JP2005223011A5 - - Google Patents

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Publication number
JP2005223011A5
JP2005223011A5 JP2004027125A JP2004027125A JP2005223011A5 JP 2005223011 A5 JP2005223011 A5 JP 2005223011A5 JP 2004027125 A JP2004027125 A JP 2004027125A JP 2004027125 A JP2004027125 A JP 2004027125A JP 2005223011 A5 JP2005223011 A5 JP 2005223011A5
Authority
JP
Japan
Prior art keywords
vacuum chamber
exposure apparatus
substrate
chamber module
original
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004027125A
Other languages
English (en)
Japanese (ja)
Other versions
JP4383911B2 (ja
JP2005223011A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004027125A priority Critical patent/JP4383911B2/ja
Priority claimed from JP2004027125A external-priority patent/JP4383911B2/ja
Priority to US11/048,762 priority patent/US7130016B2/en
Publication of JP2005223011A publication Critical patent/JP2005223011A/ja
Publication of JP2005223011A5 publication Critical patent/JP2005223011A5/ja
Application granted granted Critical
Publication of JP4383911B2 publication Critical patent/JP4383911B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004027125A 2004-02-03 2004-02-03 露光装置及び半導体デバイスの製造方法 Expired - Fee Related JP4383911B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004027125A JP4383911B2 (ja) 2004-02-03 2004-02-03 露光装置及び半導体デバイスの製造方法
US11/048,762 US7130016B2 (en) 2004-02-03 2005-02-03 Exposure apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004027125A JP4383911B2 (ja) 2004-02-03 2004-02-03 露光装置及び半導体デバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2005223011A JP2005223011A (ja) 2005-08-18
JP2005223011A5 true JP2005223011A5 (enExample) 2009-09-03
JP4383911B2 JP4383911B2 (ja) 2009-12-16

Family

ID=34805863

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004027125A Expired - Fee Related JP4383911B2 (ja) 2004-02-03 2004-02-03 露光装置及び半導体デバイスの製造方法

Country Status (2)

Country Link
US (1) US7130016B2 (enExample)
JP (1) JP4383911B2 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005175187A (ja) * 2003-12-11 2005-06-30 Canon Inc 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP2005353986A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置
US20060181689A1 (en) * 2005-02-14 2006-08-17 Nikon Corporation Lithographic-optical systems including isolatable vacuum chambers, and lithography apparatus comprising same
JP2006261212A (ja) * 2005-03-15 2006-09-28 Nikon Corp 露光装置
JP2006261605A (ja) * 2005-03-18 2006-09-28 Canon Inc 露光装置及び露光方法
JP2006303462A (ja) * 2005-03-23 2006-11-02 Canon Inc 露光装置及びデバイス製造方法
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
JP4908807B2 (ja) * 2005-09-15 2012-04-04 キヤノン株式会社 処理装置、露光装置、およびデバイス製造方法
US7426015B2 (en) * 2007-01-17 2008-09-16 Asml Netherlands B.V. Device manufacturing method and lithographic apparatus
US7969550B2 (en) * 2007-04-19 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4435201B2 (ja) * 2007-04-20 2010-03-17 キヤノン株式会社 温調システムの調整方法
US8749753B2 (en) * 2007-04-27 2014-06-10 Nikon Corporation Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method
US20090147228A1 (en) * 2007-12-11 2009-06-11 Nikon Corporation Exposure apparatus, manufacturing method thereof, and maintenance method of exposure apparatus
US8964166B2 (en) * 2007-12-17 2015-02-24 Nikon Corporation Stage device, exposure apparatus and method of producing device
NL1036957A1 (nl) * 2008-06-13 2009-12-15 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
CN102187280B (zh) * 2008-10-15 2014-11-12 株式会社尼康 曝光装置及其组装方法、以及器件制造方法
JP5495547B2 (ja) * 2008-12-25 2014-05-21 キヤノン株式会社 処理装置、およびデバイス製造方法
JP6749090B2 (ja) * 2015-11-12 2020-09-02 東京エレクトロン株式会社 ハロゲン系ガスを用いる処理装置における処理方法
JP6278427B1 (ja) 2017-01-05 2018-02-14 レーザーテック株式会社 光学装置、及び除振方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2821795B2 (ja) 1990-05-17 1998-11-05 キヤノン株式会社 半導体露光装置
US5559584A (en) * 1993-03-08 1996-09-24 Nikon Corporation Exposure apparatus
JPH09218519A (ja) * 1996-02-09 1997-08-19 Nikon Corp 露光装置の環境制御方法及び装置
US6545746B1 (en) * 1996-03-04 2003-04-08 Nikon Corporation Projection exposure apparatus
KR970067591A (ko) * 1996-03-04 1997-10-13 오노 시게오 투영노광장치
JP3690540B2 (ja) 1996-03-04 2005-08-31 株式会社ニコン 投影露光装置
JP3890136B2 (ja) * 1997-03-25 2007-03-07 キヤノン株式会社 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置
WO1999050892A1 (en) * 1998-03-31 1999-10-07 Nikon Corporation Optical device and exposure system equipped with optical device
JP2000012412A (ja) 1998-06-18 2000-01-14 Kokusai Electric Co Ltd 半導体製造装置の性能監視方法および装置
US6842221B1 (en) * 1999-03-12 2005-01-11 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
US6614504B2 (en) * 2000-03-30 2003-09-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2002158155A (ja) * 2000-11-17 2002-05-31 Canon Inc 露光装置および露光方法
JP2002203771A (ja) 2000-12-28 2002-07-19 Nikon Corp 露光装置、輸送方法
US6801301B2 (en) * 2001-10-12 2004-10-05 Canon Kabushiki Kaisha Exposure apparatus
JP2005175187A (ja) * 2003-12-11 2005-06-30 Canon Inc 光学部材、冷却方法、冷却装置、露光装置、デバイス製造方法、及びデバイス
JP4666908B2 (ja) * 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
JP2005295762A (ja) * 2004-04-05 2005-10-20 Canon Inc ステージ装置および露光装置
JP2005353986A (ja) * 2004-06-14 2005-12-22 Canon Inc 露光装置

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