TWI442198B - 電腦產生的全像圖，曝光設備，及半導體裝置製造方法 - Google Patents
電腦產生的全像圖，曝光設備，及半導體裝置製造方法 Download PDFInfo
- Publication number
- TWI442198B TWI442198B TW097125579A TW97125579A TWI442198B TW I442198 B TWI442198 B TW I442198B TW 097125579 A TW097125579 A TW 097125579A TW 97125579 A TW97125579 A TW 97125579A TW I442198 B TWI442198 B TW I442198B
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- Prior art keywords
- light
- polarized light
- hologram
- computer
- anisotropic layer
- Prior art date
Links
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0272—Substrate bearing the hologram
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
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- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0891—Processes or apparatus adapted to convert digital holographic data into a hologram
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0244—Surface relief holograms
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2249—Holobject properties
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0493—Special holograms not otherwise provided for, e.g. conoscopic, referenceless holography
- G03H2001/0495—Polarisation preserving holography where amplitude, phase and polarisation state of the original objet wavefront are recorded
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- G—PHYSICS
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2222/00—Light sources or light beam properties
- G03H2222/31—Polarised light
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2223/00—Optical components
- G03H2223/20—Birefringent optical element, e.g. wave plate
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/20—Details of physical variations exhibited in the hologram
- G03H2240/23—Optical length variations, e.g. bleached silver halide
- G03H2240/24—Index variations only
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- G—PHYSICS
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/20—Details of physical variations exhibited in the hologram
- G03H2240/40—Dynamic of the variations
- G03H2240/41—Binary
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/20—Details of physical variations exhibited in the hologram
- G03H2240/40—Dynamic of the variations
- G03H2240/42—Discrete level
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/20—Details of physical variations exhibited in the hologram
- G03H2240/40—Dynamic of the variations
- G03H2240/43—Continuous
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/50—Reactivity or recording processes
- G03H2260/63—Indirect etching, e.g. lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2270/00—Substrate bearing the hologram
- G03H2270/52—Integrated surface relief hologram without forming layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007199904A JP5173309B2 (ja) | 2007-07-31 | 2007-07-31 | ホログラム、露光装置及びデバイス製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200912575A TW200912575A (en) | 2009-03-16 |
| TWI442198B true TWI442198B (zh) | 2014-06-21 |
Family
ID=40003090
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097125579A TWI442198B (zh) | 2007-07-31 | 2008-07-07 | 電腦產生的全像圖，曝光設備，及半導體裝置製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8072661B2 (enExample) |
| EP (1) | EP2023216A3 (enExample) |
| JP (1) | JP5173309B2 (enExample) |
| KR (1) | KR101004872B1 (enExample) |
| CN (1) | CN101359215B (enExample) |
| TW (1) | TWI442198B (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5032972B2 (ja) | 2007-12-28 | 2012-09-26 | キヤノン株式会社 | 計算機ホログラム、生成方法及び露光装置 |
| JP5078764B2 (ja) * | 2008-06-10 | 2012-11-21 | キヤノン株式会社 | 計算機ホログラム、露光装置及びデバイスの製造方法 |
| JP5078765B2 (ja) * | 2008-06-10 | 2012-11-21 | キヤノン株式会社 | 計算機ホログラム、露光装置及びデバイスの製造方法 |
| JP5167032B2 (ja) * | 2008-08-27 | 2013-03-21 | キヤノン株式会社 | 計算機ホログラム、露光装置及びデバイスの製造方法 |
| JP2010109242A (ja) * | 2008-10-31 | 2010-05-13 | Canon Inc | 照明光学系及び露光装置 |
| US8531747B2 (en) | 2009-06-24 | 2013-09-10 | Canon Kabushiki Kaisha | Hologram, hologram data generation method, and exposure apparatus |
| JP2011040618A (ja) * | 2009-08-12 | 2011-02-24 | Nikon Corp | 回折光学素子、照明光学系、露光装置、デバイスの製造方法、及び回折光学素子の設計方法 |
| US9116303B2 (en) * | 2010-03-05 | 2015-08-25 | Canon Kabushiki Kaisha | Hologram with cells to control phase in two polarization directions and exposure apparatus |
| CN104252017A (zh) * | 2013-06-28 | 2014-12-31 | 苏州印象镭射科技有限公司 | 一种激光全息数码透镜模具及其制作方法 |
| KR102646706B1 (ko) * | 2015-03-26 | 2024-03-11 | 오토이, 인크. | 재조명가능 홀로그램 |
| JP6924427B2 (ja) * | 2019-01-25 | 2021-08-25 | 大日本印刷株式会社 | 回折光学素子、照明装置、投射装置および投射型表示装置 |
| CN115244433A (zh) | 2020-03-11 | 2022-10-25 | 尼尔技术有限公司 | 衍射光学元件 |
| EP4212927A4 (en) * | 2020-09-07 | 2024-10-16 | Fujikura Ltd. | OPTICAL DIFFRACTION ELEMENT AND OPTICAL COMPUTER SYSTEM |
| WO2022168385A1 (ja) * | 2021-02-05 | 2022-08-11 | 株式会社フジクラ | 光回折素子ユニット、光演算装置、組立方法、及び、製造方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4043058B2 (ja) * | 1995-06-01 | 2008-02-06 | 旭硝子株式会社 | 光ヘッド装置に用いられる回折素子の製造方法 |
| JP4545297B2 (ja) * | 2000-09-01 | 2010-09-15 | 大日本印刷株式会社 | 光学素子およびその製造方法 |
| DE10124803A1 (de) * | 2001-05-22 | 2002-11-28 | Zeiss Carl | Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator |
| JP2004198348A (ja) | 2002-12-20 | 2004-07-15 | Nikon Corp | 干渉計及び投影露光装置の製造方法 |
| JP2006005319A (ja) | 2004-06-21 | 2006-01-05 | Canon Inc | 照明光学系及び方法、露光装置及びデバイス製造方法 |
| KR100684872B1 (ko) * | 2004-08-03 | 2007-02-20 | 삼성전자주식회사 | 빛의 편광을 공간적으로 제어하는 광학 시스템 및 이를제작하는 방법 |
| JP2006196715A (ja) | 2005-01-13 | 2006-07-27 | Nikon Corp | 光束変換素子、照明光学装置、露光装置、および露光方法 |
| US20060289577A1 (en) | 2005-06-23 | 2006-12-28 | Malone Larry D | Universal attachment system |
-
2007
- 2007-07-31 JP JP2007199904A patent/JP5173309B2/ja not_active Expired - Fee Related
-
2008
- 2008-07-07 TW TW097125579A patent/TWI442198B/zh not_active IP Right Cessation
- 2008-07-07 EP EP08159814A patent/EP2023216A3/en not_active Withdrawn
- 2008-07-28 US US12/180,605 patent/US8072661B2/en not_active Expired - Fee Related
- 2008-07-31 KR KR1020080074839A patent/KR101004872B1/ko not_active Expired - Fee Related
- 2008-07-31 CN CN2008101294670A patent/CN101359215B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP5173309B2 (ja) | 2013-04-03 |
| JP2009036916A (ja) | 2009-02-19 |
| KR101004872B1 (ko) | 2010-12-28 |
| US8072661B2 (en) | 2011-12-06 |
| TW200912575A (en) | 2009-03-16 |
| EP2023216A2 (en) | 2009-02-11 |
| CN101359215A (zh) | 2009-02-04 |
| EP2023216A3 (en) | 2009-02-25 |
| KR20090013133A (ko) | 2009-02-04 |
| CN101359215B (zh) | 2010-12-08 |
| US20090034036A1 (en) | 2009-02-05 |
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| Date | Code | Title | Description |
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| MM4A | Annulment or lapse of patent due to non-payment of fees |