SE0300453D0 - Pattern generation method - Google Patents

Pattern generation method

Info

Publication number
SE0300453D0
SE0300453D0 SE0300453A SE0300453A SE0300453D0 SE 0300453 D0 SE0300453 D0 SE 0300453D0 SE 0300453 A SE0300453 A SE 0300453A SE 0300453 A SE0300453 A SE 0300453A SE 0300453 D0 SE0300453 D0 SE 0300453D0
Authority
SE
Sweden
Prior art keywords
electromagnetic radiation
pattern
generation method
pattern generation
workpiece
Prior art date
Application number
SE0300453A
Other languages
English (en)
Inventor
Peter Ekberg
John-Oskar Larsson
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Priority to SE0300453A priority Critical patent/SE0300453D0/sv
Publication of SE0300453D0 publication Critical patent/SE0300453D0/sv
Priority to EP04713277A priority patent/EP1595184A1/en
Priority to PCT/SE2004/000233 priority patent/WO2004074940A1/en
Priority to KR1020057012247A priority patent/KR20050099609A/ko
Priority to JP2006502808A priority patent/JP2006518484A/ja
Priority to CNA200480004777XA priority patent/CN1751273A/zh
Priority to US11/206,197 priority patent/US7488957B2/en
Priority to US11/980,441 priority patent/US20080078960A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
SE0300453A 2003-02-20 2003-02-20 Pattern generation method SE0300453D0 (sv)

Priority Applications (8)

Application Number Priority Date Filing Date Title
SE0300453A SE0300453D0 (sv) 2003-02-20 2003-02-20 Pattern generation method
EP04713277A EP1595184A1 (en) 2003-02-20 2004-02-20 Pattern generation method
PCT/SE2004/000233 WO2004074940A1 (en) 2003-02-20 2004-02-20 Pattern generation method
KR1020057012247A KR20050099609A (ko) 2003-02-20 2004-02-20 패턴 생성 방법
JP2006502808A JP2006518484A (ja) 2003-02-20 2004-02-20 パターン発生方法
CNA200480004777XA CN1751273A (zh) 2003-02-20 2004-02-20 图案产生方法
US11/206,197 US7488957B2 (en) 2003-02-20 2005-08-18 Pattern generation methods and apparatuses
US11/980,441 US20080078960A1 (en) 2003-02-20 2007-10-31 Pattern generation methods and apparatuses

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0300453A SE0300453D0 (sv) 2003-02-20 2003-02-20 Pattern generation method

Publications (1)

Publication Number Publication Date
SE0300453D0 true SE0300453D0 (sv) 2003-02-20

Family

ID=20290453

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0300453A SE0300453D0 (sv) 2003-02-20 2003-02-20 Pattern generation method

Country Status (7)

Country Link
US (2) US7488957B2 (sv)
EP (1) EP1595184A1 (sv)
JP (1) JP2006518484A (sv)
KR (1) KR20050099609A (sv)
CN (1) CN1751273A (sv)
SE (1) SE0300453D0 (sv)
WO (1) WO2004074940A1 (sv)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE0300453D0 (sv) 2003-02-20 2003-02-20 Micronic Laser Systems Ab Pattern generation method
US7501601B2 (en) * 2003-09-03 2009-03-10 Xenetech U.S.A., Inc. Automated laser engraver
US7388663B2 (en) * 2004-10-28 2008-06-17 Asml Netherlands B.V. Optical position assessment apparatus and method
DE102006008075A1 (de) * 2005-04-19 2006-10-26 Kleo Halbleitertechnik Gmbh & Co Kg Belichtungsanlage
DE102006008080A1 (de) * 2006-02-22 2007-08-30 Kleo Maschinenbau Ag Belichtungsanlage
JP5154178B2 (ja) * 2007-09-14 2013-02-27 ヤマザキマザック株式会社 複合加工旋盤
KR20100110996A (ko) * 2009-04-06 2010-10-14 주식회사 프로텍 그리드 이미지와 스테이지의 이동 각도 조절에 의한 레이저빔 간 피치조절 방법
DE102010010071A1 (de) * 2010-02-26 2011-09-01 Bundesdruckerei Gmbh Markierungsvorrichtung und Verfahren zum Markieren von Wert- oder Sicherheitsdokumenten unter Verwendung von Lichtleitfasern
TW201224678A (en) * 2010-11-04 2012-06-16 Orc Mfg Co Ltd Exposure device
CN102841507B (zh) * 2011-06-23 2014-06-25 虎尾科技大学 激光直写式纳米周期性结构图案制造设备
JP6552410B2 (ja) * 2012-05-30 2019-07-31 ロリク アーゲーＲｏｌｉｃ Ａｇ 個別にパターン化された異方性を有する素子の高速な製造
US9145332B2 (en) 2012-08-16 2015-09-29 Infineon Technologies Ag Etching apparatus and method
FR3006068B1 (fr) * 2013-05-24 2015-04-24 Saint Gobain Procede d'obtention d'un substrat
CN104459858B (zh) * 2014-12-30 2017-02-22 中国科学院长春光学精密机械与物理研究所 一种双气浮导轨式光栅刻划刀架驱动装置
US9718291B2 (en) * 2015-10-16 2017-08-01 Oce-Technologies B.V. Printer carriage support structure
CN105290664B (zh) * 2015-12-09 2017-04-19 重庆镭宝激光智能机器人制造有限公司 一种焊接机器人高精度移动装置
CN109270803B (zh) * 2018-10-22 2020-08-11 上海理工大学 一种多版并列光刻的排版系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4063103A (en) * 1975-04-11 1977-12-13 Tokyo Shibaura Electric Co., Ltd. Electron beam exposure apparatus
US4445485A (en) * 1981-11-27 1984-05-01 Chamness Jr Addison B Engine fuel system
DE4022732A1 (de) 1990-07-17 1992-02-20 Micronic Laser Systems Ab Auf einem lichtempfindlich beschichteten substrat durch fokussierte laserstrahlung hergestellte struktur sowie verfahren und vorrichtung zu ihrer herstellung
EP0558781B1 (en) * 1992-03-05 1998-08-05 Micronic Laser Systems Ab Method and apparatus for exposure of substrates
US6134981A (en) * 1999-12-03 2000-10-24 Nikon Research Corporation Of America Precision scanning apparatus and method with fixed and movable guide members
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JPH11237744A (ja) * 1997-12-18 1999-08-31 Sanee Giken Kk 露光装置および露光方法
US6816302B2 (en) * 1998-03-02 2004-11-09 Micronic Laser Systems Ab Pattern generator
US6816602B2 (en) * 2001-03-01 2004-11-09 Lockheed Martin Corporation System and method of deferred postal address processing
JP4320694B2 (ja) * 2001-08-08 2009-08-26 株式会社オーク製作所 多重露光描画装置および多重露光式描画方法
US7001481B2 (en) * 2001-11-30 2006-02-21 Micron Technology, Inc. Method and system providing high flux of point of use activated reactive species for semiconductor processing
SE0300453D0 (sv) 2003-02-20 2003-02-20 Micronic Laser Systems Ab Pattern generation method

Also Published As

Publication number Publication date
JP2006518484A (ja) 2006-08-10
US20080078960A1 (en) 2008-04-03
US20060027538A1 (en) 2006-02-09
US7488957B2 (en) 2009-02-10
WO2004074940A1 (en) 2004-09-02
CN1751273A (zh) 2006-03-22
EP1595184A1 (en) 2005-11-16
KR20050099609A (ko) 2005-10-14

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