JP2009036916A5 - - Google Patents

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Publication number
JP2009036916A5
JP2009036916A5 JP2007199904A JP2007199904A JP2009036916A5 JP 2009036916 A5 JP2009036916 A5 JP 2009036916A5 JP 2007199904 A JP2007199904 A JP 2007199904A JP 2007199904 A JP2007199904 A JP 2007199904A JP 2009036916 A5 JP2009036916 A5 JP 2009036916A5
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JP
Japan
Prior art keywords
light
polarization direction
linearly polarized
holograms
anisotropic layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007199904A
Other languages
English (en)
Japanese (ja)
Other versions
JP5173309B2 (ja
JP2009036916A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2007199904A external-priority patent/JP5173309B2/ja
Priority to JP2007199904A priority Critical patent/JP5173309B2/ja
Priority to TW097125579A priority patent/TWI442198B/zh
Priority to EP08159814A priority patent/EP2023216A3/en
Priority to US12/180,605 priority patent/US8072661B2/en
Priority to CN2008101294670A priority patent/CN101359215B/zh
Priority to KR1020080074839A priority patent/KR101004872B1/ko
Publication of JP2009036916A publication Critical patent/JP2009036916A/ja
Publication of JP2009036916A5 publication Critical patent/JP2009036916A5/ja
Publication of JP5173309B2 publication Critical patent/JP5173309B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2007199904A 2007-07-31 2007-07-31 ホログラム、露光装置及びデバイス製造方法 Expired - Fee Related JP5173309B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2007199904A JP5173309B2 (ja) 2007-07-31 2007-07-31 ホログラム、露光装置及びデバイス製造方法
TW097125579A TWI442198B (zh) 2007-07-31 2008-07-07 電腦產生的全像圖，曝光設備，及半導體裝置製造方法
EP08159814A EP2023216A3 (en) 2007-07-31 2008-07-07 Computer generated hologram, exposure apparatus, and hologram fabrication method
US12/180,605 US8072661B2 (en) 2007-07-31 2008-07-28 Computer generated hologram, exposure apparatus, and device fabrication method
CN2008101294670A CN101359215B (zh) 2007-07-31 2008-07-31 计算机生成的全息图元件、曝光设备以及器件制造方法
KR1020080074839A KR101004872B1 (ko) 2007-07-31 2008-07-31 계산기홀로그램, 노광장치, 및 디바이스의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007199904A JP5173309B2 (ja) 2007-07-31 2007-07-31 ホログラム、露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009036916A JP2009036916A (ja) 2009-02-19
JP2009036916A5 true JP2009036916A5 (enExample) 2010-09-16
JP5173309B2 JP5173309B2 (ja) 2013-04-03

Family

ID=40003090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007199904A Expired - Fee Related JP5173309B2 (ja) 2007-07-31 2007-07-31 ホログラム、露光装置及びデバイス製造方法

Country Status (6)

Country Link
US (1) US8072661B2 (enExample)
EP (1) EP2023216A3 (enExample)
JP (1) JP5173309B2 (enExample)
KR (1) KR101004872B1 (enExample)
CN (1) CN101359215B (enExample)
TW (1) TWI442198B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5032972B2 (ja) * 2007-12-28 2012-09-26 キヤノン株式会社 計算機ホログラム、生成方法及び露光装置
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5078764B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5167032B2 (ja) * 2008-08-27 2013-03-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP2010109242A (ja) * 2008-10-31 2010-05-13 Canon Inc 照明光学系及び露光装置
US8531747B2 (en) 2009-06-24 2013-09-10 Canon Kabushiki Kaisha Hologram, hologram data generation method, and exposure apparatus
JP2011040618A (ja) * 2009-08-12 2011-02-24 Nikon Corp 回折光学素子、照明光学系、露光装置、デバイスの製造方法、及び回折光学素子の設計方法
US9116303B2 (en) * 2010-03-05 2015-08-25 Canon Kabushiki Kaisha Hologram with cells to control phase in two polarization directions and exposure apparatus
CN104252017A (zh) * 2013-06-28 2014-12-31 苏州印象镭射科技有限公司 一种激光全息数码透镜模具及其制作方法
WO2016153850A1 (en) * 2015-03-26 2016-09-29 Otoy, Inc. Relightable holograms
WO2020153504A1 (ja) * 2019-01-25 2020-07-30 大日本印刷株式会社 回折光学素子、照明装置、投射装置、投射型表示装置および要素回折光学素子の製造方法
CN115244433A (zh) 2020-03-11 2022-10-25 尼尔技术有限公司 衍射光学元件
JP7426474B2 (ja) 2020-09-07 2024-02-01 株式会社フジクラ 光回折素子、及び、光演算システム
US20240418914A1 (en) * 2021-02-05 2024-12-19 Fujikura Ltd. Light diffraction element unit, optical computing device, assembling method, and manufacturing method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4043058B2 (ja) * 1995-06-01 2008-02-06 旭硝子株式会社 光ヘッド装置に用いられる回折素子の製造方法
JP4545297B2 (ja) * 2000-09-01 2010-09-15 大日本印刷株式会社 光学素子およびその製造方法
DE10124803A1 (de) * 2001-05-22 2002-11-28 Zeiss Carl Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator
JP2004198348A (ja) 2002-12-20 2004-07-15 Nikon Corp 干渉計及び投影露光装置の製造方法
JP2006005319A (ja) 2004-06-21 2006-01-05 Canon Inc 照明光学系及び方法、露光装置及びデバイス製造方法
KR100684872B1 (ko) 2004-08-03 2007-02-20 삼성전자주식회사 빛의 편광을 공간적으로 제어하는 광학 시스템 및 이를제작하는 방법
JP2006196715A (ja) 2005-01-13 2006-07-27 Nikon Corp 光束変換素子、照明光学装置、露光装置、および露光方法
US20060289577A1 (en) 2005-06-23 2006-12-28 Malone Larry D Universal attachment system

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