JP2006135087A5

JP2006135087A5 -

Info

Publication number: JP2006135087A5
Application number: JP2004322575A
Authority: JP
Filing date: 2004-11-05
Publication date: 2007-12-13
Anticipated expiration: 2024-11-05

Claims

An exposure apparatus for transferring a pattern to a photosensitive substrate,
A mask stage for moving the mask with space definition member that defines a space for the surface of the mask and the boundary,
A pressure controller for controlling the pressure in the space;
An operation mechanism for combining a space definition member suitable for a mask to be used for exposure processing among the plurality of space definition members with the mask;
An exposure apparatus for transferring a mask pattern mounted on the mask stage onto a photosensitive substrate while controlling the pressure in the space by the pressure controller.

It further includes a stocker that can accommodate a plurality of masks,
The operating mechanism, in the course of conveying the mask to the mask stage from the stocker, the exposure apparatus according to claim 1, wherein the combining space definition member with respect to the mask according to the transport.

After the pair of masks and the space defining member are transferred to the mask stage, a first flow path provided in the space defining member and a second flow path provided in the mask stage are connected, and the first and The exposure apparatus according to claim 1, wherein the pressure controller can control the pressure of the space through the second flow path.

A buffer that temporarily holds the mask;
The operating mechanism, the first mask and the first space definition member disposed on the mask stage after completion of the exposure process is transported to the buffer, then a second, which is prepared in a predetermined position in order to use then The exposure apparatus according to claim 1 , wherein the mask and the second space defining member are transported to the mask stage.

A buffer that temporarily holds the mask and the space defining member;
The operating mechanism, then the first space definition member held by said buffer after the first mask and the first space definition member disposed on the mask stage after completion of the exposure process has been transported to the buffer Combined with the second mask prepared at the predetermined position for use, and then transports the second mask prepared at the predetermined position and the first space defining member combined therewith to the mask stage. The exposure apparatus according to claim 1 , wherein:

A stocker capable of accommodating a plurality of masks and space defining members;
An apparatus according to claim 4 or claim 5, characterized in that next further comprising a mask to be used is taken out from the stocker and a second operating mechanism disposed in the predetermined position.

The stocker includes a first accommodating portion that accommodates a plurality of masks and a second accommodating portion that accommodates a plurality of space defining members, and the second operation mechanism takes out an arbitrary mask from the first accommodating portion. Combined with one of the plurality of space defining members accommodated in the second accommodating portion, and then driven to convey the pair of masks and the space defining member according to the combination to the predetermined position. The exposure apparatus according to claim 6, characterized in that:

The exposure apparatus according to claim 1, further comprising a cleaner that cleans the space defining member.

9. The exposure apparatus according to claim 8, wherein the cleaner includes a sensor that detects foreign matter adhering to the space defining member and a foreign matter removing mechanism that removes foreign matter adhering to the space defining member. .

An exposure apparatus for transferring a pattern to a photosensitive substrate,
A mask stage for moving the mask with space definition member that defines a space for the surface of the mask and the boundary,
A pressure controller for controlling the pressure in the space;
A stocker including a first accommodating portion for accommodating a plurality of masks and a second accommodating portion for accommodating a plurality of space defining members;
An arbitrary mask is taken out from the first housing portion and combined with one of a plurality of space defining members housed in the second housing portion, and then a pair of masks and space defining members related to the combination are combined with the mask. An operating mechanism for conveying to the stage;
An exposure apparatus for transferring a mask pattern mounted on the mask stage onto a photosensitive substrate while controlling the pressure in the space by the pressure controller.

A device manufacturing method comprising:
Transferring the mask pattern to the photosensitive substrate using the exposure apparatus according to claim 1;
Developing the photosensitive substrate to which the pattern has been transferred;
A device manufacturing method comprising: