JP2006080543A5 - - Google Patents

Download PDF

Info

Publication number
JP2006080543A5
JP2006080543A5 JP2005291810A JP2005291810A JP2006080543A5 JP 2006080543 A5 JP2006080543 A5 JP 2006080543A5 JP 2005291810 A JP2005291810 A JP 2005291810A JP 2005291810 A JP2005291810 A JP 2005291810A JP 2006080543 A5 JP2006080543 A5 JP 2006080543A5
Authority
JP
Japan
Prior art keywords
substrate
optical system
projection optical
exposure apparatus
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005291810A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006080543A (ja
JP3997245B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005291810A priority Critical patent/JP3997245B2/ja
Priority claimed from JP2005291810A external-priority patent/JP3997245B2/ja
Publication of JP2006080543A publication Critical patent/JP2006080543A/ja
Publication of JP2006080543A5 publication Critical patent/JP2006080543A5/ja
Application granted granted Critical
Publication of JP3997245B2 publication Critical patent/JP3997245B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2005291810A 2005-10-04 2005-10-04 露光装置及びデバイス製造方法 Expired - Fee Related JP3997245B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005291810A JP3997245B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005291810A JP3997245B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003185389A Division JP3862678B2 (ja) 2003-06-27 2003-06-27 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006080543A JP2006080543A (ja) 2006-03-23
JP2006080543A5 true JP2006080543A5 (enExample) 2007-08-23
JP3997245B2 JP3997245B2 (ja) 2007-10-24

Family

ID=36159692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005291810A Expired - Fee Related JP3997245B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP3997245B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220100596A (ko) * 2019-11-14 2022-07-15 에이에스엠엘 네델란즈 비.브이. 기판 지지부, 리소그래피 장치, 전하 분포를 조작하기 위한 방법 및 기판을 준비하기 위한 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4210871B2 (ja) * 1997-10-31 2009-01-21 株式会社ニコン 露光装置
CN100568101C (zh) * 2002-11-12 2009-12-09 Asml荷兰有限公司 光刻装置和器件制造方法
SG10201603067VA (en) * 2003-04-11 2016-05-30 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TW200511388A (en) * 2003-06-13 2005-03-16 Nikon Corp Exposure method, substrate stage, exposure apparatus and method for manufacturing device

Similar Documents

Publication Publication Date Title
TWI263859B (en) Lithographic apparatus and device manufacturing method
TW200502703A (en) Exposure system and device manufacturing method
TW200611082A (en) Exposure system and device production method
JP2005005707A5 (enExample)
TW200507063A (en) Linking unit, exposure apparatus and method for manufacturing device
TW200745772A (en) Exposure apparatus and device manufacturing method
JP2011181937A5 (enExample)
JP2010199615A5 (ja) 露光方法及び露光装置
JP2012138618A5 (enExample)
JP2012138619A5 (ja) 液浸露光装置、液浸露光方法、デバイス製造方法、及び液浸露光装置の製造方法
JP2008199034A5 (enExample)
JP2005268489A5 (enExample)
EP1672682A4 (en) SUBSTRATE TRANSPORT DEVICE AND METHOD, EXPOSURE DEVICE AND METHOD AND COMPONENT MANUFACTURING METHOD
TW200717186A (en) Exposure apparatus and method
TW200731335A (en) Exposure apparatus and device manufacturing method
TW200620410A (en) Measurement method, exposure method, and device manufacturing method
JP2009182253A5 (enExample)
JP2005223011A5 (enExample)
TW200700926A (en) Optical element, exposure apparatus, and device manufacturing method
JP2011500370A5 (enExample)
TW201035696A (en) Alignment method, exposure method, electronic device fabrication method, alignment device, and exposure device
TW200721258A (en) Exposure apparatus and exposure method
TW201729980A (zh) 壓印裝置以及物品製造方法
JP2006041302A5 (enExample)
JP2006261606A5 (enExample)