JP3997245B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

Info

Publication number
JP3997245B2
JP3997245B2 JP2005291810A JP2005291810A JP3997245B2 JP 3997245 B2 JP3997245 B2 JP 3997245B2 JP 2005291810 A JP2005291810 A JP 2005291810A JP 2005291810 A JP2005291810 A JP 2005291810A JP 3997245 B2 JP3997245 B2 JP 3997245B2
Authority
JP
Japan
Prior art keywords
liquid
optical system
projection optical
substrate
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005291810A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006080543A5 (enExample
JP2006080543A (ja
Inventor
一志 中野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2005291810A priority Critical patent/JP3997245B2/ja
Publication of JP2006080543A publication Critical patent/JP2006080543A/ja
Publication of JP2006080543A5 publication Critical patent/JP2006080543A5/ja
Application granted granted Critical
Publication of JP3997245B2 publication Critical patent/JP3997245B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005291810A 2005-10-04 2005-10-04 露光装置及びデバイス製造方法 Expired - Fee Related JP3997245B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005291810A JP3997245B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005291810A JP3997245B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003185389A Division JP3862678B2 (ja) 2003-06-27 2003-06-27 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006080543A JP2006080543A (ja) 2006-03-23
JP2006080543A5 JP2006080543A5 (enExample) 2007-08-23
JP3997245B2 true JP3997245B2 (ja) 2007-10-24

Family

ID=36159692

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005291810A Expired - Fee Related JP3997245B2 (ja) 2005-10-04 2005-10-04 露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP3997245B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220100596A (ko) * 2019-11-14 2022-07-15 에이에스엠엘 네델란즈 비.브이. 기판 지지부, 리소그래피 장치, 전하 분포를 조작하기 위한 방법 및 기판을 준비하기 위한 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4210871B2 (ja) * 1997-10-31 2009-01-21 株式会社ニコン 露光装置
CN100568101C (zh) * 2002-11-12 2009-12-09 Asml荷兰有限公司 光刻装置和器件制造方法
SG10201603067VA (en) * 2003-04-11 2016-05-30 Nikon Corp Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
JP2005277363A (ja) * 2003-05-23 2005-10-06 Nikon Corp 露光装置及びデバイス製造方法
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TW200511388A (en) * 2003-06-13 2005-03-16 Nikon Corp Exposure method, substrate stage, exposure apparatus and method for manufacturing device

Also Published As

Publication number Publication date
JP2006080543A (ja) 2006-03-23

Similar Documents

Publication Publication Date Title
JP3862678B2 (ja) 露光装置及びデバイス製造方法
JP4582089B2 (ja) 液浸リソグラフィ用の液体噴射回収システム
JP2008034801A (ja) 露光装置およびデバイス製造方法
US20100097584A1 (en) Exposure apparatus and device fabrication method
JP2008227452A (ja) 露光装置およびデバイス製造方法
WO2006077859A1 (ja) 液体除去装置、露光装置、及びデバイス製造方法
JP4533416B2 (ja) 露光装置およびデバイス製造方法
JP4164508B2 (ja) 露光装置及びデバイス製造方法
JP3997243B2 (ja) 露光装置及びデバイス製造方法
JP3997245B2 (ja) 露光装置及びデバイス製造方法
JP3997242B2 (ja) 露光装置及びデバイス製造方法
JP3997244B2 (ja) 露光装置及びデバイス製造方法
US20110164239A1 (en) Apparatus and method for recovering liquid droplets in immersion lithography
JP4194591B2 (ja) 露光装置及びデバイス製造方法
JP2006060016A (ja) 流体給排装置及びそれを有する露光装置
JP2008218595A (ja) 露光装置
JP2009218564A (ja) 露光装置及びデバイス製造方法
JP2009302452A (ja) 露光装置及びデバイス製造方法
JP2007242732A (ja) 露光装置及びデバイス製造方法
JP2008140957A (ja) 液浸露光装置
JP2008140959A (ja) 液浸露光装置
JP2009065132A (ja) 露光装置及びデバイス製造方法

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070509

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070628

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070727

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20070806

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100810

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100810

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110810

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120810

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120810

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130810

Year of fee payment: 6

LAPS Cancellation because of no payment of annual fees