JP2006332100A5 - - Google Patents
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- Publication number
- JP2006332100A5 JP2006332100A5 JP2005149329A JP2005149329A JP2006332100A5 JP 2006332100 A5 JP2006332100 A5 JP 2006332100A5 JP 2005149329 A JP2005149329 A JP 2005149329A JP 2005149329 A JP2005149329 A JP 2005149329A JP 2006332100 A5 JP2006332100 A5 JP 2006332100A5
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- gas
- exposure apparatus
- wafer
- final optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Claims (4)
前記最終光学素子の周辺に配置されたノズルユニットを有し、
前記ノズルユニットには、気体を供給する気体供給口が設けられており、
前記最終光学素子の下の液膜の除去時、前記最終光学素子の下に前記気体供給口から高湿度の気体を供給することを特徴とする露光装置。 In an immersion exposure apparatus that exposes a wafer through a liquid film under the final optical element ,
A nozzle unit disposed around the final optical element;
Wherein the nozzle unit, the gas supply port is provided for supplying gas,
It said final upon removal of the lower liquid film of the optical element, exposure apparatus and supplying the high humidity of the gas from the gas supply port below the last optical element.
前記気体回収口は、前記最終光学素子の下の液膜の除去時、前記最終光学素子の下の高湿度の気体を回収することを特徴とする請求項２記載の露光装置。 On the inner side of the wall of the nozzle unit, and a gas recovery port is provided to recover the gas,
3. The exposure apparatus according to claim 2 , wherein the gas recovery port recovers a high-humidity gas under the final optical element when the liquid film under the final optical element is removed .
前記２つのウエハステージを前記最終光学素子の下で交換しながらウエハを露光し、
前記２つのウエハステージの少なくとも一方のウエハステージが前記最終光学素子の下に常に存在することを特徴とする請求項１〜３のいずれか一項記載の露光装置。 Holding the wafer has two wafer stages move,
Exposing the wafer while exchanging the two wafer stages under the final optical element,
The exposure apparatus according to claim 1, wherein at least one of the two wafer stages is always present under the final optical element .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005149329A JP4708860B2 (en) | 2005-05-23 | 2005-05-23 | Immersion exposure equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005149329A JP4708860B2 (en) | 2005-05-23 | 2005-05-23 | Immersion exposure equipment |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006332100A JP2006332100A (en) | 2006-12-07 |
| JP2006332100A5 true JP2006332100A5 (en) | 2008-07-03 |
| JP4708860B2 JP4708860B2 (en) | 2011-06-22 |
Family
ID=37553519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005149329A Expired - Fee Related JP4708860B2 (en) | 2005-05-23 | 2005-05-23 | Immersion exposure equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4708860B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4899473B2 (en) * | 2005-12-28 | 2012-03-21 | 株式会社ニコン | Imaging optical system, exposure apparatus, and device manufacturing method |
| US7866637B2 (en) | 2007-01-26 | 2011-01-11 | Asml Netherlands B.V. | Humidifying apparatus, lithographic apparatus and humidifying method |
| JP5157637B2 (en) * | 2008-05-21 | 2013-03-06 | 株式会社ニコン | Exposure apparatus, exposure method, and device manufacturing method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20050110033A (en) * | 2003-03-25 | 2005-11-22 | 가부시키가이샤 니콘 | Exposure system and device production method |
| KR101364889B1 (en) * | 2003-04-10 | 2014-02-19 | 가부시키가이샤 니콘 | Environmental system including vaccum scavange for an immersion lithography apparatus |
| KR101686762B1 (en) * | 2003-06-19 | 2016-12-28 | 가부시키가이샤 니콘 | Exposure device and device producing method |
| JP2005064210A (en) * | 2003-08-12 | 2005-03-10 | Nikon Corp | Method for exposure, and method of manufacturing electronic device and exposure device utilizing the method |
-
2005
- 2005-05-23 JP JP2005149329A patent/JP4708860B2/en not_active Expired - Fee Related
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