CN1327294C - Lens consisting of a crystalline material - Google Patents
Lens consisting of a crystalline material Download PDFInfo
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- CN1327294C CN1327294C CNB02828920XA CN02828920A CN1327294C CN 1327294 C CN1327294 C CN 1327294C CN B02828920X A CNB02828920X A CN B02828920XA CN 02828920 A CN02828920 A CN 02828920A CN 1327294 C CN1327294 C CN 1327294C
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- crystal orientation
- lens
- lenticular unit
- crystal
- projection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Abstract
The invention relates to a method for producing an optical blank (1) consisting of a crystalline material, as a preliminary stage for the production of a lens or a lens element for an objective, especially a projection objective for a microlithography projection exposure installation. According to the inventive method, the orientation of a first crystal direction (3) defined inside the crystalline structure is determined first of all. The optical blank (1) is then worked in such a way that the first crystal direction (3) is essentially perpendicular to an optical raw surface (7) of the optical blank (1). A marking is then applied to the optical blank (1) or to a holding mount of the optical blank (1), said marking being related to a second crystal direction (11) in a defined manner. The second crystal direction forms an angle different from zero with the first crystal direction (3).
Description
The present invention relates to make with crystalline material the method and the optical blank of optical blank, optical blank is intended for the preproduction phase of making lens or lenticular unit.Therefore the invention still further relates to the method for making lens or lenticular unit.Lens or lenticular unit are used on object lens, particularly use on the projection objective of the apparatus for projection exposure of microlithography technology.Therefore the invention still further relates to object lens, the particularly projection objective of microlithography technology apparatus for projection exposure.
At US 6,201, the known method of making optical blank with crystal of fluoride in 634.Make the projection objective of microlithography technology apparatus for projection exposure with optical blank.Excellent is object lens orientation of its axis＜111 of object lens〉crystal orientation.According to US 6,201,634, select＜111〉crystal orientation, so that the disturbing effect of stress birefrin is minimized.
In general birefringent lens can cause no polarization ray is divided into and has two rays of different polarization state and different velocity of propagation and direction separately.If birefringent lens is used on object lens, like this if do not arrange corresponding correction measure then to cause the reduction of resolving power of lens.For example might cause birefringence effect on the lens by the stress birefrin of the mechanical stress of manufacture method or object lens decision.Particularly birefringence plays an important role on crystal optics.Anisotropic crystal is birefringent.
But isotropic crystal also has the intrinsic birefringence as cube crystal of fluoride, this particularly the VUV-wavelength (＜apparent in view 200nm) time.Cube crystal of fluoride such as calcium fluoride and its operation wavelength of barium fluoride are the lens materials in the projection objective excellence of this wavelength coverage.Therefore the isotropy birefringece crystal that plays interference effect in this wavelength coverage can be revised by adequate measures.
Because the clear and definite sign in crystal orientation plays an important role below, at first introducing is used to indicate the crystal orientation, the label symbol of the lens in crystalline plane and its lens orientation of its axis crystal orientation.
The indication of crystallographic direction is indicated in "＜" and "〉" between, the crystrallographic plane indication is indicated between " { " and " } ".Wherein crystallographic direction illustrates the plane normal direction on corresponding crystal plane all the time.So crystallographic direction＜100〉be in crystrallographic plane { the plane normal direction on the 100}.The oikocryst of crystal of fluoride that belongs to cubic crystal is to for＜110 〉,
＜101 〉,
＜011 〉,
＜111 〉,
＜100 〉,＜010 〉,＜001 〉,
With
Oikocryst is to＜100 〉,＜010 〉,＜001 〉,
With
Be on the symmetrical characteristic basis of cubic crystal equivalence, the just following crystal orientation of pointing to one of these crystal orientation obtains prefix and is " (100) ".With these oikocrysts to one of vertical crystalline plane obtain corresponding prefix and be " (100) ".Its lens axis obtains corresponding prefix with these oikocrysts to parallel lens and is " (100) ".
Oikocryst is to＜110 〉,
＜101 〉,
＜011 〉,
With
Be mutually equivalence equally, then point to below these oikocrysts to one of the crystal orientation obtain prefix and be " (110) ".Perpendicular to these oikocrysts to one of crystalline plane correspondingly obtain prefix for " (110) ".Its lens axis correspondingly obtains prefix with these oikocrysts to parallel lens and is " (110) ".
Oikocryst is to＜111 〉,
With
Be equivalent mutually equally, be " (111) " so the crystal orientation in one of these crystal orientation of following sensing obtains prefix.With these oikocrysts to one of vertical crystalline plane correspondingly obtain prefix and be " (111) ".Its lens axis correspondingly obtains prefix with these oikocrysts to parallel lens and is " (111) ".
Relate to below above-mentioned oikocryst to one of explanation be suitable for equally the equivalence oikocryst to.
From J.Burnett et al. (Physical Review B, 64 volumes (2001), 241102-1 to 241102-4 page or leaf) article, known in " the intrinsic birefringence of calcium fluoride and barium fluoride crystal ", the lens of being made by calcium fluoride and barium fluoride crystal have the intrinsic birefringence.Wherein the intrinsic birefringence is relevant with the material direction and the directions of rays of crystal of fluoride lens to a great extent.Birefringence acts on along (110) crystal orientation the biglyyest and passes on the ray of lens.The measurement of carrying out shows there, go up the birefringence that occurs when wavelength X=156.1nm carries out ray propagates in calcium fluoride crystal orientation (110) and be (11.8 ± 0.4) nm/cm, the birefringence that the birefringence that occurs during wavelength X=193.09nm occurs during for (3.6 ± 0.2) nm/cra and wavelength X=253.65nm is (0.55 ± 0.07) nm/cra.As narrating in theory, opposite calcium fluoride does not have the intrinsic birefringence when ray is propagated in (100) crystal orientation with in (111) crystal orientation.Therefore the intrinsic birefringence is relevant with direction to a great extent and along with the reduction of wavelength obviously increases.
From J.Burnett et al. (spie ' s oemagazine, in March, 2002 the 23-25 page or leaf,
Http:// oemagazine.com/from TheMagazine/mar02/brief.html) represented to have the crystal of fluoride intrinsic birefringence of cubic crystal structure and the relation of angle among " using the problem of calcium fluoride " article Fig. 4.Wherein the intrinsic birefringence of ray not only with the field angle of ray but also relevant with the position angle.Find out significantly from Fig. 4, if lens orientation of its axis (100) crystal orientation intrinsic birefringence has four times azimuthal symmetry, if with lens orientation of its axis (111) if crystal orientation intrinsic birefringence has three times azimuthal symmetry and lens orientation of its axis (110) crystal orientation intrinsic birefringence that two times azimuthal symmetry is arranged.It is to reduce the birefringent disturbing effect of intrinsic that two fluoride lens are rotated on mutually around its lens axis.It is suitable being 45 ° for two its rotation angle of lens in its lens orientation of its axis (100) crystal orientation, it is suitable being 60 ° for two its rotation angle of lens in its lens orientation of its axis (111) crystal orientation, and it is suitable being 90 ° for two its rotation angle of lens in its lens orientation of its axis (110) crystal orientation.By using paired (100) simultaneously, (111) and (110) lens can reduce the aberration of two mutually orthogonal polarization states.In addition by using calcium fluoride lens and barium fluoride lens can also revise the birefringent disturbing effect of intrinsic simultaneously, because according to Fig. 2 of this piece article, the birefringence in barium fluoride and the comparable crystal orientation of calcium fluoride has contrary sign.
For example known projection object lens and microlithography technology apparatus for projection exposure from patented claim WO 01/50171 A1 (US series No.10/177580) and summary literal wherein.Numerical aperture was 0.8 and 0.9 projection objective pure refraction and that hold concurrently reflection and refract light when the embodiment of this application had represented that operation wavelength is 193nm and 157nm.Use calcium fluoride as lens material.
In having patent application PCT/EP 02/05050 of disclosed applicant in advance, various modification methods have not been narrated, so that reduce for example birefringent disturbing effect of intrinsic in WO 01/50171 A1 (US series No.10/177580) embodiment.Parallel use is disclosed in addition by the lens of same crystal of fluoride manufacturing and (100) lens and (111) lens or (110) lens that use the correction coating.To apply for that disclosed content can be incorporated among the application widely.
The modification method of Xu Shu reduction birefringence disturbing effect is to be based upon on the lens basis of using relative relay lens axis before this.Rotation angle between two lens is for example relevant with which crystal orientation of lens orientation of its axis.The lens of making according to the method for the US 6,201,634 of narration before this, for example its lens axis is meant to (111) crystal orientation.In order to reduce the rotation angle that is fit between two (111) lens that the birefringent disturbing effect of intrinsic draws before this narration in this case is 60 °.Wherein rotation angle relates to the crystal structure of two lens.Yet the crystal structure of lens can not be found out from appearance.
Task of the present invention is, explanation is made optical blank as making lens or the method for lenticular unit preproduction phase by crystalline material, this method is considered, when lens that optical blank is made or lenticular unit use on object lens subsequently, can arrange to rotate an angle of predesignating relatively with reference to its crystal structure.
This task is to use according to claim 1 to make the method for optical blank by crystalline material and according to the optical blank of claim 13, make the method for lens or lenticular unit by crystalline material according to claim 16 and claim 18, and according to the lens or the lenticular unit of claim 28 and 32, according to the object lens of claim 33 and 37, make according to the microlithography technology apparatus for projection exposure of claim 39 with according to claim 40 that the method for semiconductor devices solves.
The advantage of structure of the present invention is to draw from the feature of relevant claim.
For in the rotation angle that can be adjusted at the rotation angle of predesignating between lens or the lenticular unit on the object lens and can adjust object lens or on reference direction between two lens or the lenticular unit, predesignate, wherein rotation angle is relevant with the crystal structure of lens or lenticular unit, has a sign of defining relation to suit if each lens or each lenticular unit or its support member have with the lens crystal structure.
For example can be understood as by bonding about lenticular unit and seamlessly to be combined into single lens by optics.In general lenticular unit is represented the assembly of single lens.
Excellent is with cube crystal of fluoride calcium fluoride for example, and barium fluoride or strontium fluoride are as the original material of optical blank.
There has been net shape to require a lot of shape processing and surface working process before up to lens or lenticular unit.Because lens or lenticular unit are made of crystalline material, in general the single crystal ingot that for example can make in US 6,201,634 methods of having narrated or single crystal rod are as original material.For example at first manufacture an optical blank by saw and mill by single crystal ingot.The preproduction phase of lens or lenticular unit is called optical blank.Can manufacture one or more lens or lenticular unit by optical blank.If manufacture a plurality of lens or lenticular unit by an optical blank, so optical blank is divided into single blank by saw, wherein single optical blank grinds and/or polishes in the procedure of processing of back, so that can carry out optical measurement on the surface of preprocessing.Then ready like this optical blank is constituted single cylindrical material sheet.
Excellent now is that if optical blank has been processed into an optical blank surface, its surface normal points to the first interior crystal orientation of crystal structure direction of definition.This oikocryst usual practice that excellent is is in this way＜100 〉,＜111〉or＜110〉crystal orientation.Require on optical blank, at first to determine first crystal orientation for this reason.Can before being divided into single optical blank, optical blank carry out in definite first crystal orientation on the optical blank.Also can at first carry out sawing and definite separately on single optical blank then.Optical blank is processed like this by sawing and grinding, made first crystal orientation almost perpendicular to the optical blank surface.Deviation between excellent is first crystal orientation and the surperficial angle of optical blank is less than 5 °.This moment, the front or the reverse side of material piece represented on the optical blank surface.
Coat the mark that defining relation is arranged with second crystal orientation in next procedure on optical blank or its support member, there is an angle that is not equal to 0 ° in second crystal orientation and first crystal orientation.Wherein second crystal orientation be an oikocryst equally to or the crystal orientation that in crystal structure, defines, for example＜331〉crystal orientation or＜511〉crystal orientation.
Mark can be fixedly connected at the optical blank exterior circular column or with optical blank on the support member the some shape or draw the groove of shape.Wherein support member can be by metal, and pottery or glass ceramics are made.
For example can set up the defining relation between second crystal orientation and the mark like this, mark is represented a reference direction, and reference direction is perpendicular to first crystal orientation and represent the projection of second crystal orientation on the plane of pointing to first crystal orientation on its plane normal.Have an axis of symmetry on the optical blank of cylindrical shape, the axis of symmetry points to the direction in first crystal orientation basically, and excellent is that the reference direction and the axis of symmetry intersect.So for example mark represent reference direction and optical blank outside cylinder or with the intersection point of support member.Therefore also be second crystal orientation that is projected with tag definitions with the associated coordinate system of optical blank on the position angle.The position angle is defined as angle between reference direction and the coordinate axis, and this coordinate axis intersects perpendicular to axis of symmetry with axis of symmetry.
When determining first crystal orientation, optical blank can be measured particularly roentgen's (R ntgen refers to X ray) measurement radiation exposure of ray with one.For example { will measure the ray reflection on the 111} crystalline plane and produce a corresponding bragg reflection in the crystalline plane that belongs to first crystal orientation.Because it is known measuring the wavelength of ray and the material of optical blank, the measurement ray of incident and reflection relates to the nominal angle in crystal orientation because the bragg reflection law is known.Now optical blank is adjusted to the bragg reflection of finding first crystal orientation always with respect to cloth loudspeaker lattice measurement mechanism.From the relative orientation of measurement mechanism and optical blank, can determine to relate to the orientation in first crystal orientation of plane normal on the optical blank surface of optical blank now.If the plane normal on optical blank surface and first crystal orientation are inconsistent, optical blank is for example processed up to angular deviation less than ± 5 ° by grinding.
In the form of implementation of excellence optical blank rotatably is supported on the axle, this is perpendicular to the optical blank surface of optical blank.Now to different rotation angle, under simple scenario on 0 ° and 90 ° definite bragg reflection.
Can determine reference direction by calculating bragg reflection equally.To measure ray and reflect this moment on the crystalline plane that belongs to second crystal orientation.
Can determine the position of reference direction selectively by means of Laue-method.
It is suitable selecting reference direction like this, a light on the lens of making by optical blank subsequently, owing to birefringent reason for example obtains two maximum aberrations that are in the polarization state of orthogonal linear, if this light is perpendicular to the projection on the plane in first crystal orientation when parallel with reference direction.If people are used to reduce intrinsic birefringence disturbing effect with relative relay lens as modification method, then owing to the reason of this mark should be adjusted above-mentioned rotation angle easily.Also possible mark reference direction obtains minimum aberration for reference direction light, if it is when being parallel to reference direction perpendicular to the projection on the plane in first crystal orientation.
If first crystal orientation point to＜100〉crystal orientation or＜111〉crystal orientation or during with the crystal orientation of these crystal orientation equivalences, then be suitable, if second crystal orientation perpendicular to the projection on the plane in first crystal orientation is being, be parallel to＜110〉crystal orientation or be parallel to when belonging to same plane, equivalent crystal orientation.Be parallel to＜110〉crystal orientation or be parallel to the light that belongs to equivalent crystal orientation, in cube crystal of fluoride, obtain two then and be in the maximum aberration of orthogonal polarization state.
If first crystal orientation sensing＜111〉crystal orientation or equivalent with it crystal orientation, so excellence is that second crystal orientation points to＜331〉or equivalent with it crystal orientation.
If first crystal orientation sensing＜100〉crystal orientation or equivalent with it crystal orientation, so excellence is that second crystal orientation points to＜511〉or equivalent with it crystal orientation.
Can cause the material damage at the optical blank surf zone because be used for determining the measurement ray of bragg reflection, suitable is by grinding or polishing this material area of the measured ray process of optical blank to be removed.
In this way can the excellent lens or the lenticular unit that optical blank are used to make object lens as initial product.
If when making lens or lenticular unit with the optical blank of preparing so now, so the optical surface of lens or lenticular unit is processed like this, the lens axis is adjusted into almost parallel with the direction in first crystal orientation, perhaps parallel with the surface normal on optical blank surface.The angular deviation that excellent is between first crystal orientation and lens axis is less than 5 °.Produce the lens surface of lens bending by optical blank surfacing and polishing to optical blank.If relate to the rotation symmetrical surface, then the lens axis is the axis of symmetry.The center line that the lens axis can be by the beam injected when non-rotating symmetrical surface or given by a straight line is minimum about the x-ray angle of all rays in the lens.The revision board that for example relates to lens refraction or diffraction and have a free shape correction surface can be used as lens.If flat board is arranged on the raypath of object lens, also they can be regarded as lens.Dull and stereotyped at this moment lens axis is perpendicular to the lens surface on plane.
If the mark of the reference direction that will coat before this when making lens or lenticular unit with optical blank is lost, should note the mark of reference direction being transferred to lens or lenticular unit or transferring on its support member.
With lens or lenticular unit use high power optical for example during the microlithography technology projection objective angular deviation between the lens axis and first crystallographic direction have important effect, even it is less than 5 °.Therefore excellent is determine this angular deviation very exactly.For example use roentgen's diffraction method this moment.Excellent in addition is if not only the orientation in angular dimension but also first crystal orientation is known.The orientation can be described with bias direction.Perpendicular to the lens axis with in the projection that obtains perpendicular to the bias direction on the plane of lens axis as first crystal orientation.Then on lens or lenticular unit with bias direction for example in the enterprising row labels in the edge of lens.Mark can also be coated on the support member of lens or lenticular unit selectively.When if lens or lenticular unit or its support member have had the mark of a reference direction, so can also determine to have between reference direction and the bias direction angle of symbol and it is distributed to lens or lenticular unit.For example angle value can be stored in material data of having stored lens or lenticular unit and a database the making data.
In a selectable process, can also at first the optical blank of being made by crystalline material be manufactured lens or lenticular unit and coat the mark in second crystal orientation.This moment, for example the scioptics surfacing manufactured lens with polishing by optical blank.This moment, surface was to process like this, make axis of lens line parallel in excellence be oikocryst to first crystal orientation.Coat mark in next procedure on lens or lenticular unit or its support member, there is the relation of a definition in the mark and second crystal orientation, and second crystal orientation and first crystal orientation have and be different from 0 ° angle.If lens orientation of its axis＜111〉crystal orientation or＜511〉crystal orientation, if lens orientation of its axis＜100〉during the crystal orientation, this moment second crystal orientation can be oikocryst equally to or crystal structure in the crystal orientation of a definition, for example＜331〉crystal orientation.
For example mark can be lens or lenticular unit exterior circular column or with support member that lens or lenticular unit are fixedlyed connected on the some shape or draw the groove of shape.Wherein support member can be by metal, and pottery or glass ceramics are made.
For example can set up the defining relation between second crystal orientation and the mark like this, mark is represented a reference direction, and reference direction is perpendicular to the lens axis and represent the projection of second crystal orientation on its plane normal sensing lens axis direction.Excellent is reference direction and lens axes intersect.So mark for example represent reference direction and lens or lenticular unit outside cylinder or with the intersection point of its support member.Therefore also be second crystal orientation that is projected with tag definitions with lens or the associated coordinate system of lenticular unit on the position angle.
Can use the method for having advised in order to determine reference direction for optical blank.If the position of lens is adjustable, therefore excellent is when measuring bragg reflection, will measure the place of ray shoots in a definition of curved lens surface.If particularly measuring is that suitable is in the lens top area with the measurement ray shoots when the different position of rotation of lens carries out.
For can be owing to not covered from shade on convex lens surface, excellent be so selected second crystal orientation, will be used for determining that the ray of first crystal orientation or employed measurement ray of injecting of reference direction and refraction is not disturbed by the geometric configuration of lens.
Excellent is with cube crystal of fluoride such as calcium fluoride, barium fluoride or strontium fluoride, as the crystalline material of wavelength less than the 200nm object lens.
Have only when wavelength during less than 200nm the intrinsic birefringence of cube crystal of fluoride so big influence is just arranged, require suitable correction measure.Therefore at first determine reference direction and require in case of necessity to determine that bias direction suits for using.Excellent is the reference direction mark will be arranged or have the lens of bias direction mark or lenticular unit to use on object lens in case of necessity, and scioptics or lenticular unit rotate relatively around its lens axis and reduce the birefringence disturbing effect thereon.With the mark relevant lens are on purpose rotated and become very simple with the crystal orientation.Can determine the single lens of object lens or the rotation angle between the lenticular unit like this owing to know the birefringent characteristic of cube crystal of fluoride and known corrections method in theory in advance, birefringence is obviously reduced the disturbing effect of object lens imaging.
Suitable especially is, if when determining rotation angle, also consider angular dimension and bias direction known between first crystal orientation and lens axis for each lens.
When if the optical effect of lens and lenticular unit is relevant to a great extent with the angular deviation between first crystal orientation and the lens axis, definite separately bias direction and deviation mark are only excellent.So scioptics around its lens axis suitably numerical value of predesignating of rotation can influence effect like this to the object lens imaging function, the acting in conjunction by a plurality of mutual relay lens or lenticular unit produces correcting action.Therefore can also use lens or the lenticular unit that angular deviation is arranged between first crystal orientation and lens axis.This makes and becomes very easy by crystalline material manufacturing lens or lenticular unit, because can ignore manufacturing tolerance.
Can relate to pure refraction projection object lens this moment on object lens, pure refractive objective lens is to be made of a lot of lens of arranging around optical axial rotation symmetry, or relates to the projection objective of holding concurrently reflected light and refract light Aviar.
Excellent is this projection objective can be used on the microlithography technology apparatus for projection exposure, and this equipment comprises illuminator from light source, and the mask orientation system has the mask of structure, projection objective, the photosensitive layer of object lens orientation system and optical sensitive.
Can make semiconductor device with the microlithography technology projecting illumination system.
Be described in detail the present invention by means of accompanying drawing.
Fig. 1 represents a cross section by optical blank with sketch;
Fig. 2 vertical view of sketch presentation graphs 1 optical blank;
Fig. 3 represents by adding a cross section of frame lens with sketch;
Fig. 4 adds the vertical view of frame lens with sketch presentation graphs 3;
Fig. 5 represents a cross section by other embodiment lens with sketch;
Fig. 6 vertical view of the lens of sketch presentation graphs 5;
Fig. 7 represents the skeleton view of object lens with sketch;
Fig. 8 represents a lens cross section of projection objective; With
Fig. 9 represents apparatus for projection exposure with sketch.
Narrated the manufacturing of calcium fluoride lens as an embodiment, its lens axis points to basically＜and 111〉crystal orientation.But this manufacture method can also be used and make lens by other crystalline materials with cubic crystal structure such as barium fluoride or strontium fluoride.The lens axis can also refer to＜100 in addition〉or＜110〉crystal orientation.This method is not only applicable to make the plane parallel lens can also be applicable to that manufacturing has the lens or the lenticular unit of curved surface.
Preparatory stage as the manufacturing lens is at first made an optical blank.Fig. 1 and 2 represents the optical blank 1 made with the inventive method with sketch.Fig. 1 has represented along the cross section of the straight line A-A that draws at Fig. 2 vertical view by optical blank.
In first step, determine calcium fluoride optical blank＜111 in this situation〉orientation in crystal orientation 3.At this moment＜111〉crystal orientation 3 is perpendicular to some { 111} crystalline plane 5 that are drawn on Fig. 1.Can use more high-precision crystallography method, for example determine by obtaining divisional plane or producing the corrosion pitting.People can improve determining of crystal orientation with roentgen's diffraction method.The instrument that is fit to when using monochromatic roentgen-ray is a goniometer for this reason.Determine { the appearance of 111} crystalline plane 5 bragg reflections by means of table values known from document.Wherein relevant with refraction table values illustrates desired incident angle.People will fluoridize calcium tablet around rotating perpendicular to an axle fluoridizing calcium tablet when measuring.Therefore people obtain the deviation of different rotary angle＜111〉crystal orientation and calcium fluoride plate plane normal.Should determine the deviation of at least two position of rotation.Measure in this embodiment and carry out at 0 ° and 90 °.Can be additionally on 180 ° and 270 ° or other intermediate angle, measure in order to improve measuring accuracy.
Like this calcium tablet is fluoridized in processing in second step, and the plane normal of fluoridizing calcium tablet is parallel to＜111〉crystal orientation 3 direction, so＜111〉crystal orientation 3 perpendicular to optical blank surface 7.This moment, as the basis that has purpose to revise, that is to say by sawing or grinding had definition ground processing fluoridizing calcium tablet with measured deviation.The plane normal of fluoridizing calcium tablet after this process points to＜111〉crystal orientation, and its deviation is less than 5 °.
In the 3rd step, fluoridizing the reference direction 9 of determining to have defining relation on the calcium tablet with other crystal orientation.The plane normal of fluoridizing calcium tablet points to＜111〉crystal orientation 3, and this is suitable for, and discern three crystal orientation＜110 〉,＜011〉and＜101, perhaps＜100 〉,＜010〉and＜one of 001〉crystal orientation, these are grouped into center on＜111〉crystal orientation three ripple symmetries.Therefore what is interesting is, if because owing to the birefringent reason light of intrinsic calcium fluoride lens＜110〉crystal orientation or when moving in the crystal orientation of equivalence with it, light obtains the maximum aberration of two mutually orthogonal linear polarization states.Light is＜100〉crystal orientation or with it the equivalence the crystal orientation move, optics does not obtain aberration.Three crystal orientation＜110 〉,＜011〉and＜35 ° of 101〉each self intersection angles, three crystal orientation＜100 〉,＜010〉and＜001 and＜angle between 111〉crystal orientation is 55 °.Owing to the physics reason cannot be measured in roentgen's refraction of (110) or (100) of calcium fluoride structure crystal crystalline plane.Therefore people help with the bragg reflection of other crystalline plane, and these crystalline plane and (100) or (110) crystalline plane have the relation of a definition.For example can use (331)-bragg reflection.Three crystal orientation＜331 〉,＜133〉and＜313 with＜111〉crystal orientation 22 ° of angles are arranged separately at this moment.Will perpendicular to 331} crystalline plane 13＜331〉crystal orientation 11 be drawn on Fig. 1, drawn wherein some.Monochromatic copper K α in calcium fluoride
1(331)-bragg reflection (8048eV) is less than 38 °.Therefore obtain injecting the angle and be 16 ° and be 60 ° with respect to the detection angle of reference planes, reference planes are by surface 7 definition of fluoridizing calcium tablet.If sheet is rotated 360 ° around plane normal, on three anglecs of rotation, can measure bragg reflection.One of direction vector that this has illustrated three important (331) crystalline plane is positioned on the plane of incidence of cloth loudspeaker lattice measurement.Projection and three crystal orientation＜110 on sheet surface 7, these three (331) crystal orientation 〉,＜011 with＜101 projection be parallel.If people determine crystal orientation＜331 〉,＜133 and＜313 projecting direction, so people have also determined crystal orientation＜110 simultaneously 〉,＜011 and＜101 projecting direction.When surface normal and＜111〉light source and detecting device must correspondingly be followed the tracks of when the crystal orientation had deviation.
On Fig. 2, reference direction 9 point to be projected＜331〉crystal orientation, this is to be projected in perpendicular to＜111〉on the plane in crystal orientation.Reference direction is crossing with the axis of symmetry 17 of optical blank 1 in addition.
Can also determine crystal orientation with laue pattern selectively.Opposite with the monochromatic roentgen-ray measurement of the usefulness of narration before this bragg reflection, using " white " in Laue method is broadband roentgen's light work.Obtain the bragg reflection of different crystalline plane wire harness for white roentgen's light people, so produce the laue pattern relevant with material characteristics.If＜111〉launch around some angles of sheet normal in the crystal orientation, consequently the light distortion image.For example analyze the Laue characteristic exactly, so can use it for definite＜111 with the software that is fit to〉deviation of crystal orientation and sheet normal.In addition image is analyzed and allow to be determined three-figure crystal orientation＜110,＜011〉and＜101, perhaps＜100 〉,＜010〉and＜001 and so orientation of definite sheet.
In the 3rd step, on optical blank 1, coat the mark 15 of mark reference direction 9 at least.Therefore mark 15 and＜331〉crystal orientation 11 has the relation of a definition.For example mark 15 can be used cutting, and corrosion is write and carried out.The right cylinder edge of optical blank 1 is provided for mark 15.Also mark can be coated in selectively on the support member of fixing with optical blank 1.
In the 5th step, make lens by optical blank 1.Fig. 3 and 4 usefulness sketches are represented the lens 31 by optical blank 1 manufacturing.This moment, lens 31 were supported by a support member 33.Fig. 3 represents that supported lens 31 are cross sections along the straight line B-B that is drawn in Fig. 4 vertical view.
This moment, lens 31 were such processing, make lens axis 35 be parallel to＜111〉crystal orientation 3.The mark 15 that is coated with before this is not damaged when processing optical blank 1.This might or polish a upper surface and a lower surface at lens and carry out because of thickness procedure of processing such as grinding, rather than carries out at the right cylinder edge.If but when the edge of fluoridizing calcium tablet also will process for example turning, be necessary mark to be transferred on the support member of fluoridizing calcium tablet and will be marked to recoat on the right cylinder edge after processing with enough precision accurately.
In a further embodiment, by cube crystal of fluoride for example the optical blank of calcium fluoride make lens, calcium fluoride＜111〉crystal orientation be substantially perpendicular to the surface of optical blank.Have only after making lens and just mark is coated on the lens.
In first step, make lens like this by optical blank, make lens orientation of its axis＜111 crystal orientation.
In second step, determine reference direction.Narrated therein to use and be used to make the same method of optical blank before this.Yet must be noted that, can in height adjust roentgen-ray hitting a little at lens surface exactly this moment.When if people measure different points on the lens surface of bending, the supporting surface of lens in height should be adjustable for this reason.Curvature should be noted that in addition owing to may exist incident and shade ray that come out.By selecting suitable bragg reflection and measuring geometric configuration subsequently and might avoid shade.
Can be on the arbitrfary point of on the clinometer rule architecture basics said method being used on the parallel plane plate on the surface.
When processing optical blank and lens, should be noted that and to produce color center with roentgenization calcium fluoride.Be approximately 30 μ m in the invasion depth of calcium fluoride during with Cu-K α-radiation exposure.For fear of what have the color center excellence is to carry out roentgen's analysis on an optical blank that carries out corresponding material removal afterwards or the lens.Mean that with Cu-K α-radiation exposure the material removal is at least 30 μ m.
Fig. 5 and 6 usefulness sketches are represented the other embodiment according to lens 51 of the present invention.Fig. 5 represents that lens 51 are along a cross section that is drawn in straight line C-C on Fig. 6.
This moment, calcium fluoride lens 53 was not (111) lens, but (100) lens.Yet lens axis 53 be not point to exactly＜100〉crystal orientation 55, and lens axis 53 and＜deviation δ appears between 100〉crystal orientation 55.At this moment＜100〉crystal orientation 55 is perpendicular to { 100} crystalline plane 57.
Except the size of angle δ, determine that bias direction 63 also is important.People obtain bias direction 63 conducts＜100〉crystal orientation 55 perpendicular to the projection on the plane of lens axis 53.
Excellent is that bias direction 63 intersects with lens axis 53.On lens 51, coat mark 65 in order to indicate bias direction 63.Mark can also be coated in Fig. 5 and 6 does not have on the support member of expression.Mark 65 on Fig. 6 has illustrated the intersection point of bias direction 63 with lens 51 exterior circular columns.
By the different position of rotation of lens 51 are determined＜100〉crystal orientation 55 bragg reflection, can determine＜100〉crystal orientation 55 with the orientation of lens axis 53.Rotate lens 51 this moment around its lens axis 53.Suitable is to determine deviation at least two position of rotation.Measure in this embodiment and carry out at 0 ° and 90 °.To measure in addition at 180 ° and 270 ° and carry out in order to improve measuring accuracy.
Selectively can also be with the deviation between laue pattern definite＜100〉crystal orientation 55 and the lens axis 53, if the measurement ray shoots of incident is when lens axis 53 directions.
For lens being centered on the rotation angle of the lens axis of its reference direction of fixedlying connected with object lens, a unique mark is just enough.Because lens 51 have the mark 67 of reference direction 69, also can determine the angle between reference direction 69 and the bias direction 63 on the position of the mark 65 of bias direction 63 and distribute to lens selectively.For example can be in the database of for example having stored lens 51 material data and process data with this angle and misalignment angle common storage.Therefore these angles and misalignment angle can be offered the optimization method use.
Fig. 7 represents a embodiment according to object lens 71 of the present invention with sketch.Object lens are imaged as image I M with object OB.What be expressed is lens 73,75,77 and 79.Lens 73,75,77 and 79 lens orientation of its axis optical axis OA direction.Lens 73 and 75 are (111) lens, and lens 77 and 79 are made (100) lens by calcium fluoride.Lens are arranged to separately around its axis rotate in order to revise intrinsic birefringence disturbing effect, so be minimum along the difference between the corresponding aberration of two orthogonal polarization states of the aperture ray 81 of optical axis OA ragged edge and a ray.Rotation angle between (111) lens 73 and 75 is 60 °.Can easily adjust rotation angle according to the present invention, because lens 73 and 75 have the mark 83 and 85 of expression reference direction 87 and 89.Reference direction 87 and 89 represents each＜331〉crystal orientation perpendicular to the projection on the plane of each lens axis.(100) rotation angle between the lens 77 and 79 is not 45 ° accurately because on these lens each＜100〉crystal orientation be not the lens axis direction that points to exactly separately.Bias direction 95 and 97 have been represented by mark 91 and 93.The size and the orientation of deviation when the rotation angle optimization between lens 77 and 79, have been considered.Can easily adjust the rotation angle of being calculated between lens 77 and 79 by means of mark 99 and 101.Mark represented each＜511〉crystal orientation in reference direction 103 and 105 perpendicular to the projection on each lens axis plane.
Narrate optimization method below, have on the object lens of known optical design can determine on the one hand with optimization method extraordinary oikocryst to direction on single lens the lens axis direction and can determine rotation angle between the lens in addition on the one hand.A plurality of lens of this object lens are to be made by the known birefringence crystal of fluoride of birefringent characteristic.If except crystalline material and the known material orientation that relates to the lens coordinate system, for example can predict the intrinsic birefringent influence relevant with the position angle in theory with the ray opening angle.But can also know birefringent characteristic by measuring lens.Because the optical design of the birefringent characteristic of known lens and object lens, also just known the aberration of two mutually orthogonal linear polarization states that ray obtains in object lens.Below this aberration is used as absolute figure and is suitable for minimized optimization value.Also can carry out optimization with similar approach to the whole beam that constitutes by single ray.The degree of freedom that this optimization is possible is the mutual rotation angle of single lens and in the orientation of oikocryst lens axis on the basis.This suits, if only suppose that on the one hand lens orientation of its axis oikocryst is when the relation with the mutual rotation angle of other one side lens and each lens axis direction is discrete value.
Provide three degree of freedom for the lens axis direction.So the lens axis can point to (100), (111) or (110) crystal orientation.
With the lens orientation of its axis same or with it the equivalence oikocryst to combination of lenses become single group, wherein each group has two lens at least.
The discrete rotation angle of a lens combination is relevant with the orientation of lens axis.
Drawing following rotation angle setting value for the group with n (100) lens is:
γ=90 °/n+m * 90 ° ± 10 °, wherein m is an arbitrary integer.
If a group comprises two (100) lens, then ideally the rotation angle between two lens is 45 °, perhaps 135 °, and 225 ° ...
Drawing following rotation angle setting value for the group with n (111) lens is:
γ=120 °/n+m * 120 ° ± 10 °, wherein m is an arbitrary integer.
Drawing following rotation angle setting value for the group with n (110) lens is:
γ=180 °/n+m * 180 ° ± 10 °, wherein m is an arbitrary integer.
Therefore rotation angle that can lens are discrete mutually and discrete grain arrangement provide as degree of freedom.
In this parameter space, seek the rotation angle of single lens and the optimization value of grain arrangement now and be assumed to minimum value, perhaps be lower than those combinations of threshold value.
For each object lens the solution an of the best is arranged, promptly two of whole beam aberrations that are in the polarization state of quadrature are assumed to minimum value.
Yet determine that this best solution bothers very much, if when particularly a lot of lens being arranged as Fig. 8 object lens 8.Represented that on Fig. 8 wavelength is the lens cross section of double reflected light and the refract light projection objective 8 of 157nm.The optical data of these object lens is summarised in the form 1.Embodiment can learn from patented claim WO 01/50171 A1 (US series No.10/177580) and corresponding Fig. 9 or form 8.The functional mode that is described in detail object lens 8 can referenced patent application WO 01/50171 A1 (US series No.10/177580).All lens of object lens are made of calcium fluoride crystal.The numerical aperture of objective of image aspect is 0.8.
Known optimization method now, though not unconditional best solution, found for the enough good solution of object lens practical application.Known in the literature very approximate mathematical problem " shop salesperson's problem " is wherein sought a short as far as possible route for given map by the city of predesignating.
When optimization, can make in the following method known their title from document:
1. Meng Te-Carlow search
2. Mo Ni annealing
3. acceptable threshold value
4. the simulated annealing that has the interlude heating
5. genetic algorithm
In first embodiment, provide four degree of freedom (FGH) for each lens in order to revise intrinsic birefringence disturbing effect:
FGH1: (111) lens that have rotation angle and be 0 °
FGH2: (111) lens that have rotation angle and be 60 °
FGH3: (100) lens that have rotation angle and be 0 °
FGH4: (100) lens that have rotation angle and be 45 °
Wherein the rotation angle of single lens relates to a fixing reference direction on the O of object lens plane separately.
Determine the best crystal orientation and the rotation angle β that relates to the lens L801 to L817 of a fixed reference direction on projection plane O of lens axis by means of the setting value of Meng Te-Carlow-search and four degree of freedom FGH1 to FGH4 for the projection objective of Fig. 8
LForm 2 has illustrated the crystal orientation and the rotation angle β of lens axis for lens L801 to L817
LTwo aberrations that are in the polarization state of quadrature of uppermost and nethermost aperture ray also have been described for each lens.The aperture ray of two ragged edges came out to the mid point that reaches the object lens field and related to optical axis OA with each comfortable plane of delineation O ' from an object lens point a angle corresponding to image limit numerical aperture is arranged this moment.Obtaining maximum aberration is 5nm.
| Lens | The orientation of lens axis | Angle beta L[°] | The optics progressive error [nm] of the aperture ray of ragged edge topmost | The optics progressive error [nm] of the aperture ray of ragged edge bottom |
| L801 | <100> | 45 | 0.0 | -3.1 |
| L802 | <111> | 60 | -13.0 | 29.7 |
| L803 | <100> | 0 | -15.1 | -27.6 |
| L803 | <100> | 0 | -26.0 | -19.2 |
| L802 | <111> | 60 | 28.3 | -14.2 |
| L804 | <111> | 0 | -7.6 | 9.8 |
| L805 | <100> | 45 | -3.1 | -1.0 |
| L806 | <100> | 0 | 0.0 | -2.1 |
| L807 | <111> | 60 | -7.8 | 1.0 |
| L808 | <100> | 45 | 0.0 | -1.1 |
| L809 | <100> | 0 | 0.0 | -0.7 |
| L810 | <100> | 0 | -0.1 | -1.5 |
| L811 | <100> | 0 | -3.9 | -1.7 |
| L812 | <111> | 0 | 15.4 | -5.0 |
| L813 | <100> | 0 | -3.7 | -0.2 |
| L814 | <100> | 0 | -2.1 | -0.1 |
| L815 | <100> | 45 | -11.4 | -6.6 |
| L816 | <111> | 60 | -16.8 | 49.6 |
| L817 | <111> | 0 | 55.7 | -12.2 |
| Amount to | -5.0 | -2.7 |
Form 2
If people distribute to single group with lens, people obtain optimized other degree of freedom.This moment one group of lens the same oikocryst of lens orientation of its axis to.In one group lens are arranged to so mutual rotation now, the distribution that is in the aberration of orthogonal linear polarisation state by one group of two of causing almost is rotational symmetric.Can adjust the rotation angle between single group now arbitrarily, so that for example process the aberration of decision with these additional degree of freedom corrections.
Lens L801 and L814 constitute first group with (100) lens in the embodiment of form 2, and the rotation angle that wherein two lens is arranged to mutual rotation is 45 °.
Lens L802, L804, L807 and L812 constitute second group with (111) lens.Lens L802 and L807 and lens L804 and L812 constitute a son group this moment separately, in the child group, lens are arranged to can not rotate mutually or a rotation angle is arranged at most is γ=l * 120 ° ± 10 °, wherein l is an integer.Two son groups are arranged to 60 ° of angles of mutual rotation, so the rotation angle between two lens that are made of different son groups are γ=60 °+m * 120 ° ± 10 °, wherein m is an integer.
Lens L803, L805 and L815 constitute the 3rd group with (100) lens.Lens L803 and lens L805 and L815 constitute a son group this moment separately, in the child group, lens are arranged to can not rotate mutually or a rotation angle is arranged at most is γ=l * 90 ° ± 10 °, wherein l is an integer.Two son groups are arranged to mutual rotation 45, so the rotation angle between two lens that are made of different son groups are γ=45 °+m * 90 ° ± 10 °, wherein m is an integer.
Lens L808, L809 and L811 constitute the 4th group with (100) lens.Lens L808 and L808 and L809 constitute a son group this moment separately, in the child group, lens are arranged to can not rotate mutually or a rotation angle is arranged at most is γ=l * 90 ° ± 10 °, wherein l is an integer.Two son groups are arranged to mutual rotation 45, so the rotation angle between two lens of different son groups is γ=45 °+m * 90 ° ± 10 °, wherein m is an integer.
Lens L816 and L817 constitute the 5th group with (111) lens, wherein two lens are arranged to the rotation angle of 60 ° of mutual rotations.
Provide eight degree of freedom for each lens in a second embodiment:
FGH1: (111) lens that have rotation angle and be 0 °
FGH2: (111) lens that have rotation angle and be 60 °
FGH3: (100) lens that have rotation angle and be 0 °
FGH4: (100) lens that have rotation angle and be 45 °
FGH5: (110) lens that have rotation angle and be 0 °
FGH6: (110) lens that have rotation angle and be 90 °
FGH7: (110) lens that have rotation angle and be 45 °
FGH8: (110) lens that have rotation angle and be 135 °
Improve along with the number of degrees of freedom, purpose increases optimized result, yet the optimization expense increases also exponentially.Draw other degree of freedom by the thinner classification of rotation angle.
Naturally also can carry out optimization method with thinner discrete rotation angle.
When optimization, it is also conceivable that the measurement data of the discontinuity of materials of the surface data of the lens of stress birefrin or mirror and/or lens.Obtain the interference volume that occurred in this way and obtain each object lens state by means of degree of freedom, these provide good image quality jointly.
Particularly the mark bias direction and understand the oikocryst that draws separately on each lens of each lens axis and object lens between the size and the orientation of deviation consider the effect that causes owing to deviation can be in optimization the time.Accurately pointing to (100) at the lens axis, on the lens in (111) or (110) crystal orientation, the equivalent rotation angle that obtains owing to crystallization symmetry reason is arranged all the time, is γ=45 °+m * 90 ° for two (100) lens for example.If now for two (100) lens each lens axis and each extraordinary oikocryst between when occurring a deviation separately, when optimization, natural number m can be used as degree of freedom.Can suppose that wherein natural number m is numerical value 1,2 and 3.Because being marks, bias direction and reference direction cross, so can adjust the rotation angle of determining so exactly.
Narrate optimization method with single step below:
In first step, calculate its objective function for the known object lens of lens birefringent characteristic.The degree of objective function explanation birefringence disturbing effect.The aberration of polarization state that for example two of ragged edge aperture ray can be in orthogonal linear is as objective function.Also the maximal value or the mean value that the aberration of beam might be distributed is defined as objective function.With the lens rotation angle, crystal orientation and objective function are stored for these object lens states.
There is a threshold value for objective function, when being no more than the threshold value of birefringence disturbing effect, can tolerates.
In second step, check whether objective function is no more than threshold value.If being no more than threshold value this method interrupts.Carry out the 3rd step if be not less than threshold value.
In the 3rd step, now in object lens, change mutual rotation angle of lens and crystal orientation according to the degree of freedom of predesignating, can use one of said method therein, for example Meng Te-Carlow-method.
After the 3rd method, restart the first step of this method, determine the feeder number that is carried out therein.If the feeder number that is carried out surpasses maximal value, then this method is interrupted equally.
If be no more than a definite threshold value, or surpass a feeder number of predesignating, then this method is interrupted.If surpass maximum feeder number, then for example as a result of can produce a table of grading, the single object lens state with related objective function has been described therein.
Narrate the principle structure of microlithography technology apparatus for projection exposure by Fig. 9.Apparatus for projection exposure 111 has 115, one of 113, one lighting devices of a light source to have 117, one projection objectives 119 of mask and an irradiated photosensitive layer 121 of structure.Lighting device 115 pools together the light of light source 113, for example according to the operation wavelength of KrF or ArF laser instrument be radiated on the mask 117.The object lens 119 entrance pupils illumination that is ready to the monochromaticity of the distribution of light predesignated by irradiation process therein and predesignates.Mask 117 is supported on the light path by means of mask holder 113.The mask 113 of use on microlithography technology has a micrometer-nanostructured.Except so-called grid, can also use controllable micro mirror array or programmable LCD-array as the mask that has structure.The part of mask 117 or mask is imaged on the photosensitive layer 121 by photosensitive layer support 125 by means of projection objective 119.For example projection objective 119 is double reflected light and refract light object lens that Fig. 8 represents.Wherein the single lens 127 of projection objective are arranged to mutual rotation, so that birefringence disturbing effect or other effects are minimized.Owing to be easy to adjust the rotation angle of lens according to the mask of arrangement of the present invention.Photosensitive layer 121 is typically a silicon wafer, and silicon wafer is with a photaesthesia coating, promptly so-called opposing.Further making semiconductor device with irradiated photosensitive layer in the procedure of processing then.
| The L61 lens | Radius | Thickness | Glass | Refractive index when 157.13nm | 1/2 free diameter |
| 0 L801 SP1 L802 L803 SP2 L803′ L802′ SP3 Z1 L804 L805 L806 L807 L808 L809 L810 L811 L812 L813 L814 L815 L816 L817 0′ | 0.000000000 0.000000000 276.724757380 1413.944109416AS 0.000000000 0.000000000 -195.924336384 -467.658808527 -241.385736441 -857.211727400AS 0.000000000 253.074839896 857.211727400AS 241.385736441 467.658808527 195.924336384 0.000000000 0.000000000 0.000000000 432.544479547 -522.188532471 -263.167605725 -291.940616829AS 589.642961222AS -5539.698828792 221.780582003 153.071443064 309.446967518 -2660.227900099 23655.354584194 -1473.189213176 -652.136459374 -446.489459129 174.593507050 392.239615259AS 0.000000000 7497.306838492 318.210831711 428.724465129 3290.097860119AS 721.012739719 -272.650872353 131.257556743 632.112566477AS 342.127616157AS 449.261078744 144.034814702 -751.263321098AS 0.000000000 | 34.000000000 0.100000000 40.000000000 95.000000000 11.000000000 433.237005445 17.295305525 40.841112468 15.977235467 21.649331094 0.000010000 21.649331094 15.977235467 40.841112468 17.295305525 419.981357165 6.255658280 42.609155219 67.449547115 37.784311058 113.756133662 33.768525968 14.536591424 20.449887046 443.944079795 9.000000000 22.790060084 38.542735318 0.100022286 12.899131182 9.318886362 16.359499814 0.100000000 25.900313780 14.064505431 2.045119392 16.759051656 8.891640764 41.295806263 7.377912006 33.927118706 6.871397517 38.826450065 4.409527396 37.346293509 4.859754445 34.792179308 11.999872684 0.000127776 | CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 CaF2 | 1.00000000 1.00000000 1.55970990 1.00000000 1.00000000 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.00000000 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.00000000 1.00000000 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.55970990 1.00000000 1.00000000 | 82.150 87.654 90.112 89.442 90.034 90.104 92.746 98.732 105.512 118.786 139.325 119.350 118.986 108.546 102.615 95.689 76.370 76.064 73.981 90.274 92.507 100.053 106.516 110.482 110.523 108.311 104.062 104.062 104.098 104.054 103.931 103.644 103.877 99.267 96.610 96.552 96.383 94.998 95.548 95.040 95.443 95.207 81.345 74.847 70.394 54.895 48.040 33.475 16.430 |
Aspheric constants
The aspheric surface of lens L801
K 0.0000
C1 4.90231706e-009
C2 3.08634889e-014
C3 -9.53005325e-019
C4 -6.06316417e-024
C5 6.11462814e-028
C6 -8.64346302e-032
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
The aspheric surface of lens L803
K 0.0000
C1 -5.33460884e-009
C2 9.73867225e-014
C3 -3.28422058e-018
C4 1.50550421e-022
C5 0.00000000e+000
C6 0.00000000e+000
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
The aspheric surface of lens L803 '
K 0.0000
C1 5.33460884e-009
C2 -9.73867225e-014
C3 3.28422058e-018
C4 -1.50550421e-022
C5 0.00000000e+000
C6 0.00000000e+000
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
The aspheric surface of lens L805
K 0.0000
C1 2.42569449e-009
C2 3.96137865e-014
C3 -2.47855149e-018
C4 795092779e-023
C5 0.00000000e+000
C6 0.00000000e+000
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
The aspheric surface of lens L806
K 0.0000
C1 -6.74111232e-009
C2 -2.57289693e-014
C3 -2.81309020e-018
C4 6.70057831e-023
C5 5.06272344e-028
C6 -4.81282974e-032
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
The aspheric surface of lens L811
K 0.0000
C1 2.28889624e-008
C2 -1.88390559e-014
C3 2.86010656e-017
C4 -3.18575336e-021
C5 1.45886017e-025
C6 -1.08492931e-029
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
The aspheric surface of lens L813
K 0.0000
C1 3.40212872e-008
C2 -1.08008877e-012
C3 4.33814531e-017
C4 -7.40125614e-021
C5 5.66856812e-025
C6 0.00000000e+000
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
The aspheric surface of lens L815
K 0.0000
C1 -3.15395039e-008
C2 4.30010133e-012
C3 3.11663337e-016
C4 -3.64089769e-020
C5 1.06073268e-024
C6 0.00000000e+000
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
The aspheric surface of lens L816
K 0.0000
C1 -2.16574623e-008
C2 -6.67182801e-013
C3 4.46519932e-016
C4 -3.71571535e-020
C5 0.00000000e+000
C6 0.00000000e+000
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
The aspheric surface of lens L817
K 0.0000
C1 2.15121397e-008
C2 -1.65301726e-011
C3 -5.03883747e-015
C4 1.03441815e-017
C5 -6.29122773e-021
C6 144097714e-024
C7 0.00000000e+000
C8 0.00000000e+000
C9 0.00000000e+000
Claims (30)
1. make optical blank (1) as making the method that lens (31,51,73,75,79) or lenticular unit are used for the preproduction phase of object lens (71,8) with crystalline material,
It is characterized in that by following treatment step:
A) determine to be defined in the orientation in first crystal orientation (3) of orientation in the crystal structure;
B) such processing optical blank (1) makes first crystal orientation (3) be substantially perpendicular to the optical blank surface (7) of optical blank (1);
C) coat a mark (15) at optical blank (1) or on optical blank (1) support member, there is the relation of a definition in described mark this moment (15) and second crystal orientation (11), make second crystal orientation and first crystal orientation (3) have one to be not equal to zero angle,
Wherein, described mark (15) expression is perpendicular to the direction of the reference direction (9) of first crystal orientation (3), and wherein reference direction (9) expression second crystal orientation (11) is perpendicular to the projection on the plane, first crystal orientation (3).
2. according to the process of claim 1 wherein that described lens (31,51,73,75,79) or lenticular unit are the projection objectives that is used for microlithography technology apparatus for projection exposure (111).
3. according to the method for claim 1,
Wherein the position of first crystal orientation (3) is to determine by the bragg reflection direction that measurement belongs to first sets of crystal planes (5) in this first crystal orientation (3).
4. according to the method for claim 2,
Wherein to be that bragg reflection direction by the sets of crystal planes (5) measured on a plurality of measuring positions compares definite in the position of first crystal orientation (3), and there is different rotational angles described a plurality of measuring positions to the axis (17) perpendicular to the optical blank surface (7) of blank.
5. according to the method for one of claim 1 to 4,
Wherein first crystal orientation (3) point to＜100〉crystal orientation or＜111〉crystal orientation or＜110〉crystal orientation or with the crystal orientation of these crystal orientation equivalences.
6. according to the method for claim 1 to 4,
Wherein crystalline material is a calcium fluoride, strontium fluoride or barium fluoride.
7. according to the method for claim 3 or 4,
Wherein the position of reference direction (9) is to determine by the bragg reflection direction that measurement belongs to second sets of crystal planes (13) in second crystal orientation (11).
8. according to the method for claim 3 or 4,
Wherein the position of reference direction (9) is determined by means of Laue-method.
9. according to the method for one of claim 1 to 4,
A light beam is being parallel to reference direction (9) perpendicular to the projection on the plane, first crystal orientation (3), obtains two maximum or minimum aberrations that are in orthogonal linear polarisation state.
10. according to the method for one of claim 1 to 4,
Wherein first crystal orientation (3) point to＜100〉crystal orientation or with the crystal orientation or sensing＜111 of＜100〉crystal orientation equivalences crystal orientation or with the crystal orientation of＜111〉crystal orientation equivalences, and wherein second crystal orientation (11) with first crystal orientation (3) vertical plane on projection be to be parallel to＜110〉crystal orientation projection or the projection of crystal orientation on the plane vertical of equivalence with it with first crystal orientation.
11. according to the method for one of claim 1 to 4,
Wherein first crystal orientation (3) point to＜111〉crystal orientation or the crystal orientation of equivalence with it and second crystal orientation (11) point to＜331〉crystal orientation or the crystal orientation of equivalence with it, or
Wherein first crystal orientation (3) point to＜100〉crystal orientation or the crystal orientation of equivalence with it and second crystal orientation (11) point to＜511〉crystal orientation or the crystal orientation of equivalence with it.
12. according to the method for claim 3 or 4,
Wherein will be removed by those material areas that cloth loudspeaker lattice are measured the optical blank (1) that ray passes.
13. with the optical blank (1) of a kind of crystalline material as the initial product of the lens (31,51,73,75,77,79) of making object lens (71,8) or lenticular unit,
Have an optical blank surface (7), first crystal orientation (3) are substantially perpendicular to this optical blank surface,
Wherein the support member of optical blank (1) or optical blank (1) has a mark (15), and there is the relation of a definition this mark and second crystal orientation (11), and second crystal orientation and first crystal orientation (3) have and are not equal to zero angle,
Wherein, the direction of the reference direction (9) that described mark (15) expression is vertical with first crystal orientation (3), wherein reference direction (9) represents that second crystal orientation (11) is perpendicular to the projection on the plane, first crystal orientation (3).
14. according to the optical blank (1) of claim 13, wherein said lens (31,51,73,75,79) or lenticular unit are used for microlithography technology apparatus for projection exposure (111).
15. according to the optical blank (1) of claim 13, described optical blank is to make according to the method for one of claim 1 to 12.
16. use optical blank (1) to make the method for lens (31,51,73,75,77,79) or lenticular unit according to one of claim 13 to 15,
It is characterized by following treatment step:
A2) lens (31) or lenticular unit are shaped, make the direction in the crystal orientation of winning (3,55) be arranged essentially parallel to lens axis (35,53).
17., wherein have following further treatment step according to the method for claim 16:
B2) determine angular deviation between lens axis (5) and first crystal orientation (55),
C2) determine with lens by the vertical bias direction of line (53) (63,95,97), wherein bias direction (6 3,95,97) represents first crystal orientation (55) perpendicular to the projection on the plane of lens axis (53),
D2) with bias direction (63,95,97) mark is coated in lens (51,77,79) or on the lenticular unit or be coated in lens (51,77,79) or on the support member of lenticular unit, and/or determine in reference direction (69) and bias direction (63,95,97) angle between is also given lens (51,77,79) or lenticular unit with this angular distribution.
18. with the method for a kind of crystalline material manufacturing lens (31,51,73,75,77,79) or lenticular unit,
It is characterized by following treatment step:
A1) lens (31,51,73,75,77,79) or lenticular unit are shaped, make that first crystal orientation (3,55) that is orientated of definition is parallel with lens axis (35,53) basically in crystal structure;
B1) with mark (15,37,67,83,85,99,101) be coated in lens (31,51,73,75,77,79) or lenticular unit or be coated on the support member (33) of lens (31) or lenticular unit, wherein said mark (15,37,67,83,85,99,101) with second crystal orientation (11,59) relation of a definition is arranged, make second crystal orientation (11,59) and first crystal orientation (3,55) that individual zero the angle that is not equal to be arranged
Wherein, described mark (15,37,67,83,85,99,101) expression is perpendicular to lens axis (35,5 3) reference direction (9,69,87,89,103,105) direction, wherein reference direction (9,69,87,89,103,105) represent second crystal orientation (11,59) perpendicular to the projection on the plane of lens axis (35,53).
19. according to the method for claim 18,
Wherein lens axis (35,5 3) point to basically＜100〉crystal orientation or with the crystal orientation or sensing＜111 of＜100〉crystal orientation equivalences crystal orientation or with the crystal orientation or sensing＜110 of＜111〉crystal orientation equivalences crystal orientation or with
＜110〉crystal orientation of crystal orientation equivalence.
20. according to the method for claim 18 or 19,
Wherein crystalline material is a calcium fluoride, fluorine strontium or barium fluoride.
21. according to the method for claim 18 or 19,
Wherein the position of reference direction (9,69,87,89,103,105) is to determine by the bragg reflection direction that measurement belongs to the sets of crystal planes (13,61) of second crystal orientation (11,59).
22. according to the method for claim 18 or 19,
Wherein the position of reference direction (9,69,87,89,103,105) is determined by means of Laue method.
23. according to the method for claim 18 or 19,
One of them light beam is being parallel to reference direction (9,69,87,89,103,105) perpendicular to the projection on the plane, first crystal orientation (3,55), obtains two maximum or minimum aberrations of polarization state that are in orthogonal linear.
24. according to the method for claim 18 or 19,
First crystal orientation (3 wherein, 55) point to＜100〉crystal orientation or point to crystal orientation or sensing＜111 with＜100〉crystal orientation equivalences crystal orientation or sensing and＜crystal orientation of 111〉crystal orientation equivalences, and two crystal orientation (11 wherein, 59) with the first crystal orientation vertical plane on projection be to be parallel to crystal orientation＜100 or the crystal orientation of equivalence with it perpendicular to the projection on the plane of first crystal orientation (3,55).
25. according to the method for claim 21,
Wherein when the formation on lens (31,51,73,75,77,79) or the lenticular unit, will be measured lens (31,51,73,75,77,79) that ray passes by cloth loudspeaker lattice or those material areas of lenticular unit are removed.
26., have following further process method step according to the method for claim 18 or 19:
C1) determine angular deviation between lens axis (53) and first crystal orientation (55),
D1) determine the bias direction (63,95,97) vertical with lens axis (53), wherein bias direction (63,95,97) represent first crystal orientation (55) perpendicular to lens by the projection on the plane of line (53),
E1) with bias direction (6 3,95,97) mark is coated in lens (51,77,79) or on the lenticular unit or be coated in lens (51,77,79) or on the support member of lenticular unit, and/or definite reference direction (69) and bias direction (63,95,97) angle between is also given lens (51,77,79) or lenticular unit with this angular distribution.
27. lens (31,51,73,75,77,79) or a lenticular unit that is used for object lens (71,8),
Wherein lens (31,51,73,75,77,79) or lenticular unit are made by crystalline material,
Wherein the lens axis of lens (31,51) or lenticular unit (35,5 3) points to the direction of first crystal orientation (3,55) basically,
Wherein the support member (33) of lens (31,51) or lenticular unit or lens (31) or lenticular unit has the mark (15,37 that defining relation is arranged with second crystal orientation (11,59), 67,83,85,99,101), it has and is not equal to zero angle with first crystal orientation (3,55)
Wherein, described mark (15,37,67,83,85,99,101) illustrate perpendicular to first crystal orientation (3,55) reference direction (9,69,87,89,103,105) direction, wherein reference direction (9,69,87,89,103,105) expression second crystal orientation (11,59) is perpendicular to the projection on the plane, first crystal orientation (3,55).
28. according to the lens (31,51,73,75,77,79) or the lenticular unit of claim 27, wherein, described object lens are microlithography technology apparatus for projection exposure (111) projection objectives.
29. according to the lens (31,51,73,75,77,79) or the lenticular unit of claim 27, wherein lens (31,51,73,75,77,79) or lenticular unit are to make according to the claim of one of claim 18 to 27.
30. lens (51 according to one of claim 27 to 29,77,79) or lenticular unit, wherein lens (51,77,79) or support member lenticular unit or lens or lenticular unit an other mark (65,91,93) is arranged, this mark marks bias direction (63,95,97), it perpendicular to lens axis (53) and expression first crystal orientation (55) perpendicular to the projection on lens axis (53) plane.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EPPCT/EP02/05050 | 2002-05-08 | ||
| PCT/EP2002/005050 WO2002093209A2 (en) | 2001-05-15 | 2002-05-08 | Lens system consisting of fluoride crystal lenses |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1625718A CN1625718A (en) | 2005-06-08 |
| CN1327294C true CN1327294C (en) | 2007-07-18 |
Family
ID=29414645
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB02828920XA Expired - Fee Related CN1327294C (en) | 2002-05-08 | 2002-11-13 | Lens consisting of a crystalline material |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2005524985A (en) |
| KR (1) | KR20050003410A (en) |
| CN (1) | CN1327294C (en) |
| AU (1) | AU2002356590A1 (en) |
| WO (1) | WO2003096124A1 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1851574A1 (en) * | 2005-02-25 | 2007-11-07 | Carl Zeiss SMT AG | Optical system, in particular objective or illumination system for a microlithographic projection exposure apparatus |
| DE102005019726A1 (en) * | 2005-04-22 | 2006-10-26 | Carl Zeiss Smt Ag | Projection objective lens mounting and aligning method, for lithography, involves assembling optical units to form lens, which is mounted/aligned based on azimuth angular position, which is determined based on inhomogeneities of one unit |
| DE102007059071A1 (en) * | 2007-12-07 | 2009-06-10 | Carl Zeiss Smt Ag | Optical element e.g. illumination lens, manufacturing method for microlithography system, involves manufacturing optical usable surfaces by material processing, where connecting surface cuts continuous optical usable surface |
| JP6381210B2 (en) * | 2013-12-27 | 2018-08-29 | キヤノン株式会社 | Optical element unit, method for adjusting relative position in rotation direction, exposure apparatus, and method for manufacturing article |
| CN108151626B (en) * | 2018-01-19 | 2023-11-28 | 天活松林光学（广州）有限公司 | Spherical surface normal angle quick measuring device of spherical prism |
| DE102022118146B3 (en) | 2022-07-20 | 2023-12-07 | Carl Zeiss Jena Gmbh | Method for producing an optical element for a lithography system |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11106296A (en) * | 1997-09-30 | 1999-04-20 | Mitsui Chem Inc | Single crystal optical element and its production |
| US6201634B1 (en) * | 1998-03-12 | 2001-03-13 | Nikon Corporation | Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element |
| US6324003B1 (en) * | 1999-12-23 | 2001-11-27 | Silicon Valley Group, Inc. | Calcium fluoride (CaF2) stress plate and method of making the same |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4022904C2 (en) * | 1990-07-16 | 2001-05-23 | Siemens Ag | Method for applying a marking indicating the orientation of the crystal lattice of a crystal wafer |
| JP2004526331A (en) * | 2001-05-15 | 2004-08-26 | カール・ツアイス・エスエムテイ・アーゲー | Objective lens including fluoride crystal lens |
| US6788389B2 (en) * | 2001-07-10 | 2004-09-07 | Nikon Corporation | Production method of projection optical system |
| TW571344B (en) * | 2001-07-10 | 2004-01-11 | Nikon Corp | Manufacturing method for projection optic system |
| US6994747B2 (en) * | 2001-07-17 | 2006-02-07 | Nikon Corporation | Method for producing optical member |
-
2002
- 2002-11-13 CN CNB02828920XA patent/CN1327294C/en not_active Expired - Fee Related
- 2002-11-13 KR KR10-2004-7017804A patent/KR20050003410A/en active IP Right Grant
- 2002-11-13 AU AU2002356590A patent/AU2002356590A1/en not_active Abandoned
- 2002-11-13 WO PCT/EP2002/012690 patent/WO2003096124A1/en active Application Filing
- 2002-11-13 JP JP2004504053A patent/JP2005524985A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11106296A (en) * | 1997-09-30 | 1999-04-20 | Mitsui Chem Inc | Single crystal optical element and its production |
| US6201634B1 (en) * | 1998-03-12 | 2001-03-13 | Nikon Corporation | Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element |
| US6324003B1 (en) * | 1999-12-23 | 2001-11-27 | Silicon Valley Group, Inc. | Calcium fluoride (CaF2) stress plate and method of making the same |
Non-Patent Citations (1)
| Title |
|---|
| Intrinsic birefringence in calcium fluoride and barium fluoride John H. Burnett 等人,Physical Review B,Vol.64 2001 * |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20050003410A (en) | 2005-01-10 |
| AU2002356590A1 (en) | 2003-11-11 |
| WO2003096124A1 (en) | 2003-11-20 |
| JP2005524985A (en) | 2005-08-18 |
| CN1625718A (en) | 2005-06-08 |
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