprising: a second transport member that transports a substrate to which no liquid is attached. 基板上に存在する露光用の液体を除去する液体除去装置をさらに備え、
前記第１搬送部材は、液体が付着した基板を、前記液体除去装置へ搬送することを特徴とする請求項２３記載の露光装置。 A liquid removing device for removing the exposure liquid present on the substrate;
24. The exposure apparatus according to claim 23, wherein the first transport member transports the substrate to which the liquid is adhered to the liquid removing apparatus. 前記第１搬送部材の少なくとも一部の表面は撥液性であることを特徴とする請求項２３または２４記載の露光装置。   25. The exposure apparatus according to claim 23, wherein at least a part of the surface of the first transport member is liquid repellent. 前記第１搬送部材による基板の搬送経路の下の少なくとも一部に配置され、基板から落下した液体を処理する液体処理機構をさらに備えることを特徴とする請求項２１〜２５のいずれか一項記載の露光装置。   26. The liquid processing mechanism according to any one of claims 21 to 25, further comprising a liquid processing mechanism that is disposed in at least a part of the substrate transport path by the first transport member and processes a liquid dropped from the substrate. Exposure equipment. 液体を介して基板上に露光光を照射して基板を露光する露光装置であって、
基板を保持して移動可能な第１保持部材と、
基板を保持して移動可能な第２保持部材と、
前記第１保持部材に保持された基板が露光されているときに、前記第２保持部材に保持された、露光を終えた基板に付着した液体の除去を行う液体除去装置と、
を備える露光装置。 An exposure apparatus that exposes a substrate by irradiating exposure light onto the substrate through a liquid,
A first holding member movable while holding the substrate;
A second holding member movable while holding the substrate;
A liquid removing device for removing the liquid adhering to the exposed substrate held by the second holding member when the substrate held by the first holding member is exposed;
An exposure apparatus comprising: 請求項１〜２７のいずれか一項記載の露光装置を用いることを特徴とするデバイス製造方法。   A device manufacturing method using the exposure apparatus according to any one of claims 1 to 27. パターンの像を液体を介して基板上に転写して基板を露光する露光装置と共に用いられる液体除去装置であって、
露光された基板を保持する保持部と、
基板上に存在する露光用の液体を除去する液体除去機構とを備える液体除去装置。 A liquid removal apparatus used together with an exposure apparatus for transferring an image of a pattern onto a substrate through a liquid to expose the substrate,
A holding unit for holding the exposed substrate;
A liquid removal apparatus comprising: a liquid removal mechanism that removes an exposure liquid existing on a substrate. さらに、液体除去機構を包囲するカバーを備える請求項２９に記載の液体除去装置。   30. The liquid removal apparatus according to claim 29, further comprising a cover surrounding the liquid removal mechanism. さらに、前記保持部に基板を搬送する搬送装置を備える請求項２９または３０に記載の液体除去装置。   Furthermore, the liquid removal apparatus of Claim 29 or 30 provided with the conveying apparatus which conveys a board | substrate to the said holding | maintenance part. 請求項１〜２７のいずれか一項記載に記載の露光装置と、
露光した基板を処理を行う処理装置とを備える露光システム。 An exposure apparatus according to any one of claims 1 to 27;
An exposure system comprising: a processing apparatus that processes an exposed substrate. 前記処理装置が、基板の基材に感光性材料を塗布する塗布装置及び露光された基板を現像する現像装置の少なくとも一方を含む請求項３２に記載の露光システム。   The exposure system according to claim 32, wherein the processing apparatus includes at least one of a coating apparatus that applies a photosensitive material to a base material of a substrate and a developing apparatus that develops the exposed substrate.
JP2003410472A 2002-12-10 2003-12-09 Exposure apparatus, device manufacturing method, and exposure system Expired - Fee Related JP4525062B2 (en)

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