JP2006093721A5 - - Google Patents

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Publication number
JP2006093721A5
JP2006093721A5 JP2005291809A JP2005291809A JP2006093721A5 JP 2006093721 A5 JP2006093721 A5 JP 2006093721A5 JP 2005291809 A JP2005291809 A JP 2005291809A JP 2005291809 A JP2005291809 A JP 2005291809A JP 2006093721 A5 JP2006093721 A5 JP 2006093721A5
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JP
Japan
Prior art keywords
substrate
exposure
exposure apparatus
liquid
flat plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005291809A
Other languages
English (en)
Japanese (ja)
Other versions
JP4164508B2 (ja
JP2006093721A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005291809A priority Critical patent/JP4164508B2/ja
Priority claimed from JP2005291809A external-priority patent/JP4164508B2/ja
Publication of JP2006093721A publication Critical patent/JP2006093721A/ja
Publication of JP2006093721A5 publication Critical patent/JP2006093721A5/ja
Application granted granted Critical
Publication of JP4164508B2 publication Critical patent/JP4164508B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005291809A 2005-10-04 2005-10-04 露光装置及びデバイス製造方法 Expired - Fee Related JP4164508B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005291809A JP4164508B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005291809A JP4164508B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003185389A Division JP3862678B2 (ja) 2003-06-27 2003-06-27 露光装置及びデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007248076A Division JP4533416B2 (ja) 2007-09-25 2007-09-25 露光装置およびデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006093721A JP2006093721A (ja) 2006-04-06
JP2006093721A5 true JP2006093721A5 (enExample) 2007-08-23
JP4164508B2 JP4164508B2 (ja) 2008-10-15

Family

ID=36234328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005291809A Expired - Fee Related JP4164508B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP4164508B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4517354B2 (ja) * 2004-11-08 2010-08-04 株式会社ニコン 露光装置及びデバイス製造方法
US7423720B2 (en) 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101585370B1 (ko) * 2006-08-31 2016-01-14 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
JP5177736B2 (ja) * 2006-11-01 2013-04-10 レーザーテック株式会社 マスク検査装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1571697A4 (en) * 2002-12-10 2007-07-04 Nikon Corp EXPOSURE SYSTEM AND DEVICE PRODUCTION METHOD
SG139733A1 (en) * 2003-04-11 2008-02-29 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法

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