JP2008532273A5 - - Google Patents
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- Publication number
- JP2008532273A5 JP2008532273A5 JP2007556602A JP2007556602A JP2008532273A5 JP 2008532273 A5 JP2008532273 A5 JP 2008532273A5 JP 2007556602 A JP2007556602 A JP 2007556602A JP 2007556602 A JP2007556602 A JP 2007556602A JP 2008532273 A5 JP2008532273 A5 JP 2008532273A5
- Authority
- JP
- Japan
- Prior art keywords
- optical system
- lens
- lenses
- subgroup
- respect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims 33
- 239000000463 material Substances 0.000 claims 6
- 238000005286 illumination Methods 0.000 claims 5
- 239000002178 crystalline material Substances 0.000 claims 4
- 239000013078 crystal Substances 0.000 claims 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims 2
- 229910020068 MgAl Inorganic materials 0.000 claims 1
- 239000002223 garnet Substances 0.000 claims 1
- 230000010287 polarization Effects 0.000 claims 1
- 239000011780 sodium chloride Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US65627205P | 2005-02-25 | 2005-02-25 | |
| PCT/EP2006/060196 WO2006089919A1 (en) | 2005-02-25 | 2006-02-22 | Optical system, in particular objective or illumination system for a microlithographic projection exposure apparatus |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009006343A Division JP2009086692A (ja) | 2005-02-25 | 2009-01-15 | マイクロ・リソグラフィー投影露光装置のための光学システム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008532273A JP2008532273A (ja) | 2008-08-14 |
| JP2008532273A5 true JP2008532273A5 (enExample) | 2009-04-09 |
Family
ID=36499284
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007556602A Pending JP2008532273A (ja) | 2005-02-25 | 2006-02-22 | マイクロ・リソグラフィー投影露光装置のための光学システム |
| JP2009006343A Pending JP2009086692A (ja) | 2005-02-25 | 2009-01-15 | マイクロ・リソグラフィー投影露光装置のための光学システム |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009006343A Pending JP2009086692A (ja) | 2005-02-25 | 2009-01-15 | マイクロ・リソグラフィー投影露光装置のための光学システム |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20080198455A1 (enExample) |
| EP (1) | EP1851574A1 (enExample) |
| JP (2) | JP2008532273A (enExample) |
| KR (1) | KR20070105976A (enExample) |
| WO (1) | WO2006089919A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1701179A1 (de) * | 2005-03-08 | 2006-09-13 | Schott AG | Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung |
| DE102006025044A1 (de) | 2005-08-10 | 2007-02-15 | Carl Zeiss Smt Ag | Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102006038454A1 (de) | 2005-12-23 | 2007-07-05 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| DE102006038398A1 (de) * | 2006-08-15 | 2008-02-21 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| JP2008216498A (ja) * | 2007-03-01 | 2008-09-18 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
| JP2009031603A (ja) | 2007-07-27 | 2009-02-12 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
| WO2009043790A2 (en) | 2007-10-02 | 2009-04-09 | Carl Zeiss Smt Ag | Projection objective for microlithography |
| JP5476565B2 (ja) * | 2008-07-25 | 2014-04-23 | 独立行政法人物質・材料研究機構 | Yag単結晶、それを用いた光学部品およびその関連機器 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4757354A (en) * | 1986-05-02 | 1988-07-12 | Matsushita Electrical Industrial Co., Ltd. | Projection optical system |
| JP2000331927A (ja) * | 1999-03-12 | 2000-11-30 | Canon Inc | 投影光学系及びそれを用いた投影露光装置 |
| JP2004526331A (ja) * | 2001-05-15 | 2004-08-26 | カール・ツアイス・エスエムテイ・アーゲー | フッ化物結晶レンズを含む対物レンズ |
| DE10210782A1 (de) * | 2002-03-12 | 2003-10-09 | Zeiss Carl Smt Ag | Objektiv mit Kristall-Linsen |
| JP2003050349A (ja) * | 2001-05-30 | 2003-02-21 | Nikon Corp | 光学系および該光学系を備えた露光装置 |
| US6683710B2 (en) * | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
| TW558749B (en) * | 2001-06-20 | 2003-10-21 | Nikon Corp | Optical system and the exposure device comprising the same |
| JP3639807B2 (ja) * | 2001-06-27 | 2005-04-20 | キヤノン株式会社 | 光学素子及び製造方法 |
| US6775063B2 (en) * | 2001-07-10 | 2004-08-10 | Nikon Corporation | Optical system and exposure apparatus having the optical system |
| TW571344B (en) * | 2001-07-10 | 2004-01-11 | Nikon Corp | Manufacturing method for projection optic system |
| JP2003161882A (ja) * | 2001-11-29 | 2003-06-06 | Nikon Corp | 投影光学系、露光装置および露光方法 |
| US7075721B2 (en) * | 2002-03-06 | 2006-07-11 | Corning Incorporated | Compensator for radially symmetric birefringence |
| JP4350341B2 (ja) * | 2002-03-26 | 2009-10-21 | キヤノン株式会社 | 光学系及び露光装置 |
| JP2003297729A (ja) * | 2002-04-03 | 2003-10-17 | Nikon Corp | 投影光学系、露光装置および露光方法 |
| AU2002356590A1 (en) * | 2002-05-08 | 2003-11-11 | Carl Zeiss Smt Ag | Lens consisting of a crystalline material |
| JP2004045692A (ja) * | 2002-07-11 | 2004-02-12 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
| US6958864B2 (en) * | 2002-08-22 | 2005-10-25 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
| JP2005537512A (ja) * | 2002-09-03 | 2005-12-08 | カール・ツアイス・エスエムテイ・アーゲー | 複屈折レンズを伴う対物レンズ |
| WO2004023172A1 (de) * | 2002-09-03 | 2004-03-18 | Carl Zeiss Smt Ag | Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen |
| DE10253353A1 (de) * | 2002-09-03 | 2004-03-11 | Carl Zeiss Smt Ag | Objektiv mit doppelbrechenden Linsen |
| DE10304116A1 (de) * | 2002-09-03 | 2004-03-11 | Carl Zeiss Smt Ag | Optimierverfahren für ein Objektiv mit Fluorid-Kristall-Linsen sowie Objektiv mit Fluorid-Kristall-Linsen |
| WO2005059645A2 (en) * | 2003-12-19 | 2005-06-30 | Carl Zeiss Smt Ag | Microlithography projection objective with crystal elements |
| JP2006113533A (ja) * | 2004-08-03 | 2006-04-27 | Nikon Corp | 投影光学系、露光装置、および露光方法 |
| WO2006047127A1 (en) * | 2004-10-21 | 2006-05-04 | Saint-Gobain Ceramics & Plastics, Inc. | Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices |
| DE102006013560A1 (de) * | 2005-04-19 | 2006-10-26 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung |
| DE102006025044A1 (de) * | 2005-08-10 | 2007-02-15 | Carl Zeiss Smt Ag | Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
| JP2009031603A (ja) * | 2007-07-27 | 2009-02-12 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
-
2006
- 2006-02-22 WO PCT/EP2006/060196 patent/WO2006089919A1/en not_active Ceased
- 2006-02-22 JP JP2007556602A patent/JP2008532273A/ja active Pending
- 2006-02-22 US US11/813,902 patent/US20080198455A1/en not_active Abandoned
- 2006-02-22 EP EP06708459A patent/EP1851574A1/en not_active Withdrawn
- 2006-02-22 KR KR1020077016953A patent/KR20070105976A/ko not_active Ceased
-
2009
- 2009-01-15 JP JP2009006343A patent/JP2009086692A/ja active Pending
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