JPH10255319A - Master disk exposure device and method therefor - Google Patents

Master disk exposure device and method therefor

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Publication number
JPH10255319A
JPH10255319A JP7645097A JP7645097A JPH10255319A JP H10255319 A JPH10255319 A JP H10255319A JP 7645097 A JP7645097 A JP 7645097A JP 7645097 A JP7645097 A JP 7645097A JP H10255319 A JPH10255319 A JP H10255319A
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Prior art keywords
master
liquid
exposure apparatus
nozzle
water
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JP7645097A
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Japanese (ja)
Inventor
Masashi Suenaga
Toshinori Sugiyama
正志 末永
寿紀 杉山
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Hitachi Maxell Ltd
日立マクセル株式会社
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion

Abstract

PROBLEM TO BE SOLVED: To provide a master disk exposure device capable of exposing a minute pit and a narrow groove with high precision and provided with a developing function. SOLUTION: In this master disk exposure device 100, a master disk 19 coated with a photoresist film 20 is irradiated convergently with laser beams to form a desired pattern. A nozzle 210 fills water between a condensing lens 17 and the master disk 19 during the exposure. The condensing lens 17 increases in NA and functions as an immersion objective. With the nozzle arranged in piping for a water tank and a developer tank, and with a valve installed that changes a feeding liquid to water or developer, the master disk aligner can also be used as a developing device.

Description

【発明の詳細な説明】 DETAILED DESCRIPTION OF THE INVENTION

【0001】 [0001]

【発明の属する技術分野】本発明は、光ディスク等の記録媒体用基板の原盤を製造するための原盤露光装置に関し、より詳細にはフォトレジストを塗布した原盤を露光する際の露光解像力を向上することができる原盤露光装置及び方法に関する。 The present invention relates to relates to a master exposure apparatus for manufacturing a master disc of a recording medium substrate such as an optical disk, and more improved exposure resolution when exposing the original disk coated with photoresist it relates to master exposure apparatus and method capable.

【0002】 [0002]

【従来の技術】コンパクトディスクや光磁気ディスクの基板は、プリフォーマット信号に対応するグルーブやプリエンボスピットのパターンを原盤上に露光及び現像により形成した後、得られた原盤を複製してスタンパを作製し、スタンパを装着した射出成型器でプラスチック材料等を射出成型することによって製造される。 Substrate of the Prior Art Compact disc or a magneto-optical disc is formed by forming by exposure and development patterns of grooves and pre-embossed pits corresponding to the preformat signal on the master, a stamper to replicate the resulting master produced, it is produced by injection molding a plastic material such as an injection molding machine fitted with a stamper. 原盤にグルーブやプリエンボスピットのパターンを形成するために原盤露光装置が用いられている。 And master exposure apparatus is used for forming a pattern of grooves and pre-embossed pits on the master disk. 原盤露光装置は、通常、フォトレジストが塗布されたガラス原盤を回転しながら、原盤面に照射するレーザ光をプリフォーマット信号に応じてオンオフすることによって所定のパターンでフォトレジストを感光する。 Master exposure apparatus, usually, while rotating the glass master coated with the photoresist to expose the photoresist in a predetermined pattern by turning on and off in accordance with the laser beam to be irradiated on the master surface preformat signal. 感光した原盤は、原盤露光装置から取り外された後、現像装置のターンテーブルに装着され、回転している原盤表面に上方からアルカリ液を供給することにより現像が行われる。 Photosensitive the master, after being detached from the master exposure device is mounted on a turntable of a developing device, development is performed by supplying the alkaline liquid from above the rotation to which the master surface. 現像が終わると、原盤に形成された溝やピットの寸法が適切がどうかを光ヘッドを備えた検査装置により検査される。 When the development is completed, the dimensions of the grooves or pits formed on the master is inspected by the inspection apparatus having an optical head if appropriate. こうしてスタンパ形成用の原盤が作製されている。 Thus master for forming stamper is produced.

【0003】上述の原盤露光装置として、例えば、テレビジョン学会誌 Vol 37, No.6, 475-490頁(1983年)には、レーザ光波長λ=457.98nm、レンズ開口数NA=0.93の光ヘッドを用いて、原盤上にスポットサイズ約0.5μmにレーザ光を絞り込むことができるVHD/AHD方式ビデオディスクのレーザカッティングマシンが開示されている。 [0003] As the above-mentioned master exposure apparatus, for example, television Journal Vol 37, No.6, in pp 475-490 (1983), the laser beam wavelength λ = 457.98nm, the lens numerical aperture NA = 0. using 93 optical head, laser cutting machine VHD / AHD-system video disc can be narrowed laser beam is disclosed in spot size of about 0.5μm on the master. このカッティングマシンを用いると最小0.25μmのエンボスピットを形成することができることが報告されている。 It has been reported that it is possible to form a minimum 0.25μm embossed pits using this cutting machine. また、このカッティングマシンはレーザスポットを原盤に追従させるためにHe−Neレーザを補助ビームとしたフォーカシングサーボ系を用いている。 Further, the cutting machine uses a focusing servo system in which the He-Ne laser and the auxiliary beam in order to follow the laser spot on the master.

【0004】特開平6−187668号公報は、狭トラックピッチ化、高密度記録しても隣接トラックからのクロストークを軽減することができる光ディスク原盤の製造方法を開示しており、原盤露光において上記文献とほぼ同様の構成のレーザカッティングマシンを使用している。 [0004] JP-A-6-187668, the narrow track pitch, even when high density recording discloses a process for the preparation of the master optical disc can be reduced crosstalk from adjacent tracks, said at master exposure using a laser cutting machine of substantially the same structure as the literature.

【0005】 [0005]

【発明が解決しようとする課題】近年のマルチメディア化による情報量の増大に伴い、光ディスク等の情報記録媒体の高密度化、大容量化が要望されている。 As the amount of information increases due to recent multimedia [0005], high density information recording medium such as an optical disk, large capacity has been demanded. この要望に応えるために、原盤露光装置においても光ディスク等に記録するエンボスピットやグルーブのパターンをより微小化して露光する必要がある。 To meet this demand, it is necessary to further miniaturization to expose the embossed pits and grooves of the pattern to be recorded on the optical disk or the like even in the master exposure apparatus. かかる微小パターンを露光するには、レーザ光を原盤に集光するレンズの開口数(NA)を増大すること、レーザ光の波長を短波長化することが考えられる。 To exposing such fine patterns, to increase the numerical aperture of the lens for converging the laser light on the master and (NA), it is conceivable to shorten the wavelength of the wavelength of the laser beam. しかしながら、レンズのNA及びレーザ波長の短波長化には限界があり、露光分解能を大幅に向上することは容易ではない。 However, the shorter wavelength of the NA and the laser wavelength of the lens is limited, it is not easy to greatly improve the exposure resolution.

【0006】また、前記のように露光及び現像工程は、 Moreover, exposure and development processes as described above,
それぞれ、原盤露光装置及び現像装置を用いて別々に行われていたため、装置コストがかかるとともに、装置設置スペースも必要であり、さらにスタンパを製造するまでの工程を煩雑化していた。 Each order was done separately using a master exposure device and the developing device, with such a device costs, device installation space is also required, has been complicated further steps up to produce a stamper.

【0007】本発明の目的は、情報ピットの微小化及び狭トラックピッチ化に対応した狭溝化を実現することができる原盤露光装置を提供することにある。 An object of the present invention is to provide a master exposure apparatus which can realize a narrow groove of corresponding to miniaturization and narrow track pitch of the information pit.

【0008】また、本発明の別の目的は、露光機能のみならず現像機能をも備え且つ露光解像力が向上した原盤露光装置を提供することにある。 [0008] Another object of the present invention is to and the exposure resolution is also provided with a developing function not exposure function only to provide a master exposure device with improved.

【0009】本発明のさらに別の目的は、情報ピットの微小化及び狭トラックピッチ化に対応した狭溝化を実現することができる原盤露光方法を提供することにある。 Still another object of the present invention is to provide a master exposure method capable of realizing a narrow groove of corresponding to miniaturization and narrow track pitch of the information pit.

【課題を解決するための手段】本発明の第1の態様に従えば、フォトレジストを塗布した記録媒体製造用原盤にレーザ光を集光して照射することによりフォトレジストを所望のパターンに感光する原盤露光装置において、上記レーザ光を上記原盤表面に集光するための光学素子と、上記光学素子と上記原盤表面との間の光路に液体を介在させるための手段とを備えることを特徴とする原盤露光装置が提供される。 According to a first aspect of the present invention, in order to solve the problems], photosensitive photoresist in the desired pattern by irradiating by condensing a laser beam on a recording medium manufacturing master coated with photoresist in master exposure apparatus, and characterized in that it comprises an optical element for condensing the laser beam on the surface of the master, and means for interposing a liquid in the optical path between the optical device and the surface of the master master exposure apparatus is provided.

【0010】本発明の原盤露光装置の原理を図6を用いて説明する。 [0010] The principle of the master exposure apparatus of the present invention will be described with reference to FIG. 図6は、本発明の原盤露光装置の光ヘッドにより露光されている原盤19近傍の拡大概念図である。 Figure 6 is an enlarged schematic view of the master 19 near which is exposed by the optical head of the master exposure apparatus of the present invention. 原盤露光装置のレーザ光源(図示しない)から照射されたレーザ光4はリレーレンズ15を介して集光レンズ17により原盤上に塗布されたフォトレジスト膜20 Photo laser beam 4 emitted from the laser light source (not shown) of the master exposure apparatus which is applied onto the master by the condenser lens 17 through the relay lens 15 resist film 20
の表面に集光される。 It is focused on the surface. 本発明の原盤露光装置は、図6に示したように液体200を原盤表面上に供給するノズル210を備えており、露光動作中には、このノズル21 Master exposure apparatus of the present invention comprises a nozzle 210 for supplying the liquid 200 onto the master surface, as shown in FIG. 6, during the exposure operation, the nozzle 21
0から供給された液体200により原盤のフォトレジスト膜20と集光レンズ17との間隙は充満される。 Gap between the photoresist film 20 and the condenser lens 17 of the master by 0 liquid 200 supplied from is filled. ここで、集光レンズ17により識別しうる2点間の最小距離rは一般に下記式(1)により表される。 Here, the minimum distance r between two points that can be identified by the condenser lens 17 is represented by the general formula (1).

【0011】 [0011]

【数1】 r=λ/NA=λ/(n・sinα) ・・・(1) 式中、λは集光レンズ17に入射するレーザ光4の波長、NAは集光レンズ17の開口数、nは集光レンズ1 [Number 1] r = λ / NA = λ / (n · sinα) ··· (1) wherein, lambda is the wavelength of the laser beam 4 entering the condenser lens 17, NA is the numerical aperture of the condenser lens 17 , n is the focusing lens 1
7の物点側(原盤側)媒質の屈折率、αは集光レンズ1 7 object point side (master side) the refractive index of the medium, alpha condenser lens 1
7から照射される光束の最大開きの半分すなわち開口半角をそれぞれ示す。 Respectively half or opening half-angle of maximum opening of the light beam irradiated from the 7. 集光レンズ17により識別しうる2 2 discernible by the condenser lens 17
点間の最小距離rが小さいほど、原盤露光装置の露光解像力が高いといえる。 As the minimum distance r between the points is small, it can be said that exposure resolution of master exposure apparatus is high. レーザ光の波長λを一定とした場合、rを小さくするには上式(1)からNAを大きくすればよいことがわかる。 When the wavelength of the laser beam λ is constant, the smaller the r is seen that may be increased NA from the above equation (1). NAは式(1)のようにNA= NA is as shown in Equation (1) NA =
n・sinαで定義されるので、NAを増大するには屈折率nと開口半角αを大きくすればよい。 Since defined by n · sin .alpha, it may be increased refractive index n and the opening half-angle α to increase the NA. 本発明では原盤の表面20と集光レンズ17との間に液体200(n Liquid 200 (n between the present invention and the surface 20 and the condenser lens 17 of the master
>1)が充満されているので、空気(n=1)が原盤表面と集光レンズ間に介在する場合、すなわち、従来の原盤露光装置の集光レンズよりもNAを増大することができる。 Since> 1) is filled, when air (n = 1) is interposed between the master surface and the condenser lens, i.e., it is possible to increase the NA than the condenser lens of a conventional master exposure apparatus. 換言すれば、本発明の原盤露光装置では、集光レンズ17を液浸レンズとして機能させることができる。 In other words, in master exposure apparatus of the present invention, it can function condenser lens 17 as an immersion lens.
液体200は、NAを大きくするために、屈折率の大きな液体が好ましいが、レンズ17の収差の防止する観点から原盤の表面20と集光レンズ17との間隔を微調整する場合には、集光レンズ17の屈折率に近い屈折率を有する液体、例えば、セダー油を用いるのが好ましい。 Liquid 200, in the case in order to increase the NA, but a large liquid is preferably in the refractive index, to finely adjust the distance between the surface 20 and the condenser lens 17 from the viewpoint of preventing the aberrations of the master lens 17, condensing a liquid having a refractive index close to the refractive index of the optical lens 17, for example, preferably used cedar oil.
しかしながら、液体200は、原盤のフォトレジスト膜20と接触することになるので、フォトレジストを腐食させず且つ後処理が容易であるという観点から水が好適である。 However, the liquid 200, it means that the contact with the photoresist film 20 of the master, the water from the viewpoint and the post-processing does not corrode the photoresist is easy is preferable.

【0012】本発明の原盤露光装置は、さらに、現像液を原盤上に供給するための手段を有することができる。 [0012] master exposure apparatus of the present invention may further comprise means for supplying a developing solution onto the master.
原盤露光装置に現像液供給手段を装着することにより露光後のプロセスに使用されていた現像装置が不要となり、露光・現像プロセスを簡略化することが可能になる。 A developing device which has been used in the process after the exposure by mounting the developer supply to the master exposure apparatus is not required, it is possible to simplify the exposure and development processes.

【0013】上記現像液を原盤上に供給するための手段は、上記光学素子と原盤との間に介在させる液体または現像液を原盤上に吐出するためのノズルと、該ノズルに上記液体または現像液を供給するための供給装置と、上記ノズルへの上記液体または現像液の供給を切り換えるための切り換え装置とから構成することができる。 [0013] means for supplying the developing solution onto the master, and a nozzle for discharging the liquid or developer is interposed between the optical element and the master on the master, the liquid or the developer to the nozzle it can be composed of a supply device for supplying liquid, a switching device for switching the supply of the liquid or the developer liquid to the nozzle. 本発明の原盤露光装置の具体例では、集光レンズと原盤との間に液体を介在させるために原盤上に液体を吐出するためのノズルとノズルに液体を供給するための供給装置を用いているので、供給液を現像液と露光用の液体とで切り換えることができる切り換え装置、例えば、電磁弁を装着すれば、かかるノズル及び液体供給装置を現像液供給用としても用いることができ、一層簡単な構造で現像機能を原盤露光装置に組み込むことができる。 In an embodiment of the master exposure apparatus of the present invention, by using a supply device for supplying liquid to the nozzle and a nozzle for discharging the liquid onto the master in order to interpose the liquid between the condenser lens and the master because there, switching device capable of switching between a liquid for exposure to feed the developing solution, for example, if mounting the solenoid valve, can also be used such nozzle and the liquid supply device for the developer supply, more a developing function may be incorporated into the master exposure apparatus with a simple structure.

【0014】本発明の原盤露光装置は、さらに、露光及び現像された原盤のピットや溝の幅や深さ等を検査するための検査装置を備えることができる。 [0014] master exposure apparatus of the present invention may further comprise an inspection apparatus for inspecting the exposure and the width and depth of the pits and grooves of the developed master disk and the like. これにより、原盤露光装置により露光・現像・検査が一つの装置で可能となり、設備コストの削減及びスタンパ製造までのプロセスを簡略化することができる。 Thus, exposure, development, testing the master exposure apparatus becomes possible with a single device, it is possible to simplify the process to reduce and stamper production equipment cost. 従来の検査装置は光ヘッドを備え、光ヘッドからの検査光を走査して現像露光されたピットや溝幅を検査していたので、原盤露光装置の集光レンズを含む光ヘッドを検査用の光ヘッドとして使用することが可能となり、装置の簡略化及び小型化が可能となる。 Conventional inspection device comprises an optical head, since the developed exposed pits or the groove width by scanning the inspection light from the optical head has been inspected, the inspection light head including a focusing lens of the master exposure apparatus it is possible to use as an optical head, thereby simplifying and downsizing of the apparatus.

【0015】本発明の第2の態様に従えば、フォトレジストを塗布した記録媒体製造用原盤にレーザ光を集光して照射することによりフォトレジストを所望のパターンに感光する原盤露光方法において、上記レーザ光を集光するための光学素子と原盤との間に液体を介在させながら原盤露光を行うことを特徴とする原盤露光方法が提供される。 According to a second aspect of the invention, in the master exposure method exposes a photoresist to a desired pattern by irradiating by condensing a laser beam on a recording medium manufacturing master coated with photoresist, master exposure method characterized by performing the master exposure while interposing the liquid between the optical element and the master for condensing the laser beam is provided.

【0016】本発明の原盤露光方法に従えば、レーザ光を集光するための光学素子と原盤との間に液体を介在させながら原盤露光を行うために、光学素子を液浸レンズとして機能させて光ヘッドの露光解像力を向上させることができる。 According to master exposure method of the present invention, in order to perform a master exposure while interposing the liquid between the optical element and the master for the focusing laser light, it caused to function optical element as an immersion lens it is possible to improve the exposure resolution of the optical head Te. また、露光中に原盤上に付着した塵等を液体を流動させることにより除去することができる。 Also, dust or the like adhering on the master during the exposure can be removed by flowing the liquid.

【0017】 [0017]

【発明の実施の形態】以下、本発明の固体イマージョンレンズを用いた原盤露光装置の実施の形態及び実施例を図面を参照しながら説明する。 DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, with reference to the embodiments and examples of the master exposure apparatus using a solid immersion lens of the present invention with reference to the accompanying drawings.

【0018】〔第1実施例〕本発明に従う原盤露光装置の第1実施例を図1により説明する。 [0018] The first embodiment of the master exposure apparatus according to First Embodiment The present invention will be described with reference to FIG. 図1は、原盤露光装置100の構成概略を示す。 Figure 1 shows a schematic configuration of a master exposure apparatus 100. 原盤露光装置100は、 Master exposure apparatus 100,
主に、露光用のレーザ光を出射するレーザ光源1、原盤19への照射タイミング及び照射位置をそれぞれ調整する音響光学(AO)変調器7及び音響光学(AO)偏向器9、露光用光ヘッド27、原盤19を回転するターンテーブル21、原盤19上に水を吐出するノズル210 Mainly, the laser light source 1 for emitting a laser beam for exposure, an acousto-optic (AO) modulator 7 and acousto-optic (AO) deflector 9 for adjusting respectively the irradiation timing and irradiation position of the master 19, the exposure light head 27, a turntable 21 for rotating the master disk 19, a nozzle 210 for ejecting water onto the master disk 19
及び水/現像液供給装置220、照射されたスポットを観測するための撮像管24及びディスプレイ26並びに光路を調整するためのビームスプリッター3、ミラー1 And water / developer supply unit 220, an image pickup tube 24 for observing the illuminated spot and a display 26 and a beam splitter 3 for adjusting the optical path, the mirror 1
1、ハーフミラー13、レンズ6等の種々の光学素子から構成されている。 1, a half mirror 13, and a variety of optical elements such as lenses 6.

【0019】レーザ光源1から出射されたレーザ光束2 The laser beam 2 emitted from the laser light source 1
はビームスプリッタ3により第1の光束4と第2の光束5に分けられる。 It is divided between the first light flux 4 by the beam splitter 3 to the second beam 5. 第1の光束4は、一対のレンズ6で挟まれたAO変調器7に入射して、記録すべき信号のタイミングに応じたパルス光に変調される。 The first light beam 4 is incident on the AO modulator 7 which is sandwiched by the pair of lenses 6, is modulated into a pulse light according to the timing of the signal to be recorded. AO変調器7で変調されたパルス光はミラー8で反射された後、AO偏向器9に入射して原盤19の所定の半径方向位置を照射するように偏向される。 After pulsed light modulated by the AO modulator 7 are reflected by the mirror 8, and enters the AO deflector 9 is deflected so as to irradiate a predetermined radial position of the master 19. 次いで、偏向された光は、偏光ミラー10及びミラー11を経て光ヘッド27に入射する。 Then, polarized light is incident on the optical head 27 through the polarizing mirror 10 and a mirror 11. 光ヘッド27には後述するリレーレンズ15及び集光レンズ17が装着されており、それらのレンズによりレーザ光は原盤19の表面の所定位置に集光される。 The optical head 27 is mounted relay lens 15 and condenser lens 17 to be described later, the laser light by the lenses is focused at a predetermined position on the surface of the master 19. 原盤19上には予め入射光に対して感光性のフォトレジスト20が塗布されている。 On top master 19 photosensitive photoresist 20 is applied against the previously incident light. 一方、第2の光束5はEO変調器12に入射する。 On the other hand, the second beam 5 is incident on the EO modulator 12. AO変調器7の代わりにEO変調器12により照射タイミング及び露光量を変調してもよい。 It may modulate the irradiation timing and the exposure value by EO modulator 12 instead of the AO modulator 7. EO変調器12を通過した光はハーフミラー13で反射され、λ/2位相板14を透過した後、偏光ミラー10、ミラー11を経て光ヘッド27に到達する。 The light passing through the EO modulator 12 is reflected by the half mirror 13, passes through the lambda / 2 phase plate 14, and reaches the optical head 27 through the polarizing mirror 10, the mirror 11.

【0020】ノズル210はターンテーブル21の上方で且つ原盤19の中心近傍に配置されており、原盤19 The nozzle 210 is and placed in the vicinity of the center of the master disk 19 above the turntable 21, the master 19
に向かって水200を吐出する。 Ejecting the water 200 towards the. ターンテーブル21により原盤19が回転されるとその遠心力で水200は原盤19の外周に広がり、原盤のフォトレジスト膜20を覆う水膜を形成する。 Water 200 in its centrifugal force when the master 19 is rotated by the turntable 21 is spread on the outer circumference of the master 19 to form a water film covering the photoresist film 20 of the master disk. 原盤19の外周に向かって流動した水200は集光レンズ17と原盤のフォトレジスト表面20との間を充満するため、集光レンズ17は液浸レンズとして機能する。 Water 200 to flow toward the outer periphery of the master 19 to fill the space between the condenser lens 17 and the master disk of the photoresist surface 20, the condenser lens 17 functions as an immersion lens.

【0021】光ヘッド27から原盤19上のフォトレジスト膜20に照射された光は、前記式(1)及び液浸レンズの原理により空気中の理論的な最小スポット径よりも小さなスポットを形成してフォトレジスト膜20を感光させる。 The light irradiated on the photoresist film 20 on the optical head 27 master 19, the formula (1) and the principle of immersion lens to form a smaller spot than the theoretical minimum spot diameter in the air and expose the photoresist film 20 Te. このため、従来の原盤露光装置よりも露光解像力が向上し、一層微細なピット及び案内溝のパターンを高精度で露光することができる。 This improves the exposure resolution than conventional master exposure apparatus, it is possible to expose a pattern of finer pits and guide grooves with high accuracy. 光ヘッド27の構造の詳細については後述する。 It will be described later in detail the structure of the optical head 27.

【0022】原盤19のフォトレジスト膜20の表面から反射された光は、集光レンズ17及びリレーレンズ1 [0022] Light reflected from the surface of the photoresist film 20 of the master disk 19, a condenser lens 17 and the relay lens 1
5を透過して平行光となり、ミラー11、偏光ミラー1 5 becomes parallel light passes through the mirror 11, the polarizing mirror 1
0、ハーフミラー13を経てレンズ22により撮像管2 0, an image pickup tube 2 by the lens 22 through the half mirror 13
4上に集光される。 4 is focused on. 撮像管24のディスプレイ26に表示されたスポット像26a,26bを観察することにより、集光レンズ17によって形成されるスポット形状を確認することができる。 Displayed spot image 26a on the display 26 of the image pickup tube 24, by observing 26b, it is possible to confirm the spot shape formed by the condenser lens 17.

【0023】レーザ光源1、AO変調器7、EO変調器12、ターンテーブル21等の動作は、図示しない制御部(図3及び図4参照)により一括して管理される。 The laser light source 1, AO modulator 7, EO modulator 12, the operation of such turntable 21 is managed collectively by a control unit not shown (see FIGS. 3 and 4). 制御部にはプリフォーマット信号が入力され、それに応じてAO変調器7等の発光周期等が調整される。 The control unit is pre-formatted signal is input, the light emitting period such as AO modulator 7 is adjusted accordingly.

【0024】次に、原盤露光装置100の光ヘッド27 [0024] Next, an optical head 27 of the master exposure apparatus 100
の構造の詳細を図2及び図3を用いて説明する。 The details of the structure will be described with reference to FIGS. 2 and 3. 図2 Figure 2
は、集光レンズ17を弾性部材18を介して支持する光ヘッド27を下方から見た斜視図を示し、図3は光ヘッド27の拡大断面図を示す。 Shows a perspective view of the optical head 27 for supporting the condenser lens 17 via the elastic member 18 from below, Figure 3 is an enlarged sectional view of the optical head 27. なお、図3には、光ヘッド27の構造を分かり易くするために、ノズル210から吐出された水200の図示は省略してある。 Incidentally, in FIG. 3, for ease of construction of the optical head 27, shown in the water 200 discharged from the nozzle 210 is omitted.

【0025】図2に示すように光ヘッド27は、集光レンズ17と、集光レンズ17を保持する集光レンズホルダ16aと、光ヘッドベース部28とを備え、集光レンズホルダ16aはベース部28の底面に固着された4本の支持部材29及びそれに接続された弾性部材18a、 The optical head 27 as shown in FIG. 2, a condenser lens 17, a condenser lens holder 16a for holding the condensing lens 17, and an optical head base portion 28, a condensing lens holder 16a is based four support members 29 and the elastic member 18a connected thereto which is fixed to the bottom surface of the section 28,
例えば板バネにより支持されている。 For example, it is supported by the leaf spring. この支持構造により、集光レンズホルダ16aは、原盤平面と平行な方向(図中X,Y方向)に拘束され、集光レンズ17の光軸方向(図中Z方向)に可動である。 The support structure, the condenser lens holder 16a is master plane parallel to the direction (in the figure X, Y-direction) is restrained in a movable direction of the optical axis of the condenser lens 17 (in the drawing the Z direction).

【0026】図3に示すように、集光レンズホルダ16 As shown in FIG. 3, the condenser lens holder 16
aはその上部にピエゾ素子33を介してリレーレンズ1 a relay lens 1 via the piezoelectric element 33 in its upper portion
5を支持するリレーレンズホルダ32を備える。 5 comprises a relay lens holder 32 which supports the. ここで、ピエゾ素子33は集光レンズ17に対するリレーレンズ15の光軸方向位置を変更してリレーレンズ15の焦点位置を微調整する。 Here, the piezoelectric element 33 by changing the optical axis direction position of the relay lens 15 with respect to the condenser lens 17 to finely adjust the focal position of the relay lens 15.

【0027】リレーレンズホルダ32は弾性部材18b The relay lens holder 32 is an elastic member 18b
を介してベース部28の支持部材29と連結されている。 It is coupled to the support member 29 of the base portion 28 via a. リレーレンズホルダ32上には、ボイスコイル型アクチュエータ140を構成するボビン34eが固着されており、アクチュエータ140の他の構成要素であるコイル34f、永久磁石35b、ヨーク36c,36dはベース部28に装着されている。 On the relay lens holder 32, a bobbin 34e that constitutes the voice coil actuator 140 are fixed, the coil 34f is another component of the actuator 140, the permanent magnet 35b, yoke 36c, 36d are attached to the base portion 28 It is. これにより、アクチュエータ140が駆動すると、集光レンズ17及びリレーレンズ15がベース部28に対して光軸方向(図面上下方向)に移動することになる。 Thus, when the actuator 140 is driven, so that the condensing lens 17 and the relay lens 15 is moved in the optical axis direction (vertical direction) relative to the base portion 28. アクチュエータ140の駆動は、撮像管24のディスプレイ26によるスポット像26a,26bの観察結果に基づいて制御部88を通じて行われる。 Driving of the actuator 140, the spot images 26a by the display 26 of the image pickup tube 24 is performed via the control unit 88 based on the 26b observations. これにより、集光レンズ17の端面と原盤19表面との間隔が適正な値に調整される。 Thus, the distance between the end face and the master 19 surface of the condenser lens 17 is adjusted to an appropriate value. 集光レンズ17の端面と原盤19表面との間隔は、集光レンズ1 Distance between the end surface and the master 19 surface of the condenser lens 17, the condensing lens 1
7の焦点距離に応じて、一般に、数μm〜数十μmに調整される。 7 in accordance with the focal length of typically be adjusted to several μm~ several tens [mu] m.

【0028】集光レンズ17は球の一部を切断して形成された半球型レンズである。 The condenser lens 17 is a hemispherical lens formed by cutting a portion of a sphere. レンズ17の切断面、すなわち、レンズ17の出射面17aは、水中に含まれる気泡を出射面表面に停めないようにするために凸型の曲面に加工するのが好ましい。 Cutting surface of the lens 17, i.e., the exit surface 17a of the lens 17 is preferably processed into a convex curved surface of the air bubbles contained in the water in order to prevent stop on exit surface surface. レンズの形状及びレンズの切断面の位置は、特に限定されないが、集光レンズ17が無収差レンズとなるように加工することもできる。 The position of the cutting surface shape and the lens of the lens is not particularly limited, may be a condenser lens 17 is machined so that no aberration lens. 集光レンズ17の材料は、特に限定されないが、C、Si Material of the condenser lens 17 is not particularly limited, C, Si
C、Si 34 、ZrO 2 、Ta 25 、ZnS、Ti C, Si 3 N 4, ZrO 2, Ta 2 O 5, ZnS, Ti
2 、または高屈折率ガラス及び一般の光学ガラスや水晶等を使用することができる。 O 2, or a high refractive index glass and general optical glass or quartz or the like can be used.

【0029】次に、図4を用いて、図1に示した水/現像液供給装置220の構造の詳細を説明する。 Next, with reference to FIG. 4, illustrating the details of the structure of water / developer supply device 220 shown in FIG. 水/現像液供給装置220は、主に、アルカリ液である現像液及び水をそれぞれ貯蔵するタンク82,84と、それらのタンク内部を加圧する窒素ポンプ92と、タンク82, Water / developer supply device 220 mainly includes a tank 82, 84 for storing respectively a developing solution, and water is an alkaline solution, nitrogen pump 92 for pressurizing the interior thereof of the tank, the tank 82,
84からノズル210に水/現像液を供給する配管8 84 pipe for supplying water / developer nozzle 210 from 8
0,80a,80b及び制御部88等から構成されている。 0,80A, and a 80b and the control unit 88 and the like. 水/現像液を吐出するノズル210は配管80に接続され、その途中から現像液タンク82に接続する配管80aと水タンク84に接続する配管80bに分岐する。 Nozzles 210 for discharging a water / developer is connected to the pipe 80, branched from the middle of the pipe 80b to be connected to the pipe 80a and the water tank 84 to be connected to the developer tank 82. 配管80a及び80bにはそれぞれ電磁バルブ86 Each of the pipes 80a and 80b electromagnetic valve 86
a及び86bが装着されており、その開閉は制御部88 a and 86b are attached, the opening and closing control unit 88
により制御される。 It is controlled by. 配管80の途中には流量コントロールバルブ90が装着され、ノズル210から吐出される液体の流量が制御部88を通じて制御される。 In the middle of the pipe 80 is mounted the flow control valve 90, the flow rate of the liquid discharged from the nozzle 210 is controlled via the control unit 88. 現像液タンク82と水タンク84にはそれぞれ窒素ポンプ92から高圧窒素が供給され、タンク内部が加圧されることによってそれらのタンク82,84から現像液及び水が配管80a,80bに流出される。 High pressure nitrogen is supplied to the developing tank 82 and the water tank 84 from the nitrogen pump 92, the developer and water are outlet pipe 80a, to 80b from their tanks 82 and 84 by the tank is pressurized . 窒素ポンプ92もまた制御部88により制御されている。 Nitrogen pump 92 is also controlled by the control unit 88. なお、制御部88 In addition, the control unit 88
は、図1に示した原盤露光装置の露光動作を一括して管理している制御部と共通している。 Is common to the control unit that manages collectively the exposure operation of the master exposure apparatus shown in FIG.

【0030】図4に示したような現像液/水供給装置2 [0030] Figure 4 as shown in a developing solution / water supply apparatus 2
20の動作を以下に説明する。 The operation of the 20 will be described below. 原盤露光装置において露光が行われる際、制御部88は水タンク84側の電磁バルブ86bを開放して水タンク84内の水を配管80に供給する。 When exposure is performed in master exposure apparatus, the control unit 88 supplies the water in the water tank 84 to the pipe 80 by opening the electromagnetic valve 86b of the water tank 84 side. 制御部88はまた流量コントロールバルブ9 The control unit 88 also flow control valve 9
0を制御して、配管80中を流れる水の流量を調節し、 0 by controlling the to adjust the flow rate of the water flowing through the pipe 80,
適量の水をノズル210から吐出させる。 Ejecting an appropriate amount of water from the nozzle 210. これにより、 As a result,
露光中は、集光レンズ17と原盤表面のフォトレジスト20との間隙が水で充満され、集光レンズ17が液浸レンズとして機能する。 During exposure, the gap between the photoresist 20 of the condenser lens 17 and the master surface is filled with water, the condenser lens 17 functions as an immersion lens. また、露光前または露光中にフォトレジスト膜20上に付着した塵等がノズルからの水により流し出されるために、塵等の付着物による露光精度の低下を防止することもできる。 Further, in order to pre-exposure or dust and the like adhered on the photoresist film 20 during exposure is flushed out by the water from the nozzle, it is also possible to prevent deterioration of the exposure accuracy due to deposits such as dust. なお、ノズル210から吐出される水量は、集光レンズ17と原盤表面のフォトレジスト20との間隙が常に水で充満される量が必要であるが、原盤上での水の流動により集光レンズ17と原盤表面のフォトレジスト20との間の維持された間隔を変動させないようにするのが望ましい。 Incidentally, the amount of water discharged from the nozzle 210 is a gap between the photoresist 20 of the condenser lens 17 and the surface of the master is always necessary amount to be filled with water, the condenser lens by the flow of water on the master 17 and it is desirable so as not to change the maintenance intervals between the photoresist 20 of the master surface. 原盤上での水の流れを安定させるためにノズル210の吐出方向を水平方向にしてもよい。 The discharge direction of the nozzle 210 may be a horizontal direction in order to stabilize the flow of water on the master. また、集光レンズホルダ16aによる水の抵抗を減らすために集光レンズホルダ16aの底面の端部が曲面を形成するようにしてもよい。 The end portion of the bottom surface of the condensing lens holder 16a may be formed a curved surface in order to reduce the resistance of the water by the condenser lens holder 16a.

【0031】原盤20の露光が終了すると、制御部88 [0031] When the exposure of the master 20 is completed, the control unit 88
は電磁バルブ86bを閉鎖するとともに、現像液タンク82側の電磁バルブ86aを開放することによってノズル210から吐出される液を水から現像液に切り換える。 Along with closing the electromagnetic valve 86b, it switched to a developer liquid discharged from the nozzle 210 by opening the developer tank 82 side of the electromagnetic valve 86a from the water. 流量コントロールバルブ90は制御部88の制御下で現像液の流量を調整し、適切な流速の現像液をノズル210から吐出させる。 Flow rate control valve 90 adjusts the flow rate of the developing solution under the control of the control unit 88 to eject the developing solution suitable flow rate from the nozzle 210. こうして、感光した原盤20の現像動作が行われる。 Thus, the developing operation of the light-sensitive the master 20 is performed.

【0032】図4に示した装置220では、現像液と水とを電磁バルブ86a,bを切り換えることによって同一ノズル210により供給することができため、露光終了後、感光した原盤を移動することなくその場合で現像することができる。 [0032] In the apparatus 220 shown in FIG. 4, since it is possible to supply the same nozzle 210 by a developing solution and water switching solenoid valves 86a, the b, after the exposure, without moving the photosensitive the master it can be developed in such a case.

【0033】さらに、図1に示した光ヘッド27、撮像管24及びディスプレイ26は、露光・現像が終了した後に原盤上に形成されたピット及び溝の幅や深さ等を検査するための検査装置として用いることも可能である。 Furthermore, the optical head 27, an image pickup tube 24 and the display 26 shown in FIG. 1, the inspection for exposure and development are examining the width and depth such as pits and grooves formed on the master after the completion It can also be used as a device.
このように原盤露光装置を構成することにより、従来の原盤露光装置を、露光・現像・検査が可能な一体型装置とすることができる。 By thus configuring the master exposure device, a conventional master exposure apparatus, it is possible to exposure, development, testing is an integral unit capable.

【0034】〔第2実施例〕本発明に従う原盤露光装置の第2実施例を図5を用いて説明する。 [0034] The second embodiment of the master exposure apparatus according to the Second Embodiment The present invention will be described with reference to FIG. 図5は、図3に示した原盤露光装置の光ヘッド27の変形例を示す断面図である。 Figure 5 is a sectional view showing a modification of the optical head 27 in the master exposure apparatus shown in FIG. 図5に示した光ヘッド部は、集光レンズ17 An optical head unit shown in FIG. 5, the condenser lens 17
を支持する集光レンズホルダ16bの構造が図3に示した集光レンズホルダ16aと異なる以外は、実施例1の原盤露光装置100の光ヘッド部と同様の構造を有する。 Except that the structure of the condenser lens holder 16b for supporting a different condenser lens holder 16a shown in FIG. 3 has the same structure as the optical head portion of the master exposure apparatus 100 of the first embodiment. それゆえ、実施例1の原盤露光装置100と共通する部材及び構造については同一の符号を付してその説明を省略する。 Therefore, for the same members and structures as master exposure apparatus 100 of the first embodiment and their description is omitted with the same reference numerals. また、図5には、集光レンズホルダ16b Further, in FIG. 5, a condensing lens holder 16b
の構造を分かり易くするために、ノズル210から吐出された水の図示を省略してある。 For clarity the structures are not shown in the water discharged from the nozzle 210.

【0035】集光レンズホルダ16bは、その中央に集光レンズ17を支持し、ホルダ底部は外側に向かうに従って原盤19との間隔が広くなるような錐面を形成している。 The condensing lens holder 16b is a condenser lens 17 is supported at its center, the holder bottom forms a conical surface such as the interval between the master 19 becomes wider toward the outside. 集光レンズホルダ16bの内部には、外部から集光レンズ17に通じる空洞(光路)16f,16gが集光レンズ17の光軸を挟んで対称に形成されおり、一方の光路16fの開口部(光入射口)には光ファイバ40 Inside the condenser lens holder 16b, the cavity communicating from the outside to the condenser lens 17 (optical path) 16f, 16g are formed symmetrically about the optical axis of the condenser lens 17, the opening of one optical path 16f ( optical fiber on the light entrance) 40
が装着され、他方の光路16gの開口部(光出射口)には、スリット41a及び検出部41bを備えたレンズ位置検出器41が装着されている。 There is mounted, the opening of the other optical path 16g (light exit), the lens position detector 41 having a slit 41a and detector 41b is mounted. レンズ位置検出器41 Lens position detector 41
の検出部41bは前述のボイスコイルモータ140を制御する制御部88に接続されている。 The detection portion 41b are connected to a control unit 88 that controls the aforementioned voice coil motor 140. すなわち、実施例1の原盤露光装置では、ボイスコイルモータ140の制御はディスプレイ26による観察結果に基づいて行っていたが、この実施例ではレンズ位置検出器41からの検出信号に基づいて行う。 That is, in the master exposure apparatus of Example 1, but the control of the voice coil motor 140 was performed based on the observation by the display 26, in this embodiment performed based on the detection signal from the lens position detector 41.

【0036】光ファイバ40から射出された光は空洞(光路)16fを通って集光レンズ17に入射した後、 [0036] After the light emitted from the optical fiber 40 passes through the cavity (optical path) 16f enters the condenser lens 17,
原盤19により反射されて再び集光レンズ17及び空洞(光路)16gを通ってレンズ位置検出器41に入射する。 Through again condenser lens 17 and the cavity is reflected (light path) 16g entering the lens position detector 41 by the master 19. レンズ位置検出器41は、検出部41aと41bに分割されており、集光レンズ17の端面17cと原盤表面20との間隔が予め定めた適正値のとき、原盤からの反射光の中心がレンズ位置検出器41の検出部41aと41bの中間に配置するように設計されている。 Lens position detector 41 is divided into detection sections 41a and 41b, when the appropriate value interval is predetermined between the end surface 17c and the surface of the master 20 of the condenser lens 17, the center of the reflected light from the master lens It is designed to be placed in the middle of the detection portion 41a and 41b of the position detector 41. すなわち、このとき検出部41aと41bの前記反射光の光量が等しくなる。 That is, the light quantity of the reflected light at this time the detection unit 41a and 41b are equal. それゆえ、露光中、すなわち、ノズル2 Thus, during exposure, i.e., the nozzle 2
10から水が吐出されて原盤表面のフォトレジスト20 10 water is discharged from the surface of the master photoresist 20
上を水が流動しているときに、集光レンズ17の端面1 Over when the water is flowing, the end surface of the condenser lens 17 1
7cと原盤のフォトレジスト20との間隔が適正な間隔になければ、検出部41aと41bから出てくる反射光検出出力のバランスがくずれ、制御部ではこれに応答してボイスコイル型アクチュエータ140を駆動し集光レンズ17と原盤19との間隔が適正な値に修正されるようにする。 If the spacing is appropriate interval between 7c and master of the photoresist 20, the detection portion 41a and the balance of the reflected light detection output is lost coming out 41b, a voice coil actuator 140 in response to the control unit distance between the drive and condenser lens 17 and the master disk 19 is to be corrected to a proper value. また、水などの液体を集光レンズ17とフォトレジスト表面20との間に充満させた場合、フォトレジストと前記液体との屈折率が近似していれば、光ファイバー40から出た光がフォトレジスト表面20で反射される強度が小さくなり位置光検出部で検出される光量が減り、サーボが不安定になることがある。 Also, when a liquid such as water is filled between the condenser lens 17 and the photo resist surface 20, if the approximate refractive index of the photoresist liquid, light emitted from the optical fiber 40 is photoresist reduces the amount of light intensity reflected by the surface 20 is detected by the position light detecting unit becomes small, there is the servo becomes unstable. このような場合には、フォトレジストと原盤の間にアルミ等の反射膜を形成して反射光量を増すこともできる。 In such a case, it is also possible to increase the amount of reflected light to form a reflective film of aluminum or the like between the photoresist and master.

【0037】図5に示した原盤露光装置は、レンズ位置検出器41を備えるので集光レンズ17と原盤との間隔が常に適正な値になるように制御部88を通じて自動的に調整される。 The master exposure apparatus shown in FIG. 5, is automatically adjusted via the control unit 88 so that the distance between the condenser lens 17 and the master disk is always a proper value so comprises a lens position detector 41. 従って、露光中に原盤表面に供給された水の流量の変動等により集光レンズホルダ16bの上下方向の揺れが生じた場合でも、揺れを静めて集光レンズ17と原盤との間隔を適正な値に収束することができる。 Therefore, a even when the fluctuation of the flow rate of water supplied to the surface of the master during exposure vertical swinging of the condenser lens holder 16b occurs, calm swaying the distance between the condenser lens 17 and the master proper it is possible to converge to the value.

【0038】以上、本発明を実施例により説明してきたが、本発明は特許請求の範囲に記載した範囲で実施例の種々の変形及び改良を含むことができる。 [0038] Although the present invention has been described by examples, the present invention can include various variations and modifications of the embodiment within the range set forth in the appended claims. 上記例では、 In the above example,
原盤中央近傍に水/現像液が吐出されるようにノズルを配置したが、ノズルの位置は原盤の回転によって原盤と集光レンズとの間隙に水を充満させることができる限り任意の位置に配置することができる。 Master central portion in a water / developer placed the nozzle as discharged, but the position of the nozzle is arranged at any position as long as it is possible to fill the water in the gap between the master and the condenser lens by the rotation of the master can do. 例えば、原盤の半径方向において集光レンズと同一位置であり且つ原盤の回転方向前方にノズルを配置することができる。 For example, the same position and the condenser lens in the radial direction of the master and can be arranged nozzle forward in the rotational direction of the master. またノズルからの液体の吐出方向はノズルの向きを変更することによって任意の方向に調整することができる。 The ejection direction of liquid from the nozzle can be adjusted in any direction by changing the orientation of the nozzle.

【0039】上記実施例ではノズルを用いて水を原盤上に吐出させる構成としたが、原盤外周に沿って壁面を設けることによって原盤を底部とする容器を形成し、容器内に一定量の水を蓄えることによって原盤と集光レンズとの間隙に水を充満させることもできる。 [0039] Although a configuration in the above embodiment using a nozzle ejecting water onto the master, and forming the container to the bottom of the master by providing the wall along the master periphery, a certain amount of water into the vessel It may also be filled with water in the gap between the master and the condensing lens by storing. このようにすれば、ノズルから吐出する水の量を低減し、あるいは、 Thus, to reduce the amount of water to be discharged from the nozzle, or,
露光前にのみノズルから水を容器内に充満させ、水の流動による集光レンズホルダの揺れを抑制することができる。 Is filled from a nozzle only before exposure to water in the container, it is possible to suppress the swaying of the condensing lens holder due to the flow of water. また、ノズル自体を省略して、上記のような容器構造だけを採用してもよい。 Further, by omitting the nozzle itself may be employed only container structure as described above. すなわち、原盤と集光レンズとの間隙に水を介在させることができる方法であれば、 That is, as long as the method can be interposed water in the gap between the master and the condenser lens,
任意の方法を用いることができる。 Any method can be used.

【0040】また、上記原盤露光装置は、光ヘッド部を現像処理時に原盤から退避させることができるような退避機構あるいは光ヘッド部に現像液が付着することを防止するための光ヘッドカバーを設けることができる。 Further, the master exposure apparatus, providing a light cover for preventing the developer retraction mechanism or an optical head such that it can be retracted from the master light head portion during development adheres can. かかる退避機構または光ヘッドカバーを設けることによって光ヘッド部をアルカリ液である現像液から保護し、レンズ及びレンズホルダの腐食を防止することができる。 An optical head unit to protect it from the developer is an alkaline solution by providing such retraction mechanism or an optical head cover, it is possible to prevent corrosion of the lens and lens holder.

【0041】本発明の原盤露光装置は、コンパクトディスク、CD−ROM、デジタルビデオディスク等の再生専用の光記録媒体、CD−Rのような追記型記録媒体、 The master exposure apparatus of the present invention, a compact disk, CD-ROM, an optical recording medium of reproduction-only such as a digital video disk, a write-once recording medium such as a CD-R,
光磁気ディスクのような書換え型光記録媒体のみならずハードディスク等に使用されるエンボスピットタイプの磁気記録媒体を製造するために使用することができる。 It can be used to produce the magnetic recording medium of the emboss pit type used in a hard disk or the like not a rewritable optical recording medium only as a magneto-optical disk.

【0042】 [0042]

【発明の効果】本発明の原盤露光装置は、集光レンズと原盤との間に液体を介在させることによって集光レンズは液浸レンズとして機能することができるため、露光解像力を一層向上することができ、それによって極めて微小なピット、例えば、0.2μm以下のピットが形成される高密度記録媒体用の原盤を製造することも可能になる。 Master exposure apparatus of the present invention exhibits, for condensing lens by interposing a liquid between the condenser lens and the master can function as an immersion lens, even as improving the exposure resolution can be thereby very small pits, for example, it becomes possible to manufacture the master disk for high-density recording medium 0.2μm following pits are formed.

【0043】また、本発明の原盤露光装置は、現像液供給手段を有するため露光後のプロセスに従来使用されていた現像装置が不要となり、露光・現像プロセスを簡略化することが可能になる。 [0043] Further, master exposure apparatus of the present invention, a developing device which has been conventionally used in the process after the exposure for a developing solution supply means is not necessary, it is possible to simplify the exposure and development processes. 特に、現像液供給手段を、上記光学素子と原盤との間に介在させる液体または現像液を原盤上に吐出するためのノズルと該ノズルに該液体または現像液を供給するための供給装置と上記ノズルへの該液体または現像液の供給を切り換えるための切り換え装置とから構成することにより、ノズルから現像液と露光用の液体とを切り換えて吐出することができるため、 In particular, the developer supply means, the supply device and the for supplying liquid is interposed or developer nozzle and the nozzle for discharging onto master the liquid or the developer between said optical element and the master by composed of a switching device for switching the supply of the liquid or the developer liquid to the nozzle, it can be discharged by switching between the liquid for exposure with a developing solution from the nozzle,
一層簡単な構造で現像機能を原盤露光装置に組み込むことができる。 It can be incorporated developing function to master exposure apparatus in a more simple structure.

【0044】本発明の原盤露光装置は、さらに、露光及び現像された原盤のピットや溝の幅や深さ等を検査するための検査装置を備えることにより、原盤露光装置により露光・現像・検査が一つの装置で可能となり、設備コストの削減及びスタンパ製造までのプロセスの簡略化を実現することができる。 The master exposure apparatus of the present invention, further, by providing an inspection apparatus for inspecting the exposure and the width and depth of the pits and grooves of the developed master disc or the like, exposure, development, testing the master exposure apparatus There allows a single device, it is possible to realize simplification of the process up reduction and stamper production equipment cost.

【0045】本発明の原盤露光方法に従えば、レーザ光を集光するための光学素子と原盤との間に液体を介在させながら原盤露光を行うために、光学素子を液浸レンズとして機能させることができるとともに露光中に原盤上に付着した塵等を流動除去することができる。 According to master exposure method [0045] The present invention, in order to perform a master exposure while interposing the liquid between the optical element and the master for the focusing laser light, to function optical element as an immersion lens it can be a dust or the like adhering on the master during the exposure to flowing removed together can. このため光ヘッドの露光解像力及び露光精度を向上させることが可能になる。 Therefore it is possible to improve the exposure resolution and exposure accuracy of the optical head.

【図面の簡単な説明】 BRIEF DESCRIPTION OF THE DRAWINGS

【図1】本発明に従う原盤露光装置の全体構成を説明する概念図である。 1 is a conceptual diagram illustrating the overall configuration of a master exposure apparatus according to the present invention.

【図2】図1に示した本発明に従う原盤露光装置の光ヘッドの第1実施例を下方から見た斜視図である。 2 is a perspective view of a first embodiment of the optical head as seen from below the master exposure apparatus according to the present invention shown in FIG.

【図3】図1に示した本発明に従う原盤露光装置の光ヘッドの第1実施例を示す断面図である。 3 is a cross-sectional view showing a first embodiment of an optical head of the master exposure apparatus according to the present invention shown in FIG.

【図4】本発明の第1実施例及び第2実施例に従う原盤露光装置のノズル及び水/現像液供給装置の構造を説明する概念図である。 It is a conceptual diagram illustrating the structure of the nozzle and the water / developer supply device master exposure apparatus according to the first and second embodiments of the present invention; FIG.

【図5】本発明の第2の実施例に従う原盤露光装置の光ヘッドの断面図である。 5 is a cross-sectional view of an optical head of the master exposure apparatus according to a second embodiment of the present invention.

【図6】本発明の原盤露光装置の集光レンズが液浸レンズとして機能することを説明する図である。 [6] condenser lens master exposure apparatus of the present invention is a diagram for explaining the function as an immersion lens.

【符号の説明】 DESCRIPTION OF SYMBOLS

3 ビームスプリッタ 7 AO変調器 9 AO偏向器 16a,b 集光レンズホルダ 17 集光レンズ 18 弾性部材 20 フォトレジスト 27 光ヘッド 28 光ヘッドベース部 29 支持部材 82 現像液タンク 84 水タンク 92 窒素ポンプ 100 原盤露光装置 130 ボイスコイル型アクチュエータ 200 水 210 水/現像液吐出ノズル Third beam splitter 7 AO modulator 9 AO deflector 16a, b condensing lens holder 17 condenser lens 18 elastic member 20 photoresist 27 optical head 28 the optical head base portion 29 supporting member 82 developing tank 84 water tank 92 nitrogen pump 100 master exposure apparatus 130 voice coil actuator 200 water 210 water / developer discharge nozzle

Claims (9)

    【特許請求の範囲】 [The claims]
  1. 【請求項1】 フォトレジストを塗布した記録媒体製造用原盤にレーザ光を集光して照射することによりフォトレジストを所望のパターンに感光する原盤露光装置において、 上記レーザ光を上記原盤表面に集光するための光学素子と、 上記光学素子と上記原盤表面との間の光路に液体を介在させるための手段とを備えることを特徴とする原盤露光装置。 1. A master exposure apparatus exposes a photoresist to a desired pattern by irradiating by condensing a laser beam on a recording medium manufacturing master coated with photoresist, condensing the laser beam on the surface of the master an optical element for light, master exposure apparatus, characterized in that it comprises a means for interposing a liquid in the optical path between the optical element and the surface of the master.
  2. 【請求項2】 上記光学素子が液浸レンズとして機能することを特徴とする請求項1記載の原盤露光装置。 2. A master exposure apparatus according to claim 1, wherein said optical element functions as an immersion lens.
  3. 【請求項3】 上記液体を介在させるための手段が、原盤上に液体を吐出するためのノズルと、該ノズルに液体を供給するための液体供給装置とから構成されていることを特徴とする請求項1または2に記載の原盤露光装置。 Wherein the means for interposing the liquid to a nozzle for discharging the liquid onto the master, characterized by being composed of a liquid supply device for supplying liquid to the nozzle master exposure apparatus according to claim 1 or 2.
  4. 【請求項4】 さらに、現像液を原盤上に供給するための手段を有することを特徴とする請求項1〜3のいずれか一項に記載の原盤露光装置。 4. Furthermore, the developer master exposure apparatus according to any one of claims 1 to 3, characterized in that it comprises means for supplying to the master a.
  5. 【請求項5】 上記現像液を原盤上に供給するための手段が、上記原盤上に上記液体または現像液を吐出するためのノズルと、該ノズルに上記液体または現像液を供給するための供給装置と、該ノズルへの上記液体または現像液の供給を切り換えるための切り換え装置とから構成されていることを特徴とする請求項4に記載の原盤露光装置。 Wherein means for supplying the developing solution onto the master is supplied for feeding a nozzle for discharging the liquid or the developer on said master, the liquid or the developer to the nozzle device and, master exposure apparatus according to claim 4, characterized in that it is composed of a switching device for switching the supply of the liquid or the developer liquid to the nozzle.
  6. 【請求項6】 さらに、露光及び現像された原盤を検査するための検査装置を備えることを特徴とする請求項5 6. Furthermore, claim, characterized in that it comprises an inspection apparatus for inspecting the exposed and developed master disc 5
    に記載の原盤露光装置。 Master exposure apparatus according to.
  7. 【請求項7】 上記検査装置が、原盤露光装置の上記光学素子を含む光ヘッドであることを特徴とする請求項6 7. The inspection system, according to claim, characterized in that an optical head including the optical element of the master exposure apparatus 6
    に記載の原盤露光装置。 Master exposure apparatus according to.
  8. 【請求項8】 上記液体が水であることを特徴とする請求項1〜7のいずれか一項記載の原盤露光装置。 8. A master exposure apparatus according to any one of claims 1 to 7, characterized in that the liquid is water.
  9. 【請求項9】 フォトレジストを塗布した記録媒体製造用原盤にレーザ光を集光して照射することによりフォトレジストを所望のパターンに感光する原盤露光方法において、 上記レーザ光を集光するための光学素子と原盤との間に液体を介在させながら原盤露光を行うことを特徴とする原盤露光方法。 9. The master exposure method exposes a photoresist to a desired pattern by irradiating by condensing a laser beam on a recording medium manufacturing master coated with photoresist, for condensing the laser beam master exposure method characterized by performing the master exposure while interposing the liquid between the optical element and the master.
JP7645097A 1997-03-12 1997-03-12 Master disk exposure device and method therefor Pending JPH10255319A (en)

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