JP2015518183A5 - - Google Patents

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Publication number
JP2015518183A5
JP2015518183A5 JP2015514406A JP2015514406A JP2015518183A5 JP 2015518183 A5 JP2015518183 A5 JP 2015518183A5 JP 2015514406 A JP2015514406 A JP 2015514406A JP 2015514406 A JP2015514406 A JP 2015514406A JP 2015518183 A5 JP2015518183 A5 JP 2015518183A5
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JP
Japan
Prior art keywords
light
exposure unit
slm
lcmo
lcmo layer
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JP2015514406A
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English (en)
Japanese (ja)
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JP2015518183A (ja
JP6552410B2 (ja
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Priority claimed from PCT/EP2013/059779 external-priority patent/WO2013178453A1/en
Publication of JP2015518183A publication Critical patent/JP2015518183A/ja
Publication of JP2015518183A5 publication Critical patent/JP2015518183A5/ja
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Publication of JP6552410B2 publication Critical patent/JP6552410B2/ja
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JP2015514406A 2012-05-30 2013-05-13 個別にパターン化された異方性を有する素子の高速な製造 Active JP6552410B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP12170012.4 2012-05-30
EP12170012 2012-05-30
PCT/EP2013/059779 WO2013178453A1 (en) 2012-05-30 2013-05-13 Fast generation of elements with individually patterned anisotropy

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019072047A Division JP2019133183A (ja) 2012-05-30 2019-04-04 個別にパターン化された異方性を有する素子の高速な製造

Publications (3)

Publication Number Publication Date
JP2015518183A JP2015518183A (ja) 2015-06-25
JP2015518183A5 true JP2015518183A5 (enExample) 2016-02-18
JP6552410B2 JP6552410B2 (ja) 2019-07-31

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ID=48446309

Family Applications (2)

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JP2015514406A Active JP6552410B2 (ja) 2012-05-30 2013-05-13 個別にパターン化された異方性を有する素子の高速な製造
JP2019072047A Pending JP2019133183A (ja) 2012-05-30 2019-04-04 個別にパターン化された異方性を有する素子の高速な製造

Family Applications After (1)

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JP2019072047A Pending JP2019133183A (ja) 2012-05-30 2019-04-04 個別にパターン化された異方性を有する素子の高速な製造

Country Status (8)

Country Link
US (1) US9869935B2 (enExample)
EP (1) EP2856223B1 (enExample)
JP (2) JP6552410B2 (enExample)
KR (1) KR102184244B1 (enExample)
CN (1) CN104364682B (enExample)
AU (2) AU2013269942B2 (enExample)
BR (1) BR112014029923A2 (enExample)
WO (1) WO2013178453A1 (enExample)

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CN104460069B (zh) * 2014-12-30 2017-11-14 京东方科技集团股份有限公司 一种对位设备及其对位方法
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TWI792281B (zh) * 2020-05-22 2023-02-11 台灣積體電路製造股份有限公司 半導體光刻技術及/或方法

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