AU2002356590A1 - Lens consisting of a crystalline material - Google Patents

Lens consisting of a crystalline material

Info

Publication number
AU2002356590A1
AU2002356590A1 AU2002356590A AU2002356590A AU2002356590A1 AU 2002356590 A1 AU2002356590 A1 AU 2002356590A1 AU 2002356590 A AU2002356590 A AU 2002356590A AU 2002356590 A AU2002356590 A AU 2002356590A AU 2002356590 A1 AU2002356590 A1 AU 2002356590A1
Authority
AU
Australia
Prior art keywords
crystalline material
lens consisting
lens
crystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002356590A
Inventor
Birgit Enkisch
Hartmut Enkisch
Toralf Gruner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/EP2002/005050 external-priority patent/WO2002093209A2/en
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2002356590A1 publication Critical patent/AU2002356590A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2002356590A 2002-05-08 2002-11-13 Lens consisting of a crystalline material Abandoned AU2002356590A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
PCT/EP2002/005050 WO2002093209A2 (en) 2001-05-15 2002-05-08 Lens system consisting of fluoride crystal lenses
EPPCT/EP02/05050 2002-05-08
PCT/EP2002/012690 WO2003096124A1 (en) 2002-05-08 2002-11-13 Lens consisting of a crystalline material

Publications (1)

Publication Number Publication Date
AU2002356590A1 true AU2002356590A1 (en) 2003-11-11

Family

ID=29414645

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002356590A Abandoned AU2002356590A1 (en) 2002-05-08 2002-11-13 Lens consisting of a crystalline material

Country Status (5)

Country Link
JP (1) JP2005524985A (en)
KR (1) KR20050003410A (en)
CN (1) CN1327294C (en)
AU (1) AU2002356590A1 (en)
WO (1) WO2003096124A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1851574A1 (en) * 2005-02-25 2007-11-07 Carl Zeiss SMT AG Optical system, in particular objective or illumination system for a microlithographic projection exposure apparatus
DE102005019726A1 (en) * 2005-04-22 2006-10-26 Carl Zeiss Smt Ag Projection objective lens mounting and aligning method, for lithography, involves assembling optical units to form lens, which is mounted/aligned based on azimuth angular position, which is determined based on inhomogeneities of one unit
DE102007059071A1 (en) * 2007-12-07 2009-06-10 Carl Zeiss Smt Ag Optical element e.g. illumination lens, manufacturing method for microlithography system, involves manufacturing optical usable surfaces by material processing, where connecting surface cuts continuous optical usable surface
JP6381210B2 (en) * 2013-12-27 2018-08-29 キヤノン株式会社 Optical element unit, method for adjusting relative position in rotation direction, exposure apparatus, and method for manufacturing article
CN108151626B (en) * 2018-01-19 2023-11-28 天活松林光学（广州）有限公司 Spherical surface normal angle quick measuring device of spherical prism
DE102022118146B3 (en) 2022-07-20 2023-12-07 Carl Zeiss Jena Gmbh Method for producing an optical element for a lithography system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4022904C2 (en) * 1990-07-16 2001-05-23 Siemens Ag Method for applying a marking indicating the orientation of the crystal lattice of a crystal wafer
JP3849996B2 (en) * 1997-09-30 2006-11-22 三井化学株式会社 Method for manufacturing single crystal optical element
US6201634B1 (en) * 1998-03-12 2001-03-13 Nikon Corporation Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element
US6324003B1 (en) * 1999-12-23 2001-11-27 Silicon Valley Group, Inc. Calcium fluoride (CaF2) stress plate and method of making the same
KR20040015251A (en) * 2001-05-15 2004-02-18 칼 짜이스 에스엠티 아게 Objective with fluoride crystal lenses
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
TW571344B (en) * 2001-07-10 2004-01-11 Nikon Corp Manufacturing method for projection optic system
WO2003009017A1 (en) * 2001-07-17 2003-01-30 Nikon Corporation Method for producing optical member

Also Published As

Publication number Publication date
JP2005524985A (en) 2005-08-18
CN1327294C (en) 2007-07-18
CN1625718A (en) 2005-06-08
WO2003096124A1 (en) 2003-11-20
KR20050003410A (en) 2005-01-10

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase
TH Corrigenda

Free format text: IN VOL 18, NO 2, PAGE(S) 492 UNDER THE HEADING APPLICATIONS OPI NAME INDEX UNDER THE NAME CARL ZEISS SMT AG, APPLICATION NO. 2002356590, UNDER INID (43) CORRECT THE PUBLICATION DATE TO READ 24.11.2003