JP5173309B2 - ホログラム、露光装置及びデバイス製造方法 - Google Patents

ホログラム、露光装置及びデバイス製造方法 Download PDF

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Publication number
JP5173309B2
JP5173309B2 JP2007199904A JP2007199904A JP5173309B2 JP 5173309 B2 JP5173309 B2 JP 5173309B2 JP 2007199904 A JP2007199904 A JP 2007199904A JP 2007199904 A JP2007199904 A JP 2007199904A JP 5173309 B2 JP5173309 B2 JP 5173309B2
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JP
Japan
Prior art keywords
cell
polarized light
light
polarization direction
linearly polarized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007199904A
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English (en)
Japanese (ja)
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JP2009036916A (ja
JP2009036916A5 (enExample
Inventor
功 松原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2007199904A priority Critical patent/JP5173309B2/ja
Priority to EP08159814A priority patent/EP2023216A3/en
Priority to TW097125579A priority patent/TWI442198B/zh
Priority to US12/180,605 priority patent/US8072661B2/en
Priority to KR1020080074839A priority patent/KR101004872B1/ko
Priority to CN2008101294670A priority patent/CN101359215B/zh
Publication of JP2009036916A publication Critical patent/JP2009036916A/ja
Publication of JP2009036916A5 publication Critical patent/JP2009036916A5/ja
Application granted granted Critical
Publication of JP5173309B2 publication Critical patent/JP5173309B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0244—Surface relief holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0272—Substrate bearing the hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0891—Processes or apparatus adapted to convert digital holographic data into a hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2249—Holobject properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0493—Special holograms not otherwise provided for, e.g. conoscopic, referenceless holography
    • G03H2001/0495—Polarisation preserving holography where amplitude, phase and polarisation state of the original objet wavefront are recorded
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2249—Holobject properties
    • G03H2001/2276—Polarisation dependent holobject
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2210/00—Object characteristics
    • G03H2210/20—2D object
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/31—Polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/20—Birefringent optical element, e.g. wave plate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/23—Optical length variations, e.g. bleached silver halide
    • G03H2240/24—Index variations only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/40—Dynamic of the variations
    • G03H2240/41—Binary
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/40—Dynamic of the variations
    • G03H2240/42—Discrete level
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/40—Dynamic of the variations
    • G03H2240/43—Continuous
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/50—Reactivity or recording processes
    • G03H2260/63—Indirect etching, e.g. lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00—Substrate bearing the hologram
    • G03H2270/52—Integrated surface relief hologram without forming layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007199904A 2007-07-31 2007-07-31 ホログラム、露光装置及びデバイス製造方法 Expired - Fee Related JP5173309B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2007199904A JP5173309B2 (ja) 2007-07-31 2007-07-31 ホログラム、露光装置及びデバイス製造方法
EP08159814A EP2023216A3 (en) 2007-07-31 2008-07-07 Computer generated hologram, exposure apparatus, and hologram fabrication method
TW097125579A TWI442198B (zh) 2007-07-31 2008-07-07 電腦產生的全像圖，曝光設備，及半導體裝置製造方法
US12/180,605 US8072661B2 (en) 2007-07-31 2008-07-28 Computer generated hologram, exposure apparatus, and device fabrication method
KR1020080074839A KR101004872B1 (ko) 2007-07-31 2008-07-31 계산기홀로그램, 노광장치, 및 디바이스의 제조방법
CN2008101294670A CN101359215B (zh) 2007-07-31 2008-07-31 计算机生成的全息图元件、曝光设备以及器件制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007199904A JP5173309B2 (ja) 2007-07-31 2007-07-31 ホログラム、露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009036916A JP2009036916A (ja) 2009-02-19
JP2009036916A5 JP2009036916A5 (enExample) 2010-09-16
JP5173309B2 true JP5173309B2 (ja) 2013-04-03

Family

ID=40003090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007199904A Expired - Fee Related JP5173309B2 (ja) 2007-07-31 2007-07-31 ホログラム、露光装置及びデバイス製造方法

Country Status (6)

Country Link
US (1) US8072661B2 (enExample)
EP (1) EP2023216A3 (enExample)
JP (1) JP5173309B2 (enExample)
KR (1) KR101004872B1 (enExample)
CN (1) CN101359215B (enExample)
TW (1) TWI442198B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4212927A4 (en) * 2020-09-07 2024-10-16 Fujikura Ltd. OPTICAL DIFFRACTION ELEMENT AND OPTICAL COMPUTER SYSTEM

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5032972B2 (ja) * 2007-12-28 2012-09-26 キヤノン株式会社 計算機ホログラム、生成方法及び露光装置
JP5078764B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5167032B2 (ja) * 2008-08-27 2013-03-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP2010109242A (ja) * 2008-10-31 2010-05-13 Canon Inc 照明光学系及び露光装置
US8531747B2 (en) * 2009-06-24 2013-09-10 Canon Kabushiki Kaisha Hologram, hologram data generation method, and exposure apparatus
JP2011040618A (ja) * 2009-08-12 2011-02-24 Nikon Corp 回折光学素子、照明光学系、露光装置、デバイスの製造方法、及び回折光学素子の設計方法
US9116303B2 (en) * 2010-03-05 2015-08-25 Canon Kabushiki Kaisha Hologram with cells to control phase in two polarization directions and exposure apparatus
CN104252017A (zh) * 2013-06-28 2014-12-31 苏州印象镭射科技有限公司 一种激光全息数码透镜模具及其制作方法
EP3274770A4 (en) * 2015-03-26 2018-10-31 Otoy, Inc. Relightable holograms
WO2020153504A1 (ja) * 2019-01-25 2020-07-30 大日本印刷株式会社 回折光学素子、照明装置、投射装置、投射型表示装置および要素回折光学素子の製造方法
US12372800B2 (en) 2020-03-11 2025-07-29 Nil Technology Aps Diffractive optical elements
US20240418914A1 (en) * 2021-02-05 2024-12-19 Fujikura Ltd. Light diffraction element unit, optical computing device, assembling method, and manufacturing method

Family Cites Families (8)

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Publication number Priority date Publication date Assignee Title
JP4043058B2 (ja) * 1995-06-01 2008-02-06 旭硝子株式会社 光ヘッド装置に用いられる回折素子の製造方法
JP4545297B2 (ja) * 2000-09-01 2010-09-15 大日本印刷株式会社 光学素子およびその製造方法
DE10124803A1 (de) * 2001-05-22 2002-11-28 Zeiss Carl Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator
JP2004198348A (ja) 2002-12-20 2004-07-15 Nikon Corp 干渉計及び投影露光装置の製造方法
JP2006005319A (ja) 2004-06-21 2006-01-05 Canon Inc 照明光学系及び方法、露光装置及びデバイス製造方法
KR100684872B1 (ko) * 2004-08-03 2007-02-20 삼성전자주식회사 빛의 편광을 공간적으로 제어하는 광학 시스템 및 이를제작하는 방법
JP2006196715A (ja) * 2005-01-13 2006-07-27 Nikon Corp 光束変換素子、照明光学装置、露光装置、および露光方法
US20060289577A1 (en) 2005-06-23 2006-12-28 Malone Larry D Universal attachment system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4212927A4 (en) * 2020-09-07 2024-10-16 Fujikura Ltd. OPTICAL DIFFRACTION ELEMENT AND OPTICAL COMPUTER SYSTEM
US12242079B2 (en) 2020-09-07 2025-03-04 Fujikura Ltd. Light diffraction element and optical computing system

Also Published As

Publication number Publication date
KR101004872B1 (ko) 2010-12-28
CN101359215A (zh) 2009-02-04
TW200912575A (en) 2009-03-16
TWI442198B (zh) 2014-06-21
JP2009036916A (ja) 2009-02-19
EP2023216A2 (en) 2009-02-11
US20090034036A1 (en) 2009-02-05
EP2023216A3 (en) 2009-02-25
CN101359215B (zh) 2010-12-08
US8072661B2 (en) 2011-12-06
KR20090013133A (ko) 2009-02-04

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