KR101004872B1 - 계산기홀로그램, 노광장치, 및 디바이스의 제조방법 - Google Patents

계산기홀로그램, 노광장치, 및 디바이스의 제조방법 Download PDF

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Publication number
KR101004872B1
KR101004872B1 KR1020080074839A KR20080074839A KR101004872B1 KR 101004872 B1 KR101004872 B1 KR 101004872B1 KR 1020080074839 A KR1020080074839 A KR 1020080074839A KR 20080074839 A KR20080074839 A KR 20080074839A KR 101004872 B1 KR101004872 B1 KR 101004872B1
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South Korea
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cell
light
polarization
thickness
anisotropic layer
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KR1020080074839A
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English (en)
Korean (ko)
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KR20090013133A (ko
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이사오 마츠바라
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0244—Surface relief holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0272—Substrate bearing the hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0891—Processes or apparatus adapted to convert digital holographic data into a hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2249—Holobject properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0493—Special holograms not otherwise provided for, e.g. conoscopic, referenceless holography
    • G03H2001/0495—Polarisation preserving holography where amplitude, phase and polarisation state of the original objet wavefront are recorded
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2249—Holobject properties
    • G03H2001/2276—Polarisation dependent holobject
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2210/00—Object characteristics
    • G03H2210/20—2D object
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/31—Polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/20—Birefringent optical element, e.g. wave plate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/23—Optical length variations, e.g. bleached silver halide
    • G03H2240/24—Index variations only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/40—Dynamic of the variations
    • G03H2240/41—Binary
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/40—Dynamic of the variations
    • G03H2240/42—Discrete level
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/40—Dynamic of the variations
    • G03H2240/43—Continuous
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/50—Reactivity or recording processes
    • G03H2260/63—Indirect etching, e.g. lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00—Substrate bearing the hologram
    • G03H2270/52—Integrated surface relief hologram without forming layer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020080074839A 2007-07-31 2008-07-31 계산기홀로그램, 노광장치, 및 디바이스의 제조방법 Expired - Fee Related KR101004872B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007199904A JP5173309B2 (ja) 2007-07-31 2007-07-31 ホログラム、露光装置及びデバイス製造方法
JPJP-P-2007-00199904 2007-07-31

Publications (2)

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KR20090013133A KR20090013133A (ko) 2009-02-04
KR101004872B1 true KR101004872B1 (ko) 2010-12-28

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KR1020080074839A Expired - Fee Related KR101004872B1 (ko) 2007-07-31 2008-07-31 계산기홀로그램, 노광장치, 및 디바이스의 제조방법

Country Status (6)

Country Link
US (1) US8072661B2 (enExample)
EP (1) EP2023216A3 (enExample)
JP (1) JP5173309B2 (enExample)
KR (1) KR101004872B1 (enExample)
CN (1) CN101359215B (enExample)
TW (1) TWI442198B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5032972B2 (ja) 2007-12-28 2012-09-26 キヤノン株式会社 計算機ホログラム、生成方法及び露光装置
JP5078764B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5167032B2 (ja) * 2008-08-27 2013-03-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP2010109242A (ja) * 2008-10-31 2010-05-13 Canon Inc 照明光学系及び露光装置
US8531747B2 (en) 2009-06-24 2013-09-10 Canon Kabushiki Kaisha Hologram, hologram data generation method, and exposure apparatus
JP2011040618A (ja) * 2009-08-12 2011-02-24 Nikon Corp 回折光学素子、照明光学系、露光装置、デバイスの製造方法、及び回折光学素子の設計方法
US9116303B2 (en) * 2010-03-05 2015-08-25 Canon Kabushiki Kaisha Hologram with cells to control phase in two polarization directions and exposure apparatus
CN104252017A (zh) * 2013-06-28 2014-12-31 苏州印象镭射科技有限公司 一种激光全息数码透镜模具及其制作方法
KR102646706B1 (ko) * 2015-03-26 2024-03-11 오토이, 인크. 재조명가능 홀로그램
JP6924427B2 (ja) * 2019-01-25 2021-08-25 大日本印刷株式会社 回折光学素子、照明装置、投射装置および投射型表示装置
CN115244433A (zh) 2020-03-11 2022-10-25 尼尔技术有限公司 衍射光学元件
EP4212927A4 (en) * 2020-09-07 2024-10-16 Fujikura Ltd. OPTICAL DIFFRACTION ELEMENT AND OPTICAL COMPUTER SYSTEM
WO2022168385A1 (ja) * 2021-02-05 2022-08-11 株式会社フジクラ 光回折素子ユニット、光演算装置、組立方法、及び、製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4043058B2 (ja) * 1995-06-01 2008-02-06 旭硝子株式会社 光ヘッド装置に用いられる回折素子の製造方法
JP4545297B2 (ja) * 2000-09-01 2010-09-15 大日本印刷株式会社 光学素子およびその製造方法
DE10124803A1 (de) * 2001-05-22 2002-11-28 Zeiss Carl Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator
JP2004198348A (ja) 2002-12-20 2004-07-15 Nikon Corp 干渉計及び投影露光装置の製造方法
JP2006005319A (ja) 2004-06-21 2006-01-05 Canon Inc 照明光学系及び方法、露光装置及びデバイス製造方法
KR100684872B1 (ko) * 2004-08-03 2007-02-20 삼성전자주식회사 빛의 편광을 공간적으로 제어하는 광학 시스템 및 이를제작하는 방법
JP2006196715A (ja) 2005-01-13 2006-07-27 Nikon Corp 光束変換素子、照明光学装置、露光装置、および露光方法
US20060289577A1 (en) 2005-06-23 2006-12-28 Malone Larry D Universal attachment system

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Publication number Publication date
JP5173309B2 (ja) 2013-04-03
JP2009036916A (ja) 2009-02-19
US8072661B2 (en) 2011-12-06
TW200912575A (en) 2009-03-16
TWI442198B (zh) 2014-06-21
EP2023216A2 (en) 2009-02-11
CN101359215A (zh) 2009-02-04
EP2023216A3 (en) 2009-02-25
KR20090013133A (ko) 2009-02-04
CN101359215B (zh) 2010-12-08
US20090034036A1 (en) 2009-02-05

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