JP2006261606A5 - - Google Patents

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Publication number
JP2006261606A5
JP2006261606A5 JP2005080587A JP2005080587A JP2006261606A5 JP 2006261606 A5 JP2006261606 A5 JP 2006261606A5 JP 2005080587 A JP2005080587 A JP 2005080587A JP 2005080587 A JP2005080587 A JP 2005080587A JP 2006261606 A5 JP2006261606 A5 JP 2006261606A5
Authority
JP
Japan
Prior art keywords
liquid
space
optical system
projection optical
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005080587A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006261606A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005080587A priority Critical patent/JP2006261606A/ja
Priority claimed from JP2005080587A external-priority patent/JP2006261606A/ja
Priority to US11/375,203 priority patent/US7561249B2/en
Publication of JP2006261606A publication Critical patent/JP2006261606A/ja
Publication of JP2006261606A5 publication Critical patent/JP2006261606A5/ja
Withdrawn legal-status Critical Current

Links

JP2005080587A 2005-03-18 2005-03-18 露光装置、露光方法及びデバイス製造方法 Withdrawn JP2006261606A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005080587A JP2006261606A (ja) 2005-03-18 2005-03-18 露光装置、露光方法及びデバイス製造方法
US11/375,203 US7561249B2 (en) 2005-03-18 2006-03-15 Exposure apparatus, exposure method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005080587A JP2006261606A (ja) 2005-03-18 2005-03-18 露光装置、露光方法及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2006261606A JP2006261606A (ja) 2006-09-28
JP2006261606A5 true JP2006261606A5 (enExample) 2008-08-28

Family

ID=37009938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005080587A Withdrawn JP2006261606A (ja) 2005-03-18 2005-03-18 露光装置、露光方法及びデバイス製造方法

Country Status (2)

Country Link
US (1) US7561249B2 (enExample)
JP (1) JP2006261606A (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006261606A (ja) 2005-03-18 2006-09-28 Canon Inc 露光装置、露光方法及びデバイス製造方法
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
US7385673B2 (en) * 2005-06-10 2008-06-10 International Business Machines Corporation Immersion lithography with equalized pressure on at least projection optics component and wafer
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
JP2008218653A (ja) * 2007-03-02 2008-09-18 Canon Inc 露光装置及びデバイス製造方法
WO2008139913A1 (ja) * 2007-05-10 2008-11-20 Nikon Corporation 露光方法及び露光用平板
NL1036579A1 (nl) * 2008-02-19 2009-08-20 Asml Netherlands Bv Lithographic apparatus and methods.
US8654306B2 (en) * 2008-04-14 2014-02-18 Nikon Corporation Exposure apparatus, cleaning method, and device fabricating method
US20110222030A1 (en) * 2010-03-09 2011-09-15 Nanya Technology Corporation Immersion lithographic apparatuses
US20120062858A1 (en) * 2010-04-02 2012-03-15 Nikon Corporation Cleaning method, device manufacturing method, exposure apparatus, and device manufacturing system
JP5241862B2 (ja) 2011-01-01 2013-07-17 キヤノン株式会社 露光装置及びデバイスの製造方法
US20130016041A1 (en) * 2011-07-13 2013-01-17 Kuo-Ching Chiang High Resolution Mouse

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1598855B1 (en) * 2003-02-26 2015-04-22 Nikon Corporation Exposure apparatus and method, and method of producing apparatus
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
JP4492539B2 (ja) * 2003-09-29 2010-06-30 株式会社ニコン 液浸型光学系及び投影露光装置、並びにデバイス製造方法
US7880860B2 (en) * 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006261606A (ja) 2005-03-18 2006-09-28 Canon Inc 露光装置、露光方法及びデバイス製造方法
JP2006269942A (ja) 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法

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