JP2007258575A5 - - Google Patents

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Publication number
JP2007258575A5
JP2007258575A5 JP2006083485A JP2006083485A JP2007258575A5 JP 2007258575 A5 JP2007258575 A5 JP 2007258575A5 JP 2006083485 A JP2006083485 A JP 2006083485A JP 2006083485 A JP2006083485 A JP 2006083485A JP 2007258575 A5 JP2007258575 A5 JP 2007258575A5
Authority
JP
Japan
Prior art keywords
light beam
changing unit
phase plate
polarization
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006083485A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007258575A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006083485A priority Critical patent/JP2007258575A/ja
Priority claimed from JP2006083485A external-priority patent/JP2007258575A/ja
Priority to US11/690,315 priority patent/US20070222963A1/en
Priority to TW096110411A priority patent/TW200745726A/zh
Priority to KR1020070029097A priority patent/KR100871016B1/ko
Publication of JP2007258575A publication Critical patent/JP2007258575A/ja
Publication of JP2007258575A5 publication Critical patent/JP2007258575A5/ja
Pending legal-status Critical Current

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JP2006083485A 2006-03-24 2006-03-24 照明装置、当該照明装置を有する露光装置及びデバイス製造方法 Pending JP2007258575A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006083485A JP2007258575A (ja) 2006-03-24 2006-03-24 照明装置、当該照明装置を有する露光装置及びデバイス製造方法
US11/690,315 US20070222963A1 (en) 2006-03-24 2007-03-23 Illumination apparatus, exposure apparatus having the same, and device manufacturing method
TW096110411A TW200745726A (en) 2006-03-24 2007-03-26 Illumination apparatus, exposure apparatus having the same, and device manufacturing method
KR1020070029097A KR100871016B1 (ko) 2006-03-24 2007-03-26 조명장치, 당해 조명장치를 구비한 노광장치 및 디바이스제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006083485A JP2007258575A (ja) 2006-03-24 2006-03-24 照明装置、当該照明装置を有する露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2007258575A JP2007258575A (ja) 2007-10-04
JP2007258575A5 true JP2007258575A5 (enExample) 2009-05-07

Family

ID=38533010

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006083485A Pending JP2007258575A (ja) 2006-03-24 2006-03-24 照明装置、当該照明装置を有する露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US20070222963A1 (enExample)
JP (1) JP2007258575A (enExample)
KR (1) KR100871016B1 (enExample)
TW (1) TW200745726A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009152867A1 (en) 2008-06-20 2009-12-23 Carl Zeiss Smt Ag Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method
JP5185727B2 (ja) * 2008-08-22 2013-04-17 ギガフォトン株式会社 偏光純度制御装置及びそれを備えたガスレーザ装置
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
DE102009055184B4 (de) 2009-12-22 2011-11-10 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
JP2012191148A (ja) * 2011-03-14 2012-10-04 Ricoh Co Ltd 面発光レーザモジュール、光走査装置及び画像形成装置
WO2013042679A1 (ja) * 2011-09-19 2013-03-28 株式会社ニコン 照明光学装置、光学系ユニット、照明方法、並びに露光方法及び装置
CN114047137B (zh) * 2021-09-28 2023-09-12 深圳市麓邦技术有限公司 偏振信息转化或复制拼接方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0587728A (ja) * 1991-08-23 1993-04-06 Fuoto Device Kk 偏光解析方法とこれを用いたエリプソメータ
JPH07280649A (ja) * 1994-04-11 1995-10-27 Sumitomo Metal Mining Co Ltd 光導波路型偏波検知装置
DE10124566A1 (de) * 2001-05-15 2002-11-21 Zeiss Carl Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür
JP2003090978A (ja) * 2001-09-17 2003-03-28 Canon Inc 照明装置、露光装置及びデバイス製造方法
JP2004145217A (ja) 2002-10-28 2004-05-20 Sharp Corp 投影型画像表示装置
TW200412617A (en) * 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
TWI628698B (zh) * 2003-10-28 2018-07-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
US7170574B2 (en) * 2003-12-11 2007-01-30 Jds Uniphase Corporation Trim retarders incorporating negative birefringence
JP4776891B2 (ja) * 2004-04-23 2011-09-21 キヤノン株式会社 照明光学系、露光装置、及びデバイス製造方法
JP4537115B2 (ja) 2004-05-07 2010-09-01 キヤノン株式会社 偏光分離プリズム
US7548370B2 (en) * 2004-06-29 2009-06-16 Asml Holding N.V. Layered structure for a tile wave plate assembly

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