BR112014029923A2 - geração rápida de elementos com anisotropia individualmente padronizada - Google Patents

geração rápida de elementos com anisotropia individualmente padronizada

Info

Publication number
BR112014029923A2
BR112014029923A2 BR112014029923A BR112014029923A BR112014029923A2 BR 112014029923 A2 BR112014029923 A2 BR 112014029923A2 BR 112014029923 A BR112014029923 A BR 112014029923A BR 112014029923 A BR112014029923 A BR 112014029923A BR 112014029923 A2 BR112014029923 A2 BR 112014029923A2
Authority
BR
Brazil
Prior art keywords
elements
individually standardized
standardized
individually
anisotropy
Prior art date
Application number
BR112014029923A
Other languages
English (en)
Inventor
Seiberle Hubert
Schimitt Klaus
Original Assignee
Rolic Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rolic Ag filed Critical Rolic Ag
Publication of BR112014029923A2 publication Critical patent/BR112014029923A2/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00634—Production of filters
    • B29D11/00644—Production of filters polarizing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/364—Liquid crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/12—Function characteristic spatial light modulator

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Credit Cards Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

resumo geração rápida de elementos com anisotropia individualmente padronizada a presente invenção refere-se a um aparelho que permite a produção de elementos com propriedades anisotrópicas individualmente padronizadas, em que o padrão pode variar de elemento para elemento. um aparelho de acordo com a invenção compreende um suporte para um substrato e uma unidade de exposição para fornecer luz de alinhamento modulada espacialmente com um primeiro plano de polarização, em que a unidade de exposição contém uma fonte de luz, um modulador de luz espacial, que pode ser controlado eletronicamente, por exemplo, por um computador, e uma lente de proteção. a presente invenção se refere adicionalmente a um método de produção rápida de elementos com propriedades anisotrópicas individualmente padronizadas com uso de tal aparelho.
BR112014029923A 2012-05-30 2013-05-13 geração rápida de elementos com anisotropia individualmente padronizada BR112014029923A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP12170012 2012-05-30
PCT/EP2013/059779 WO2013178453A1 (en) 2012-05-30 2013-05-13 Fast generation of elements with individually patterned anisotropy

Publications (1)

Publication Number Publication Date
BR112014029923A2 true BR112014029923A2 (pt) 2017-06-27

Family

ID=48446309

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112014029923A BR112014029923A2 (pt) 2012-05-30 2013-05-13 geração rápida de elementos com anisotropia individualmente padronizada

Country Status (8)

Country Link
US (1) US9869935B2 (pt)
EP (1) EP2856223B1 (pt)
JP (2) JP6552410B2 (pt)
KR (1) KR102184244B1 (pt)
CN (1) CN104364682B (pt)
AU (2) AU2013269942B2 (pt)
BR (1) BR112014029923A2 (pt)
WO (1) WO2013178453A1 (pt)

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CN104460069B (zh) * 2014-12-30 2017-11-14 京东方科技集团股份有限公司 一种对位设备及其对位方法
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US10809626B2 (en) * 2017-10-26 2020-10-20 The United States Of America As Represented By The Secretary Of The Air Force Generation of vector partially coherent optical sources using phase-only spatial light modulators
KR20210130885A (ko) * 2020-04-22 2021-11-02 삼성디스플레이 주식회사 잉크젯 프린팅 장치 및 이를 이용한 쌍극성 소자의 프린팅 방법
TWI792281B (zh) * 2020-05-22 2023-02-11 台灣積體電路製造股份有限公司 半導體光刻技術及/或方法

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Also Published As

Publication number Publication date
KR102184244B1 (ko) 2020-12-01
WO2013178453A1 (en) 2013-12-05
EP2856223B1 (en) 2020-12-23
CN104364682B (zh) 2018-06-01
US9869935B2 (en) 2018-01-16
JP6552410B2 (ja) 2019-07-31
CN104364682A (zh) 2015-02-18
AU2013269942B2 (en) 2016-11-03
AU2017200037B2 (en) 2018-05-31
EP2856223A1 (en) 2015-04-08
AU2013269942A1 (en) 2014-11-20
KR20150023402A (ko) 2015-03-05
JP2019133183A (ja) 2019-08-08
US20150109597A1 (en) 2015-04-23
JP2015518183A (ja) 2015-06-25
AU2017200037A1 (en) 2017-02-02

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B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

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B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

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