JP5173309B2 - ホログラム、露光装置及びデバイス製造方法 - Google Patents
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Classifications
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
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Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
の計算機ホログラム100を構成する場合、位相をπずらす必要があり、これを実現するためには、空気と等方性層112との境界の段差h1’は、以下の数式5を満足すればよい。
10 照明装置
16 光源
18 照明光学系
181 引き回し光学系
182 ビーム整形光学系
183 偏光制御部
184 位相制御部
185 射出角度保存光学素子
186 リレー光学系
187 多光束発生部
188 リレー光学系
189 アパーチャ
190 ズーム光学系
191 多光束発生部
192 開口絞り
193 照射部
194 λ/4位相板
20 レチクル
30 投影光学系
40 ウエハ
100 計算機ホログラム
110 セル
112 等方性層
112a 凹凸面
112b 平面
114 異方性層
114a 凹凸面
114b 平面
Claims (9)
- 入射光の波面に位相分布を与えて所定面に光強度分布を形成するホログラムであって、 第1の偏光方向の直線偏光に対する屈折率と前記第1の偏光方向の直線偏光に直交する第2の偏光方向の直線偏光に対する屈折率とが異なる異方性層と、前記第1の偏光方向の直線偏光に対する屈折率と前記第2の偏光方向の直線偏光に対する屈折率とが等しい等方性層とを有し、
複数のセル毎に前記異方性層の厚さ及び屈折率の少なくとも一方が設定されることにより、前記入射光の前記第1の偏光方向の直線偏光成分の波面及び前記入射光の前記第2の偏光方向の直線偏光成分の波面に互いに異なる位相分布を与え、前記入射光の前記第1の偏光方向の直線偏光成分が前記所定面に形成する第1の光強度分布と前記入射光の前記第2の偏光方向の直線偏光成分が前記所定面に形成する第2の光強度分布とを異ならせており、
前記複数のセルにおいて、前記異方性層の厚さの種類は前記等方性層の厚さの種類よりも少ないことを特徴とするホログラム。 - 前記異方性層と前記等方性層との接合面は1つの平面であることを特徴とする請求項1記載のホログラム。
- 前記異方性層の前記第1の偏光方向又は前記第2の偏光方向の直線偏光に対する屈折率と、前記等方性層の屈折率とは等しいことを特徴とする請求項1又は2記載のホログラム。
- 前記複数のセルは、第1のセル、第2のセル、第3のセル及び第4のセルを含み、
前記第1のセル及び前記第4のセルは、前記第1の偏光方向の直線偏光と前記第2の偏光方向の直線偏光との間で位相を互いにずらさず、
前記第2のセル及び前記第3のセルは、前記第1の偏光方向の直線偏光と前記第2の偏光方向の直線偏光との間で位相を互いにπずらし、
前記第1のセル及び前記第4のセルの前記異方性層の厚さは等しく、
前記第1のセル及び前記第4のセルの前記等方性層の厚さは互いに異なり、
前記第2のセル及び前記第3のセルの前記異方性層の厚さは互いに異なり、
前記第2のセル及び前記第3のセルの前記等方性層の厚さは互いに異なることを特徴とする請求項1乃至3のうちいずれか1項に記載のホログラム。 - 前記複数のセルは、第1のセル、第2のセル、第3のセル及び第4のセルを含み、
前記第1のセル及び前記第4のセルは、前記第1の偏光方向の直線偏光と前記第2の偏光方向の直線偏光との間で位相を互いにずらさず、
前記第2のセル及び前記第3のセルは、前記第1の偏光方向の直線偏光と前記第2の偏光方向の直線偏光との間で位相を互いにπずらし、
前記第1のセル及び前記第4のセルの前記異方性層の厚さは等しく、
前記第1のセル及び前記第4のセルの前記等方性層の厚さは互いに異なり、
前記第2のセル及び前記第3のセルの前記異方性層の厚さは等しく、
前記第2のセル及び前記第3のセルの前記等方性層の厚さは互いに異なることを特徴とする請求項1乃至3のうちいずれか1項に記載のホログラム。 - 光源からの光でレチクルを照明する照明光学系と、
前記レチクルのパターンを基板に投影する投影光学系とを有し、
前記照明光学系は、請求項1乃至5のうちいずれか1項に記載のホログラムを含むことを特徴とする露光装置。 - 前記照明光学系は、前記ホログラムに入射する光を無偏光の光に変換する光学素子を含むことを特徴とする請求項6記載の露光装置。
- 前記照明光学系は、前記ホログラムに入射する光の偏光状態を調整する偏光状態調整部を含み、
当該偏光状態調整部で前記ホログラムに入射する光の前記第1の偏光方向の直線偏光成分と前記第2の偏光方向の直線偏光成分との強度比を調整することにより、前記第1の光強度分布の光強度と前記第2の光強度分布の光強度との比を調整することを特徴とする請求項6記載の露光装置。 - 請求項6乃至8のうちいずれか1項に記載の露光装置を用いて基板を露光するステップと、
露光された前記基板を現像するステップとを有することを特徴とするデバイス製造方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
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JP2007199904A JP5173309B2 (ja) | 2007-07-31 | 2007-07-31 | ホログラム、露光装置及びデバイス製造方法 |
TW097125579A TWI442198B (zh) | 2007-07-31 | 2008-07-07 | 電腦產生的全像圖,曝光設備,及半導體裝置製造方法 |
EP08159814A EP2023216A3 (en) | 2007-07-31 | 2008-07-07 | Computer generated hologram, exposure apparatus, and hologram fabrication method |
US12/180,605 US8072661B2 (en) | 2007-07-31 | 2008-07-28 | Computer generated hologram, exposure apparatus, and device fabrication method |
KR1020080074839A KR101004872B1 (ko) | 2007-07-31 | 2008-07-31 | 계산기홀로그램, 노광장치, 및 디바이스의 제조방법 |
CN2008101294670A CN101359215B (zh) | 2007-07-31 | 2008-07-31 | 计算机生成的全息图元件、曝光设备以及器件制造方法 |
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JP2007199904A JP5173309B2 (ja) | 2007-07-31 | 2007-07-31 | ホログラム、露光装置及びデバイス製造方法 |
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JP2009036916A5 JP2009036916A5 (ja) | 2010-09-16 |
JP5173309B2 true JP5173309B2 (ja) | 2013-04-03 |
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EP (1) | EP2023216A3 (ja) |
JP (1) | JP5173309B2 (ja) |
KR (1) | KR101004872B1 (ja) |
CN (1) | CN101359215B (ja) |
TW (1) | TWI442198B (ja) |
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JP5032972B2 (ja) | 2007-12-28 | 2012-09-26 | キヤノン株式会社 | 計算機ホログラム、生成方法及び露光装置 |
JP5078764B2 (ja) * | 2008-06-10 | 2012-11-21 | キヤノン株式会社 | 計算機ホログラム、露光装置及びデバイスの製造方法 |
JP5078765B2 (ja) * | 2008-06-10 | 2012-11-21 | キヤノン株式会社 | 計算機ホログラム、露光装置及びデバイスの製造方法 |
JP5167032B2 (ja) * | 2008-08-27 | 2013-03-21 | キヤノン株式会社 | 計算機ホログラム、露光装置及びデバイスの製造方法 |
JP2010109242A (ja) * | 2008-10-31 | 2010-05-13 | Canon Inc | 照明光学系及び露光装置 |
US8531747B2 (en) * | 2009-06-24 | 2013-09-10 | Canon Kabushiki Kaisha | Hologram, hologram data generation method, and exposure apparatus |
JP2011040618A (ja) * | 2009-08-12 | 2011-02-24 | Nikon Corp | 回折光学素子、照明光学系、露光装置、デバイスの製造方法、及び回折光学素子の設計方法 |
US9116303B2 (en) * | 2010-03-05 | 2015-08-25 | Canon Kabushiki Kaisha | Hologram with cells to control phase in two polarization directions and exposure apparatus |
CN104252017A (zh) * | 2013-06-28 | 2014-12-31 | 苏州印象镭射科技有限公司 | 一种激光全息数码透镜模具及其制作方法 |
EP3274770A4 (en) * | 2015-03-26 | 2018-10-31 | Otoy, Inc. | Relightable holograms |
JP6924427B2 (ja) * | 2019-01-25 | 2021-08-25 | 大日本印刷株式会社 | 回折光学素子、照明装置、投射装置および投射型表示装置 |
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JP4545297B2 (ja) * | 2000-09-01 | 2010-09-15 | 大日本印刷株式会社 | 光学素子およびその製造方法 |
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JP2004198348A (ja) | 2002-12-20 | 2004-07-15 | Nikon Corp | 干渉計及び投影露光装置の製造方法 |
JP2006005319A (ja) * | 2004-06-21 | 2006-01-05 | Canon Inc | 照明光学系及び方法、露光装置及びデバイス製造方法 |
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US20060289577A1 (en) | 2005-06-23 | 2006-12-28 | Malone Larry D | Universal attachment system |
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EP2023216A2 (en) | 2009-02-11 |
US20090034036A1 (en) | 2009-02-05 |
CN101359215A (zh) | 2009-02-04 |
KR20090013133A (ko) | 2009-02-04 |
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JP2009036916A (ja) | 2009-02-19 |
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