JP2009302155A5 - - Google Patents

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Publication number
JP2009302155A5
JP2009302155A5 JP2008152259A JP2008152259A JP2009302155A5 JP 2009302155 A5 JP2009302155 A5 JP 2009302155A5 JP 2008152259 A JP2008152259 A JP 2008152259A JP 2008152259 A JP2008152259 A JP 2008152259A JP 2009302155 A5 JP2009302155 A5 JP 2009302155A5
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JP
Japan
Prior art keywords
cells
anisotropic medium
medium
computer generated
thickness
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Application number
JP2008152259A
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English (en)
Japanese (ja)
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JP5078764B2 (ja
JP2009302155A (ja
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Priority claimed from JP2008152259A external-priority patent/JP5078764B2/ja
Priority to JP2008152259A priority Critical patent/JP5078764B2/ja
Priority to EP09161275A priority patent/EP2133755B1/en
Priority to TW098118377A priority patent/TWI405047B/zh
Priority to US12/481,428 priority patent/US8189248B2/en
Priority to KR1020090051128A priority patent/KR101109369B1/ko
Publication of JP2009302155A publication Critical patent/JP2009302155A/ja
Publication of JP2009302155A5 publication Critical patent/JP2009302155A5/ja
Publication of JP5078764B2 publication Critical patent/JP5078764B2/ja
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Expired - Fee Related legal-status Critical Current
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JP2008152259A 2008-06-10 2008-06-10 計算機ホログラム、露光装置及びデバイスの製造方法 Expired - Fee Related JP5078764B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2008152259A JP5078764B2 (ja) 2008-06-10 2008-06-10 計算機ホログラム、露光装置及びデバイスの製造方法
EP09161275A EP2133755B1 (en) 2008-06-10 2009-05-27 Computer generated hologram, exposure apparatus and device fabrication method
TW098118377A TWI405047B (zh) 2008-06-10 2009-06-03 由電腦所產生之全像片、曝光設備及裝置製造方法
KR1020090051128A KR101109369B1 (ko) 2008-06-10 2009-06-09 계산기 홀로그램, 노광 장치 및 디바이스 제조 방법
US12/481,428 US8189248B2 (en) 2008-06-10 2009-06-09 Computer generated hologram, exposure apparatus and device fabrication method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008152259A JP5078764B2 (ja) 2008-06-10 2008-06-10 計算機ホログラム、露光装置及びデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2009302155A JP2009302155A (ja) 2009-12-24
JP2009302155A5 true JP2009302155A5 (enExample) 2011-07-28
JP5078764B2 JP5078764B2 (ja) 2012-11-21

Family

ID=40957951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008152259A Expired - Fee Related JP5078764B2 (ja) 2008-06-10 2008-06-10 計算機ホログラム、露光装置及びデバイスの製造方法

Country Status (5)

Country Link
US (1) US8189248B2 (enExample)
EP (1) EP2133755B1 (enExample)
JP (1) JP5078764B2 (enExample)
KR (1) KR101109369B1 (enExample)
TW (1) TWI405047B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5339721B2 (ja) * 2007-12-28 2013-11-13 キヤノン株式会社 計算機ホログラム及び露光装置
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP2010261999A (ja) * 2009-04-30 2010-11-18 Ricoh Co Ltd 光学素子、偏光フィルタ、光アイソレータ、光学装置
US8531747B2 (en) * 2009-06-24 2013-09-10 Canon Kabushiki Kaisha Hologram, hologram data generation method, and exposure apparatus
US9116303B2 (en) * 2010-03-05 2015-08-25 Canon Kabushiki Kaisha Hologram with cells to control phase in two polarization directions and exposure apparatus
DE102010029651A1 (de) 2010-06-02 2011-12-08 Carl Zeiss Smt Gmbh Verfahren zum Betrieb einer Projektionsbelichtungsanlage für die Mikrolithographie mit Korrektur von durch rigorose Effekte der Maske induzierten Abbildungsfehlern
US9791786B1 (en) 2016-04-08 2017-10-17 Applied Materials, Inc. Method to reduce line waviness
KR101856201B1 (ko) * 2017-07-25 2018-05-09 서울대학교산학협력단 탄성파의 모드변환용 필터, 이를 이용한 초음파 트랜스듀서, 및 이를 이용한 파동에너지 소산기
CN120703892B (zh) * 2025-08-25 2025-11-04 中国科学院长春光学精密机械与物理研究所 超表面及基于折射-超表面混合设计的偏振像差补偿方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3371846B2 (ja) * 1999-04-06 2003-01-27 日本電気株式会社 ホログラム素子
JP2004018962A (ja) * 2002-06-18 2004-01-22 Nippon Paint Co Ltd 金属コロイドパターンの形成方法
JP2006005319A (ja) * 2004-06-21 2006-01-05 Canon Inc 照明光学系及び方法、露光装置及びデバイス製造方法
KR100684872B1 (ko) * 2004-08-03 2007-02-20 삼성전자주식회사 빛의 편광을 공간적으로 제어하는 광학 시스템 및 이를제작하는 방법
KR100614651B1 (ko) * 2004-10-11 2006-08-22 삼성전자주식회사 회로 패턴의 노광을 위한 장치 및 방법, 사용되는포토마스크 및 그 설계 방법, 그리고 조명계 및 그 구현방법
JP2006196715A (ja) * 2005-01-13 2006-07-27 Nikon Corp 光束変換素子、照明光学装置、露光装置、および露光方法
DE102006012034A1 (de) * 2006-03-14 2007-09-20 Carl Zeiss Smt Ag Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage
JP4866251B2 (ja) * 2007-01-11 2012-02-01 株式会社リコー 光束分岐素子および光束干渉光学系および光束干渉露光装置
JP5173309B2 (ja) * 2007-07-31 2013-04-03 キヤノン株式会社 ホログラム、露光装置及びデバイス製造方法
JP5032972B2 (ja) * 2007-12-28 2012-09-26 キヤノン株式会社 計算機ホログラム、生成方法及び露光装置
JP5339721B2 (ja) * 2007-12-28 2013-11-13 キヤノン株式会社 計算機ホログラム及び露光装置
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5167032B2 (ja) * 2008-08-27 2013-03-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法

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