KR20070105976A - 광학시스템, 특히 마이크로리소그래픽 투사노출장치용대물렌즈 또는 조명장치 - Google Patents

광학시스템, 특히 마이크로리소그래픽 투사노출장치용대물렌즈 또는 조명장치 Download PDF

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Publication number
KR20070105976A
KR20070105976A KR1020077016953A KR20077016953A KR20070105976A KR 20070105976 A KR20070105976 A KR 20070105976A KR 1020077016953 A KR1020077016953 A KR 1020077016953A KR 20077016953 A KR20077016953 A KR 20077016953A KR 20070105976 A KR20070105976 A KR 20070105976A
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KR
South Korea
Prior art keywords
lenses
lens
optical system
phase delay
subgroup
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020077016953A
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English (en)
Korean (ko)
Inventor
미카엘 토트체크
다니엘 크래머
토랄프 그루너
Original Assignee
칼 짜이스 에스엠티 아게
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Publication date
Application filed by 칼 짜이스 에스엠티 아게 filed Critical 칼 짜이스 에스엠티 아게
Publication of KR20070105976A publication Critical patent/KR20070105976A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
KR1020077016953A 2005-02-25 2006-02-22 광학시스템, 특히 마이크로리소그래픽 투사노출장치용대물렌즈 또는 조명장치 Ceased KR20070105976A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65627205P 2005-02-25 2005-02-25
US60/656,272 2005-02-25

Publications (1)

Publication Number Publication Date
KR20070105976A true KR20070105976A (ko) 2007-10-31

Family

ID=36499284

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077016953A Ceased KR20070105976A (ko) 2005-02-25 2006-02-22 광학시스템, 특히 마이크로리소그래픽 투사노출장치용대물렌즈 또는 조명장치

Country Status (5)

Country Link
US (1) US20080198455A1 (enExample)
EP (1) EP1851574A1 (enExample)
JP (2) JP2008532273A (enExample)
KR (1) KR20070105976A (enExample)
WO (1) WO2006089919A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1701179A1 (de) * 2005-03-08 2006-09-13 Schott AG Verfahren zur Herstellung von optischen Elementen für die Mikrolithographie, damit erhältliche Linsensysteme und deren Verwendung
DE102006025044A1 (de) 2005-08-10 2007-02-15 Carl Zeiss Smt Ag Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
DE102006038454A1 (de) 2005-12-23 2007-07-05 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
DE102006038398A1 (de) * 2006-08-15 2008-02-21 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
JP2008216498A (ja) * 2007-03-01 2008-09-18 Canon Inc 投影光学系、露光装置及びデバイス製造方法
JP2009031603A (ja) 2007-07-27 2009-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
WO2009043790A2 (en) 2007-10-02 2009-04-09 Carl Zeiss Smt Ag Projection objective for microlithography
JP5476565B2 (ja) * 2008-07-25 2014-04-23 独立行政法人物質・材料研究機構 Ｙａｇ単結晶、それを用いた光学部品およびその関連機器

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4757354A (en) * 1986-05-02 1988-07-12 Matsushita Electrical Industrial Co., Ltd. Projection optical system
JP2000331927A (ja) * 1999-03-12 2000-11-30 Canon Inc 投影光学系及びそれを用いた投影露光装置
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
DE10210782A1 (de) * 2002-03-12 2003-10-09 Zeiss Carl Smt Ag Objektiv mit Kristall-Linsen
JP2003050349A (ja) * 2001-05-30 2003-02-21 Nikon Corp 光学系および該光学系を備えた露光装置
US6683710B2 (en) * 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
TW558749B (en) * 2001-06-20 2003-10-21 Nikon Corp Optical system and the exposure device comprising the same
JP3639807B2 (ja) * 2001-06-27 2005-04-20 キヤノン株式会社 光学素子及び製造方法
US6775063B2 (en) * 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
TW571344B (en) * 2001-07-10 2004-01-11 Nikon Corp Manufacturing method for projection optic system
JP2003161882A (ja) * 2001-11-29 2003-06-06 Nikon Corp 投影光学系、露光装置および露光方法
US7075721B2 (en) * 2002-03-06 2006-07-11 Corning Incorporated Compensator for radially symmetric birefringence
JP4350341B2 (ja) * 2002-03-26 2009-10-21 キヤノン株式会社 光学系及び露光装置
JP2003297729A (ja) * 2002-04-03 2003-10-17 Nikon Corp 投影光学系、露光装置および露光方法
AU2002356590A1 (en) * 2002-05-08 2003-11-11 Carl Zeiss Smt Ag Lens consisting of a crystalline material
JP2004045692A (ja) * 2002-07-11 2004-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
US6958864B2 (en) * 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
JP2005537512A (ja) * 2002-09-03 2005-12-08 カール・ツアイス・エスエムテイ・アーゲー 複屈折レンズを伴う対物レンズ
WO2004023172A1 (de) * 2002-09-03 2004-03-18 Carl Zeiss Smt Ag Optimierverfahren für ein objektiv mit fluorid-kristall-linsen sowie objektiv mit fluorid-kristall-linsen
DE10253353A1 (de) * 2002-09-03 2004-03-11 Carl Zeiss Smt Ag Objektiv mit doppelbrechenden Linsen
DE10304116A1 (de) * 2002-09-03 2004-03-11 Carl Zeiss Smt Ag Optimierverfahren für ein Objektiv mit Fluorid-Kristall-Linsen sowie Objektiv mit Fluorid-Kristall-Linsen
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法
WO2006047127A1 (en) * 2004-10-21 2006-05-04 Saint-Gobain Ceramics & Plastics, Inc. Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices
DE102006013560A1 (de) * 2005-04-19 2006-10-26 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage sowie Verfahren zu dessen Herstellung
DE102006025044A1 (de) * 2005-08-10 2007-02-15 Carl Zeiss Smt Ag Abbildungssystem, insbesondere Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
JP2009031603A (ja) * 2007-07-27 2009-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
US20080198455A1 (en) 2008-08-21
JP2008532273A (ja) 2008-08-14
EP1851574A1 (en) 2007-11-07
WO2006089919A1 (en) 2006-08-31
JP2009086692A (ja) 2009-04-23

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