JP2009036916A - 計算機ホログラム、露光装置及びデバイス製造方法 - Google Patents
計算機ホログラム、露光装置及びデバイス製造方法 Download PDFInfo
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- General Physics & Mathematics (AREA)
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Abstract
【解決手段】入射光の波面に位相分布を与えて所定面に光強度分布を形成する計算機ホログラムであって、第1の方向の直線偏光に対する屈折率と前記第1の方向の直線偏光に直交する第2の方向の直線偏光に対する屈折率とが異なる異方性層と、前記第1の方向の直線偏光に対する屈折率と前記第2の方向の直線偏光に対する屈折率とが等しい等方性層とを有し、前記入射光の前記第1の方向の直線偏光成分の波面及び前記入射光の前記第2の方向の直線偏光成分の波面に互いに異なる位相分布を与えることによって、前記入射光の前記第1の方向の直線偏光成分が前記所定面に形成する第1の光強度分布と前記入射光の前記第2の方向の直線偏光成分が前記所定面に形成する第2の光強度分布とを異ならせていることを特徴とする計算機ホログラムを提供する。
【選択図】図1
Description
の計算機ホログラム100を構成する場合、位相をπずらす必要があり、これを実現するためには、空気と等方性層112との境界の段差h1’は、以下の数式5を満足すればよい。
10 照明装置
16 光源
18 照明光学系
181 引き回し光学系
182 ビーム整形光学系
183 偏光制御部
184 位相制御部
185 射出角度保存光学素子
186 リレー光学系
187 多光束発生部
188 リレー光学系
189 アパーチャ
190 ズーム光学系
191 多光束発生部
192 開口絞り
193 照射部
194 λ/4位相板
20 レチクル
30 投影光学系
40 ウエハ
100 計算機ホログラム
110 セル
112 等方性層
112a 凹凸面
112b 平面
114 異方性層
114a 凹凸面
114b 平面
Claims (14)
- 入射光の波面に位相分布を与えて所定面に光強度分布を形成する計算機ホログラムであって、
第1の方向の直線偏光に対する屈折率と前記第1の方向の直線偏光に直交する第2の方向の直線偏光に対する屈折率とが異なる異方性層と、前記第1の方向の直線偏光に対する屈折率と前記第2の方向の直線偏光に対する屈折率とが等しい等方性層とを有し、
前記入射光の前記第1の方向の直線偏光成分の波面及び前記入射光の前記第2の方向の直線偏光成分の波面に互いに異なる位相分布を与えることによって、前記入射光の前記第1の方向の直線偏光成分が前記所定面に形成する第1の光強度分布と前記入射光の前記第2の方向の直線偏光成分が前記所定面に形成する第2の光強度分布とを異ならせていることを特徴とする計算機ホログラム。 - 複数のセル毎に前記異方性層の厚さが設定されることで、前記入射光の前記第1の方向の直線偏光成分の波面及び前記入射光の前記第2の方向の直線偏光成分の波面に互いに異なる位相分布を与えることを特徴とする請求項1記載の計算機ホログラム。
- 複数のセル毎に前記異方性層の屈折率が設定されることで、前記入射光の前記第1の方向の直線偏光成分の波面及び前記入射光の前記第2の方向の直線偏光成分の波面に互いに異なる位相分布を与えることを特徴とする請求項1記載の計算機ホログラム。
- 前記複数のセル毎に前記異方性層及び前記等方性層の厚さが設定されることを特徴とする請求項2記載の計算機ホログラム。
- 前記異方性層と前記等方性層とは、平面で接合されていることを特徴とする請求項4記載の計算機ホログラム。
- 前記異方性層の厚さの種類は、前記等方性層の厚さの種類よりも少ないことを特徴とする請求項4又は5記載の計算機ホログラム。
- 前記異方性層の前記第1の方向又は前記第2の方向の直線偏光に対する屈折率と、前記等方性層の屈折率とは等しいことを特徴とする請求項4又は5記載の計算機ホログラム。
- 前記異方性層は、複屈折材料で構成されていることを特徴とする請求項1乃至7のうちいずれか1項に記載の計算機ホログラム。
- 前記複屈折材料は、真性複屈折を有することを特徴とする請求項8記載の計算機ホログラム。
- 前記異方性層は、構造複屈折を生じる凹凸構造を有することを特徴とする請求項1乃至7のうちいずれか1項に記載の計算機ホログラム。
- 光源からの光でレチクルを照明する照明光学系と、
前記レチクルのパターンを基板に投影する投影光学系とを有し、
前記照明光学系は、請求項1乃至10のうちいずれか1項に記載の計算機ホログラムを含むことを特徴とする露光装置。 - 前記照明光学系は、前記計算機ホログラムに入射する光を無偏光の光に変換する光学素子を含むことを特徴とする請求項11記載の露光装置。
- 前記照明光学系は、前記計算機ホログラムに入射する光の偏光状態を調整する偏光状態調整部を含み、
当該偏光状態調整部で前記計算機ホログラムに入射する光の前記第1の方向の直線偏光成分と前記第2の方向の直線偏光成分との強度比を調整することにより、前記第1の光強度分布の光強度と前記第2の光強度分布の光強度との比を調整することを特徴とする請求項11記載の露光装置。 - 請求項11乃至13のうちいずれか1項に記載の露光装置を用いて基板を露光するステップと、
露光された前記基板を現像するステップとを有することを特徴とするデバイス製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
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JP2007199904A JP5173309B2 (ja) | 2007-07-31 | 2007-07-31 | ホログラム、露光装置及びデバイス製造方法 |
EP08159814A EP2023216A3 (en) | 2007-07-31 | 2008-07-07 | Computer generated hologram, exposure apparatus, and hologram fabrication method |
TW097125579A TWI442198B (zh) | 2007-07-31 | 2008-07-07 | 電腦產生的全像圖,曝光設備,及半導體裝置製造方法 |
US12/180,605 US8072661B2 (en) | 2007-07-31 | 2008-07-28 | Computer generated hologram, exposure apparatus, and device fabrication method |
CN2008101294670A CN101359215B (zh) | 2007-07-31 | 2008-07-31 | 计算机生成的全息图元件、曝光设备以及器件制造方法 |
KR1020080074839A KR101004872B1 (ko) | 2007-07-31 | 2008-07-31 | 계산기홀로그램, 노광장치, 및 디바이스의 제조방법 |
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JP2007199904A JP5173309B2 (ja) | 2007-07-31 | 2007-07-31 | ホログラム、露光装置及びデバイス製造方法 |
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JP2009036916A true JP2009036916A (ja) | 2009-02-19 |
JP2009036916A5 JP2009036916A5 (ja) | 2010-09-16 |
JP5173309B2 JP5173309B2 (ja) | 2013-04-03 |
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WO2009084409A1 (en) * | 2007-12-28 | 2009-07-09 | Canon Kabushiki Kaisha | Computer generated hologram, generation method, and exposure apparatus |
JP2009302156A (ja) * | 2008-06-10 | 2009-12-24 | Canon Inc | 計算機ホログラム、露光装置及びデバイスの製造方法 |
JP2009302155A (ja) * | 2008-06-10 | 2009-12-24 | Canon Inc | 計算機ホログラム、露光装置及びデバイスの製造方法 |
WO2010024075A1 (en) * | 2008-08-27 | 2010-03-04 | Canon Kabushiki Kaisha | Computer generated hologram, exposure apparatus and device fabrication method |
JP2011040618A (ja) * | 2009-08-12 | 2011-02-24 | Nikon Corp | 回折光学素子、照明光学系、露光装置、デバイスの製造方法、及び回折光学素子の設計方法 |
JP2011191757A (ja) * | 2010-03-05 | 2011-09-29 | Canon Inc | ホログラム及び露光装置 |
JP2012532338A (ja) * | 2009-06-24 | 2012-12-13 | キヤノン株式会社 | ホログラム、ホログラムデータ生成方法及び露光装置 |
WO2020153504A1 (ja) * | 2019-01-25 | 2020-07-30 | 大日本印刷株式会社 | 回折光学素子、照明装置、投射装置、投射型表示装置および要素回折光学素子の製造方法 |
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JP2010109242A (ja) * | 2008-10-31 | 2010-05-13 | Canon Inc | 照明光学系及び露光装置 |
CN104252017A (zh) * | 2013-06-28 | 2014-12-31 | 苏州印象镭射科技有限公司 | 一种激光全息数码透镜模具及其制作方法 |
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- 2008-07-31 CN CN2008101294670A patent/CN101359215B/zh not_active Expired - Fee Related
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JP2009164297A (ja) * | 2007-12-28 | 2009-07-23 | Canon Inc | 計算機ホログラム、生成方法及び露光装置 |
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JP2009302156A (ja) * | 2008-06-10 | 2009-12-24 | Canon Inc | 計算機ホログラム、露光装置及びデバイスの製造方法 |
WO2010024075A1 (en) * | 2008-08-27 | 2010-03-04 | Canon Kabushiki Kaisha | Computer generated hologram, exposure apparatus and device fabrication method |
JP2010056248A (ja) * | 2008-08-27 | 2010-03-11 | Canon Inc | 計算機ホログラム、露光装置及びデバイスの製造方法 |
US8451428B2 (en) | 2008-08-27 | 2013-05-28 | Canon Kabushiki Kaisha | Computer generated hologram, exposure apparatus and device fabrication method |
JP2012532338A (ja) * | 2009-06-24 | 2012-12-13 | キヤノン株式会社 | ホログラム、ホログラムデータ生成方法及び露光装置 |
US8531747B2 (en) | 2009-06-24 | 2013-09-10 | Canon Kabushiki Kaisha | Hologram, hologram data generation method, and exposure apparatus |
JP2011040618A (ja) * | 2009-08-12 | 2011-02-24 | Nikon Corp | 回折光学素子、照明光学系、露光装置、デバイスの製造方法、及び回折光学素子の設計方法 |
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Also Published As
Publication number | Publication date |
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EP2023216A3 (en) | 2009-02-25 |
US8072661B2 (en) | 2011-12-06 |
EP2023216A2 (en) | 2009-02-11 |
KR20090013133A (ko) | 2009-02-04 |
TWI442198B (zh) | 2014-06-21 |
TW200912575A (en) | 2009-03-16 |
JP5173309B2 (ja) | 2013-04-03 |
US20090034036A1 (en) | 2009-02-05 |
CN101359215A (zh) | 2009-02-04 |
CN101359215B (zh) | 2010-12-08 |
KR101004872B1 (ko) | 2010-12-28 |
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