JP2007529762A5 - - Google Patents

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Publication number
JP2007529762A5
JP2007529762A5 JP2006544290A JP2006544290A JP2007529762A5 JP 2007529762 A5 JP2007529762 A5 JP 2007529762A5 JP 2006544290 A JP2006544290 A JP 2006544290A JP 2006544290 A JP2006544290 A JP 2006544290A JP 2007529762 A5 JP2007529762 A5 JP 2007529762A5
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Japan
Prior art keywords
objective lens
projection
lens
microlithography
crystal
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JP2006544290A
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Japanese (ja)
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JP2007529762A (ja
JP5102492B2 (ja
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Priority claimed from PCT/EP2004/014100 external-priority patent/WO2005059645A2/en
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Publication of JP2007529762A5 publication Critical patent/JP2007529762A5/ja
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Publication of JP5102492B2 publication Critical patent/JP5102492B2/ja
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JP2006544290A 2003-12-19 2004-12-10 結晶素子を有するマイクロリソグラフィー投影用対物レンズ Expired - Fee Related JP5102492B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US53062303P 2003-12-19 2003-12-19
US60/530,623 2003-12-19
US56800604P 2004-05-04 2004-05-04
US60/568,006 2004-05-04
PCT/EP2004/014100 WO2005059645A2 (en) 2003-12-19 2004-12-10 Microlithography projection objective with crystal elements

Publications (3)

Publication Number Publication Date
JP2007529762A JP2007529762A (ja) 2007-10-25
JP2007529762A5 true JP2007529762A5 (enExample) 2008-02-07
JP5102492B2 JP5102492B2 (ja) 2012-12-19

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JP2006544290A Expired - Fee Related JP5102492B2 (ja) 2003-12-19 2004-12-10 結晶素子を有するマイクロリソグラフィー投影用対物レンズ

Country Status (3)

Country Link
US (1) US7755839B2 (enExample)
JP (1) JP5102492B2 (enExample)
WO (2) WO2005059645A2 (enExample)

Families Citing this family (166)

* Cited by examiner, † Cited by third party
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JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US7460206B2 (en) 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
CN1910494B (zh) 2004-01-14 2011-08-10 卡尔蔡司Smt有限责任公司 反射折射投影物镜
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EP1721201A1 (en) 2004-02-18 2006-11-15 Corning Incorporated Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light
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DE102005045862A1 (de) 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optisches System für Ultraviolettlicht
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JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
WO2007025643A1 (en) 2005-08-30 2007-03-08 Carl Zeiss Smt Ag High-na projection objective with aspheric lens surfaces
JPWO2007086220A1 (ja) 2006-01-30 2009-06-18 株式会社ニコン 反射屈折結像光学系、露光装置、およびデバイスの製造方法
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