TWI405047B - 由電腦所產生之全像片、曝光設備及裝置製造方法 - Google Patents

由電腦所產生之全像片、曝光設備及裝置製造方法 Download PDF

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Publication number
TWI405047B
TWI405047B TW098118377A TW98118377A TWI405047B TW I405047 B TWI405047 B TW I405047B TW 098118377 A TW098118377 A TW 098118377A TW 98118377 A TW98118377 A TW 98118377A TW I405047 B TWI405047 B TW I405047B
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TW
Taiwan
Prior art keywords
polarized light
cells
light
phase
computer
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TW098118377A
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English (en)
Chinese (zh)
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TW201009507A (en
Inventor
松原功
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佳能股份有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0891—Processes or apparatus adapted to convert digital holographic data into a hologram
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/0208—Individual components other than the hologram
    • G03H2001/0212—Light sources or light beam properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2249—Holobject properties
    • G03H2001/2276—Polarisation dependent holobject
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/31—Polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/20—Birefringent optical element, e.g. wave plate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/10—Physical parameter modulated by the hologram
    • G03H2240/13—Amplitude and phase complex modulation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/10—Physical parameter modulated by the hologram
    • G03H2240/15—Polarisation modulation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/20—Details of physical variations exhibited in the hologram
    • G03H2240/40—Dynamic of the variations
    • G03H2240/41—Binary
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2240/00—Hologram nature or properties
    • G03H2240/50—Parameters or numerical values associated with holography, e.g. peel strength
    • G03H2240/55—Thickness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/50—Reactivity or recording processes
    • G03H2260/51—Photoanisotropic reactivity wherein polarized light induces material birefringence, e.g. azo-dye doped polymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW098118377A 2008-06-10 2009-06-03 由電腦所產生之全像片、曝光設備及裝置製造方法 TWI405047B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008152259A JP5078764B2 (ja) 2008-06-10 2008-06-10 計算機ホログラム、露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
TW201009507A TW201009507A (en) 2010-03-01
TWI405047B true TWI405047B (zh) 2013-08-11

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Family Applications (1)

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TW098118377A TWI405047B (zh) 2008-06-10 2009-06-03 由電腦所產生之全像片、曝光設備及裝置製造方法

Country Status (5)

Country Link
US (1) US8189248B2 (enExample)
EP (1) EP2133755B1 (enExample)
JP (1) JP5078764B2 (enExample)
KR (1) KR101109369B1 (enExample)
TW (1) TWI405047B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5339721B2 (ja) * 2007-12-28 2013-11-13 キヤノン株式会社 計算機ホログラム及び露光装置
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP2010261999A (ja) * 2009-04-30 2010-11-18 Ricoh Co Ltd 光学素子、偏光フィルタ、光アイソレータ、光学装置
US8531747B2 (en) * 2009-06-24 2013-09-10 Canon Kabushiki Kaisha Hologram, hologram data generation method, and exposure apparatus
US9116303B2 (en) * 2010-03-05 2015-08-25 Canon Kabushiki Kaisha Hologram with cells to control phase in two polarization directions and exposure apparatus
DE102010029651A1 (de) 2010-06-02 2011-12-08 Carl Zeiss Smt Gmbh Verfahren zum Betrieb einer Projektionsbelichtungsanlage für die Mikrolithographie mit Korrektur von durch rigorose Effekte der Maske induzierten Abbildungsfehlern
US9791786B1 (en) 2016-04-08 2017-10-17 Applied Materials, Inc. Method to reduce line waviness
KR101856201B1 (ko) * 2017-07-25 2018-05-09 서울대학교산학협력단 탄성파의 모드변환용 필터, 이를 이용한 초음파 트랜스듀서, 및 이를 이용한 파동에너지 소산기
CN120703892B (zh) * 2025-08-25 2025-11-04 中国科学院长春光学精密机械与物理研究所 超表面及基于折射-超表面混合设计的偏振像差补偿方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200402597A (en) * 2002-06-18 2004-02-16 Nippon Paint Co Ltd The formation method of metal colloid pattern
TW200628971A (en) * 2004-10-11 2006-08-16 Samsung Electronics Co Ltd Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3371846B2 (ja) * 1999-04-06 2003-01-27 日本電気株式会社 ホログラム素子
JP2006005319A (ja) * 2004-06-21 2006-01-05 Canon Inc 照明光学系及び方法、露光装置及びデバイス製造方法
KR100684872B1 (ko) 2004-08-03 2007-02-20 삼성전자주식회사 빛의 편광을 공간적으로 제어하는 광학 시스템 및 이를제작하는 방법
JP2006196715A (ja) * 2005-01-13 2006-07-27 Nikon Corp 光束変換素子、照明光学装置、露光装置、および露光方法
DE102006012034A1 (de) * 2006-03-14 2007-09-20 Carl Zeiss Smt Ag Optisches System, insbesondere in einer Beleuchtungseinrichtung einer Projektionsbelichtungsanlage
JP4866251B2 (ja) * 2007-01-11 2012-02-01 株式会社リコー 光束分岐素子および光束干渉光学系および光束干渉露光装置
JP5173309B2 (ja) * 2007-07-31 2013-04-03 キヤノン株式会社 ホログラム、露光装置及びデバイス製造方法
JP5032972B2 (ja) * 2007-12-28 2012-09-26 キヤノン株式会社 計算機ホログラム、生成方法及び露光装置
JP5339721B2 (ja) * 2007-12-28 2013-11-13 キヤノン株式会社 計算機ホログラム及び露光装置
JP5078765B2 (ja) * 2008-06-10 2012-11-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法
JP5167032B2 (ja) * 2008-08-27 2013-03-21 キヤノン株式会社 計算機ホログラム、露光装置及びデバイスの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200402597A (en) * 2002-06-18 2004-02-16 Nippon Paint Co Ltd The formation method of metal colloid pattern
TW200628971A (en) * 2004-10-11 2006-08-16 Samsung Electronics Co Ltd Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus

Also Published As

Publication number Publication date
KR101109369B1 (ko) 2012-01-30
TW201009507A (en) 2010-03-01
JP2009302155A (ja) 2009-12-24
US8189248B2 (en) 2012-05-29
EP2133755A3 (en) 2010-09-15
JP5078764B2 (ja) 2012-11-21
EP2133755B1 (en) 2013-02-27
KR20090128341A (ko) 2009-12-15
US20100183956A1 (en) 2010-07-22
EP2133755A2 (en) 2009-12-16

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